FR2509503B1 - Procede de faconnage de pieces polaires alignees pour tete magnetique en lamelles minces - Google Patents

Procede de faconnage de pieces polaires alignees pour tete magnetique en lamelles minces

Info

Publication number
FR2509503B1
FR2509503B1 FR8212211A FR8212211A FR2509503B1 FR 2509503 B1 FR2509503 B1 FR 2509503B1 FR 8212211 A FR8212211 A FR 8212211A FR 8212211 A FR8212211 A FR 8212211A FR 2509503 B1 FR2509503 B1 FR 2509503B1
Authority
FR
France
Prior art keywords
shaping
magnetic head
thin blades
polar parts
aligned polar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8212211A
Other languages
English (en)
French (fr)
Other versions
FR2509503A1 (fr
Inventor
John Randolph Osborne
Peter Gerhard Bischoff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Memorex Corp
Original Assignee
Memorex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Memorex Corp filed Critical Memorex Corp
Publication of FR2509503A1 publication Critical patent/FR2509503A1/fr
Application granted granted Critical
Publication of FR2509503B1 publication Critical patent/FR2509503B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49044—Plural magnetic deposition layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
FR8212211A 1981-07-13 1982-07-12 Procede de faconnage de pieces polaires alignees pour tete magnetique en lamelles minces Expired FR2509503B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/282,540 US4436593A (en) 1981-07-13 1981-07-13 Self-aligned pole tips

Publications (2)

Publication Number Publication Date
FR2509503A1 FR2509503A1 (fr) 1983-01-14
FR2509503B1 true FR2509503B1 (fr) 1986-07-25

Family

ID=23081984

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8212211A Expired FR2509503B1 (fr) 1981-07-13 1982-07-12 Procede de faconnage de pieces polaires alignees pour tete magnetique en lamelles minces

Country Status (6)

Country Link
US (1) US4436593A (https=)
JP (1) JPS5817523A (https=)
DE (1) DE3225780A1 (https=)
FR (1) FR2509503B1 (https=)
GB (1) GB2104418B (https=)
IE (1) IE53689B1 (https=)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5972639A (ja) * 1982-10-20 1984-04-24 Fuji Photo Film Co Ltd 磁気ヘツドの製造方法
DE3330041A1 (de) * 1983-08-19 1985-02-28 Siemens AG, 1000 Berlin und 8000 München Magnetkopf fuer ein senkrecht zu magnetisierendes aufzeichnungsmedium
JPS60133516A (ja) * 1983-12-22 1985-07-16 Hitachi Ltd 薄膜磁気ヘツドの製造方法
US4652954A (en) * 1985-10-24 1987-03-24 International Business Machines Method for making a thin film magnetic head
JPS62219217A (ja) * 1986-03-19 1987-09-26 Hitachi Maxell Ltd 磁気ヘツド
US5108837A (en) * 1987-12-04 1992-04-28 Digital Equipment Corporation Laminated poles for recording heads
US5200056A (en) * 1990-02-15 1993-04-06 Seagate Technology Inc. Method for aligning pole tips in a thin film head
US5116719A (en) * 1990-02-15 1992-05-26 Seagate Technology, Inc. Top pole profile for pole tip trimming
US4992901A (en) * 1990-02-15 1991-02-12 Seagate Technology, Inc. Self aligned magnetic poles using sacrificial mask
US5141623A (en) * 1990-02-15 1992-08-25 Seagate Technology, Inc. Method for aligning pole tips in a thin film head
NL9000546A (nl) * 1990-03-09 1991-10-01 Philips Nv Werkwijze voor het vervaardigen van een dunnefilm magneetkop alsmede een dunnefilm magneetkop vervaardigbaar volgens de werkwijze.
US5157570A (en) * 1990-06-29 1992-10-20 Digital Equipment Corporation Magnetic pole configuration for high density thin film recording head
FR2669466B1 (fr) * 1990-11-16 1997-11-07 Michel Haond Procede de gravure de couches de circuit integre a profondeur fixee et circuit integre correspondant.
US5256249A (en) * 1991-09-17 1993-10-26 Seagate Technology, Inc. Method of manufacturing a planarized magnetoresistive sensor
US5621595A (en) * 1992-10-20 1997-04-15 Cohen; Uri Pinched-gap magnetic recording thin film head
US5283942A (en) * 1992-12-29 1994-02-08 International Business Machines Corporation Sacrificial layer planarization process for fabricating a narrow thin film inductive head
US5452166A (en) * 1993-10-01 1995-09-19 Applied Magnetics Corporation Thin film magnetic recording head for minimizing undershoots and a method for manufacturing the same
US5578342A (en) * 1995-07-05 1996-11-26 Read-Rite Corporation Alignment of magnetic poles of thin film transducer
JP3349925B2 (ja) * 1996-09-10 2002-11-25 アルプス電気株式会社 薄膜磁気ヘッドの製造方法
JP2953401B2 (ja) * 1996-10-04 1999-09-27 日本電気株式会社 磁気抵抗効果型複合ヘッドの製造方法
US5804085A (en) * 1997-01-30 1998-09-08 Quantum Corporation Process for producing a pole-trimmed writer in a magnetoresistive read/write head and a data transducer made thereby
JPH117608A (ja) * 1997-04-25 1999-01-12 Fujitsu Ltd 磁気ヘッド及びその製造方法
US5916423A (en) * 1997-05-06 1999-06-29 International Business Machines Corporation P1 notched write head with minimum overmilled p1 and p2
US5966800A (en) * 1997-07-28 1999-10-19 Read-Rite Corporation Method of making a magnetic head with aligned pole tips and pole layers formed of high magnetic moment material
US6073338A (en) * 1997-08-19 2000-06-13 Read-Rite Corporation Thin film read head with coplanar pole tips
US6055138A (en) * 1998-05-06 2000-04-25 Read-Rite Corporation Thin film pedestal pole tips write head having narrower lower pedestal pole tip
EP0987529A1 (de) * 1998-09-14 2000-03-22 Heraeus Electro-Nite International N.V. Elektrischer Widerstand mit wenigstens zwei Anschlusskontaktfeldern auf einem Substrat mit wenigstens einer Ausnehmung sowie Verfahren zu dessen Herstellung
US6490125B1 (en) 1999-04-09 2002-12-03 Read-Rite Corporation Thin film write head with improved yoke to pole stitch
US6462919B1 (en) 1999-04-28 2002-10-08 Seagate Technology Llc Spin valve sensor with exchange tabs
US6375063B1 (en) * 1999-07-16 2002-04-23 Quantum Corporation Multi-step stud design and method for producing closely packed interconnects in magnetic recording heads
US6396668B1 (en) 2000-03-24 2002-05-28 Seagate Technology Llc Planar double spin valve read head
US6466419B1 (en) 2000-03-31 2002-10-15 Seagate Technology Llc Current perpendicular to plane spin valve head
US6700760B1 (en) 2000-04-27 2004-03-02 Seagate Technology Llc Tunneling magnetoresistive head in current perpendicular to plane mode
US7086139B2 (en) * 2004-04-30 2006-08-08 Hitachi Global Storage Technologies Netherlands B.V. Methods of making magnetic write heads using electron beam lithography

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3436327A (en) 1966-07-18 1969-04-01 Collins Radio Co Selective sputtering rate circuit forming process
US3677843A (en) 1970-02-02 1972-07-18 Sylvania Electric Prod Method for fabricating multilayer magnetic devices
US3808069A (en) 1972-03-15 1974-04-30 Bell Telephone Labor Inc Forming windows in composite dielectric layers
US3814641A (en) 1972-07-20 1974-06-04 Instr Inc Process of fabricating silicon photomask
DE2304685C3 (de) 1973-01-31 1975-07-17 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung mikroskopisch kleiner Metall- oder Metallegierungs-Strukturen
US3922184A (en) 1973-12-26 1975-11-25 Ibm Method for forming openings through insulative layers in the fabrication of integrated circuits
NL7608002A (nl) * 1976-07-20 1978-01-24 Philips Nv Werkwijze ter vervaardiging van een magnetische inrichting.
JPS5381110A (en) * 1976-12-25 1978-07-18 Toshiba Corp Manufacture of magnetic film head
DE2721201A1 (de) * 1977-05-11 1978-11-16 Siemens Ag Verfahren zur herstellung integrierter magnetkopfstrukturen
US4131497A (en) 1977-07-12 1978-12-26 International Business Machines Corporation Method of manufacturing self-aligned semiconductor devices
NL7709481A (nl) 1977-08-29 1979-03-02 Philips Nv Werkwijze voor het vervaardigen van een dunne film magneetkop en dunne film magneetkop ver- vaardigd met behulp van de werkwijze.
JPS54104812A (en) 1978-02-03 1979-08-17 Matsushita Electric Ind Co Ltd Thin film magnetic head and production of the same
JPS554762A (en) * 1978-06-28 1980-01-14 Fujitsu Ltd Production of thin film magnetic head
US4219853A (en) 1978-12-21 1980-08-26 International Business Machines Corporation Read/write thin film head

Also Published As

Publication number Publication date
US4436593A (en) 1984-03-13
IE821556L (en) 1983-01-13
DE3225780C2 (https=) 1990-12-06
JPS5817523A (ja) 1983-02-01
JPH0338646B2 (https=) 1991-06-11
FR2509503A1 (fr) 1983-01-14
IE53689B1 (en) 1989-01-18
GB2104418A (en) 1983-03-09
DE3225780A1 (de) 1983-02-03
GB2104418B (en) 1985-05-22

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Legal Events

Date Code Title Description
ST Notification of lapse
ST Notification of lapse
ST Notification of lapse