HK1091942A1 - Superconducting wire and method of production thereof - Google Patents

Superconducting wire and method of production thereof

Info

Publication number
HK1091942A1
HK1091942A1 HK06112483.3A HK06112483A HK1091942A1 HK 1091942 A1 HK1091942 A1 HK 1091942A1 HK 06112483 A HK06112483 A HK 06112483A HK 1091942 A1 HK1091942 A1 HK 1091942A1
Authority
HK
Hong Kong
Prior art keywords
production
superconducting wire
superconducting
wire
Prior art date
Application number
HK06112483.3A
Other languages
English (en)
Original Assignee
Sumitomo Electric Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34131494&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1091942(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sumitomo Electric Industries filed Critical Sumitomo Electric Industries
Publication of HK1091942A1 publication Critical patent/HK1091942A1/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/02Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/02Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
    • H01B12/06Films or wires on bases or cores
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576Processes for depositing or forming copper oxide superconductor layers characterised by the substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
HK06112483.3A 2003-08-06 2006-11-13 Superconducting wire and method of production thereof HK1091942A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003287971A JP2005056754A (ja) 2003-08-06 2003-08-06 超電導線材およびその製造方法
PCT/JP2004/009951 WO2005015575A1 (ja) 2003-08-06 2004-07-13 超電導線材およびその製造方法

Publications (1)

Publication Number Publication Date
HK1091942A1 true HK1091942A1 (en) 2007-01-26

Family

ID=34131494

Family Applications (1)

Application Number Title Priority Date Filing Date
HK06112483.3A HK1091942A1 (en) 2003-08-06 2006-11-13 Superconducting wire and method of production thereof

Country Status (11)

Country Link
US (1) US20060219322A1 (de)
EP (1) EP1653484B2 (de)
JP (1) JP2005056754A (de)
KR (1) KR101016868B1 (de)
CN (1) CN100477020C (de)
AU (1) AU2004264090A1 (de)
CA (1) CA2522078A1 (de)
HK (1) HK1091942A1 (de)
RU (1) RU2332737C2 (de)
TW (1) TW200518115A (de)
WO (1) WO2005015575A1 (de)

Families Citing this family (27)

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JP4411265B2 (ja) * 2005-10-21 2010-02-10 財団法人国際超電導産業技術研究センター 希土類系テープ状酸化物超電導体及びその製造方法
JP2007200870A (ja) * 2006-01-26 2007-08-09 Ls Cable Ltd 超伝導ケーブル用基板の製造方法
JP5049530B2 (ja) * 2006-08-01 2012-10-17 日本ミクロコーティング株式会社 酸化物超伝導体用テープ基材の研磨方法並びに酸化物超伝導体及び酸化物超伝導体用基材
JP5252792B2 (ja) * 2006-08-25 2013-07-31 日本ミクロコーティング株式会社 酸化物超伝導体用テープ基材の研磨方法並びに酸化物超伝導体及び酸化物超伝導体用基材
CN101221898B (zh) * 2007-01-08 2011-05-11 晶能光电(江西)有限公司 用于制造具有高质量表面的金属衬底的方法
JP5049611B2 (ja) * 2007-02-16 2012-10-17 日本ミクロコーティング株式会社 超電導体用テープ基材の製造方法及びテープ基材
US8316158B1 (en) 2007-03-12 2012-11-20 Cypress Semiconductor Corporation Configuration of programmable device using a DMA controller
JP2008311222A (ja) * 2007-05-11 2008-12-25 Furukawa Electric Co Ltd:The 超電導線およびその製造方法
DE102007024166B4 (de) * 2007-05-24 2011-01-05 Zenergy Power Gmbh Verfahren zum Bearbeiten eines Metallsubstrats und Verwendung dessen für einen Hochtemperatur-Supraleiter
JP5113430B2 (ja) * 2007-06-05 2013-01-09 九州電力株式会社 金属めっき複合基材
JP5173318B2 (ja) * 2007-08-24 2013-04-03 日本ミクロコーティング株式会社 テープ状基材の研磨方法及び酸化物超伝導体用ベース基材
JP5448425B2 (ja) 2008-11-21 2014-03-19 公益財団法人国際超電導産業技術研究センター 超電導膜成膜用基板、超電導線材及びそれらの製造方法
DE102008058768B4 (de) * 2008-11-24 2011-12-15 Zenergy Power Gmbh Verfahren zur Herstellung von Metallsubstraten für HTS-Schichtanordnungen
JP2010163679A (ja) * 2008-12-18 2010-07-29 Sumitomo Electric Ind Ltd 酸化物薄膜の成膜装置および成膜方法
JP5435448B2 (ja) * 2008-12-24 2014-03-05 古河電気工業株式会社 超電導線材用テープ状基材、その製造方法、及び超電導線材
AT12768U1 (de) * 2010-03-29 2012-11-15 Ctr Carinthian Tech Res Ag Hochtemperaturbeständige, elektrisch leitfähige dünnschichten
EP2381499B1 (de) * 2010-04-26 2014-12-17 Bruker HTS GmbH Verfahren zum Einstellen von AC Verlusten in einem bandartigen Superleiter mit Anisotropie kritischer Ströme
JP2012049086A (ja) * 2010-08-30 2012-03-08 Sumitomo Electric Ind Ltd 酸化物超電導薄膜線材、酸化物超電導薄膜線材用金属基板およびその製造方法
JP5767896B2 (ja) * 2011-08-09 2015-08-26 株式会社フジクラ 基材接続部を有する酸化物超電導導体とその製造方法
US9378869B2 (en) * 2011-11-15 2016-06-28 Furukawa Electric Co., Ltd. Superconductive wire material substrate, manufacturing method thereof and superconductive wire material
US20150279519A1 (en) * 2012-06-27 2015-10-01 Furukawa Electric Co., Ltd. Superconducting wire
JP6056877B2 (ja) * 2015-01-07 2017-01-11 三菱マテリアル株式会社 超伝導線、及び、超伝導コイル
WO2017105029A1 (ko) * 2015-12-14 2017-06-22 한국전기연구원 금속기판 결함에 의해 자기 정렬된 초전도 스트립을 구비하는 초전도 선재의 제조 방법
JP6299802B2 (ja) 2016-04-06 2018-03-28 三菱マテリアル株式会社 超伝導安定化材、超伝導線及び超伝導コイル
JP6788152B1 (ja) * 2018-12-28 2020-11-18 株式会社フジクラ 酸化物超電導線材及びその製造方法
KR20210138858A (ko) 2020-05-13 2021-11-22 한국전기연구원 유리기판을 이용한 고온초전도선재 및 이의 제조방법
JP2024519440A (ja) * 2021-03-30 2024-05-14 アヴェラテック・コーポレイション 表皮深さ損失を軽減する高抵抗および低抵抗導体層のための方法およびデバイス

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CA2008310C (en) * 1989-02-04 1997-03-04 Satoshi Takano Superconducting wire
JP2803123B2 (ja) * 1989-02-04 1998-09-24 住友電気工業株式会社 超電導線
JPH02248304A (ja) * 1989-03-20 1990-10-04 Mitsubishi Metal Corp 超伝導体薄膜の製造方法
JP2877367B2 (ja) * 1989-09-05 1999-03-31 株式会社東芝 超電導線材
DE4006094A1 (de) * 1990-02-27 1991-08-29 Kabelmetal Electro Gmbh Hochtemperatursupraleiter aus einem gewellten metallrohr
DE69119022T2 (de) * 1990-10-08 1996-10-31 Sumitomo Electric Industries Supraleitende Einrichtung mit ultradünnem Kanal aus oxydisch supraleitendem Material und Verfahren zu deren Herstellung
JP3278461B2 (ja) * 1992-08-19 2002-04-30 住友電気工業株式会社 超電導線の製造方法
US5389194A (en) * 1993-02-05 1995-02-14 Lsi Logic Corporation Methods of cleaning semiconductor substrates after polishing
JP2994183B2 (ja) * 1993-09-21 1999-12-27 財団法人国際超電導産業技術研究センター 超電導素子およびその作製方法
JP2813287B2 (ja) * 1993-10-08 1998-10-22 株式会社東芝 超電導線材
US6451450B1 (en) * 1995-04-10 2002-09-17 Ut-Battelle, Llc Method of depositing a protective layer over a biaxially textured alloy substrate and composition therefrom
JP4033945B2 (ja) * 1997-08-01 2008-01-16 株式会社フジクラ 酸化物超電導導体およびその製造方法
US6458223B1 (en) 1997-10-01 2002-10-01 American Superconductor Corporation Alloy materials
GB2336849B (en) 1998-04-27 2003-02-26 Telcon Ltd Substrate materials
US6296701B1 (en) * 1998-09-30 2001-10-02 Ut-Battelle, Llc Method of depositing an electrically conductive oxide film on a textured metallic substrate and articles formed therefrom
US6827634B2 (en) 2000-05-22 2004-12-07 Agency Of Industrial Science And Technology Ultra fine particle film forming method and apparatus
JP4316070B2 (ja) * 1999-10-07 2009-08-19 古河電気工業株式会社 高強度配向多結晶金属基板および酸化物超電導線材
US6455166B1 (en) * 2000-05-11 2002-09-24 The University Of Chicago Metallic substrates for high temperature superconductors
US6617283B2 (en) * 2001-06-22 2003-09-09 Ut-Battelle, Llc Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom
US6569745B2 (en) * 2001-06-28 2003-05-27 Sharp Laboratories Of America, Inc. Shared bit line cross point memory array
JP2003055095A (ja) * 2001-08-07 2003-02-26 Sumitomo Electric Ind Ltd 薄膜形成方法
US7129196B2 (en) * 2003-07-21 2006-10-31 Los Alamos National Security, Llc Buffer layer for thin film structures

Also Published As

Publication number Publication date
KR101016868B1 (ko) 2011-02-22
AU2004264090A1 (en) 2005-02-17
CN1833295A (zh) 2006-09-13
CN100477020C (zh) 2009-04-08
US20060219322A1 (en) 2006-10-05
WO2005015575A1 (ja) 2005-02-17
RU2006106705A (ru) 2006-07-27
EP1653484A4 (de) 2009-12-02
RU2332737C2 (ru) 2008-08-27
TW200518115A (en) 2005-06-01
KR20060055535A (ko) 2006-05-23
EP1653484B1 (de) 2012-08-08
EP1653484B2 (de) 2015-12-02
JP2005056754A (ja) 2005-03-03
CA2522078A1 (en) 2005-02-17
EP1653484A1 (de) 2006-05-03

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20120713