HK58689A - Photopolymerisation with organometal salts - Google Patents

Photopolymerisation with organometal salts

Info

Publication number
HK58689A
HK58689A HK58689A HK58689A HK58689A HK 58689 A HK58689 A HK 58689A HK 58689 A HK58689 A HK 58689A HK 58689 A HK58689 A HK 58689A HK 58689 A HK58689 A HK 58689A
Authority
HK
Hong Kong
Prior art keywords
group
composition according
hexafluorophosphate
tricarbonyl
composition
Prior art date
Application number
HK58689A
Other languages
German (de)
English (en)
French (fr)
Inventor
Edward Dr. Irving
Brian Frederick Gilbert Dr. Johnson
Kurt Dr. Meier
Original Assignee
Ciba-Geigy A.G.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba-Geigy A.G. filed Critical Ciba-Geigy A.G.
Publication of HK58689A publication Critical patent/HK58689A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
HK58689A 1982-05-19 1989-07-20 Photopolymerisation with organometal salts HK58689A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8214609 1982-05-19

Publications (1)

Publication Number Publication Date
HK58689A true HK58689A (en) 1989-07-28

Family

ID=10530464

Family Applications (1)

Application Number Title Priority Date Filing Date
HK58689A HK58689A (en) 1982-05-19 1989-07-20 Photopolymerisation with organometal salts

Country Status (6)

Country Link
EP (1) EP0094914B1 (esLanguage)
JP (1) JPS58213019A (esLanguage)
CA (1) CA1300307C (esLanguage)
DE (1) DE3366408D1 (esLanguage)
HK (1) HK58689A (esLanguage)
SG (1) SG20789G (esLanguage)

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US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
KR100219955B1 (ko) * 1992-01-22 1999-09-01 스프레이그 로버트 월터 광활성화 가능한 열경화성 에폭시 조성물
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US8871335B2 (en) 2005-08-31 2014-10-28 Kuraray America Inc. Solar control laminate
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
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JP5866686B2 (ja) 2010-01-22 2016-02-17 ディーエスエム アイピー アセッツ ビー.ブイ. 選択的視覚効果を有して層状に硬化可能な液状放射線硬化性樹脂およびその使用方法
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US9896599B2 (en) 2013-04-30 2018-02-20 3M Innovative Properties Company Process for preparing poly(benzoxazines)
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KR20160072147A (ko) 2013-10-16 2016-06-22 쓰리엠 이노베이티브 프로퍼티즈 컴파니 벤족사진 중합
JP6195552B2 (ja) * 2014-02-21 2017-09-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、パターン形成方法、並びに、これらを用いた電子デバイスの製造方法
WO2016200557A1 (en) 2015-06-09 2016-12-15 3M Innovative Properties Company Ammonium salt catalyzed benzoxazine polymerization
US20190153226A1 (en) 2016-04-08 2019-05-23 Solvay Specialty Polymers Usa, Llc Photocurable polymers, photocurable polymer compositions and lithographic processes including the same
CN113667280A (zh) * 2021-08-28 2021-11-19 林州致远电子科技有限公司 一种具有uv遮蔽作用的树脂组合物及在覆铜板中的应用

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Also Published As

Publication number Publication date
SG20789G (en) 1989-09-22
EP0094914A2 (de) 1983-11-23
CA1300307C (en) 1992-05-05
JPH0261973B2 (esLanguage) 1990-12-21
EP0094914B1 (de) 1986-09-24
EP0094914A3 (en) 1984-02-08
JPS58213019A (ja) 1983-12-10
DE3366408D1 (en) 1986-10-30

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Legal Events

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PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)