HK1202331A1 - Measuring apparatus and film-forming apparatus - Google Patents
Measuring apparatus and film-forming apparatusInfo
- Publication number
- HK1202331A1 HK1202331A1 HK15102625.2A HK15102625A HK1202331A1 HK 1202331 A1 HK1202331 A1 HK 1202331A1 HK 15102625 A HK15102625 A HK 15102625A HK 1202331 A1 HK1202331 A1 HK 1202331A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- film
- forming apparatus
- measuring
- measuring apparatus
- forming
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
- G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Toxicology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Mathematical Physics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2012/073097 WO2014038090A1 (en) | 2012-09-10 | 2012-09-10 | Measuring apparatus and film-forming apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1202331A1 true HK1202331A1 (en) | 2015-09-25 |
Family
ID=49850420
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK15102625.2A HK1202331A1 (en) | 2012-09-10 | 2015-03-16 | Measuring apparatus and film-forming apparatus |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5367196B1 (en) |
CN (1) | CN104350380B (en) |
HK (1) | HK1202331A1 (en) |
TW (1) | TWI502164B (en) |
WO (1) | WO2014038090A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107179053A (en) * | 2016-03-10 | 2017-09-19 | 中国科学院高能物理研究所 | Guiding device, the homogeneity test device of film and method |
CN105714252B (en) * | 2016-04-28 | 2018-09-28 | 中国工程物理研究院激光聚变研究中心 | A kind of optical thin film deposition scan control method and system |
US11067446B2 (en) * | 2017-06-22 | 2021-07-20 | Ams Sensors Singapore Pte. Ltd. | Compact spectrometer modules |
JP2019144217A (en) * | 2018-02-20 | 2019-08-29 | 国立大学法人千葉大学 | Film thickness measurement device, vapor deposition apparatus using the same and film characteristic evaluation device |
CN109811323B (en) * | 2019-01-23 | 2023-09-08 | 北京北方华创微电子装备有限公司 | Magnetron sputtering device and tray detection method |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01304345A (en) * | 1988-06-02 | 1989-12-07 | Nkk Corp | Gas sensor |
JPH0590371A (en) * | 1991-09-27 | 1993-04-09 | Nec Corp | Method and apparatus for film thickness measurement |
JP2973639B2 (en) * | 1991-09-30 | 1999-11-08 | 横河電機株式会社 | Equipment for measuring characteristics of sheet-like objects |
JP3534632B2 (en) * | 1998-12-22 | 2004-06-07 | シャープ株式会社 | Film thickness measurement method |
JP2001174404A (en) * | 1999-12-15 | 2001-06-29 | Takahisa Mitsui | Apparatus and method for measuring optical tomographic image |
CN1302916A (en) * | 2000-12-27 | 2001-07-11 | 中国科学院上海技术物理研究所 | Method of monitoring and controlling thickness of optical medium film for infrared-stopping filter |
JP3823745B2 (en) * | 2001-03-14 | 2006-09-20 | オムロン株式会社 | Film thickness measuring method and film thickness sensor using the method |
US7247345B2 (en) * | 2002-03-25 | 2007-07-24 | Ulvac, Inc. | Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof |
CN2552943Y (en) * | 2002-04-30 | 2003-05-28 | 西安工业学院 | Optical film thickness on line real time monitor |
JP3959469B2 (en) * | 2003-08-07 | 2007-08-15 | 独立行政法人産業技術総合研究所 | Method for measuring refractive index and thickness of film, measurement program, and computer-readable recording medium |
JP2006071589A (en) * | 2004-09-06 | 2006-03-16 | Univ Kansai | Color measuring instrument and light source device |
CN2763776Y (en) * | 2004-12-30 | 2006-03-08 | 鸿富锦精密工业(深圳)有限公司 | Film thickness monitoring controller |
CN100365467C (en) * | 2005-04-08 | 2008-01-30 | 中国科学院上海光学精密机械研究所 | Optical film thickness monitoring system |
JP4559995B2 (en) * | 2006-03-30 | 2010-10-13 | 株式会社東芝 | Tumor testing device |
JP4775798B2 (en) * | 2006-05-18 | 2011-09-21 | 独立行政法人科学技術振興機構 | Multiple gas concentration simultaneous measurement device |
CN1877298A (en) * | 2006-07-05 | 2006-12-13 | 中国科学院上海光学精密机械研究所 | Real-time measurement apparatus and measurement method for film layer spectrum |
JP2008180597A (en) * | 2007-01-24 | 2008-08-07 | Sanyo Electric Co Ltd | Light detection device and optical measurement unit |
JP5314301B2 (en) * | 2008-03-14 | 2013-10-16 | 三菱重工業株式会社 | Gas concentration measuring method and apparatus |
JP4878632B2 (en) * | 2009-07-03 | 2012-02-15 | 株式会社シンクロン | Optical film thickness meter and thin film forming apparatus equipped with optical film thickness meter |
JP2012026949A (en) * | 2010-07-27 | 2012-02-09 | Shimadzu Corp | Gas concentration measurement instrument |
JP2012063321A (en) * | 2010-09-17 | 2012-03-29 | Hamamatsu Photonics Kk | Reflectivity measurement device, reflectivity measurement method, film thickness measurement device, and film thickness measurement method |
JP5126909B2 (en) * | 2010-10-08 | 2013-01-23 | 株式会社シンクロン | Thin film forming method and thin film forming apparatus |
-
2012
- 2012-09-10 JP JP2013519298A patent/JP5367196B1/en active Active
- 2012-09-10 WO PCT/JP2012/073097 patent/WO2014038090A1/en active Application Filing
- 2012-09-10 CN CN201280073844.8A patent/CN104350380B/en active Active
-
2013
- 2013-09-10 TW TW102132518A patent/TWI502164B/en active
-
2015
- 2015-03-16 HK HK15102625.2A patent/HK1202331A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN104350380A (en) | 2015-02-11 |
TW201411090A (en) | 2014-03-16 |
CN104350380B (en) | 2017-03-15 |
WO2014038090A1 (en) | 2014-03-13 |
JP5367196B1 (en) | 2013-12-11 |
TWI502164B (en) | 2015-10-01 |
JPWO2014038090A1 (en) | 2016-08-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2519006B (en) | Size measurement device and size measurement method | |
EP2933599A4 (en) | Method and device for measuring displacement | |
EP2766744A4 (en) | Distance measurement methods and apparatus | |
EP2819566A4 (en) | Calibration apparatus | |
EP2805777A4 (en) | Coating method and device | |
EP2820527A4 (en) | Apparatus and associated methods | |
EP2808642A4 (en) | Hole-shape measuring apparatus and hole-shape measuring method | |
GB2504822B (en) | Range measurement apparatus and range measurement method | |
GB201219189D0 (en) | Spectroscopic apparatus and methods | |
EP2905576A4 (en) | Shape measuring method and device | |
EP2904647A4 (en) | An apparatus and associated methods | |
EP2891865A4 (en) | Measuring method and measuring device | |
GB201317904D0 (en) | Size measurement apparatus and size measurement method | |
EP2889603A4 (en) | Microparticle measuring device | |
HK1206676A1 (en) | Film-forming apparatus | |
GB2508874B (en) | Interferometric apparatus and sample characteristic determining apparatus using such apparatus | |
EP2893310A4 (en) | Devices and methods for measuring light | |
EP2857816A4 (en) | Mechanical-quantity measuring device | |
EP2792999A4 (en) | Physical quantity measuring device and physical quantity measuring method | |
EP2821016A4 (en) | Measurement device and measurement method | |
EP2790425A4 (en) | Time calibration method and device | |
TWI560431B (en) | Optical characteristic measuring apparatus | |
EP2908091A4 (en) | Shape measuring method and shape measuring device | |
EP2850461A4 (en) | Measurement calibration apparatus, methods, and systems | |
EP2875388A4 (en) | Measurement transformation apparatus, methods, and systems |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20210909 |