TW354390B - A photomask of projecting multi-step photo distribution pattern and process for making the same - Google Patents

A photomask of projecting multi-step photo distribution pattern and process for making the same

Info

Publication number
TW354390B
TW354390B TW085112839A TW85112839A TW354390B TW 354390 B TW354390 B TW 354390B TW 085112839 A TW085112839 A TW 085112839A TW 85112839 A TW85112839 A TW 85112839A TW 354390 B TW354390 B TW 354390B
Authority
TW
Taiwan
Prior art keywords
photomask
distribution pattern
making
same
step photo
Prior art date
Application number
TW085112839A
Other languages
Chinese (zh)
Inventor
De-Jia Lin
Rung-Je Li
Hua-Chi Jeng
Wen-Tung Jeng
Original Assignee
Ind Technology And Res Inst
Chi Mei Optoelectronics Corp
Toppoly Optoelectronics Corp
Prime View Int Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Technology And Res Inst, Chi Mei Optoelectronics Corp, Toppoly Optoelectronics Corp, Prime View Int Corp Ltd filed Critical Ind Technology And Res Inst
Priority to TW085112839A priority Critical patent/TW354390B/en
Application granted granted Critical
Publication of TW354390B publication Critical patent/TW354390B/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A kind of photomask capable of projecting multi-step photo distribution pattern comprising: (1) light-permeable substrate; (2) shield membrane having microaperture pattern; and (3) light-scattering lens arranged on the microaperture.
TW085112839A 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same TW354390B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW085112839A TW354390B (en) 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW085112839A TW354390B (en) 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same

Publications (1)

Publication Number Publication Date
TW354390B true TW354390B (en) 1999-03-11

Family

ID=57940200

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085112839A TW354390B (en) 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same

Country Status (1)

Country Link
TW (1) TW354390B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415123B (en) * 2008-11-21 2013-11-11 Sony Disc & Digital Solutions Developing method and developing apparatus
US10324370B2 (en) 2016-09-06 2019-06-18 Unimicron Technology Corp. Manufacturing method of circuit substrate and mask structure and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415123B (en) * 2008-11-21 2013-11-11 Sony Disc & Digital Solutions Developing method and developing apparatus
US10324370B2 (en) 2016-09-06 2019-06-18 Unimicron Technology Corp. Manufacturing method of circuit substrate and mask structure and manufacturing method thereof

Similar Documents

Publication Publication Date Title
TW346556B (en) Halftone phase shift mask, blank for the same, methods of manufacturing these
TW364073B (en) Method of fine feature edge tuning with optically-halftoned mask
DK0960109T3 (en) Process for the preparation of tolterodine
HUT72224A (en) Papermaking belt having semicontinous pattern and paper made thereon
AU1666699A (en) Light with a disc-shaped light guide
HK1014926A1 (en) Illumination system for ocr of indicia on a substrate
WO2002004858A3 (en) Backlight with structured sufaces
AU7529598A (en) Integrated optical circuit
AU3079397A (en) Annular mask lens having diffraction-reducing edges
EP0759686A3 (en) Process and circuit for operating a lamp
CA2341443A1 (en) Apparatus having a light source and sol-gel monolithic diffuser
AU1233200A (en) Photoresists and processes for microlithography
TW353787B (en) Reticle for off-axis illumination
EP0459655A3 (en) Photoresist process employing an i-line peak light source
EP0811865A3 (en) Illumination system and exposure apparatus
TW358900B (en) A through screen
EP0924571A3 (en) Exposing apparatus and method
EP0535229A4 (en) Mask for shifting phase
MY127590A (en) Asymmetrical resist sidewall
EP0697377A3 (en) Process for production of glass substrate coated with finely patterned Nesa glass membrane
TW354390B (en) A photomask of projecting multi-step photo distribution pattern and process for making the same
EP0863440A3 (en) Projection exposure apparatus and device manufacturing method
EP0634675A3 (en) Method of producing a light conductive plate type light source.
TW277101B (en) Process for treating slag from refuse incineration plants
TW353157B (en) Double faced mask

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent