IL66475A - Method and apparatus for magnetron cathode sputtering - Google Patents

Method and apparatus for magnetron cathode sputtering

Info

Publication number
IL66475A
IL66475A IL66475A IL6647582A IL66475A IL 66475 A IL66475 A IL 66475A IL 66475 A IL66475 A IL 66475A IL 6647582 A IL6647582 A IL 6647582A IL 66475 A IL66475 A IL 66475A
Authority
IL
Israel
Prior art keywords
cathode sputtering
magnetron cathode
magnetron
sputtering
cathode
Prior art date
Application number
IL66475A
Other languages
English (en)
Other versions
IL66475A0 (en
Original Assignee
Shatterproof Glass Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shatterproof Glass Corp filed Critical Shatterproof Glass Corp
Publication of IL66475A0 publication Critical patent/IL66475A0/xx
Publication of IL66475A publication Critical patent/IL66475A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IL66475A 1981-02-12 1982-08-05 Method and apparatus for magnetron cathode sputtering IL66475A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/233,974 US4356073A (en) 1981-02-12 1981-02-12 Magnetron cathode sputtering apparatus

Publications (2)

Publication Number Publication Date
IL66475A0 IL66475A0 (en) 1982-12-31
IL66475A true IL66475A (en) 1986-01-31

Family

ID=22879382

Family Applications (1)

Application Number Title Priority Date Filing Date
IL66475A IL66475A (en) 1981-02-12 1982-08-05 Method and apparatus for magnetron cathode sputtering

Country Status (15)

Country Link
US (1) US4356073A (xx)
EP (1) EP0070899B1 (xx)
JP (1) JPS58500174A (xx)
AR (1) AR228302A1 (xx)
AU (1) AU550796B2 (xx)
BR (1) BR8206160A (xx)
CA (1) CA1179637A (xx)
DE (1) DE3276709D1 (xx)
ES (1) ES8303552A1 (xx)
HU (1) HU187686B (xx)
IL (1) IL66475A (xx)
IT (1) IT1195779B (xx)
MX (1) MX151747A (xx)
WO (1) WO1982002725A1 (xx)
ZA (1) ZA825556B (xx)

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JPS51117933A (en) * 1975-04-10 1976-10-16 Tokuda Seisakusho Spattering apparatus
JPS5252133A (en) * 1975-07-11 1977-04-26 Tokuda Seisakusho Continuous film coating apparatus
DE2707144A1 (de) * 1976-02-19 1977-08-25 Sloan Technology Corp Kathodenzerstaeubungsvorrichtung
NL7607473A (nl) * 1976-07-07 1978-01-10 Philips Nv Verstuifinrichting en werkwijze voor het ver- stuiven met een dergelijke inrichting.
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ES509573A0 (es) 1983-02-01
ZA825556B (en) 1983-06-29
MX151747A (es) 1985-02-18
AU550796B2 (en) 1986-04-10
EP0070899A4 (en) 1984-04-04
US4356073A (en) 1982-10-26
IT8219635A0 (it) 1982-02-12
EP0070899A1 (en) 1983-02-09
CA1179637A (en) 1984-12-18
JPH0368113B2 (xx) 1991-10-25
IT1195779B (it) 1988-10-27
ES8303552A1 (es) 1983-02-01
WO1982002725A1 (en) 1982-08-19
AU8208682A (en) 1982-08-26
BR8206160A (pt) 1983-01-11
AR228302A1 (es) 1983-02-15
EP0070899B1 (en) 1987-07-08
JPS58500174A (ja) 1983-02-03
HU187686B (en) 1986-02-28
IL66475A0 (en) 1982-12-31
DE3276709D1 (de) 1987-08-13

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