IL76716A0 - Hybrid organometallic compounds,particularly for metal organic chemical vapor deposition - Google Patents
Hybrid organometallic compounds,particularly for metal organic chemical vapor depositionInfo
- Publication number
- IL76716A0 IL76716A0 IL76716A IL7671685A IL76716A0 IL 76716 A0 IL76716 A0 IL 76716A0 IL 76716 A IL76716 A IL 76716A IL 7671685 A IL7671685 A IL 7671685A IL 76716 A0 IL76716 A0 IL 76716A0
- Authority
- IL
- Israel
- Prior art keywords
- metal organic
- organic chemical
- hybrid
- hydride
- organometallic compounds
- Prior art date
Links
- 150000002902 organometallic compounds Chemical class 0.000 title abstract 2
- 238000005229 chemical vapour deposition Methods 0.000 title 1
- 239000002184 metal Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 4
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 abstract 3
- 125000001424 substituent group Chemical group 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 229910052797 bismuth Inorganic materials 0.000 abstract 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 abstract 2
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 abstract 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Chemical group C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 abstract 2
- 150000004678 hydrides Chemical class 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 230000000737 periodic effect Effects 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- 229910052711 selenium Inorganic materials 0.000 abstract 2
- 239000011669 selenium Substances 0.000 abstract 2
- 229910052714 tellurium Inorganic materials 0.000 abstract 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052790 beryllium Inorganic materials 0.000 abstract 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- -1 hydride compound Chemical class 0.000 abstract 1
- 229910052749 magnesium Inorganic materials 0.000 abstract 1
- 239000011777 magnesium Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C391/00—Compounds containing selenium
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C395/00—Compounds containing tellurium
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/02—Magnesium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/06—Zinc compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/08—Cadmium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/10—Mercury compounds
- C07F3/12—Aromatic substances containing mercury
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/06—Aluminium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/505—Preparation; Separation; Purification; Stabilisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/70—Organo-arsenic compounds
- C07F9/72—Aliphatic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/94—Bismuth compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/305—Sulfides, selenides, or tellurides
- C23C16/306—AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Chemical Vapour Deposition (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/664,645 US4720560A (en) | 1984-10-25 | 1984-10-25 | Hybrid organometallic compounds, particularly for metal organic chemical vapor deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL76716A0 true IL76716A0 (en) | 1986-02-28 |
Family
ID=24666848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL76716A IL76716A0 (en) | 1984-10-25 | 1985-10-15 | Hybrid organometallic compounds,particularly for metal organic chemical vapor deposition |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4720560A (de) |
| EP (1) | EP0181706B1 (de) |
| JP (1) | JPS61104079A (de) |
| KR (1) | KR900001008B1 (de) |
| AT (1) | ATE48002T1 (de) |
| BR (1) | BR8505338A (de) |
| CA (1) | CA1251804A (de) |
| DE (1) | DE3574257D1 (de) |
| DK (1) | DK488785A (de) |
| IL (1) | IL76716A0 (de) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3514410A1 (de) * | 1985-04-20 | 1986-10-23 | Schering AG, Berlin und Bergkamen, 1000 Berlin | Neue alkalimetallaluminiumdialkyldihydride und deren loesungen in aromatischen kohlenwasserstoffen |
| JPH0627327B2 (ja) * | 1987-06-30 | 1994-04-13 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | Ｉｂ族金属の付着方法 |
| EP0305144A3 (de) * | 1987-08-24 | 1989-03-08 | Canon Kabushiki Kaisha | Verfahren zur Herstellung einer Vebindungshalbleiterkristallschicht |
| DE3742525C2 (de) * | 1987-12-11 | 1998-02-19 | Hertz Inst Heinrich | Verfahren zur Herstellung von Metallalkylverbindungen und deren Verwendung |
| US4915988A (en) * | 1988-06-22 | 1990-04-10 | Georgia Tech Research Corporation | Chemical vapor deposition of group IIA metals and precursors therefor |
| US4992305A (en) * | 1988-06-22 | 1991-02-12 | Georgia Tech Research Corporation | Chemical vapor deposition of transistion metals |
| US4942252A (en) * | 1988-08-16 | 1990-07-17 | Cvd Incorporated | Synthesis of phosphorus and arsenic, halides and hydrides |
| NL8802458A (nl) * | 1988-10-07 | 1990-05-01 | Philips Nv | Werkwijze voor de vervaardiging van een epitaxiale indiumfosfide-laag op een substraatoppervlak. |
| US5147688A (en) * | 1990-04-24 | 1992-09-15 | Cvd, Inc. | MOCVD of indium oxide and indium/tin oxide films on substrates |
| DE4104076C2 (de) * | 1991-02-11 | 1994-03-31 | Bruker Analytische Messtechnik | Vorrichtung zur kernresonanzspektrometrischen Messung von chemischen und/oder physikalischen Reaktionsabläufen |
| US5300185A (en) * | 1991-03-29 | 1994-04-05 | Kabushiki Kaisha Toshiba | Method of manufacturing III-V group compound semiconductor |
| DE4214224A1 (de) * | 1992-04-30 | 1993-11-04 | Merck Patent Gmbh | Verwendung von elementorganischen verbindungen zur abscheidung des elementes auf substraten |
| US5380895A (en) * | 1993-02-10 | 1995-01-10 | Bandgap Technology Corporation | Method for the synthesis of metal alkyls and metal aryls |
| US5502227A (en) * | 1993-07-27 | 1996-03-26 | Cvd, Incorporated | Liquid indium source |
| JPH07153700A (ja) * | 1993-11-26 | 1995-06-16 | Sony Corp | 有機金属気相成長法及び発光素子作製方法 |
| US6211106B1 (en) * | 1998-06-18 | 2001-04-03 | Industrial Technology Research Institute | Groups IIA and IIIA based catalyst composition for preparing high-syndiotacticity polystyrene |
| EP1335415B1 (de) * | 2002-01-17 | 2005-08-03 | Shipley Co. L.L.C. | Organoindiumverbindungen zur Verwendung in der chemischen Dampfphasenabscheidung |
| DE102005037076B3 (de) * | 2005-08-03 | 2007-01-25 | Otto-Von-Guericke-Universität Magdeburg | Verfahren zur Herstellung von gemischt substituierte Organobismuthverbindungen und deren Verwendung |
| US20070141374A1 (en) * | 2005-12-19 | 2007-06-21 | General Electric Company | Environmentally resistant disk |
| WO2014078263A1 (en) * | 2012-11-14 | 2014-05-22 | Dow Global Technologies Llc | Methods of producing trimethylgallium |
| KR102317590B1 (ko) * | 2013-08-22 | 2021-10-27 | 우미코레 아게 운트 코 카게 | 알킬인듐 화합물의 제조 방법 및 이의 용도 |
| EP3173507A1 (de) * | 2015-11-25 | 2017-05-31 | Umicore AG & Co. KG | Verfahren zur metallorganischen gasphasenabscheidung unter verwendung von lösungen von indiumalkylverbindungen in kohlenwasserstoffen |
| US20240003004A1 (en) * | 2020-12-04 | 2024-01-04 | Kojundo Chemical Laboratory Co., Ltd. | Vapor deposition source material used in production of film containing indium and one or more of the other metals, and the method of producing film containing indium and one or more of the other metals |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2266776A (en) * | 1938-09-24 | 1941-12-23 | Atlantic Refining Co | Diesel fuel |
| US2818416A (en) * | 1952-12-10 | 1957-12-31 | Ethyl Corp | Cyclomatic compounds |
| US2880115A (en) * | 1955-07-13 | 1959-03-31 | Ohio Commw Eng Co | Method of gas plating light metals |
| US3097066A (en) * | 1956-02-25 | 1963-07-09 | Studiengesellschaft Kohle Mbh | Process for the production of boron and aluminium compounds containing hydrocarbon raicals and/or hydrogen |
| US2987534A (en) * | 1958-04-25 | 1961-06-06 | Ethyl Corp | Group iii-a element compounds |
| US2969382A (en) * | 1958-04-25 | 1961-01-24 | Ethyl Corp | Process for the manufacture of cyclopentadienyl group iii-a metal compounds |
| US3026356A (en) * | 1958-04-25 | 1962-03-20 | Herbert C Brown | Process for the preparation of organo boron compounds |
| US3247261A (en) * | 1958-12-24 | 1966-04-19 | Dal Mon Research Co | Organo-metallo compounds |
| US3161686A (en) * | 1960-03-30 | 1964-12-15 | Herbert C Brown | Novel organoboron compounds |
| JPS466817Y1 (de) * | 1967-06-30 | 1971-03-10 | ||
| US3755479A (en) * | 1967-10-24 | 1973-08-28 | Ethyl Corp | Beryllium hydride compositions and their use in making cyclopentadienyl beryllium hydride compounds |
| US3578494A (en) * | 1969-04-09 | 1971-05-11 | Continental Oil Co | Zinc plating by chemical reduction |
| US3755478A (en) * | 1971-08-18 | 1973-08-28 | Lithium Corp | Cyclic process for the preparation of diorganomagnesium compounds |
| JPS5312359B2 (de) * | 1972-06-14 | 1978-04-28 | ||
| JPS5422276B2 (de) * | 1973-03-19 | 1979-08-06 | ||
| IT1015238B (it) * | 1973-06-22 | 1977-05-10 | Gen Electric | Materiali magnetici stabili all a ria e loro metodo di fabbricazione |
| DE3168017D1 (en) * | 1980-05-27 | 1985-02-14 | Secr Defence Brit | Manufacture of cadmium mercury telluride |
| JPS57145972A (en) * | 1980-11-18 | 1982-09-09 | British Telecomm | Formation of group iii-v compount |
| US4447369A (en) * | 1982-04-16 | 1984-05-08 | Ethyl Corporation | Organomagnesium compounds |
-
1984
- 1984-10-25 US US06/664,645 patent/US4720560A/en not_active Expired - Lifetime
-
1985
- 1985-10-15 DE DE8585307400T patent/DE3574257D1/de not_active Expired
- 1985-10-15 AT AT85307400T patent/ATE48002T1/de not_active IP Right Cessation
- 1985-10-15 EP EP85307400A patent/EP0181706B1/de not_active Expired
- 1985-10-15 IL IL76716A patent/IL76716A0/xx unknown
- 1985-10-21 CA CA000493480A patent/CA1251804A/en not_active Expired
- 1985-10-24 KR KR1019850007847A patent/KR900001008B1/ko not_active IP Right Cessation
- 1985-10-24 DK DK488785A patent/DK488785A/da not_active Application Discontinuation
- 1985-10-25 BR BR8505338A patent/BR8505338A/pt unknown
- 1985-10-25 JP JP60239257A patent/JPS61104079A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| ATE48002T1 (de) | 1989-12-15 |
| EP0181706A1 (de) | 1986-05-21 |
| JPS61104079A (ja) | 1986-05-22 |
| DK488785D0 (da) | 1985-10-24 |
| DE3574257D1 (en) | 1989-12-21 |
| KR900001008B1 (ko) | 1990-02-24 |
| EP0181706B1 (de) | 1989-11-15 |
| KR860003266A (ko) | 1986-05-21 |
| US4720560A (en) | 1988-01-19 |
| BR8505338A (pt) | 1986-08-05 |
| DK488785A (da) | 1986-04-26 |
| CA1251804A (en) | 1989-03-28 |
| JPH0357188B2 (de) | 1991-08-30 |
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