IT1320495B1 - Crogiuolo di vetro di silice, e procedimento per la sua fabbricazione. - Google Patents

Crogiuolo di vetro di silice, e procedimento per la sua fabbricazione.

Info

Publication number
IT1320495B1
IT1320495B1 IT2000TO000512A ITTO20000512A IT1320495B1 IT 1320495 B1 IT1320495 B1 IT 1320495B1 IT 2000TO000512 A IT2000TO000512 A IT 2000TO000512A IT TO20000512 A ITTO20000512 A IT TO20000512A IT 1320495 B1 IT1320495 B1 IT 1320495B1
Authority
IT
Italy
Prior art keywords
procedure
manufacture
glass
silica crucible
crucible
Prior art date
Application number
IT2000TO000512A
Other languages
English (en)
Inventor
Atsuro Miyao
Kiyoaki Misu
Kazuhiko Tabariki
Izumi Kawakami
Kouzou Kitano
Naoyuki Obata
Hiroshi Yamaguchi
Fusaki Kimura
Original Assignee
Toshiba Ceramics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co filed Critical Toshiba Ceramics Co
Publication of ITTO20000512A0 publication Critical patent/ITTO20000512A0/it
Publication of ITTO20000512A1 publication Critical patent/ITTO20000512A1/it
Application granted granted Critical
Publication of IT1320495B1 publication Critical patent/IT1320495B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
IT2000TO000512A 1999-06-01 2000-06-01 Crogiuolo di vetro di silice, e procedimento per la sua fabbricazione. IT1320495B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15429599A JP3765368B2 (ja) 1999-06-01 1999-06-01 石英ガラスルツボおよびその製造方法

Publications (3)

Publication Number Publication Date
ITTO20000512A0 ITTO20000512A0 (it) 2000-06-01
ITTO20000512A1 ITTO20000512A1 (it) 2001-12-01
IT1320495B1 true IT1320495B1 (it) 2003-12-10

Family

ID=15581023

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000TO000512A IT1320495B1 (it) 1999-06-01 2000-06-01 Crogiuolo di vetro di silice, e procedimento per la sua fabbricazione.

Country Status (5)

Country Link
US (1) US6652934B1 (it)
JP (1) JP3765368B2 (it)
KR (1) KR100377554B1 (it)
DE (1) DE10027176C2 (it)
IT (1) IT1320495B1 (it)

Families Citing this family (35)

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US20030024467A1 (en) * 2001-08-02 2003-02-06 Memc Electronic Materials, Inc. Method of eliminating near-surface bubbles in quartz crucibles
US20030226376A1 (en) * 2002-06-10 2003-12-11 General Electric Company Fabrication of heavy walled silica tubing
JP4288652B2 (ja) * 2002-10-22 2009-07-01 ジャパンスーパークォーツ株式会社 溶融シリコンの湯面振動の判定方法
US6887949B2 (en) * 2002-11-15 2005-05-03 General Electric Company Star-branched silicone polymers as anti-mist additives for coating applications
JP4453954B2 (ja) * 2003-02-28 2010-04-21 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボの製造方法および該製造方法で製造された石英ガラスルツボ
US7383696B2 (en) 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
TWI408259B (zh) * 2006-09-28 2013-09-11 Shinetsu Quartz Prod 具有鋇摻雜內壁的矽玻璃坩堝
US8196429B2 (en) 2007-07-28 2012-06-12 Japan Super Quartz Corporation Method and apparatus for manufacturing vitreous silica crucible
JP4995069B2 (ja) * 2007-12-28 2012-08-08 ジャパンスーパークォーツ株式会社 内面結晶化ルツボおよび該ルツボを用いた引上げ方法
JP2011088755A (ja) * 2008-03-14 2011-05-06 Japan Siper Quarts Corp 石英ガラスルツボおよびその製造方法
DE102008026890B3 (de) * 2008-06-05 2009-06-04 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Vorrichtung zur Herstellung eines Tiegels aus Quarzglas
KR101156965B1 (ko) * 2008-07-03 2012-06-20 쟈판 스파 쿼츠 가부시키가이샤 석영 유리 도가니의 제조 방법, 그에 의해 제조된 석영유리 도가니 및, 그의 제조 장치
US8272234B2 (en) 2008-12-19 2012-09-25 Heraeus Shin-Etsu America, Inc. Silica crucible with pure and bubble free inner crucible layer and method of making the same
JP4903288B2 (ja) * 2009-05-26 2012-03-28 信越石英株式会社 シリカ容器及びその製造方法
US9003832B2 (en) * 2009-11-20 2015-04-14 Heraeus Shin-Etsu America, Inc. Method of making a silica crucible in a controlled atmosphere
JP4951057B2 (ja) 2009-12-10 2012-06-13 信越石英株式会社 シリカ容器及びその製造方法
JP5500684B2 (ja) * 2010-06-25 2014-05-21 株式会社Ｓｕｍｃｏ シリカガラスルツボ及びその製造方法、シリコンインゴットの製造方法
JP5500686B2 (ja) * 2010-11-30 2014-05-21 株式会社Ｓｕｍｃｏ シリカガラスルツボ
US8713966B2 (en) 2011-11-30 2014-05-06 Corning Incorporated Refractory vessels and methods for forming same
KR101638584B1 (ko) * 2011-12-22 2016-07-11 가부시키가이샤 섬코 실리카 유리 도가니의 평가 방법, 실리콘 단결정의 제조 방법
JP5844638B2 (ja) * 2011-12-29 2016-01-20 株式会社Sumco シリコンガラスルツボにおける異常サイトの検査方法
KR20140058678A (ko) * 2012-05-16 2014-05-14 신에쯔 세끼에이 가부시키가이샤 단결정 실리콘 인상용 실리카용기 및 그 제조방법
JP5941384B2 (ja) * 2012-09-25 2016-06-29 クアーズテック株式会社 シリコン単結晶引上げ用シリカガラスルツボの製造方法
JP6405828B2 (ja) * 2014-09-22 2018-10-17 株式会社Sumco ルツボ測定方法
JP6405827B2 (ja) * 2014-09-22 2018-10-17 株式会社Sumco シリカガラスルツボの製造方法
JP5946560B2 (ja) * 2015-05-13 2016-07-06 株式会社Sumco シリカガラスルツボのラマンスペクトルの三次元分布の決定方法、シリコン単結晶の製造方法
US9551649B2 (en) 2015-05-28 2017-01-24 Src, Inc. Surface sampling method, device, and system for enhanced detection of chemical and biological agents
WO2017110967A1 (ja) * 2015-12-25 2017-06-29 株式会社Sumco ルツボ検査装置、ルツボ検査方法、シリカガラスルツボ、シリカガラスルツボの製造方法、シリコンインゴットの製造方法、ホモエピタキシャルウェーハの製造方法
JP6123000B2 (ja) * 2016-05-31 2017-04-26 株式会社Sumco シリカガラスルツボの評価方法、シリコン単結晶の製造方法
JP6713382B2 (ja) * 2016-08-30 2020-06-24 クアーズテック株式会社 石英ガラスルツボの製造方法、及び石英ガラスルツボ
JP7128083B2 (ja) * 2017-11-10 2022-08-30 クアーズテック株式会社 石英ガラス部材の評価方法
JP7157932B2 (ja) * 2019-01-11 2022-10-21 株式会社Sumco シリカガラスルツボの製造装置および製造方法
CN113493925B (zh) * 2020-04-08 2024-08-02 迈图技术(山形)股份有限公司 石英玻璃坩埚及其制造方法
JP2021167267A (ja) 2020-04-08 2021-10-21 クアーズテック株式会社 石英ガラスルツボ及びその製造方法
US11821689B2 (en) * 2021-09-09 2023-11-21 James W. Masten, Jr. High efficiency heating tank

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DE3522194A1 (de) * 1985-06-21 1987-01-02 Philips Patentverwaltung Verfahren zur herstellung von glaskoerpern
WO1987005287A1 (en) * 1986-02-28 1987-09-11 Japan Oxygen Co., Ltd. Process for manufacturing glass
JP2559604B2 (ja) 1987-12-15 1996-12-04 東芝セラミックス株式会社 石英ガラスルツボの製造方法
JP2577587B2 (ja) * 1987-12-15 1997-02-05 東芝セラミックス株式会社 石英ガラスルツボ製造装置
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
JP2933404B2 (ja) * 1990-06-25 1999-08-16 信越石英 株式会社 シリコン単結晶引き上げ用石英ガラスルツボとその製造方法
EP0474158B1 (en) * 1990-09-07 1995-04-19 Mitsubishi Chemical Corporation Silica glass powder and a method for its production and a silica glass body product made thereof
JP2747856B2 (ja) 1991-10-31 1998-05-06 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法
JP2736863B2 (ja) 1994-05-31 1998-04-02 信越石英株式会社 石英ガラスルツボの製造方法
JPH10330124A (ja) * 1997-05-30 1998-12-15 Toshiba Corp 石英ガラスおよびその製造方法、ならびにその石英ガラスを用いた熱処理装置および熱処理方法

Also Published As

Publication number Publication date
KR100377554B1 (ko) 2003-03-26
JP2000344536A (ja) 2000-12-12
ITTO20000512A1 (it) 2001-12-01
DE10027176C2 (de) 2003-01-30
ITTO20000512A0 (it) 2000-06-01
DE10027176A1 (de) 2001-03-29
JP3765368B2 (ja) 2006-04-12
US6652934B1 (en) 2003-11-25
KR20010049448A (ko) 2001-06-15

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