FR2151130B1 - - Google Patents

Info

Publication number
FR2151130B1
FR2151130B1 FR7231319A FR7231319A FR2151130B1 FR 2151130 B1 FR2151130 B1 FR 2151130B1 FR 7231319 A FR7231319 A FR 7231319A FR 7231319 A FR7231319 A FR 7231319A FR 2151130 B1 FR2151130 B1 FR 2151130B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7231319A
Other languages
French (fr)
Other versions
FR2151130A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2151130A1 publication Critical patent/FR2151130A1/fr
Application granted granted Critical
Publication of FR2151130B1 publication Critical patent/FR2151130B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • ing And Chemical Polishing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7231319A 1971-09-01 1972-08-29 Photo mask mfr - eliminating defects by successive partial exposures Granted FR2151130A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712143737 DE2143737A1 (de) 1971-09-01 1971-09-01 Photoaetzverfahren

Publications (2)

Publication Number Publication Date
FR2151130A1 FR2151130A1 (en) 1973-04-13
FR2151130B1 true FR2151130B1 (enrdf_load_stackoverflow) 1974-08-19

Family

ID=5818349

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7231319A Granted FR2151130A1 (en) 1971-09-01 1972-08-29 Photo mask mfr - eliminating defects by successive partial exposures

Country Status (4)

Country Link
JP (1) JPS5133445B2 (enrdf_load_stackoverflow)
DE (1) DE2143737A1 (enrdf_load_stackoverflow)
FR (1) FR2151130A1 (enrdf_load_stackoverflow)
IT (1) IT963413B (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501805A (enrdf_load_stackoverflow) * 1973-05-14 1975-01-09
JPS5168772A (en) * 1974-12-11 1976-06-14 Matsushita Electronics Corp Handotaisochino seizohoho
JPS5348676A (en) * 1976-10-15 1978-05-02 Handotai Kenkyu Shinkokai Method of forming pattern
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
DE2734580C2 (de) * 1977-08-01 1979-02-15 Hoechst Ag, 6000 Frankfurt Verfahren zum Herstellen eines Originals eines Informationsträgers
JPS5429976A (en) * 1977-08-10 1979-03-06 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS5676531A (en) * 1979-11-28 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
DE3013819A1 (de) * 1980-04-10 1981-10-15 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung gedruckter leiterplatten
JPS594017A (ja) * 1982-06-30 1984-01-10 Toshiba Corp 電子ビ−ム露光方法
US4456371A (en) * 1982-06-30 1984-06-26 International Business Machines Corporation Optical projection printing threshold leveling arrangement
JPS59232418A (ja) * 1983-06-15 1984-12-27 Sumitomo Electric Ind Ltd 微細パタ−ン形成法
EP0448735B1 (en) * 1990-03-23 1997-08-06 Ushio Denki Kabushiki Kaisha Method of exposing a peripheral part of wafer

Also Published As

Publication number Publication date
FR2151130A1 (en) 1973-04-13
JPS5133445B2 (enrdf_load_stackoverflow) 1976-09-20
DE2143737A1 (de) 1973-03-08
IT963413B (it) 1974-01-10
JPS4833908A (enrdf_load_stackoverflow) 1973-05-15

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Legal Events

Date Code Title Description
ST Notification of lapse