HK1064324A1 - Cmp conditioner, method for arranging hard abrasive grains for use in cmp conditioner, and process for producing cmp conditioner - Google Patents

Cmp conditioner, method for arranging hard abrasive grains for use in cmp conditioner, and process for producing cmp conditioner

Info

Publication number
HK1064324A1
HK1064324A1 HK04107147A HK04107147A HK1064324A1 HK 1064324 A1 HK1064324 A1 HK 1064324A1 HK 04107147 A HK04107147 A HK 04107147A HK 04107147 A HK04107147 A HK 04107147A HK 1064324 A1 HK1064324 A1 HK 1064324A1
Authority
HK
Hong Kong
Prior art keywords
cmp conditioner
abrasive grains
support member
hard abrasive
cmp
Prior art date
Application number
HK04107147A
Other languages
English (en)
Inventor
Toshiya Kinoshita
Eiji Hashino
Setsuo Sato
Ryuichi Araki
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000388994A external-priority patent/JP3598062B2/ja
Priority claimed from JP2001262167A external-priority patent/JP2003071718A/ja
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Publication of HK1064324A1 publication Critical patent/HK1064324A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/14—Zonally-graded wheels; Composite wheels comprising different abrasives

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
HK04107147A 2000-12-21 2004-09-17 Cmp conditioner, method for arranging hard abrasive grains for use in cmp conditioner, and process for producing cmp conditioner HK1064324A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000388994A JP3598062B2 (ja) 2000-12-21 2000-12-21 Ｃｍｐドレッサー、ｃｍｐドレッサーに使用する硬質砥粒の配列方法、及びｃｍｐドレッサーの製造方法
JP2001262167A JP2003071718A (ja) 2001-08-30 2001-08-30 Ｃｍｐコンディショナー、ｃｍｐコンディショナーに使用する硬質砥粒の配列方法、及びｃｍｐコンディショナー製造方法
PCT/JP2001/011209 WO2002049807A1 (fr) 2000-12-21 2001-12-20 Conditionneur pour polissage chimico-mecanique, procede pour agencer des grains rigides utilises dans un conditionneur pour polissage chimico-mecanique, et procede pour produire un conditionneur pour polissage chimico-mecanique

Publications (1)

Publication Number Publication Date
HK1064324A1 true HK1064324A1 (en) 2005-01-28

Family

ID=26606289

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04107147A HK1064324A1 (en) 2000-12-21 2004-09-17 Cmp conditioner, method for arranging hard abrasive grains for use in cmp conditioner, and process for producing cmp conditioner

Country Status (8)

Country Link
US (2) US20040072510A1 (fr)
EP (1) EP1346797B1 (fr)
KR (1) KR100552391B1 (fr)
CN (1) CN100361786C (fr)
DE (1) DE60124424T2 (fr)
HK (1) HK1064324A1 (fr)
TW (1) TW575477B (fr)
WO (1) WO2002049807A1 (fr)

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US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9868100B2 (en) 1997-04-04 2018-01-16 Chien-Min Sung Brazed diamond tools and methods for making the same
US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
TWI238753B (en) 2002-12-19 2005-09-01 Miyanaga Kk Diamond disk for grinding
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US20060258276A1 (en) * 2005-05-16 2006-11-16 Chien-Min Sung Superhard cutters and associated methods
US7658666B2 (en) * 2004-08-24 2010-02-09 Chien-Min Sung Superhard cutters and associated methods
US7762872B2 (en) * 2004-08-24 2010-07-27 Chien-Min Sung Superhard cutters and associated methods
US20070060026A1 (en) * 2005-09-09 2007-03-15 Chien-Min Sung Methods of bonding superabrasive particles in an organic matrix
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8398466B2 (en) 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
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EP2411181A1 (fr) 2009-03-24 2012-02-01 Saint-Gobain Abrasives, Inc. Outil abrasif à utiliser comme conditionneur de tampon pour polissage mécano-chimique
US20110104989A1 (en) * 2009-04-30 2011-05-05 First Principles LLC Dressing bar for embedding abrasive particles into substrates
US8801497B2 (en) * 2009-04-30 2014-08-12 Rdc Holdings, Llc Array of abrasive members with resilient support
US9221148B2 (en) 2009-04-30 2015-12-29 Rdc Holdings, Llc Method and apparatus for processing sliders for disk drives, and to various processing media for the same
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US9204693B2 (en) 2012-08-20 2015-12-08 Forever Mount, LLC Brazed joint for attachment of gemstones to each other and/or a metallic mount
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Also Published As

Publication number Publication date
EP1346797B1 (fr) 2006-11-08
WO2002049807A1 (fr) 2002-06-27
CN100361786C (zh) 2008-01-16
US20040072510A1 (en) 2004-04-15
KR100552391B1 (ko) 2006-02-20
US20060160477A1 (en) 2006-07-20
DE60124424D1 (de) 2006-12-21
DE60124424T2 (de) 2007-10-04
EP1346797A1 (fr) 2003-09-24
TW575477B (en) 2004-02-11
US7465217B2 (en) 2008-12-16
KR20030063408A (ko) 2003-07-28
CN1482959A (zh) 2004-03-17
EP1346797A4 (fr) 2004-08-11

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20131220