HK1059804A1 - Process and device for forming ceramic coatings onmetals and alloys, and coatings produced by this process. - Google Patents

Process and device for forming ceramic coatings onmetals and alloys, and coatings produced by this process.

Info

Publication number
HK1059804A1
HK1059804A1 HK04102314A HK04102314A HK1059804A1 HK 1059804 A1 HK1059804 A1 HK 1059804A1 HK 04102314 A HK04102314 A HK 04102314A HK 04102314 A HK04102314 A HK 04102314A HK 1059804 A1 HK1059804 A1 HK 1059804A1
Authority
HK
Hong Kong
Prior art keywords
coatings
onmetals
alloys
forming ceramic
produced
Prior art date
Application number
HK04102314A
Other languages
English (en)
Inventor
Alexander Sergeevich Shatrov
Victor Iosifovich Samsonov
Original Assignee
Isle Coat Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0207193A external-priority patent/GB2386907B/en
Application filed by Isle Coat Ltd filed Critical Isle Coat Ltd
Publication of HK1059804A1 publication Critical patent/HK1059804A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005—Apparatus specially adapted for electrolytic conversion coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/024—Anodisation under pulsed or modulated current or potential
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/026—Anodisation with spark discharge
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20—Electroplating using ultrasonics, vibrations
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating Methods And Accessories (AREA)
HK04102314A 2002-03-27 2004-03-30 Process and device for forming ceramic coatings onmetals and alloys, and coatings produced by this process. HK1059804A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0207193A GB2386907B (en) 2002-03-27 2002-03-27 Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process
US10/123,010 US6896785B2 (en) 2002-03-27 2002-04-15 Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process

Publications (1)

Publication Number Publication Date
HK1059804A1 true HK1059804A1 (en) 2004-07-16

Family

ID=28676486

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04102314A HK1059804A1 (en) 2002-03-27 2004-03-30 Process and device for forming ceramic coatings onmetals and alloys, and coatings produced by this process.

Country Status (7)

Country Link
EP (1) EP1488024B1 (ja)
JP (2) JP4182002B2 (ja)
CN (1) CN100503899C (ja)
AU (1) AU2002329410A1 (ja)
HK (1) HK1059804A1 (ja)
NO (1) NO20034936L (ja)
WO (1) WO2003083181A2 (ja)

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AU2002329410A1 (en) * 2002-03-27 2003-10-13 Isle Coat Limited Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process
US7196459B2 (en) * 2003-12-05 2007-03-27 International Resistive Co. Of Texas, L.P. Light emitting assembly with heat dissipating support
CN100348780C (zh) * 2004-03-16 2007-11-14 天津大学 脉冲镀镍基纳米复合镀层的方法及设备
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CN100420775C (zh) * 2005-05-23 2008-09-24 狄士春 钢铁表面微弧氧化处理方法
CN100396823C (zh) * 2005-09-29 2008-06-25 陕西科技大学 一种超声水热电沉积制备涂层或薄膜的方法及其装置
CN100469946C (zh) * 2005-12-19 2009-03-18 广东工业大学 一种TiC陶瓷涂层的制备方法
JP4125765B2 (ja) * 2006-09-28 2008-07-30 日本パーカライジング株式会社 金属のセラミックス皮膜コーティング方法およびそれに用いる電解液ならびにセラミックス皮膜および金属材料
US20080086195A1 (en) * 2006-10-05 2008-04-10 Boston Scientific Scimed, Inc. Polymer-Free Coatings For Medical Devices Formed By Plasma Electrolytic Deposition
US8343253B2 (en) 2007-02-15 2013-01-01 Kankyou Engineering Co., Ltd. Method for producing conductor fine particles
EP1967615A1 (de) * 2007-03-07 2008-09-10 Siemens Aktiengesellschaft Verfahren zum Aufbringen einer Wärmedämmbeschichtung und Turbinenbauteile mit einer Wärmedämmbeschichtung
WO2008120046A1 (en) * 2007-04-02 2008-10-09 Gostevs, Vladimirs Method of forming a protective ceramic coating on the surface of metal products
EP2187988B1 (en) 2007-07-19 2013-08-21 Boston Scientific Limited Endoprosthesis having a non-fouling surface
WO2009020520A1 (en) 2007-08-03 2009-02-12 Boston Scientific Scimed, Inc. Coating for medical device having increased surface area
GB0720982D0 (en) 2007-10-25 2007-12-05 Plasma Coatings Ltd Method of forming a bioactive coating
US8920491B2 (en) 2008-04-22 2014-12-30 Boston Scientific Scimed, Inc. Medical devices having a coating of inorganic material
US8932346B2 (en) 2008-04-24 2015-01-13 Boston Scientific Scimed, Inc. Medical devices having inorganic particle layers
CN101333673B (zh) * 2008-07-29 2011-11-23 浙江工业大学 用于微弧氧化制备纳米陶瓷涂层的电解液及处理方法
JP5394021B2 (ja) * 2008-08-06 2014-01-22 アイシン精機株式会社 アルミニウム合金ピストン部材およびその製造方法
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DE102008043970A1 (de) * 2008-11-21 2010-05-27 Biotronik Vi Patent Ag Verfahren zur Herstellung einer korrosionshemmenden Beschichtung auf einem Implantat aus einer biokorrodierbaren Magnesiumlegierung sowie nach dem Verfahren hergestelltes Implantat
DE102009012945A1 (de) * 2009-03-12 2010-09-16 Mtu Aero Engines Gmbh Verfahren zur Herstellung einer abrasiven Beschichtung und Bauteil für eine Turbomaschine
GB2469115B (en) 2009-04-03 2013-08-21 Keronite Internat Ltd Process for the enhanced corrosion protection of valve metals
CN101892507B (zh) * 2010-07-29 2012-02-22 南昌航空大学 一种提高钛合金微弧氧化膜生长速度的方法
MX2013008785A (es) 2011-02-08 2014-01-24 Cambridge Nanolitic Ltd Revestimiento no metalico y metodo para su produccion.
KR101349076B1 (ko) * 2011-07-20 2014-01-14 현대자동차주식회사 연료전지 스택용 매니폴드 블록의 산화층 형성 장치 및 방법
US20150290135A1 (en) * 2012-11-16 2015-10-15 Merck Sharp & Dohme Corp. Process for making agglomerates using acoustic mixing technology
KR101476235B1 (ko) * 2012-12-11 2014-12-24 한국기계연구원 플라즈마 전해산화를 이용한 마그네슘재 표면처리 방법, 이에 의해 형성된 마그네슘 양극산화피막 및 플라즈마 전해산화에 사용되는 마그네슘재 표면처리액
WO2014175653A1 (ko) * 2013-04-23 2014-10-30 인제대학교 산학협력단 전기 화학 증착에 의한 나노 구조체의 제조 방법 및 이에 의하여 제조된 나노 구조체
KR101572849B1 (ko) * 2013-04-23 2015-12-01 인제대학교 산학협력단 전기 화학 증착에 의한 나노 구조체의 제조 방법 및 이에 의하여 제조된 나노 구조체
GB2513575B (en) 2013-04-29 2017-05-31 Keronite Int Ltd Corrosion and erosion-resistant mixed oxide coatings for the protection of chemical and plasma process chamber components
KR101419273B1 (ko) * 2013-08-27 2014-07-15 (주)엠에스티테크놀로지 플라즈마 전해 산화에 의해 금속 표면에 투명층을 형성하는 방법
CN103567404A (zh) * 2013-11-04 2014-02-12 虞雪君 一种用于结晶器的复合镀层材料及制备方法
CN103567405A (zh) * 2013-11-04 2014-02-12 虞雪君 一种用于冶金连铸机结晶器的复合镀层材料
CH708829A1 (fr) 2013-11-11 2015-05-15 Panerai Ag Off Composant en alliage aluminium-lithium comprenant un revêtement céramique et procédé pour former le revêtement.
CN103695985B (zh) * 2013-12-16 2016-02-10 电子科技大学 一种镍氢电池镍电极表面制备氧化钛涂层的方法
CN104562130B (zh) * 2014-08-22 2017-06-16 东莞市武华新材料有限公司 轻金属或其合金表面氧化钛基陶瓷膜层的制造方法
US9506161B2 (en) * 2014-12-12 2016-11-29 Metal Industries Research & Development Centre Surface treatment of a magnesium alloy
JP2016156036A (ja) * 2015-02-23 2016-09-01 株式会社栗本鐵工所 皮膜形成方法
KR101701268B1 (ko) * 2015-04-09 2017-02-13 현대성우메탈 주식회사 마그네슘 합금용 플라즈마 전해 산화용 전해액 및 이를 이용한 전해산화방법
CN108368632B (zh) 2015-12-16 2020-09-25 汉高股份有限及两合公司 用于在铝上沉积钛基保护涂层的方法
CN109385654A (zh) * 2017-08-11 2019-02-26 昆山汉鼎精密金属有限公司 自动微弧氧化系统及其方法
KR102205172B1 (ko) 2019-06-19 2021-01-20 오엠피주식회사 금속제 물품의 내표면에 산화피막을 형성하는 장치
KR102205173B1 (ko) 2019-06-19 2021-01-20 오엠피주식회사 금속제 물품의 내표면에 산화피막을 형성하는 방법
CN110257878B (zh) * 2019-07-16 2021-06-08 广西大学 一种制备铝钛复合板微弧氧化膜的方法
CN113943964A (zh) * 2020-07-15 2022-01-18 中国科学院上海硅酸盐研究所 钛合金表面热控耐磨损涂层及其制备方法
CN112708917A (zh) * 2020-12-23 2021-04-27 西安工业大学 一种钛合金涡轮叶片表面微弧氧化层的制备方法
CN113774459A (zh) * 2021-09-29 2021-12-10 上海交通大学 一种锆合金表面致密高耐蚀微弧氧化膜层的制备方法
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AU2002329410A1 (en) * 2002-03-27 2003-10-13 Isle Coat Limited Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process

Also Published As

Publication number Publication date
AU2002329410A1 (en) 2003-10-13
JP2008038256A (ja) 2008-02-21
JP2005521794A (ja) 2005-07-21
JP4722102B2 (ja) 2011-07-13
JP4182002B2 (ja) 2008-11-19
NO20034936D0 (no) 2003-11-06
CN1623013A (zh) 2005-06-01
EP1488024B1 (en) 2017-05-03
NO20034936L (no) 2004-01-09
AU2002329410A8 (en) 2003-10-13
CN100503899C (zh) 2009-06-24
EP1488024A2 (en) 2004-12-22
WO2003083181A2 (en) 2003-10-09
WO2003083181A3 (en) 2004-09-10

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PE Patent expired

Effective date: 20220326