IT1230793B - Composizione fotosensibile, processo per formare un modello usando la stessa e composto ad alto peso molecolare. - Google Patents

Composizione fotosensibile, processo per formare un modello usando la stessa e composto ad alto peso molecolare.

Info

Publication number
IT1230793B
IT1230793B IT8920689A IT2068989A IT1230793B IT 1230793 B IT1230793 B IT 1230793B IT 8920689 A IT8920689 A IT 8920689A IT 2068989 A IT2068989 A IT 2068989A IT 1230793 B IT1230793 B IT 1230793B
Authority
IT
Italy
Prior art keywords
model
molecular weight
same
high molecular
photosensitive composition
Prior art date
Application number
IT8920689A
Other languages
English (en)
Other versions
IT8920689A0 (it
Inventor
Hajime Morishita
Nobuaki Hayashi
Saburo Nonogaki
Mickiaki Hashimoto
Masato Ito
Masahiro Nishizawa
Kiyoshi Miura
Yoshiyuki Odaka
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of IT8920689A0 publication Critical patent/IT8920689A0/it
Application granted granted Critical
Publication of IT1230793B publication Critical patent/IT1230793B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
IT8920689A 1988-05-31 1989-05-30 Composizione fotosensibile, processo per formare un modello usando la stessa e composto ad alto peso molecolare. IT1230793B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63134177A JP2628692B2 (ja) 1988-05-31 1988-05-31 パターン形成方法及びカラーブラウン管の製造方法

Publications (2)

Publication Number Publication Date
IT8920689A0 IT8920689A0 (it) 1989-05-30
IT1230793B true IT1230793B (it) 1991-10-29

Family

ID=15122245

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8920689A IT1230793B (it) 1988-05-31 1989-05-30 Composizione fotosensibile, processo per formare un modello usando la stessa e composto ad alto peso molecolare.

Country Status (5)

Country Link
US (1) US5024920A (it)
JP (1) JP2628692B2 (it)
KR (1) KR910006196B1 (it)
CN (1) CN1032030C (it)
IT (1) IT1230793B (it)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6027849A (en) * 1992-03-23 2000-02-22 Imation Corp. Ablative imageable element
JPH06258823A (ja) * 1993-03-05 1994-09-16 Sanyo Chem Ind Ltd 感光性樹脂
US5725978A (en) * 1995-01-31 1998-03-10 Basf Aktiengesellschaft Water-soluble photosensitive resin composition and a method of forming black matrix patterns using the same
US5866296A (en) * 1996-01-25 1999-02-02 Toyo Gosei Co., Ltd. Photosensitive resin composition
KR19980020614A (ko) * 1996-09-10 1998-06-25 손욱 감광성 수지 조성물, 그 제조방법 및 그 감광성 수지 조성물을 이용한 패턴의 형성방법
KR100458566B1 (ko) * 1997-07-29 2005-04-20 삼성에스디아이 주식회사 블랙매트릭스또는형광막형성용수용성고분자및그제조방법
KR100450215B1 (ko) * 1997-07-29 2004-12-03 삼성에스디아이 주식회사 접착력보강형광막용슬러리및형광막패턴형성방법
KR100450214B1 (ko) * 1997-07-29 2004-12-03 삼성에스디아이 주식회사 접착력보강포토레지스트조성물
KR100428614B1 (ko) * 1997-07-29 2004-07-16 삼성에스디아이 주식회사 형광체 슬러리 조성물
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
KR20020077948A (ko) 2001-04-03 2002-10-18 삼성에스디아이 주식회사 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE549814A (it) * 1955-07-29
JPS5137138B2 (it) * 1972-01-26 1976-10-14
US4086090A (en) * 1973-07-25 1978-04-25 Hitachi, Ltd. Formation of pattern using acrylamide-diacetoneacrylamide copolymer
JPS5239289B2 (it) * 1974-07-01 1977-10-04
JPS5660431A (en) * 1979-10-24 1981-05-25 Hitachi Ltd Photosensitive composition and pattern forming method

Also Published As

Publication number Publication date
CN1038356A (zh) 1989-12-27
IT8920689A0 (it) 1989-05-30
KR900018734A (ko) 1990-12-22
JPH01302348A (ja) 1989-12-06
US5024920A (en) 1991-06-18
KR910006196B1 (ko) 1991-08-16
JP2628692B2 (ja) 1997-07-09
CN1032030C (zh) 1996-06-12

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970527