IN2014DN07816A - - Google Patents

Download PDF

Info

Publication number
IN2014DN07816A
IN2014DN07816A IN7816DEN2014A IN2014DN07816A IN 2014DN07816 A IN2014DN07816 A IN 2014DN07816A IN 7816DEN2014 A IN7816DEN2014 A IN 7816DEN2014A IN 2014DN07816 A IN2014DN07816 A IN 2014DN07816A
Authority
IN
India
Prior art keywords
polysiloxane
formula
photopolymerizable layer
compound represented
organosilicon compound
Prior art date
Application number
Other languages
English (en)
Inventor
Johan Loccufier
Marin Steenackers
Sam Verbrugghe
Original Assignee
Agfa Graphics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics Nv filed Critical Agfa Graphics Nv
Publication of IN2014DN07816A publication Critical patent/IN2014DN07816A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/04—Intermediate layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/10—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by inorganic compounds, e.g. pigments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
IN7816DEN2014 2012-06-05 2013-03-20 IN2014DN07816A (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12170799 2012-06-05
US201261656521P 2012-06-07 2012-06-07
PCT/EP2013/055773 WO2013182328A1 (en) 2012-06-05 2013-03-20 A lithographic printing plate precursor

Publications (1)

Publication Number Publication Date
IN2014DN07816A true IN2014DN07816A (de) 2015-05-15

Family

ID=49711432

Family Applications (1)

Application Number Title Priority Date Filing Date
IN7816DEN2014 IN2014DN07816A (de) 2012-06-05 2013-03-20

Country Status (5)

Country Link
US (1) US9329479B2 (de)
EP (1) EP2855152B1 (de)
CN (1) CN104334351B (de)
IN (1) IN2014DN07816A (de)
WO (1) WO2013182328A1 (de)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6017894B2 (ja) * 2012-09-03 2016-11-02 信越化学工業株式会社 ネガ型平版印刷版原版用感光性組成物及びそれを用いたネガ型平版印刷用原版
EP2916171B1 (de) 2014-03-03 2017-05-31 Agfa Graphics Nv Verfahren zum Herstellen eines Lithographiedruckformvorläufers
US10522771B2 (en) 2014-12-01 2019-12-31 Samsung Electronics Co., Ltd. Composition, electronic device, and thin film transistor
JP2016145866A (ja) * 2015-02-06 2016-08-12 株式会社Adeka 感光性ソルダーレジスト組成物
KR102407114B1 (ko) 2015-05-29 2022-06-08 삼성전자주식회사 절연액, 절연체, 박막 트랜지스터 및 전자 소자
KR102380151B1 (ko) 2015-08-31 2022-03-28 삼성전자주식회사 박막 트랜지스터, 및 이를 포함하는 전자 장치
KR102450399B1 (ko) * 2015-10-06 2022-09-30 삼성전자주식회사 박막 트랜지스터, 그 제조 방법, 그리고 상기 박막 트랜지스터를 포함하는 전자 장치
US10727426B2 (en) 2015-12-21 2020-07-28 Samsung Electronics Co., Ltd. Thin film transistor, method of manufacturing the same, and electronic device including the same
CN109069368A (zh) * 2016-04-27 2018-12-21 美国陶氏有机硅公司 亲水性硅烷
WO2017189076A1 (en) * 2016-04-27 2017-11-02 Dow Corning Corporation Hydrophilic silanes
JP2018005046A (ja) * 2016-07-05 2018-01-11 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 反転パターン形成組成物、反転パターンの形成方法、および素子の形成方法
CN106279241A (zh) * 2016-07-16 2017-01-04 北京化工大学 一种含硅氧烷结构的单官能度丙烯酸酯单体及其制备方法
CN106279242A (zh) * 2016-07-16 2017-01-04 北京化工大学 一种含硅氧烷结构的三官能度丙烯酸酯单体及其制备方法
EP3392709A1 (de) 2017-04-21 2018-10-24 Agfa Nv Lithografiedruckplattenvorläufer
EP3431290B1 (de) * 2017-07-20 2021-09-08 Agfa Nv Lithografiedruckplattenvorläufer
EP3441223B1 (de) 2017-08-07 2024-02-21 Eco3 Bv Lithographiedruckplattenvorläufer
EP3474073B1 (de) 2017-10-17 2022-12-07 Agfa Offset Bv Methode zur herstellung einer druckplatte
EP3495891B1 (de) 2017-12-08 2021-06-16 Agfa Nv Verfahren zur herstellung einer lithografiedruckplatte
US11465403B2 (en) 2018-03-22 2022-10-11 Agfa Nv Lithographic printing plate precursor
JP7104487B2 (ja) * 2018-03-30 2022-07-21 株式会社松風 柔軟性を有するラジカル重合性シランカップリング化合物およびそれらを含有する医科歯科用硬化性組成物
JP7104486B2 (ja) * 2018-03-30 2022-07-21 株式会社松風 高靭性シランカップリング化合物およびそれらを含有する医科歯科用硬化性組成物
JP7104488B2 (ja) * 2018-03-30 2022-07-21 株式会社松風 ウレタン結合を有するラジカル重合性シランカップリング化合物およびそれらを含有する医科歯科用硬化性組成物
EP3793830B1 (de) 2018-05-14 2023-03-29 Agfa Offset Bv Lithographiedruckplattenvorläufer
EP3587112B1 (de) * 2018-06-21 2024-04-03 Eco3 Bv Lithographiedruckplattenvorläufer
EP3587113B1 (de) 2018-06-21 2023-01-04 Agfa Offset Bv Lithographiedruckplattenvorläufer
EP3650938A1 (de) 2018-11-09 2020-05-13 Agfa Nv Lithographiedruckplattenvorläufer
CN113168095B (zh) 2018-12-10 2024-05-24 易客发有限公司 平版印刷版前体
EP3686011A1 (de) 2019-01-23 2020-07-29 Agfa Nv Lithographiedruckplattenvorläufer
WO2021055076A1 (en) * 2019-09-18 2021-03-25 Novelis Inc. Metal surface coatings for improving bond performance and methods of making the same
JP2022551695A (ja) * 2019-10-09 2022-12-13 ビーエーエスエフ コーティングス ゲゼルシャフト ミット ベシュレンクテル ハフツング カルボキシル官能性樹脂用シラン官能性硬化剤、バインダー及びその２ｋコーティング組成物
EP3815900A1 (de) 2019-10-31 2021-05-05 Agfa Nv Lithographiedruckplattenvorläufer und verfahren zur herstellung von hydrophoben harzpartikeln
CN110862409B (zh) * 2019-12-04 2021-08-20 江南大学 一种制备含二元醇结构的硅烷类化合物及其改性水性聚氨酯的方法
EP3875271A1 (de) 2020-03-04 2021-09-08 Agfa Nv Lithographiedruckplattenvorläufer
EP3892469B1 (de) 2020-04-10 2023-11-08 Eco3 Bv Lithographiedruckplattenvorläufer
EP3922462B1 (de) 2020-06-08 2023-03-01 Agfa Offset Bv Lithografischer photopolymerer druckplattenvorläufer mit verbesserter tageslichtstabilität
EP3928983B1 (de) 2020-06-24 2023-09-27 Eco3 Bv Lithografiedruckplattenvorläufer
CN115697708A (zh) 2020-06-24 2023-02-03 爱克发胶印有限公司 平版印刷版前体
US20230311474A1 (en) 2020-06-24 2023-10-05 Agfa Offset Bv A Lithographic Printing Plate Precursor
EP3960455A1 (de) 2020-08-31 2022-03-02 Agfa Offset Bv Lithografiedruckplattenvorläufer
CN116324620A (zh) 2020-10-09 2023-06-23 爱克发胶印有限公司 平版印刷版前体
CN116601006A (zh) 2020-12-16 2023-08-15 爱克发胶印有限公司 平版印刷机印活准备方法
EP4035897A1 (de) 2021-01-28 2022-08-03 Agfa Offset Bv Lithografiedruckplattenvorläufer
EP4129682A1 (de) 2021-08-05 2023-02-08 Agfa Offset Bv Lithografiedruckplattenvorläufer
WO2023107523A1 (en) * 2021-12-09 2023-06-15 Rohm And Haas Company Silicone core acrylic shell impact modifiers containing phosphorus
EP4223534A1 (de) 2022-02-07 2023-08-09 Agfa Offset Bv Lithografiedruckplattenvorläufer
EP4239411A1 (de) 2022-03-04 2023-09-06 Eco3 Bv Verfahren und vorrichtung zum verarbeiten eine lithografiedruckplattenvorläufers
EP4382306A1 (de) 2022-12-08 2024-06-12 Eco3 Bv Make-ready-verfahren für eine lithographische druckmaschine

Family Cites Families (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE635804A (de) 1962-03-21
US4045232A (en) 1973-11-12 1977-08-30 Topar Products Corporation Printing ink composition
US4252887A (en) 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
US4459349A (en) 1981-03-27 1984-07-10 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
US4410621A (en) 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
JPS5956403A (ja) 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
DE3404366A1 (de) 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US4622286A (en) 1985-09-16 1986-11-11 E. I. Du Pont De Nemours And Company Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer
DE3627757A1 (de) 1986-08-16 1988-02-18 Basf Ag Verfahren zur herstellung von flachdruckplatten
DE3832032A1 (de) 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US5204143A (en) 1989-04-03 1993-04-20 Fuji Photo Film Co., Ltd. Process for treating metal surface
US4981517A (en) 1989-06-12 1991-01-01 Desanto Jr Ronald F Printing ink emulsion
DE3928794A1 (de) 1989-08-31 1991-03-07 Basf Ag Verfahren zur herstellung von platten-, folien- oder bandfoermigen materialien sowie verfahren zur herstellung von sensibilisierten flachdruckplatten
JP2596850B2 (ja) * 1990-07-09 1997-04-02 富士写真フイルム株式会社 湿し水不要感光性平版印刷版
JP3589360B2 (ja) 1995-03-22 2004-11-17 富士写真フイルム株式会社 感光性印刷版
JPH09269593A (ja) 1996-04-01 1997-10-14 Fuji Photo Film Co Ltd 感光性平版印刷版
US6140392A (en) 1998-11-30 2000-10-31 Flint Ink Corporation Printing inks
EP1025992B1 (de) 1999-02-02 2003-07-23 Agfa-Gevaert Verfahren zur Herstellung positiv arbeitender Druckplatten
DE19915717A1 (de) 1999-04-08 2000-10-12 Agfa Gevaert Ag Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht
DE19940921A1 (de) 1999-08-27 2001-03-01 Agfa Gevaert Ag Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial
DE19944073A1 (de) 1999-09-14 2001-03-15 Agfa Gevaert Ag Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht
JP4037015B2 (ja) 1999-09-22 2008-01-23 富士フイルム株式会社 光重合性組成物、画像形成材料及び平版印刷版用版材
JP4098483B2 (ja) 2001-03-12 2008-06-11 富士フイルム株式会社 平版印刷版原版
US6899994B2 (en) 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US7261998B2 (en) 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US6893797B2 (en) 2001-11-09 2005-05-17 Kodak Polychrome Graphics Llc High speed negative-working thermal printing plates
US6875557B2 (en) 2001-08-29 2005-04-05 Fuji Photo Film Co., Ltd. Plate-making method of printing plate
JP2003252939A (ja) 2002-03-01 2003-09-10 Fuji Photo Film Co Ltd 光重合性組成物
DE60224114T2 (de) 2002-03-06 2008-12-04 Agfa Graphics N.V. Verfahren zum Entwickeln eines wärmeempfindlichen lithographischen Druckplattenvorläufers mit einer Gummilösung
EP1349006B1 (de) 2002-03-28 2013-09-25 Agfa Graphics N.V. Fotopolymerisierbare Zusammensetzung, die im Wellenlängenbereich von 300 bis zu 450 nm sensibilisiert ist
US7172850B2 (en) 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
US7659046B2 (en) 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
EP1359008B1 (de) 2002-04-29 2005-08-31 Agfa-Gevaert Strahlungsempfindliches Gemisch, damit hergestelltes Aufzeichnungsmaterial, und Verfahren zur Herstellung einer Druckplatte
EP1369231A3 (de) 2002-06-05 2009-07-08 FUJIFILM Corporation Infrarotempfindliche Zusammensetzung und Bildaufzeichnungsmaterial für IR-Strahlung
JP2004012706A (ja) 2002-06-05 2004-01-15 Fuji Photo Film Co Ltd 平版印刷版原版
US7052418B2 (en) 2002-11-26 2006-05-30 Lifetime Products, Inc. Basketball backboard
JP2005014348A (ja) 2003-06-25 2005-01-20 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
JP4418714B2 (ja) 2003-07-10 2010-02-24 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
WO2005029187A1 (en) 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymerizable composition.
CN1882881A (zh) 2003-09-22 2006-12-20 爱克发-格法特公司 感光聚合物印刷版前体
FI20035220A (fi) 2003-11-26 2005-05-27 Megalock Oy Kahdella ovella varustettu turvaeteinen
EP1543958B1 (de) * 2003-12-18 2009-01-28 Agfa Graphics N.V. Wärmeempfindlicher lithographischer Druckplattevorläufer
JP4319567B2 (ja) * 2004-03-04 2009-08-26 富士フイルム株式会社 重合性組成物及び平版印刷版原版
ATE553417T1 (de) 2004-05-06 2012-04-15 Agfa Graphics Nv Fotopolymer-druckplatten-vorläufer
CN100573342C (zh) 2004-05-19 2009-12-23 爱克发印艺公司 制造光聚合物印版的方法
CN1984778B (zh) 2004-07-08 2010-12-29 爱克发印艺公司 阴片热敏平版印刷版前体的制备方法
EP1614539B1 (de) 2004-07-08 2008-09-17 Agfa Graphics N.V. Verfahren zur Herstellung einer lithographischen Druckplatte
DE102004041609B3 (de) * 2004-08-27 2006-07-13 Kodak Polychrome Graphics Gmbh Interlayer für Lithographie-Druckplatten
DE102005002754B4 (de) 2005-01-20 2008-07-31 Kodak Graphic Communications Gmbh Phosphonosubstituierte Siloxane als Interlayer für Lithographie-Druckplatten
WO2006137261A1 (ja) * 2005-06-21 2006-12-28 Konica Minolta Medical & Graphic, Inc. 感光性組成物、感光性平版印刷版材料および平版印刷版材料の画像形成方法
ATE391014T1 (de) 2005-06-21 2008-04-15 Agfa Graphics Nv Wärmeempfindliches bildaufzeichnungselement
EP2772805A1 (de) 2005-11-18 2014-09-03 Agfa Graphics Nv Verfahren zur Herstellung einer Flachdruckplatte
ATE497192T1 (de) * 2005-11-18 2011-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ATE426836T1 (de) 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1843203A1 (de) 2006-04-03 2007-10-10 Agfa Graphics N.V. Verfahren zur Herstellung einer Fotopolymerdruckform
US8053162B2 (en) 2008-06-17 2011-11-08 Eastman Kodak Company Substrate and imageable element with hydrophilic interlayer

Also Published As

Publication number Publication date
WO2013182328A1 (en) 2013-12-12
CN104334351B (zh) 2016-08-17
US9329479B2 (en) 2016-05-03
CN104334351A (zh) 2015-02-04
EP2855152B1 (de) 2016-03-16
EP2855152A1 (de) 2015-04-08
US20150168837A1 (en) 2015-06-18

Similar Documents

Publication Publication Date Title
IN2014DN07816A (de)
EP2336256A4 (de) Zusammensetzung zur bildung einer siliciumhaltigen resistunterschichtfolie mit einer oniumgruppe
MY160698A (en) Hydrophilic coating
MY163187A (en) Novel imidazo-oxazine compound or salt thereof
MY163274A (en) S1p modulating agents
EP2483441A4 (de) Dampfabscheidungsreaktor zur bildung einer dünnschicht auf einer gekrümmten oberfläche
HK1175147A1 (zh) 用於平版印刷板的基材
MY171055A (en) 3,5-disubstituted alkynylbenzene compound and salt thereof
JP2012111758A5 (de)
EP2576231A4 (de) Lithographiedruckplattenvorläufer, plattenherstellungsverfahren dafür und neuartige polymerverbindung
EP2451821A4 (de) Gallotanninverbindungen für zusammensetzungen zur beschichtung von lithographiedruckplatten
IN2015DN00446A (de)
AU2012310674B2 (en) Radioactive fluorine labeled compound
JP2015525275A5 (de)
EP2765457A4 (de) Zusammensetzung zur bildung einer siliciumhaltigen euv-lack-unterschichtfolie
IN2014CN04960A (de)
DK2090930T3 (da) Forløber for vandfri litografisk trykplade
EP2555054A4 (de) Entwickler zur verarbeitung eines flachdruckplattenvorläufers, verfahren zur herstellung einer flachdruckplatte mit dem entwickler und druckverfahren
EP2762974A4 (de) Verfahren zur herstellung einer lithografiedruckplatte
CL2008001577A1 (es) Metodo para tratar una leucemia positiva en un sujeto resistente a imatinib que comprende el uso de un compuesto derivado de 3-ciano-quinolina.
JP2008248311A5 (de)
UA105843C2 (uk) Спосіб одержання кремнієвмісних азодикарбамідів
JP2014091849A5 (de)
EP2818522A4 (de) Chromogene zusammensetzung, chromogene härtbare zusammensetzung, lithografiedruckplattenvorläufer, plattenherstellungsverfahren und chromogene verbindung
WO2012153966A3 (ko) 복합시트 및 이를 이용한 디스플레이 기판