IL87303A - Multiple,parallel packed column vaporizer - Google Patents

Multiple,parallel packed column vaporizer

Info

Publication number
IL87303A
IL87303A IL87303A IL8730388A IL87303A IL 87303 A IL87303 A IL 87303A IL 87303 A IL87303 A IL 87303A IL 8730388 A IL8730388 A IL 8730388A IL 87303 A IL87303 A IL 87303A
Authority
IL
Israel
Prior art keywords
chemical
vaporization
vaporizer
columns
parallel
Prior art date
Application number
IL87303A
Other languages
English (en)
Other versions
IL87303A0 (en
Original Assignee
Atochem North America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atochem North America filed Critical Atochem North America
Publication of IL87303A0 publication Critical patent/IL87303A0/xx
Publication of IL87303A publication Critical patent/IL87303A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/06—Evaporators with vertical tubes
    • B01D1/065—Evaporators with vertical tubes by film evaporating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Fats And Perfumes (AREA)
IL87303A 1987-08-05 1988-08-02 Multiple,parallel packed column vaporizer IL87303A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/082,011 US4924936A (en) 1987-08-05 1987-08-05 Multiple, parallel packed column vaporizer

Publications (2)

Publication Number Publication Date
IL87303A0 IL87303A0 (en) 1989-01-31
IL87303A true IL87303A (en) 1992-11-15

Family

ID=22168168

Family Applications (1)

Application Number Title Priority Date Filing Date
IL87303A IL87303A (en) 1987-08-05 1988-08-02 Multiple,parallel packed column vaporizer

Country Status (18)

Country Link
US (1) US4924936A (de)
EP (2) EP0303911B1 (de)
JP (1) JPH03500667A (de)
KR (1) KR910006786B1 (de)
CN (1) CN1018717B (de)
AT (1) ATE97010T1 (de)
BR (1) BR8807642A (de)
CA (1) CA1296996C (de)
DE (1) DE3885536T2 (de)
DK (1) DK165126C (de)
ES (1) ES2046257T3 (de)
FI (1) FI90567C (de)
IE (1) IE63516B1 (de)
IL (1) IL87303A (de)
IN (1) IN169676B (de)
MX (1) MX166195B (de)
WO (1) WO1989001055A1 (de)
ZA (1) ZA885641B (de)

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US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
HU210994B (en) * 1990-02-27 1995-09-28 Energiagazdalkodasi Intezet Heat-exchanging device particularly for hybrid heat pump operated by working medium of non-azeotropic mixtures
US5203925A (en) * 1991-06-20 1993-04-20 Matsushita Electric Industrial Co., Ltd. Apparatus for producing a thin film of tantalum oxide
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US5470441A (en) * 1994-03-07 1995-11-28 Phillips Petroleum Company Packed column vaporizer and vaporizing process
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
TW565626B (en) * 1996-11-20 2003-12-11 Ebara Corp Liquid feed vaporization system and gas injection device
US6142215A (en) * 1998-08-14 2000-11-07 Edg, Incorporated Passive, thermocycling column heat-exchanger system
FR2800754B1 (fr) * 1999-11-08 2003-05-09 Joint Industrial Processors For Electronics Dispositif evaporateur d'une installation de depot chimique en phase vapeur
DE19960333C2 (de) * 1999-12-15 2002-12-19 Tetra Laval Holdings & Finance Vorrichtung zum Herstellen eines Gasgemisches und deren Verwendung
ATE535940T1 (de) * 2001-01-18 2011-12-15 Watanabe M & Co Ltd Verdampfer und die beschictungsvorrichtung mit dem verdampfer
CA2430041A1 (en) 2003-05-26 2004-11-26 Eugene I. Moody Atomized liquid boiler
US20050205215A1 (en) * 2004-03-17 2005-09-22 General Electric Company Apparatus for the evaporation of aqueous organic liquids and the production of powder pre-forms in flame hydrolysis processes
WO2006009872A1 (en) * 2004-06-22 2006-01-26 Arkema Inc. Direct injection chemical vapor deposition method
JP4553245B2 (ja) * 2004-09-30 2010-09-29 東京エレクトロン株式会社 気化器、成膜装置及び成膜方法
FR2894165B1 (fr) * 2005-12-01 2008-06-06 Sidel Sas Installation d'alimentation en gaz pour machines de depot d'une couche barriere sur recipients
JP5141141B2 (ja) * 2007-08-23 2013-02-13 東京エレクトロン株式会社 気化器、気化器を用いた原料ガス供給システム及びこれを用いた成膜装置
CA2735069C (en) 2010-08-24 2016-04-12 Kemex Ltd. Vapour recovery unit for steam assisted gravity drainage (sagd) system
US10435307B2 (en) 2010-08-24 2019-10-08 Private Equity Oak Lp Evaporator for SAGD process
EP2609038A4 (de) 2010-08-24 2014-09-03 Kemex Ltd Verunreinigungsbekämpfungssystem in einem system zur verarbeitung von verdunstungswasser
CA2735061C (en) 2010-08-24 2017-07-18 Kemex Ltd. An improved water recovery system sagd system utilizing a flash drum
RU2013139465A (ru) * 2011-01-27 2015-03-10 1Нсайт Текнолоджиз Лтд. Компактный испаритель для модульной портативной системы sagd
US20140158514A1 (en) * 2012-12-07 2014-06-12 Advanced Water Recovery, Llc Methods of separating salts and solvents from water
DE102013101703A1 (de) * 2013-02-21 2014-08-21 Borgwarner Beru Systems Gmbh Verdampfer
CA2879257C (en) 2014-01-21 2022-11-15 Kemex Ltd. Evaporator sump and process for separating contaminants resulting in high quality steam
WO2016144869A1 (en) 2015-03-12 2016-09-15 Ppg Industries Ohio, Inc. Optoelectronic device and method of making the same
US10672921B2 (en) 2015-03-12 2020-06-02 Vitro Flat Glass Llc Article with transparent conductive layer and method of making the same
US10112208B2 (en) 2015-12-11 2018-10-30 VITRO S.A.B. de C.V. Glass articles with nanoparticle regions
WO2017100607A1 (en) 2015-12-11 2017-06-15 Vitro, S.A.B. De C.V. Coating system and articles made thereby
EP3381874A1 (de) * 2017-03-31 2018-10-03 Arkema B.V. Zuführvorrichtung für eine beschichtungsvorrichtung, beschichtungsvorrichtung damit und verfahren damit
US11421320B2 (en) 2017-12-07 2022-08-23 Entegris, Inc. Chemical delivery system and method of operating the chemical delivery system
CN112469498B (zh) * 2018-08-24 2023-04-25 株式会社堀场Stec 气化器、液体材料气化装置和气化方法
CN110860097A (zh) * 2019-12-10 2020-03-06 贵州航天乌江机电设备有限责任公司 一种保持蒸发器热壁上下温度均衡的方法及装置

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Also Published As

Publication number Publication date
ZA885641B (en) 1989-04-26
ATE97010T1 (de) 1993-11-15
DK165126B (da) 1992-10-12
EP0303911A1 (de) 1989-02-22
WO1989001055A1 (en) 1989-02-09
FI90567B (fi) 1993-11-15
US4924936A (en) 1990-05-15
DE3885536T2 (de) 1994-03-10
KR890701795A (ko) 1989-12-21
JPH0553869B2 (de) 1993-08-11
IE63516B1 (en) 1995-05-03
FI90567C (fi) 1994-02-25
DK29690A (da) 1990-04-04
IE882389L (en) 1989-02-05
MX166195B (es) 1992-12-23
IL87303A0 (en) 1989-01-31
CN1018717B (zh) 1992-10-21
CN1032111A (zh) 1989-04-05
FI900450A0 (fi) 1990-01-29
EP0303911B1 (de) 1993-11-10
EP0391907A1 (de) 1990-10-17
JPH03500667A (ja) 1991-02-14
BR8807642A (pt) 1990-06-12
DK165126C (da) 1993-02-22
DE3885536D1 (de) 1993-12-16
KR910006786B1 (ko) 1991-09-02
IN169676B (de) 1991-11-30
CA1296996C (en) 1992-03-10
ES2046257T3 (es) 1994-02-01
DK29690D0 (da) 1990-02-05

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Legal Events

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KB Patent renewed
MM9K Patent not in force due to non-payment of renewal fees