HK1142965A1 - Developing method and developing apparatus - Google Patents

Developing method and developing apparatus

Info

Publication number
HK1142965A1
HK1142965A1 HK10109469.1A HK10109469A HK1142965A1 HK 1142965 A1 HK1142965 A1 HK 1142965A1 HK 10109469 A HK10109469 A HK 10109469A HK 1142965 A1 HK1142965 A1 HK 1142965A1
Authority
HK
Hong Kong
Prior art keywords
substrate
light
developer
resist layer
order light
Prior art date
Application number
HK10109469.1A
Other languages
English (en)
Original Assignee
Sony Disc & Digital Solutions
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Disc & Digital Solutions filed Critical Sony Disc & Digital Solutions
Publication of HK1142965A1 publication Critical patent/HK1142965A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
    • G03G15/326—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by application of light, e.g. using a LED array
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern
    • G03G13/26—Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes
    • G03G13/28—Planographic printing plates
    • G03G13/286—Planographic printing plates for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • G03G15/04036—Details of illuminating systems, e.g. lamps, reflectors
    • G03G15/04045—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers
    • G03G15/04072—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • G03G15/043—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material with means for controlling illumination or exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/65—Apparatus which relate to the handling of copy material
    • G03G15/6588—Apparatus which relate to the handling of copy material characterised by the copy material, e.g. postcards, large copies, multi-layered materials, coloured sheet material
    • G03G15/6591—Apparatus which relate to the handling of copy material characterised by the copy material, e.g. postcards, large copies, multi-layered materials, coloured sheet material characterised by the recording material, e.g. plastic material, OHP, ceramics, tiles, textiles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G2215/00—Apparatus for electrophotographic processes
    • G03G2215/00362—Apparatus for electrophotographic processes relating to the copy medium handling
    • G03G2215/00443—Copy medium
    • G03G2215/00523—Other special types, e.g. tabbed

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Textile Engineering (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
HK10109469.1A 2008-11-21 2010-10-05 Developing method and developing apparatus HK1142965A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008298817A JP2010123230A (ja) 2008-11-21 2008-11-21 現像方法、及び現像装置

Publications (1)

Publication Number Publication Date
HK1142965A1 true HK1142965A1 (en) 2010-12-17

Family

ID=42196390

Family Applications (1)

Application Number Title Priority Date Filing Date
HK10109469.1A HK1142965A1 (en) 2008-11-21 2010-10-05 Developing method and developing apparatus

Country Status (5)

Country Link
US (1) US20100129098A1 (ja)
JP (1) JP2010123230A (ja)
CN (1) CN101738876B (ja)
HK (1) HK1142965A1 (ja)
TW (1) TWI415123B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102540769A (zh) * 2010-12-15 2012-07-04 无锡华润上华半导体有限公司 显影方法
JP2013232252A (ja) 2012-04-27 2013-11-14 Sony Dadc Corp 記録媒体製造方法、記録媒体

Family Cites Families (31)

* Cited by examiner, † Cited by third party
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JPS618751A (ja) * 1984-06-22 1986-01-16 Hitachi Ltd ホトレジストの現像装置
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JP3070113B2 (ja) * 1991-03-07 2000-07-24 ソニー株式会社 フォトレジストの現像処理装置
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JP3382970B2 (ja) * 1992-07-06 2003-03-04 ソニー株式会社 光ディスク原盤の製造方法
TW354390B (en) * 1996-10-18 1999-03-11 Ind Technology And Res Inst A photomask of projecting multi-step photo distribution pattern and process for making the same
TW359770B (en) * 1997-09-16 1999-06-01 Sanei Giken Co Ltd Photomask and alignment method
TW359769B (en) * 1998-04-09 1999-06-01 Ind Tech Res Inst Multidensity photomask and production process therefor
US6210050B1 (en) * 1998-12-01 2001-04-03 Advanced Micro Devices, Inc. Resist developing method and apparatus with nozzle offset for uniform developer application
JP4545874B2 (ja) * 2000-04-03 2010-09-15 キヤノン株式会社 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法
US6692165B2 (en) * 2001-03-01 2004-02-17 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US6629786B1 (en) * 2001-04-30 2003-10-07 Advanced Micro Devices, Inc. Active control of developer time and temperature
US6841238B2 (en) * 2002-04-05 2005-01-11 Flex Products, Inc. Chromatic diffractive pigments and foils
US6758612B1 (en) * 2002-01-16 2004-07-06 Advanced Micro Devices, Inc. System and method for developer endpoint detection by reflectometry or scatterometry
JP4055543B2 (ja) * 2002-02-22 2008-03-05 ソニー株式会社 レジスト材料及び微細加工方法
JP2004310960A (ja) * 2003-04-10 2004-11-04 Matsushita Electric Ind Co Ltd 光ディスク原盤製造装置
JP4369325B2 (ja) * 2003-12-26 2009-11-18 東京エレクトロン株式会社 現像装置及び現像処理方法
JP2006019575A (ja) * 2004-07-02 2006-01-19 Sharp Corp フォトレジストの現像方法及び現像装置
CN101714369B (zh) * 2004-07-16 2013-04-24 三菱化学媒体株式会社 光记录介质及光记录介质的光记录方法
US7371022B2 (en) * 2004-12-22 2008-05-13 Sokudo Co., Ltd. Developer endpoint detection in a track lithography system
JP2006344310A (ja) * 2005-06-09 2006-12-21 Sony Corp 現像方法および現像装置
JP4684858B2 (ja) * 2005-11-10 2011-05-18 東京エレクトロン株式会社 リンス処理方法、現像処理方法、現像処理装置、制御プログラムおよびコンピュータ読取可能な記憶媒体
JP2007207354A (ja) * 2006-02-02 2007-08-16 Funai Electric Co Ltd 光ピックアップ装置及びそれを備えた光ディスク装置
JP4797662B2 (ja) * 2006-02-03 2011-10-19 東京エレクトロン株式会社 塗布、現像方法、塗布、現像装置及び記憶媒体
US8054731B2 (en) * 2006-08-29 2011-11-08 Sanyo Electric Co., Ltd. Photodetector and optical pickup apparatus
JP4900117B2 (ja) * 2007-07-30 2012-03-21 東京エレクトロン株式会社 現像装置、現像方法及び記憶媒体
NL1036468A1 (nl) * 2008-02-27 2009-08-31 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
JP5056582B2 (ja) * 2008-05-22 2012-10-24 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5305331B2 (ja) * 2008-06-17 2013-10-02 東京エレクトロン株式会社 現像処理方法及び現像処理装置
NL2003497A (en) * 2008-09-23 2010-03-24 Asml Netherlands Bv Lithographic system, lithographic method and device manufacturing method.
KR101295203B1 (ko) * 2008-10-06 2013-08-09 에이에스엠엘 네델란즈 비.브이. 2차원 타겟을 이용한 리소그래피 포커스 및 조사량 측정

Also Published As

Publication number Publication date
US20100129098A1 (en) 2010-05-27
CN101738876A (zh) 2010-06-16
TW201027527A (en) 2010-07-16
JP2010123230A (ja) 2010-06-03
CN101738876B (zh) 2013-03-27
TWI415123B (zh) 2013-11-11

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20171123