TW354390B - A photomask of projecting multi-step photo distribution pattern and process for making the same - Google Patents

A photomask of projecting multi-step photo distribution pattern and process for making the same

Info

Publication number
TW354390B
TW354390B TW085112839A TW85112839A TW354390B TW 354390 B TW354390 B TW 354390B TW 085112839 A TW085112839 A TW 085112839A TW 85112839 A TW85112839 A TW 85112839A TW 354390 B TW354390 B TW 354390B
Authority
TW
Taiwan
Prior art keywords
photomask
distribution pattern
making
same
step photo
Prior art date
Application number
TW085112839A
Other languages
Chinese (zh)
Inventor
De-Jia Lin
Rung-Je Li
Hua-Chi Jeng
Wen-Tung Jeng
Original Assignee
Ind Technology And Res Inst
Chi Mei Optoelectronics Corp
Toppoly Optoelectronics Corp
Prime View Int Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Technology And Res Inst, Chi Mei Optoelectronics Corp, Toppoly Optoelectronics Corp, Prime View Int Corp Ltd filed Critical Ind Technology And Res Inst
Priority to TW085112839A priority Critical patent/TW354390B/en
Application granted granted Critical
Publication of TW354390B publication Critical patent/TW354390B/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A kind of photomask capable of projecting multi-step photo distribution pattern comprising: (1) light-permeable substrate; (2) shield membrane having microaperture pattern; and (3) light-scattering lens arranged on the microaperture.
TW085112839A 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same TW354390B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW085112839A TW354390B (en) 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW085112839A TW354390B (en) 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same

Publications (1)

Publication Number Publication Date
TW354390B true TW354390B (en) 1999-03-11

Family

ID=57940200

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085112839A TW354390B (en) 1996-10-18 1996-10-18 A photomask of projecting multi-step photo distribution pattern and process for making the same

Country Status (1)

Country Link
TW (1) TW354390B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415123B (en) * 2008-11-21 2013-11-11 Sony Disc & Digital Solutions Developing method and developing apparatus
US10324370B2 (en) 2016-09-06 2019-06-18 Unimicron Technology Corp. Manufacturing method of circuit substrate and mask structure and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415123B (en) * 2008-11-21 2013-11-11 Sony Disc & Digital Solutions Developing method and developing apparatus
US10324370B2 (en) 2016-09-06 2019-06-18 Unimicron Technology Corp. Manufacturing method of circuit substrate and mask structure and manufacturing method thereof

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Legal Events

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MK4A Expiration of patent term of an invention patent