IT1197776B - Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddetto - Google Patents
Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddettoInfo
- Publication number
- IT1197776B IT1197776B IT21126/86A IT2112686A IT1197776B IT 1197776 B IT1197776 B IT 1197776B IT 21126/86 A IT21126/86 A IT 21126/86A IT 2112686 A IT2112686 A IT 2112686A IT 1197776 B IT1197776 B IT 1197776B
- Authority
- IT
- Italy
- Prior art keywords
- passive
- circuit realized
- thin layer
- obtaining thin
- above process
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
- H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49082—Resistor making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49082—Resistor making
- Y10T29/49099—Coating resistive material on a base
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Non-Adjustable Resistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Microwave Amplifiers (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT21126/86A IT1197776B (it) | 1986-07-15 | 1986-07-15 | Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddetto |
EP87201179A EP0256568B1 (en) | 1986-07-15 | 1987-06-19 | Process for obtaining thin-film circuits and passive circuit made by said process |
DE8787201179T DE3772900D1 (de) | 1986-07-15 | 1987-06-19 | Verfahren zum herstellen einer duennschichtschaltung und nach diesem verfahren hergestellte passive schaltung. |
JP62173102A JPH07101730B2 (ja) | 1986-07-15 | 1987-07-13 | 薄膜受動回路の製造方法とその方法によって製造される薄膜受動回路 |
NO872916A NO173037C (no) | 1986-07-15 | 1987-07-13 | Fremgangsmaate for aa tilveiebringe passive tynnsjikt-kretser, og en passiv krets fremstilt ved fremgangsmaaten |
US07/627,568 US5152869A (en) | 1986-07-15 | 1990-12-11 | Process for obtaining passive thin-layer circuits with resistive lines having different layer resistances and passive circuit made by said process |
GR91401653T GR3003237T3 (en) | 1986-07-15 | 1991-11-29 | Process for obtaining thin-film circuits and passive circuit made by said process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT21126/86A IT1197776B (it) | 1986-07-15 | 1986-07-15 | Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddetto |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8621126A0 IT8621126A0 (it) | 1986-07-15 |
IT8621126A1 IT8621126A1 (it) | 1988-01-15 |
IT1197776B true IT1197776B (it) | 1988-12-06 |
Family
ID=11177117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT21126/86A IT1197776B (it) | 1986-07-15 | 1986-07-15 | Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddetto |
Country Status (7)
Country | Link |
---|---|
US (1) | US5152869A (it) |
EP (1) | EP0256568B1 (it) |
JP (1) | JPH07101730B2 (it) |
DE (1) | DE3772900D1 (it) |
GR (1) | GR3003237T3 (it) |
IT (1) | IT1197776B (it) |
NO (1) | NO173037C (it) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1197776B (it) * | 1986-07-15 | 1988-12-06 | Gte Telecom Spa | Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddetto |
IT1216135B (it) * | 1988-03-18 | 1990-02-22 | Sits Soc It Telecom Siemens | Dielettrico mediante deposizioni in processo per la realizzazione di vuoto di metalli, e relativo fori metallizzati in un substrato prodotto ottenuto. |
US5310965A (en) * | 1991-08-28 | 1994-05-10 | Nec Corporation | Multi-level wiring structure having an organic interlayer insulating film |
US5288951A (en) * | 1992-10-30 | 1994-02-22 | At&T Bell Laboratories | Copper-based metallizations for hybrid integrated circuits |
US5352331A (en) * | 1993-12-07 | 1994-10-04 | Trw Inc. | Cermet etch technique for integrated circuits |
EP0697723A3 (en) * | 1994-08-15 | 1997-04-16 | Ibm | Method of metallizing an insulating layer |
US6498385B1 (en) | 1999-09-01 | 2002-12-24 | International Business Machines Corporation | Post-fuse blow corrosion prevention structure for copper fuses |
DE10039710B4 (de) * | 2000-08-14 | 2017-06-22 | United Monolithic Semiconductors Gmbh | Verfahren zur Herstellung passiver Bauelemente auf einem Halbleitersubstrat |
US6475400B2 (en) | 2001-02-26 | 2002-11-05 | Trw Inc. | Method for controlling the sheet resistance of thin film resistors |
DE10213940A1 (de) * | 2002-03-28 | 2003-10-30 | Bosch Gmbh Robert | Verfahren zur Herstellung einer auf einem Substrat aufgebauten Dünnschichtanordnung, insbesondere Sensoranordnung sowie eine Dünnschichtanordnung |
TWI266568B (en) * | 2004-03-08 | 2006-11-11 | Brain Power Co | Method for manufacturing embedded thin film resistor on printed circuit board |
US7199016B2 (en) | 2004-08-13 | 2007-04-03 | Raytheon Company | Integrated circuit resistor |
JP2009295346A (ja) * | 2008-06-03 | 2009-12-17 | Hitachi Cable Ltd | 電気接点層付金属材及びその製造方法 |
US8242876B2 (en) | 2008-09-17 | 2012-08-14 | Stmicroelectronics, Inc. | Dual thin film precision resistance trimming |
US8400257B2 (en) | 2010-08-24 | 2013-03-19 | Stmicroelectronics Pte Ltd | Via-less thin film resistor with a dielectric cap |
US8659085B2 (en) | 2010-08-24 | 2014-02-25 | Stmicroelectronics Pte Ltd. | Lateral connection for a via-less thin film resistor |
US8436426B2 (en) * | 2010-08-24 | 2013-05-07 | Stmicroelectronics Pte Ltd. | Multi-layer via-less thin film resistor |
US8927909B2 (en) | 2010-10-11 | 2015-01-06 | Stmicroelectronics, Inc. | Closed loop temperature controlled circuit to improve device stability |
US8809861B2 (en) | 2010-12-29 | 2014-08-19 | Stmicroelectronics Pte Ltd. | Thin film metal-dielectric-metal transistor |
US9159413B2 (en) | 2010-12-29 | 2015-10-13 | Stmicroelectronics Pte Ltd. | Thermo programmable resistor based ROM |
US8981527B2 (en) * | 2011-08-23 | 2015-03-17 | United Microelectronics Corp. | Resistor and manufacturing method thereof |
US8526214B2 (en) | 2011-11-15 | 2013-09-03 | Stmicroelectronics Pte Ltd. | Resistor thin film MTP memory |
US9140735B2 (en) | 2013-05-03 | 2015-09-22 | Infineon Technologies Ag | Integration of current measurement in wiring structure of an electronic circuit |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3423821A (en) * | 1965-03-18 | 1969-01-28 | Hitachi Ltd | Method of producing thin film integrated circuits |
US4112196A (en) * | 1977-01-24 | 1978-09-05 | National Micronetics, Inc. | Beam lead arrangement for microelectronic devices |
JPS55162254A (en) * | 1979-06-05 | 1980-12-17 | Nec Corp | Composite integrated circuit |
US4226932A (en) * | 1979-07-05 | 1980-10-07 | Gte Automatic Electric Laboratories Incorporated | Titanium nitride as one layer of a multi-layered coating intended to be etched |
JPS57113264A (en) * | 1980-12-29 | 1982-07-14 | Fujitsu Ltd | Manufacture of mis type capacitor |
DE3200983A1 (de) * | 1982-01-14 | 1983-07-21 | Siemens AG, 1000 Berlin und 8000 München | Elektrisches netzwerk |
IT1197776B (it) * | 1986-07-15 | 1988-12-06 | Gte Telecom Spa | Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddetto |
US4801469A (en) * | 1986-08-07 | 1989-01-31 | The United States Of America As Represented By The Department Of Energy | Process for obtaining multiple sheet resistances for thin film hybrid microcircuit resistors |
-
1986
- 1986-07-15 IT IT21126/86A patent/IT1197776B/it active
-
1987
- 1987-06-19 DE DE8787201179T patent/DE3772900D1/de not_active Expired - Lifetime
- 1987-06-19 EP EP87201179A patent/EP0256568B1/en not_active Expired - Lifetime
- 1987-07-13 NO NO872916A patent/NO173037C/no unknown
- 1987-07-13 JP JP62173102A patent/JPH07101730B2/ja not_active Expired - Lifetime
-
1990
- 1990-12-11 US US07/627,568 patent/US5152869A/en not_active Expired - Fee Related
-
1991
- 1991-11-29 GR GR91401653T patent/GR3003237T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
US5152869A (en) | 1992-10-06 |
IT8621126A0 (it) | 1986-07-15 |
IT8621126A1 (it) | 1988-01-15 |
NO173037C (no) | 1993-10-13 |
JPS6329961A (ja) | 1988-02-08 |
NO173037B (no) | 1993-07-05 |
JPH07101730B2 (ja) | 1995-11-01 |
DE3772900D1 (de) | 1991-10-17 |
EP0256568A2 (en) | 1988-02-24 |
GR3003237T3 (en) | 1993-02-17 |
NO872916D0 (no) | 1987-07-13 |
EP0256568B1 (en) | 1991-09-11 |
EP0256568A3 (en) | 1988-08-10 |
NO872916L (no) | 1988-01-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19960710 |