HK1202331A1 - Measuring apparatus and film-forming apparatus - Google Patents
Measuring apparatus and film-forming apparatusInfo
- Publication number
- HK1202331A1 HK1202331A1 HK15102625.2A HK15102625A HK1202331A1 HK 1202331 A1 HK1202331 A1 HK 1202331A1 HK 15102625 A HK15102625 A HK 15102625A HK 1202331 A1 HK1202331 A1 HK 1202331A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- film
- forming apparatus
- measuring
- measuring apparatus
- forming
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
- G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Toxicology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Mathematical Physics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Chemical Vapour Deposition (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2012/073097 WO2014038090A1 (ja) | 2012-09-10 | 2012-09-10 | 測定装置及び成膜装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1202331A1 true HK1202331A1 (en) | 2015-09-25 |
Family
ID=49850420
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK15102625.2A HK1202331A1 (en) | 2012-09-10 | 2015-03-16 | Measuring apparatus and film-forming apparatus |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5367196B1 (ja) |
CN (1) | CN104350380B (ja) |
HK (1) | HK1202331A1 (ja) |
TW (1) | TWI502164B (ja) |
WO (1) | WO2014038090A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107179053A (zh) * | 2016-03-10 | 2017-09-19 | 中国科学院高能物理研究所 | 导光装置、薄膜的均匀性测试装置和方法 |
CN105714252B (zh) * | 2016-04-28 | 2018-09-28 | 中国工程物理研究院激光聚变研究中心 | 一种光学薄膜沉积扫描控制方法及系统 |
WO2018236287A1 (en) * | 2017-06-22 | 2018-12-27 | Ams Sensors Singapore Pte. Ltd. | COMPACT SPECTROMETER MODULES |
JP2019144217A (ja) * | 2018-02-20 | 2019-08-29 | 国立大学法人千葉大学 | 膜厚測定装置、これを用いた蒸着装置及び膜特性評価装置 |
CN109811323B (zh) * | 2019-01-23 | 2023-09-08 | 北京北方华创微电子装备有限公司 | 一种磁控溅射装置和托盘检测方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01304345A (ja) * | 1988-06-02 | 1989-12-07 | Nkk Corp | ガス検知装置 |
JPH0590371A (ja) * | 1991-09-27 | 1993-04-09 | Nec Corp | 膜厚測定方法及びその装置 |
JP2973639B2 (ja) * | 1991-09-30 | 1999-11-08 | 横河電機株式会社 | シ―ト状物体の特性測定装置 |
JP3534632B2 (ja) * | 1998-12-22 | 2004-06-07 | シャープ株式会社 | 膜厚測定方法 |
JP2001174404A (ja) * | 1999-12-15 | 2001-06-29 | Takahisa Mitsui | 光断層像計測装置および計測方法 |
CN1302916A (zh) * | 2000-12-27 | 2001-07-11 | 中国科学院上海技术物理研究所 | 关于红外截止滤光片光学介质膜厚度的监控方法 |
JP3823745B2 (ja) * | 2001-03-14 | 2006-09-20 | オムロン株式会社 | 膜厚測定方法およびその方法を用いた膜厚センサ |
US7247345B2 (en) * | 2002-03-25 | 2007-07-24 | Ulvac, Inc. | Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof |
CN2552943Y (zh) * | 2002-04-30 | 2003-05-28 | 西安工业学院 | 光学薄膜厚度在线实时监控仪 |
JP3959469B2 (ja) * | 2003-08-07 | 2007-08-15 | 独立行政法人産業技術総合研究所 | 膜の屈折率及び厚さの測定方法、測定プログラム及びコンピュータ読取可能な記録媒体 |
JP2006071589A (ja) * | 2004-09-06 | 2006-03-16 | Univ Kansai | 色測定装置及び光源装置 |
CN2763776Y (zh) * | 2004-12-30 | 2006-03-08 | 鸿富锦精密工业(深圳)有限公司 | 膜厚监控装置 |
CN100365467C (zh) * | 2005-04-08 | 2008-01-30 | 中国科学院上海光学精密机械研究所 | 光学膜厚监控系统 |
JP4559995B2 (ja) * | 2006-03-30 | 2010-10-13 | 株式会社東芝 | 腫瘍検査装置 |
JP4775798B2 (ja) * | 2006-05-18 | 2011-09-21 | 独立行政法人科学技術振興機構 | 複数ガス濃度同時測定装置 |
CN1877298A (zh) * | 2006-07-05 | 2006-12-13 | 中国科学院上海光学精密机械研究所 | 膜层光谱的实时测量装置及其测量方法 |
JP2008180597A (ja) * | 2007-01-24 | 2008-08-07 | Sanyo Electric Co Ltd | 光検出装置および光学測定ユニット |
JP5314301B2 (ja) * | 2008-03-14 | 2013-10-16 | 三菱重工業株式会社 | ガス濃度計測方法および装置 |
JP4878632B2 (ja) * | 2009-07-03 | 2012-02-15 | 株式会社シンクロン | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
JP2012026949A (ja) * | 2010-07-27 | 2012-02-09 | Shimadzu Corp | ガス濃度測定装置 |
JP2012063321A (ja) * | 2010-09-17 | 2012-03-29 | Hamamatsu Photonics Kk | 反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法 |
JP5126909B2 (ja) * | 2010-10-08 | 2013-01-23 | 株式会社シンクロン | 薄膜形成方法及び薄膜形成装置 |
-
2012
- 2012-09-10 WO PCT/JP2012/073097 patent/WO2014038090A1/ja active Application Filing
- 2012-09-10 JP JP2013519298A patent/JP5367196B1/ja active Active
- 2012-09-10 CN CN201280073844.8A patent/CN104350380B/zh active Active
-
2013
- 2013-09-10 TW TW102132518A patent/TWI502164B/zh active
-
2015
- 2015-03-16 HK HK15102625.2A patent/HK1202331A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN104350380A (zh) | 2015-02-11 |
WO2014038090A1 (ja) | 2014-03-13 |
TWI502164B (zh) | 2015-10-01 |
CN104350380B (zh) | 2017-03-15 |
TW201411090A (zh) | 2014-03-16 |
JPWO2014038090A1 (ja) | 2016-08-08 |
JP5367196B1 (ja) | 2013-12-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20210909 |