CN2552943Y - Optical film thickness on line real time monitor - Google Patents
Optical film thickness on line real time monitor Download PDFInfo
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- CN2552943Y CN2552943Y CN 02224851 CN02224851U CN2552943Y CN 2552943 Y CN2552943 Y CN 2552943Y CN 02224851 CN02224851 CN 02224851 CN 02224851 U CN02224851 U CN 02224851U CN 2552943 Y CN2552943 Y CN 2552943Y
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Abstract
The utility model discloses an optical thin film thickness online real-time monitoring meter, which comprises a silicon photocell, an optical fiber sensor, a reflector, a lens, an amplifier, a filter, a phase locking unit, a modulator, a coupler, a monochromator, a photomultiplier tube, a data acquisition card and a computer, and other components. Two beams of light omitted by a light source are respectively modulated through different frequencies, and four beams of rays are obtained respectively through a light beam splitter; wherein, two beams of rays enter into the monochromator and the photomultiplier tube through an optical fiber, the other two beams of rays are received by the silicon photocell to respectively form the restituted signal of a measuring signal and a reference signal; the signal can be displayed and printed by the computer; at the same time, the computer ceaselessly detects and compares the changing signal, once the signal reaches to the overshoot of an extreme point or a reflectance value obtained by the computer in advance, a baffle is closed in time through a servo system to stop the coating by vaporization to the film; thereby, the monitoring to the film thickness is completed, and the automation of the coating process is realized.
Description
One, affiliated field
The utility model belongs to optical film technology field, and particularly a kind of vacuum is coated with the optical film thickness online in real time monitor of optical thin film.
Two, background technology
Aspect film thickness monitoring, mainly contain photoelectric extreme value method monitoring, wide spectrum film thickness monitoring and quartz crystal succusion etc.Photoelectric extreme value method is at present in optical film thickness control method, and is widely used a kind of, and it is to adopt photoelectric photometry, and directly MEASUREMENTS OF THIN transmissivity or reflectivity extreme value realize the control to optical film thickness.Typical optical film thickness meter as shown in Figure 1.
The major cause of existing film thickness monitoring system immunity from interference, less stable has: 1.. and the stability of monitor signal in the job stability remarkably influenced of light source, photomultiplier and power supply source thereof.For example, photomultiplier highly compressed minor fluctuations will cause the output pulsation that surpasses an order of magnitude.Therefore in Monitoring systems, their stability requirement is very high.2.. monitoring light shines directly into this structure on the monochromator entrance slit, make system the anti-vibration ability, to get rid of the stray light ability more weak, affects the stability of monitor signal.3.. the quality good or not of Design of Simulating Circuits, especially electronic element is determining the quality that signal filtering is handled.4.. only handle by analog filtering, and further digital filtering, handle and just show by charactron, also affect the stability of the digital demonstration of monitor signal.
Three, summary of the invention
According to problem or deficiency that above-mentioned prior art exists, the purpose of this utility model is, a kind of optical film thickness online in real time monitor is provided.
The accurate monitoring of optical film thickness is the gordian technique of preparation optical thin film, and it directly affects reflectivity, Optical transmission spectrum characteristic and the polarization characteristic of film.And the object of optical film thickness monitoring is meant: being coated with in the process of film, in order to guarantee to produce qualified film product, (its measurement is carried out simultaneously) measured and controlled to reflectivity (or transmissivity) to film in coating process in coating process, and measuring result is used for the film Thickness Control.During monitoring,, stop the rete evaporation, thereby realize control film thickness in case when measuring numerical value and reaching, just close baffle plate immediately with the corresponding numerical value of desired thickness.
The accurate monitoring of optical film thickness depends on the accurate judgement to extreme point, further requires the highly stable, accurate of take off data.The purpose of invention just is being to spend not significantly when improving system cost, obtains the relatively-better stability take off data, thereby reaches the purpose to the accurate monitoring of optical film thickness.
To achieve these goals, the technical solution adopted in the utility model is, optical film thickness online in real time monitor comprises, a pair of silicon photocell 1 and 2, Fibre Optical Sensor 9, reflective mirror 3,4,5 and semi-transparent semi-reflecting lens 6,7 is characterized in that:
Silicon photocell 1 and 2 is separately positioned on the light source of monitoring, is used to receive, form the restituted signal of test signal and reference signal, and silicon photocell 1 is used for the reference arm restituted signal, and silicon photocell 2 is used to test the road restituted signal after modulator 27 modulation; Reference arm restituted signal and test road restituted signal enter in phase locking unit 22 and the phase locking unit 23 through amplifier 18, wave filter 19 and amplifier 16, wave filter 17 respectively;
The light that semi-transparent semi-reflecting lens 6 will see through from speculum 3 is as the reference optical signal, reflective mirror 3 is arranged on the light path of semi-transparent semi-reflecting lens 6, the light path of semi-transparent semi-reflecting lens 7 is provided with reflective mirror 4, the luminous reflectance that reflective mirror 4 transmits semi-transparent semi-reflecting lens 7 is to sheet 8 relatively, after comparison, relatively sheet 8 is delivered on the reflective mirror 5 light that reflective mirror 4 transmits as the test light signal again; Reference optical signal and test light signal are passed in the Fibre Optical Sensor 9, optical signal is sent into monochromator 11 and photomultiplier 12 after coupling mechanism 10 couplings, amplify 13 through prime, after secondary amplification 14 and three grades amplify 15, send into bandpass filter 20 respectively, in 21, bandpass filter 20,21 send into signal in phase locking unit 22 and the phase locking unit 23 again, phase locking unit 22 and phase locking unit 23 are isolated reference signal and evaporating state signal and test signal and vacuum tightness signal respectively with above-mentioned four road signals, send into data collecting card 24, data collecting card 24 also is connected to a temperature signal, inserts computer 25 by data collecting card; Computer 25 is with printer, digital demonstration, indicating meter links to each other and control servosystem 26, and servosystem 26 links to each other with comparison sheet 8;
The light that light source sends is divided into two bundles, and after the different frequency modulation, the beam splitter of respectively hanging oneself again obtains four bundle light respectively; Wherein the two-beam line enters monochromator, photomultiplier by optical fiber, and the two-beam line is received by silicon photocell in addition, forms the restituted signal of test signal and reference signal respectively; The two-beam line that enters photomultiplier forms reference signal and the measurement signal with different frequency; This two signal is common to carry out demodulation process through after preposition amplification and the multistage amplification by bandpass filter, lock-in amplifier, obtains dc reference signal and test signal, and by the data collecting card collection; After image data carried out digital filtering, digital divide and demonstration linearizing, show, print by computer; Simultaneously, computer ceaselessly detects, relatively the signal that changes, in case this signal reaches the overshoot of extreme point or during the reflectance value that calculates in advance, in time close baffle plate by servosystem, stops the rete evaporation; Thereby finish monitoring to thicknesses of layers.
Some other characteristics of the present utility model are that described modulator 27 adopts the double frequency modulator.
Four, description of drawings
Fig. 1 is typical optical film thickness meter structural representation;
Fig. 2 is an optical film thickness online in real time monitor structural representation of the present utility model.
Five, embodiment
Below in conjunction with accompanying drawing the utility model is described in further detail.Referring to Fig. 2, optical film thickness online in real time monitor of the present utility model is that former extremum method film thickness monitoring system has been carried out rational transformation.Comprise that a pair of silicon photocell 1 and 2, Fibre Optical Sensor 9, reflective mirror 3,4,5 and semi-transparent semi-reflecting lens 6,7 is characterized in that:
Silicon photocell 1 and 2 is separately positioned on the light source of monitoring, is used to receive, form the restituted signal of test signal and reference signal, and silicon photocell 1 is used for the reference arm restituted signal, and silicon photocell 2 is used to test the road restituted signal after modulator 27 modulation; Reference arm restituted signal and test road restituted signal enter in phase locking unit 22 and the phase locking unit 23 through amplifier 18, wave filter 19 and amplifier 16, wave filter 17 respectively;
The light that semi-transparent semi-reflecting lens 6 will see through from speculum 3 is as the reference optical signal, reflective mirror 3 is arranged on the light path of semi-transparent semi-reflecting lens 6, the light path of semi-transparent semi-reflecting lens 7 is provided with reflective mirror 4, the luminous reflectance that reflective mirror 4 transmits semi-transparent semi-reflecting lens 7 is to sheet 8 relatively, after comparison, relatively sheet 8 is delivered on the reflective mirror 5 light that reflective mirror 4 transmits as the test light signal again; Reference optical signal and test light signal are passed in the Fibre Optical Sensor 9, optical signal is sent into monochromator 11 and photomultiplier 12 after coupling mechanism 10 couplings, amplify 13 through prime, after secondary amplification 14 and three grades amplify 15, send into bandpass filter 20 respectively, in 21, bandpass filter 20,21 send into signal in phase locking unit 22 and the phase locking unit 23 again, phase locking unit 22 and phase locking unit 23 are isolated reference signal and evaporating state signal and test signal and vacuum tightness signal respectively with above-mentioned four road signals, send into data collecting card 24, data collecting card 24 also is connected to a temperature signal, inserts computer 25 by data collecting card; Computer 25 is with printer, digital demonstration, indicating meter links to each other and control servosystem 26, and servosystem 26 links to each other with comparison sheet 8;
The light that light source sends is divided into two bundles, and after the different frequency modulation, the beam splitter of respectively hanging oneself again obtains four bundle light respectively; Wherein the two-beam line enters monochromator, photomultiplier by optical fiber, and the two-beam line is received by silicon photocell in addition, forms the restituted signal of test signal and reference signal respectively; The two-beam line that enters photomultiplier forms reference signal and the measurement signal with different frequency; This two signal is common to carry out demodulation process through after preposition amplification and the multistage amplification by bandpass filter, lock-in amplifier, obtains dc reference signal and test signal, and by the data collecting card collection; After image data carried out digital filtering, digital divide and demonstration linearizing, show, print by computer; Simultaneously, computer ceaselessly detects, relatively the signal that changes, in case this signal reaches the overshoot of extreme point or during the reflectance value that calculates in advance, in time close baffle plate by servosystem, stops the rete evaporation; Thereby finish monitoring to thicknesses of layers.
Modulator 27 adopts the double frequency modulator.
The utility model has been given prominence to following characteristic emphatically at existing film thickness monitoring system:
A: utilize four light path systems that saturating (instead) rate of penetrating of spectrum that optical thin film is coated with in the process is measured;
B: utilize same light source, same monochromator, same photomultiplier and double frequency modulator and twin-lock decide amplifier simultaneously measurement signal light intensity and with reference to light intensity;
C: utilize saturating (instead) radiance rate value of replacement recently of two light intensity signals that record, touch the interferential influence altogether to eliminate;
D: utilize special software to eliminate that difference is touched and the influence of random disturbance.1) modulator adopts the double frequency modulator
In Photoelectric Detection, optical modulation is important content, and intensity modulated, phase modulated, Polarization Modulation, frequency modulation and wavelength-modulated are often arranged.What native system adopted is intensity modulated (claiming the optical throughput modulation again), be instigate optical carrier characteristic parameter (intensity) by the changing features that is transmitted information, detect the method that transmits with realization information.The light that light source sends is modulated through the modulator of different frequencies, and its effect has:
1.. can reduce the influence of spurious rays to measuring result.In measuring process, be difficult to avoid extraneous non-flashlight to enter photomultiplier, the light that sends when evaporation is melted as coating materials etc.These optical signals will be attached on the measurement signal after being received by photomultiplier.The common feature of these additional signals is to occur with the DC quantity form.Flashlight is modulated, and between amplifier, is carried out ac coupling, make alternating signal be able to by, isolate out the DC component of non-signal, thereby eliminated the influence of stray light.
2.. can eliminate of the influence of photomultiplier dark current to measuring result.Various photoelectricity or thermo-electric device are because the effect of dark emission of temperature or extra electric field when no external optical signals is done the time spent, all has dark current to produce in its groundwork loop.When direct current measurement, dark current will be attached to influences measuring result in the signal, if adopt modulated light signal, just can eliminate the influence of dark current.
3.. necessary working signal when modulation signal still is lock-in amplifier and frequency-selecting amplifier work.
The utility model is compared with home-made coating equipment (producing the DMD-700J coating equipment with Beijing instrument plant used in this research is example), with monofrequency modulation becoming double frequency modulation (optical system for testing is that 33Hz, reference path are 383Hz), this not only has above-mentioned 3 advantages, and be that the digital divide of four light path systems, twin-lock circuitry phase and test and reference is prepared, thereby can suppress the interference of common sparings such as light source, modulating motor, monochromator and multiplier tube to greatest extent.For stable debugging, the works better of being convenient to circuit of modulating frequency, new system has adopted modulating motor high-power, stabilization of speed.2) four light path systems
Four light path lens imaging systems are meant, the 33HZ modulated test light path that contains monitoring piece Thickness Variation information, the 383HZ modulation reference light path that contains modulated light source information, and 33HZ, 383HZ two-way modulation light path (the twin-lock circuitry phase that is used for cross-correlation detection).Test light signal and reference optical signal to monochromator, carry out opto-electronic conversion by same photomultiplier by the common Optical Fiber Transmission again.
The utility model adopts monofrequency modulated test light path and modulation light path, and this structure makes the stability of test signal significantly rely on the job stability of light source, photomultiplier and power supply source thereof.Although four light path systems are more complicated than the light path of original system, but greatly reduce the job stability requirement of these key equipments, and can significantly improve the static stability and the plated film repeatability of Monitoring systems.3) optical fiber
Former coating system adopts is that parallel light path and direct irradiation are in this structure of monochromator entrance slit.The utility model adopts imaging optical path and by the optical fiber transmission.Optical fiber has good biography optical property, can improve the utilization ratio of luminous energy; Have multiple geometric compliance, can be placed on measurement point such as aperture (signal that is beneficial to imaging system is accepted); Adopt optical fiber to transmit tested optical signal, can get rid of when light transmission spurious rays the interference of measuring light signal; Adopt optical fiber to be connected, can eliminate the influence of coating equipment vibration measurement signal with monochromator.4) coupling mechanism
Come the tested optical signal of relay len imaging system with optical fiber, and connect with monochromator.This needs a proximate 4f lens imaging system to realize reliable, removable connection as coupling mechanism.Because optical fiber exit window and monochromator entrance slit all have a numerical aperture, the coupling of numerical aperture can realize the biography light of maximum efficiency, through estimation, is about a 4f system.5) monochromator and photomultiplier
The effect of monochromator is that the optical signal that the optical fiber transmission comes is divided into monochromatic ray.Corresponding from the monochromatic wavelength that the monochromator exit slit comes out with the rete supervisory wavelength.Use monochromator can reduce the influence of spurious rays to measurement signal.
Photomultiplier is a kind of being based upon on photovoltaic effect, secondary electron emission and the electron optics theoretical basis, and faint incident optical signal is converted to photoelectron, and obtains the vacuum photoemissive device of multiplication.Its principal feature is highly sensitive, good stability, response speed is fast and noise is little.It is a current amplifier spare, has higher current gain, is adapted to the detection of faint optical signal especially.6) prime amplifier, multistage amplification, frequency-selecting amplifier and twin-lock amplifier mutually
The optical signal that photomultiplier received is very faint, and the signal of its output often also is deeply buried among the noise, need amplify it.Therefore the output terminal in photomultiplier is all closely connecting a low-noise preamplifier.Its effect is: amplify phototube and increase the ultra-weak electronic signal of pipe output and improve signal to noise ratio; Mate the impedance between rearmounted treatment circuit and the photomultiplier, improve the through-put power of signal.Requirement to prime amplifier is: lower noise, high gain, enough signal bandwidth and carrying capacity; Favorable linearity and immunity from interference; Structurally require compactness, near detection means; Good ground connection and shielding.The utility model adopts field effect transistor as prime amplifier.
The design of secondary amplification and three grades of amplifications is to be that 3mV-10mV and data collecting card analog input scope are that the requirement of 5V is carried out according to input signal.
The utility model is compared with the monofrequency modulation signal of original system, in electric circuit inspection, for outstanding signal and inhibition noise, simultaneously superposition double frequency modulation signal is together separated, and adopts bandpass filter that signal is carried out frequency-selecting and amplifies.
Lock-in amplifier is a kind of general amplifier that alternating signal is carried out phase sensitive detection.Its utilization has the restituted signal of the phase-locked relation of same frequency to make comparisons with measured signal, only measured signal itself and those and restituted signal is had response with frequency (or frequency multiplication), in-phase noise component.Therefore, can suppress noise significantly, improve detectivity and signal to noise ratio, be a kind of active parts that faint optical signal is measured.
The utility model is compared with original system, has adopted twin-lock phase amplifying circuit (is corresponding with four light path design).Entire circuit part (from the front end circuit to the phase lock circuitry) adopts the symmetric configuration design, and selects the high-performance components and parts of identical or close quality for use, for usefulness " digital divide " the inhibition circuit drift of back has been created condition.In order to improve the immunity from interference of Circuits System,, circuit, computer and capture card etc. have been carried out protective sheath with monochromator, the pipe integrated shielding of photomultiplier transit.The high performance signal line has been adopted in the connection of signal.7) multi pass acquisition, digital filtering and digital divider
With data collecting card test signal, reference signal and the vacuum tightness of circuit output, base reservoir temperature, evaporating state etc. are carried out multi pass acquisition.Determine that according to sampling theorem and algorithm a suitable sample frequency carries out multi pass acquisition, and guarantee that test is consistent with A/D conversion accuracy with reference to two-way, be beneficial to the elimination of common mode interference.
Mainly adopted digital filtering technique for DM EMI.The following advantage of having compared with analog filtering: do not need hardware device; Filter of a plurality of input channels " shared "; Reliably, stable; Can realize filtering to the very low signal of frequency; It is flexible to change filtering parameter.As, anti-pulse jamming compound filter method.
Test signal has been compared precision height, good stability, glitch-free advantage divided by the digital divide of reference signal with analog divider.Importantly, digital divide can be eliminated the common mode interference that light source, photomultiplier etc. cause, has finally realized the static stability of the purpose of design-raising Monitoring systems of four light paths, twin-lock circuitry phase.8) digital demonstration, data are printed and controlling alarm
The thickness signal has not only passed through the processing of twin-lock circuitry phase but also has adopted multiple digital technique to handle (digital filtering, digital divide and demonstration linearizing), is shown by charactron again.This only just carries out number demonstration by analog circuitry processes and compares with original system, and stability is than higher.Can monitor that monitor data and processing parameter can print for analysis by the monitoring interface in the indicating meter for processing parameter in the coating process and rete state.Can obtain stopping plating constantly by the monitoring evaluation algorithm for the Thickness Variation data, and send photoelectric alarm and drive the servosystem of closing baffle plate, thereby realize film thickness monitoring.
The utility model and original system have carried out contrast test, result such as following table:
| Long-time stability | 30 seconds stability (in the last bit jitter amount of indicating value) | Each time control accuracy standard deviation | |
| Original system | 1.3%/hour | ±4.5 | ?1.25％ |
| Native system | 0.15%/hour | ±1 | ?0.27％ |
By the table in as seen, the utility model all is improved largely than original system on the indexs such as repeatability, accuracy, sensitivity in the film thickness monitoring process.
Claims (2)
1. an optical film thickness online in real time monitor comprises, a pair of silicon photocell [1] and [2], Fibre Optical Sensor [9], reflective mirror [3], [4], [5] and lens [6], [7] is characterized in that:
Silicon photocell [1] and [2] are separately positioned on the light source of monitoring, and silicon photocell [1] is used for the reference arm restituted signal, and silicon photocell [2] is used to test the road restituted signal after modulator [27] modulation; Reference arm restituted signal and test road restituted signal enter in phase locking unit [22] and the phase locking unit [23] through amplifier [18], wave filter [19] and amplifier [16], wave filter [17] respectively;
The light that lens [6] will see through from speculum [3] is as the reference optical signal, reflective mirror [3] is arranged on the light path of lens [6], the light path of lens [7] is provided with reflective mirror [4], the luminous reflectance that reflective mirror [4] transmits lens [7] arrives and compares on the sheet [8], after comparison, relatively sheet [8] is delivered to reflective mirror [5] upward as the test light signal with the light of reflective mirror [4] transmission again; Reference optical signal and test light signal are passed in the Fibre Optical Sensor [9], optical signal is sent into monochromator [11] and photomultiplier [12] after coupling mechanism [10] coupling, amplify [13] through prime, after secondary amplification [14] and the three grades of amplifications [15], send into bandpass filter [20] respectively, [21] in, bandpass filter [20], [21] again signal is sent in phase locking unit [22] and the phase locking unit [23], phase locking unit [22] and phase locking unit [23] are isolated reference signal and evaporating state signal and test signal and vacuum tightness signal respectively with above-mentioned four road signals, send into data collecting card [24], data collecting card [24] also is connected to a temperature signal, inserts computer [25] by data collecting card; Computer [25] is with printer, digital demonstration, indicating meter links to each other and control servosystem [26], and servosystem [26] links to each other with comparison sheet [8].
2. optical film thickness online in real time monitor according to claim 1 is characterized in that, described modulator [27] adopts the double frequency modulator.
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| CN 02224851 CN2552943Y (en) | 2002-04-30 | 2002-04-30 | Optical film thickness on line real time monitor |
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| CN 02224851 CN2552943Y (en) | 2002-04-30 | 2002-04-30 | Optical film thickness on line real time monitor |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100350278C (en) * | 2005-11-15 | 2007-11-21 | 郑睿敏 | Apparatus for controlling thickness of digital optical film |
| CN100454045C (en) * | 2007-02-27 | 2009-01-21 | 河南中光学集团有限公司 | Measurement and display method for film thickness reflectivity of optical coated film |
| CN101127373B (en) * | 2007-09-30 | 2010-09-29 | 南京理工大学 | Solar thermal photovoltaic device for frequency division absorption |
| CN102051581A (en) * | 2010-12-30 | 2011-05-11 | 东莞宏威数码机械有限公司 | Substrate film-coating processing system |
| CN101802251B (en) * | 2007-09-21 | 2013-01-23 | 株式会社爱发科 | Thin film forming apparatus, film thickness measuring method and film thickness sensor |
| CN104350380A (en) * | 2012-09-10 | 2015-02-11 | 株式会社新柯隆 | Measuring apparatus and film-forming apparatus |
| CN105466887A (en) * | 2015-11-24 | 2016-04-06 | 东南大学 | Detection system of thin-walled closed glass chamber's optical parameters and method thereof |
| CN112126907A (en) * | 2020-08-28 | 2020-12-25 | 佛山市博顿光电科技有限公司 | Vacuum coating control system and control method thereof, and vacuum coating equipment |
| CN115597501A (en) * | 2022-09-30 | 2023-01-13 | 中山吉联光电科技有限公司（Cn） | High-precision wide-spectrum optical film thickness online monitoring system |
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2002
- 2002-04-30 CN CN 02224851 patent/CN2552943Y/en not_active Expired - Fee Related
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100350278C (en) * | 2005-11-15 | 2007-11-21 | 郑睿敏 | Apparatus for controlling thickness of digital optical film |
| CN100454045C (en) * | 2007-02-27 | 2009-01-21 | 河南中光学集团有限公司 | Measurement and display method for film thickness reflectivity of optical coated film |
| CN101802251B (en) * | 2007-09-21 | 2013-01-23 | 株式会社爱发科 | Thin film forming apparatus, film thickness measuring method and film thickness sensor |
| CN101127373B (en) * | 2007-09-30 | 2010-09-29 | 南京理工大学 | Solar thermal photovoltaic device for frequency division absorption |
| CN102051581A (en) * | 2010-12-30 | 2011-05-11 | 东莞宏威数码机械有限公司 | Substrate film-coating processing system |
| CN102051581B (en) * | 2010-12-30 | 2013-04-03 | 东莞宏威数码机械有限公司 | Substrate film-coating processing system |
| CN104350380A (en) * | 2012-09-10 | 2015-02-11 | 株式会社新柯隆 | Measuring apparatus and film-forming apparatus |
| TWI502164B (en) * | 2012-09-10 | 2015-10-01 | Shincron Co Ltd | A measuring device and a film forming device |
| CN104350380B (en) * | 2012-09-10 | 2017-03-15 | 株式会社新柯隆 | Measurement apparatus and film formation device |
| CN105466887A (en) * | 2015-11-24 | 2016-04-06 | 东南大学 | Detection system of thin-walled closed glass chamber's optical parameters and method thereof |
| CN105466887B (en) * | 2015-11-24 | 2018-10-23 | 东南大学 | The detecting system and method for thin-walled closed glass chamber optical parameter |
| CN112126907A (en) * | 2020-08-28 | 2020-12-25 | 佛山市博顿光电科技有限公司 | Vacuum coating control system and control method thereof, and vacuum coating equipment |
| CN115597501A (en) * | 2022-09-30 | 2023-01-13 | 中山吉联光电科技有限公司（Cn） | High-precision wide-spectrum optical film thickness online monitoring system |
| CN115597501B (en) * | 2022-09-30 | 2023-11-03 | 中山吉联光电科技有限公司 | High-precision wide-spectrum optical film thickness online monitoring system |
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