IL160393A0 - Method for supplying divided gas to a chamber from a gas supply apparatus equipped with a flow rate control system - Google Patents
Method for supplying divided gas to a chamber from a gas supply apparatus equipped with a flow rate control systemInfo
- Publication number
- IL160393A0 IL160393A0 IL16039303A IL16039303A IL160393A0 IL 160393 A0 IL160393 A0 IL 160393A0 IL 16039303 A IL16039303 A IL 16039303A IL 16039303 A IL16039303 A IL 16039303A IL 160393 A0 IL160393 A0 IL 160393A0
- Authority
- IL
- Israel
- Prior art keywords
- chamber
- flow rate
- control system
- supply apparatus
- rate control
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0664—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7759—Responsive to change in rate of fluid flow
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7761—Electrically actuated valve
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002161086A JP3856730B2 (ja) | 2002-06-03 | 2002-06-03 | 流量制御装置を備えたガス供給設備からのチャンバーへのガス分流供給方法。 |
PCT/JP2003/000437 WO2003102707A1 (fr) | 2002-06-03 | 2003-01-20 | Procede pour acheminer un gaz entre une installation d'acheminement de gaz equipee d'un regulateur de debit et une chambre, tout en le divisant |
Publications (1)
Publication Number | Publication Date |
---|---|
IL160393A0 true IL160393A0 (en) | 2004-07-25 |
Family
ID=29706569
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL16039303A IL160393A0 (en) | 2002-06-03 | 2003-01-20 | Method for supplying divided gas to a chamber from a gas supply apparatus equipped with a flow rate control system |
IL160393A IL160393A (en) | 2002-06-03 | 2004-02-13 | A method of supplying gas divided into a cell from a gas supply device equipped with a flow rate control system |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL160393A IL160393A (en) | 2002-06-03 | 2004-02-13 | A method of supplying gas divided into a cell from a gas supply device equipped with a flow rate control system |
Country Status (9)
Country | Link |
---|---|
US (1) | US7059363B2 (xx) |
EP (1) | EP1521154A1 (xx) |
JP (1) | JP3856730B2 (xx) |
KR (1) | KR100556195B1 (xx) |
CN (1) | CN100426169C (xx) |
CA (1) | CA2457986A1 (xx) |
IL (2) | IL160393A0 (xx) |
TW (1) | TW565756B (xx) |
WO (1) | WO2003102707A1 (xx) |
Families Citing this family (56)
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JP4195837B2 (ja) * | 2003-06-20 | 2008-12-17 | 東京エレクトロン株式会社 | ガス分流供給装置及びガス分流供給方法 |
JP4351495B2 (ja) * | 2003-07-16 | 2009-10-28 | 株式会社堀場エステック | 流量比率制御装置 |
US7072743B2 (en) * | 2004-03-09 | 2006-07-04 | Mks Instruments, Inc. | Semiconductor manufacturing gas flow divider system and method |
JP4550507B2 (ja) * | 2004-07-26 | 2010-09-22 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
US20060124169A1 (en) | 2004-12-09 | 2006-06-15 | Tokyo Electron Limited | Gas supply unit, substrate processing apparatus, and supply gas setting method |
US8084451B2 (en) | 2005-01-10 | 2011-12-27 | University Of Connecticut | Heteropyrrole analogs acting on cannabinoid receptors |
US9520276B2 (en) | 2005-06-22 | 2016-12-13 | Tokyo Electron Limited | Electrode assembly and plasma processing apparatus |
US20060288934A1 (en) * | 2005-06-22 | 2006-12-28 | Tokyo Electron Limited | Electrode assembly and plasma processing apparatus |
CN100466164C (zh) * | 2005-12-08 | 2009-03-04 | 北京圆合电子技术有限责任公司 | 一种真空腔室的充气系统 |
US20070151668A1 (en) | 2006-01-04 | 2007-07-05 | Tokyo Electron Limited | Gas supply system, substrate processing apparatus, and gas supply method |
JP4895167B2 (ja) * | 2006-01-31 | 2012-03-14 | 東京エレクトロン株式会社 | ガス供給装置,基板処理装置,ガス供給方法 |
JP2007208085A (ja) * | 2006-02-03 | 2007-08-16 | Hitachi High-Technologies Corp | プラズマ処理装置及びその分流比検定方法 |
US7896967B2 (en) | 2006-02-06 | 2011-03-01 | Tokyo Electron Limited | Gas supply system, substrate processing apparatus and gas supply method |
JP4911984B2 (ja) * | 2006-02-08 | 2012-04-04 | 東京エレクトロン株式会社 | ガス供給装置,基板処理装置,ガス供給方法及びシャワーヘッド |
JP4814706B2 (ja) * | 2006-06-27 | 2011-11-16 | 株式会社フジキン | 流量比可変型流体供給装置 |
US20080078746A1 (en) * | 2006-08-15 | 2008-04-03 | Noriiki Masuda | Substrate processing system, gas supply unit, method of substrate processing, computer program, and storage medium |
KR101428826B1 (ko) * | 2006-12-12 | 2014-08-08 | 가부시키가이샤 호리바 에스텍 | 유량 비율 제어 장치 |
JP4598044B2 (ja) * | 2007-10-29 | 2010-12-15 | シーケーディ株式会社 | 流量検定故障診断装置、流量検定故障診断方法及び流量検定故障診断プログラム |
JP5192214B2 (ja) * | 2007-11-02 | 2013-05-08 | 東京エレクトロン株式会社 | ガス供給装置、基板処理装置および基板処理方法 |
JP5054500B2 (ja) * | 2007-12-11 | 2012-10-24 | 株式会社フジキン | 圧力制御式流量基準器 |
JP5011195B2 (ja) * | 2008-04-10 | 2012-08-29 | 東京エレクトロン株式会社 | 流体分流供給ユニット |
BRPI0917012A2 (pt) * | 2008-08-13 | 2016-02-16 | Shell Int Research | método e aparelho para controlar o fluxo de gás entre uma ou mais correntes de entrada e uma ou mais correntes de saída através de uma conjunção |
KR101386552B1 (ko) * | 2009-08-20 | 2014-04-17 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리 장치 및 방법과 플라즈마 에칭 처리 장치 및 방법 |
CN103003924B (zh) * | 2010-06-28 | 2015-07-08 | 东京毅力科创株式会社 | 等离子体处理装置及方法 |
WO2012016971A1 (en) * | 2010-08-02 | 2012-02-09 | Basell Polyolefine Gmbh | Process and apparatus for mixing and splitting fluid streams |
JP2013093514A (ja) * | 2011-10-27 | 2013-05-16 | Sharp Corp | 気相成長装置 |
JP2013098233A (ja) * | 2011-10-28 | 2013-05-20 | Sharp Corp | 気相成長装置 |
JP5881467B2 (ja) * | 2012-02-29 | 2016-03-09 | 株式会社フジキン | ガス分流供給装置及びこれを用いたガス分流供給方法 |
JP6037707B2 (ja) * | 2012-08-07 | 2016-12-07 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置及びプラズマ処理装置の診断方法 |
US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
DE102014110159A1 (de) * | 2014-07-18 | 2016-01-21 | Krones Aktiengesellschaft | Verfahren und Vorrichtung zum Befüllen eines Behälters mit einem Füllprodukt |
CN105576268B (zh) | 2014-10-08 | 2019-02-15 | 通用电气公司 | 用于控制流量比的系统和方法 |
US10658222B2 (en) | 2015-01-16 | 2020-05-19 | Lam Research Corporation | Moveable edge coupling ring for edge process control during semiconductor wafer processing |
TW201634738A (zh) * | 2015-01-22 | 2016-10-01 | 應用材料股份有限公司 | 用於在空間上分離之原子層沉積腔室的經改良注射器 |
KR101652469B1 (ko) * | 2015-02-27 | 2016-08-30 | 주식회사 유진테크 | 다중 가스 제공 방법 및 다중 가스 제공 장치 |
US9904299B2 (en) | 2015-04-08 | 2018-02-27 | Tokyo Electron Limited | Gas supply control method |
US10957561B2 (en) * | 2015-07-30 | 2021-03-23 | Lam Research Corporation | Gas delivery system |
US10365666B2 (en) * | 2015-09-11 | 2019-07-30 | Hitachi Metals, Ltd. | Mass flow controller |
US10192751B2 (en) | 2015-10-15 | 2019-01-29 | Lam Research Corporation | Systems and methods for ultrahigh selective nitride etch |
US10497542B2 (en) | 2016-01-04 | 2019-12-03 | Daniel T. Mudd | Flow control showerhead with integrated flow restrictors for improved gas delivery to a semiconductor process |
US10825659B2 (en) | 2016-01-07 | 2020-11-03 | Lam Research Corporation | Substrate processing chamber including multiple gas injection points and dual injector |
US10699878B2 (en) | 2016-02-12 | 2020-06-30 | Lam Research Corporation | Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring |
US10147588B2 (en) | 2016-02-12 | 2018-12-04 | Lam Research Corporation | System and method for increasing electron density levels in a plasma of a substrate processing system |
US10651015B2 (en) | 2016-02-12 | 2020-05-12 | Lam Research Corporation | Variable depth edge ring for etch uniformity control |
US10438833B2 (en) | 2016-02-16 | 2019-10-08 | Lam Research Corporation | Wafer lift ring system for wafer transfer |
US10410832B2 (en) | 2016-08-19 | 2019-09-10 | Lam Research Corporation | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment |
US10365665B2 (en) | 2017-01-17 | 2019-07-30 | Rodney Laible | Automatic detection system for detecting disruptions in the flow to a dispensing apparatus |
US10279942B1 (en) * | 2017-01-17 | 2019-05-07 | Rodney Laible | Automatic detection system for detecting disruptions in the flow to a dispensing apparatus |
CN110234965B (zh) * | 2017-02-10 | 2020-10-27 | 株式会社富士金 | 流量测定方法以及流量测定装置 |
US10983537B2 (en) | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
JP6912947B2 (ja) * | 2017-06-14 | 2021-08-04 | 川崎重工業株式会社 | 油圧システム |
JP7122102B2 (ja) | 2017-11-08 | 2022-08-19 | 東京エレクトロン株式会社 | ガス供給システム及びガス供給方法 |
JP7044629B2 (ja) * | 2018-05-18 | 2022-03-30 | 株式会社堀場エステック | 流体制御装置、及び、流量比率制御装置 |
JP7068062B2 (ja) * | 2018-06-18 | 2022-05-16 | 株式会社堀場製作所 | 流体制御装置、及び、流量比率制御装置 |
KR20210139347A (ko) * | 2019-04-25 | 2021-11-22 | 가부시키가이샤 후지킨 | 유량 제어 장치 |
CN112378950B (zh) * | 2020-10-14 | 2022-11-22 | 上海交通大学 | 一种用于模拟高温气体传热特性的实验设备 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0864490A (ja) | 1993-12-27 | 1996-03-08 | Motoyama Seisakusho:Kk | ガス系の流量制御装置 |
JP3291161B2 (ja) | 1995-06-12 | 2002-06-10 | 株式会社フジキン | 圧力式流量制御装置 |
JP3586075B2 (ja) | 1997-08-15 | 2004-11-10 | 忠弘 大見 | 圧力式流量制御装置 |
JPH11212653A (ja) * | 1998-01-21 | 1999-08-06 | Fujikin Inc | 流体供給装置 |
JP3522535B2 (ja) * | 1998-05-29 | 2004-04-26 | 忠弘 大見 | 圧力式流量制御装置を備えたガス供給設備 |
JP3626874B2 (ja) | 1999-04-16 | 2005-03-09 | 忠弘 大見 | 並列分流型の流体供給装置 |
WO2000063756A1 (fr) * | 1999-04-16 | 2000-10-26 | Fujikin Incorporated | Dispositif d'alimentation en fluide du type derivation parallele, et procede et dispositif de commande du debit d'un systeme de pression du type a fluide variable utilise dans ledit dispositif |
US6363958B1 (en) * | 1999-05-10 | 2002-04-02 | Parker-Hannifin Corporation | Flow control of process gas in semiconductor manufacturing |
JP2001216030A (ja) * | 2000-02-07 | 2001-08-10 | Babcock Hitachi Kk | ガス流量制御システム |
US6934643B2 (en) * | 2003-06-20 | 2005-08-23 | Delphi Technologies, Inc. | Ultra accurate gas injection system with vehicle transient air simulation |
-
2002
- 2002-06-03 JP JP2002161086A patent/JP3856730B2/ja not_active Expired - Lifetime
-
2003
- 2003-01-20 EP EP03701808A patent/EP1521154A1/en not_active Withdrawn
- 2003-01-20 KR KR1020047000678A patent/KR100556195B1/ko active IP Right Grant
- 2003-01-20 US US10/495,641 patent/US7059363B2/en not_active Expired - Lifetime
- 2003-01-20 CN CNB038007770A patent/CN100426169C/zh not_active Expired - Lifetime
- 2003-01-20 IL IL16039303A patent/IL160393A0/xx active IP Right Grant
- 2003-01-20 WO PCT/JP2003/000437 patent/WO2003102707A1/ja active Application Filing
- 2003-01-20 CA CA002457986A patent/CA2457986A1/en not_active Abandoned
- 2003-02-12 TW TW92102899A patent/TW565756B/zh not_active IP Right Cessation
-
2004
- 2004-02-13 IL IL160393A patent/IL160393A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CA2457986A1 (en) | 2003-12-11 |
CN1543596A (zh) | 2004-11-03 |
KR100556195B1 (ko) | 2006-03-03 |
EP1521154A1 (en) | 2005-04-06 |
TW565756B (en) | 2003-12-11 |
WO2003102707A1 (fr) | 2003-12-11 |
KR20040024869A (ko) | 2004-03-22 |
US20050005994A1 (en) | 2005-01-13 |
JP2004005308A (ja) | 2004-01-08 |
JP3856730B2 (ja) | 2006-12-13 |
TW200307863A (en) | 2003-12-16 |
IL160393A (en) | 2009-02-11 |
CN100426169C (zh) | 2008-10-15 |
US7059363B2 (en) | 2006-06-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FF | Patent granted |