JP1624794S - - Google Patents

Info

Publication number
JP1624794S
JP1624794S JPD2018-16190F JP2018016190F JP1624794S JP 1624794 S JP1624794 S JP 1624794S JP 2018016190 F JP2018016190 F JP 2018016190F JP 1624794 S JP1624794 S JP 1624794S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2018-16190F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2018-16190F priority Critical patent/JP1624794S/ja
Priority to US29/677,753 priority patent/USD900760S1/en
Priority to TW108300478F priority patent/TWD199478S/zh
Application granted granted Critical
Publication of JP1624794S publication Critical patent/JP1624794S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2018-16190F 2018-07-24 2018-07-24 Active JP1624794S (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2018-16190F JP1624794S (fr) 2018-07-24 2018-07-24
US29/677,753 USD900760S1 (en) 2018-07-24 2019-01-23 Ion shield plate for semiconductor manufacturing apparatus
TW108300478F TWD199478S (zh) 2018-07-24 2019-01-24 半導體製造裝置用離子遮蔽板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-16190F JP1624794S (fr) 2018-07-24 2018-07-24

Publications (1)

Publication Number Publication Date
JP1624794S true JP1624794S (fr) 2019-02-18

Family

ID=65359165

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2018-16190F Active JP1624794S (fr) 2018-07-24 2018-07-24

Country Status (3)

Country Link
US (1) USD900760S1 (fr)
JP (1) JP1624794S (fr)
TW (1) TWD199478S (fr)

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USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus

Also Published As

Publication number Publication date
TWD199478S (zh) 2019-09-01
USD900760S1 (en) 2020-11-03

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