IE53689B1 - Self-aligned pole tips for a thin film magnetic head - Google Patents
Self-aligned pole tips for a thin film magnetic headInfo
- Publication number
- IE53689B1 IE53689B1 IE1556/82A IE155682A IE53689B1 IE 53689 B1 IE53689 B1 IE 53689B1 IE 1556/82 A IE1556/82 A IE 1556/82A IE 155682 A IE155682 A IE 155682A IE 53689 B1 IE53689 B1 IE 53689B1
- Authority
- IE
- Ireland
- Prior art keywords
- pole
- layer
- insulative layer
- magnetic head
- protective metal
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 11
- 230000001681 protective effect Effects 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 239000002184 metal Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 18
- 229910003271 Ni-Fe Inorganic materials 0.000 claims abstract description 4
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 4
- 239000000956 alloy Substances 0.000 claims abstract description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 5
- 239000010948 rhodium Substances 0.000 claims description 5
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000009713 electroplating Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 238000000992 sputter etching Methods 0.000 claims description 2
- 229910000889 permalloy Inorganic materials 0.000 abstract description 4
- 125000006850 spacer group Chemical group 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000003486 chemical etching Methods 0.000 abstract 2
- 239000011810 insulating material Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 35
- 239000000243 solution Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49044—Plural magnetic deposition layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/282,540 US4436593A (en) | 1981-07-13 | 1981-07-13 | Self-aligned pole tips |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IE821556L IE821556L (en) | 1983-01-13 |
| IE53689B1 true IE53689B1 (en) | 1989-01-18 |
Family
ID=23081984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IE1556/82A IE53689B1 (en) | 1981-07-13 | 1982-06-28 | Self-aligned pole tips for a thin film magnetic head |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4436593A (https=) |
| JP (1) | JPS5817523A (https=) |
| DE (1) | DE3225780A1 (https=) |
| FR (1) | FR2509503B1 (https=) |
| GB (1) | GB2104418B (https=) |
| IE (1) | IE53689B1 (https=) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5972639A (ja) * | 1982-10-20 | 1984-04-24 | Fuji Photo Film Co Ltd | 磁気ヘツドの製造方法 |
| DE3330041A1 (de) * | 1983-08-19 | 1985-02-28 | Siemens AG, 1000 Berlin und 8000 München | Magnetkopf fuer ein senkrecht zu magnetisierendes aufzeichnungsmedium |
| JPS60133516A (ja) * | 1983-12-22 | 1985-07-16 | Hitachi Ltd | 薄膜磁気ヘツドの製造方法 |
| US4652954A (en) * | 1985-10-24 | 1987-03-24 | International Business Machines | Method for making a thin film magnetic head |
| JPS62219217A (ja) * | 1986-03-19 | 1987-09-26 | Hitachi Maxell Ltd | 磁気ヘツド |
| US5108837A (en) * | 1987-12-04 | 1992-04-28 | Digital Equipment Corporation | Laminated poles for recording heads |
| US5200056A (en) * | 1990-02-15 | 1993-04-06 | Seagate Technology Inc. | Method for aligning pole tips in a thin film head |
| US5116719A (en) * | 1990-02-15 | 1992-05-26 | Seagate Technology, Inc. | Top pole profile for pole tip trimming |
| US4992901A (en) * | 1990-02-15 | 1991-02-12 | Seagate Technology, Inc. | Self aligned magnetic poles using sacrificial mask |
| US5141623A (en) * | 1990-02-15 | 1992-08-25 | Seagate Technology, Inc. | Method for aligning pole tips in a thin film head |
| NL9000546A (nl) * | 1990-03-09 | 1991-10-01 | Philips Nv | Werkwijze voor het vervaardigen van een dunnefilm magneetkop alsmede een dunnefilm magneetkop vervaardigbaar volgens de werkwijze. |
| US5157570A (en) * | 1990-06-29 | 1992-10-20 | Digital Equipment Corporation | Magnetic pole configuration for high density thin film recording head |
| FR2669466B1 (fr) * | 1990-11-16 | 1997-11-07 | Michel Haond | Procede de gravure de couches de circuit integre a profondeur fixee et circuit integre correspondant. |
| US5256249A (en) * | 1991-09-17 | 1993-10-26 | Seagate Technology, Inc. | Method of manufacturing a planarized magnetoresistive sensor |
| US5621595A (en) * | 1992-10-20 | 1997-04-15 | Cohen; Uri | Pinched-gap magnetic recording thin film head |
| US5283942A (en) * | 1992-12-29 | 1994-02-08 | International Business Machines Corporation | Sacrificial layer planarization process for fabricating a narrow thin film inductive head |
| US5452166A (en) * | 1993-10-01 | 1995-09-19 | Applied Magnetics Corporation | Thin film magnetic recording head for minimizing undershoots and a method for manufacturing the same |
| US5578342A (en) * | 1995-07-05 | 1996-11-26 | Read-Rite Corporation | Alignment of magnetic poles of thin film transducer |
| JP3349925B2 (ja) * | 1996-09-10 | 2002-11-25 | アルプス電気株式会社 | 薄膜磁気ヘッドの製造方法 |
| JP2953401B2 (ja) * | 1996-10-04 | 1999-09-27 | 日本電気株式会社 | 磁気抵抗効果型複合ヘッドの製造方法 |
| US5804085A (en) * | 1997-01-30 | 1998-09-08 | Quantum Corporation | Process for producing a pole-trimmed writer in a magnetoresistive read/write head and a data transducer made thereby |
| JPH117608A (ja) * | 1997-04-25 | 1999-01-12 | Fujitsu Ltd | 磁気ヘッド及びその製造方法 |
| US5916423A (en) * | 1997-05-06 | 1999-06-29 | International Business Machines Corporation | P1 notched write head with minimum overmilled p1 and p2 |
| US5966800A (en) * | 1997-07-28 | 1999-10-19 | Read-Rite Corporation | Method of making a magnetic head with aligned pole tips and pole layers formed of high magnetic moment material |
| US6073338A (en) * | 1997-08-19 | 2000-06-13 | Read-Rite Corporation | Thin film read head with coplanar pole tips |
| US6055138A (en) * | 1998-05-06 | 2000-04-25 | Read-Rite Corporation | Thin film pedestal pole tips write head having narrower lower pedestal pole tip |
| EP0987529A1 (de) * | 1998-09-14 | 2000-03-22 | Heraeus Electro-Nite International N.V. | Elektrischer Widerstand mit wenigstens zwei Anschlusskontaktfeldern auf einem Substrat mit wenigstens einer Ausnehmung sowie Verfahren zu dessen Herstellung |
| US6490125B1 (en) | 1999-04-09 | 2002-12-03 | Read-Rite Corporation | Thin film write head with improved yoke to pole stitch |
| US6462919B1 (en) | 1999-04-28 | 2002-10-08 | Seagate Technology Llc | Spin valve sensor with exchange tabs |
| US6375063B1 (en) * | 1999-07-16 | 2002-04-23 | Quantum Corporation | Multi-step stud design and method for producing closely packed interconnects in magnetic recording heads |
| US6396668B1 (en) | 2000-03-24 | 2002-05-28 | Seagate Technology Llc | Planar double spin valve read head |
| US6466419B1 (en) | 2000-03-31 | 2002-10-15 | Seagate Technology Llc | Current perpendicular to plane spin valve head |
| US6700760B1 (en) | 2000-04-27 | 2004-03-02 | Seagate Technology Llc | Tunneling magnetoresistive head in current perpendicular to plane mode |
| US7086139B2 (en) * | 2004-04-30 | 2006-08-08 | Hitachi Global Storage Technologies Netherlands B.V. | Methods of making magnetic write heads using electron beam lithography |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3436327A (en) | 1966-07-18 | 1969-04-01 | Collins Radio Co | Selective sputtering rate circuit forming process |
| US3677843A (en) | 1970-02-02 | 1972-07-18 | Sylvania Electric Prod | Method for fabricating multilayer magnetic devices |
| US3808069A (en) | 1972-03-15 | 1974-04-30 | Bell Telephone Labor Inc | Forming windows in composite dielectric layers |
| US3814641A (en) | 1972-07-20 | 1974-06-04 | Instr Inc | Process of fabricating silicon photomask |
| DE2304685C3 (de) | 1973-01-31 | 1975-07-17 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung mikroskopisch kleiner Metall- oder Metallegierungs-Strukturen |
| US3922184A (en) | 1973-12-26 | 1975-11-25 | Ibm | Method for forming openings through insulative layers in the fabrication of integrated circuits |
| NL7608002A (nl) * | 1976-07-20 | 1978-01-24 | Philips Nv | Werkwijze ter vervaardiging van een magnetische inrichting. |
| JPS5381110A (en) * | 1976-12-25 | 1978-07-18 | Toshiba Corp | Manufacture of magnetic film head |
| DE2721201A1 (de) * | 1977-05-11 | 1978-11-16 | Siemens Ag | Verfahren zur herstellung integrierter magnetkopfstrukturen |
| US4131497A (en) | 1977-07-12 | 1978-12-26 | International Business Machines Corporation | Method of manufacturing self-aligned semiconductor devices |
| NL7709481A (nl) | 1977-08-29 | 1979-03-02 | Philips Nv | Werkwijze voor het vervaardigen van een dunne film magneetkop en dunne film magneetkop ver- vaardigd met behulp van de werkwijze. |
| JPS54104812A (en) | 1978-02-03 | 1979-08-17 | Matsushita Electric Ind Co Ltd | Thin film magnetic head and production of the same |
| JPS554762A (en) * | 1978-06-28 | 1980-01-14 | Fujitsu Ltd | Production of thin film magnetic head |
| US4219853A (en) | 1978-12-21 | 1980-08-26 | International Business Machines Corporation | Read/write thin film head |
-
1981
- 1981-07-13 US US06/282,540 patent/US4436593A/en not_active Expired - Lifetime
-
1982
- 1982-06-28 IE IE1556/82A patent/IE53689B1/en unknown
- 1982-07-08 GB GB08219847A patent/GB2104418B/en not_active Expired
- 1982-07-09 DE DE19823225780 patent/DE3225780A1/de active Granted
- 1982-07-12 FR FR8212211A patent/FR2509503B1/fr not_active Expired
- 1982-07-12 JP JP57119991A patent/JPS5817523A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| US4436593A (en) | 1984-03-13 |
| IE821556L (en) | 1983-01-13 |
| DE3225780C2 (https=) | 1990-12-06 |
| JPS5817523A (ja) | 1983-02-01 |
| JPH0338646B2 (https=) | 1991-06-11 |
| FR2509503A1 (fr) | 1983-01-14 |
| FR2509503B1 (fr) | 1986-07-25 |
| GB2104418A (en) | 1983-03-09 |
| DE3225780A1 (de) | 1983-02-03 |
| GB2104418B (en) | 1985-05-22 |
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