HK1019774A1 - Etching composition and use thereof. - Google Patents

Etching composition and use thereof.

Info

Publication number
HK1019774A1
HK1019774A1 HK99104858A HK99104858A HK1019774A1 HK 1019774 A1 HK1019774 A1 HK 1019774A1 HK 99104858 A HK99104858 A HK 99104858A HK 99104858 A HK99104858 A HK 99104858A HK 1019774 A1 HK1019774 A1 HK 1019774A1
Authority
HK
Hong Kong
Prior art keywords
etching composition
etching
composition
Prior art date
Application number
HK99104858A
Other languages
English (en)
Inventor
David Lee Rath
Ravikumar Ramachandran
Original Assignee
Ibm
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm, Siemens Corp filed Critical Ibm
Publication of HK1019774A1 publication Critical patent/HK1019774A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0041—Photosensitive materials providing an etching agent upon exposure
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G03F7/2043—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • H01L21/31138—Etching organic layers by chemical means by dry-etching
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Materials Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
HK99104858A 1997-11-21 1999-10-28 Etching composition and use thereof. HK1019774A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97575597A 1997-11-21 1997-11-21
US09/137,179 US6630074B1 (en) 1997-04-04 1998-08-20 Etching composition and use thereof

Publications (1)

Publication Number Publication Date
HK1019774A1 true HK1019774A1 (en) 2000-02-25

Family

ID=26834992

Family Applications (1)

Application Number Title Priority Date Filing Date
HK99104858A HK1019774A1 (en) 1997-11-21 1999-10-28 Etching composition and use thereof.

Country Status (8)

Country Link
US (1) US6630074B1 (ja)
EP (1) EP0918081B1 (ja)
JP (1) JP3181264B2 (ja)
KR (1) KR100334346B1 (ja)
CN (1) CN1180459C (ja)
DE (1) DE69820397T2 (ja)
HK (1) HK1019774A1 (ja)
TW (1) TW570971B (ja)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030209514A1 (en) * 1997-04-04 2003-11-13 Infineon Technologies North America Corp. Etching composition and use thereof with feedback control of HF in BEOL clean
US20050217707A1 (en) * 1998-03-13 2005-10-06 Aegerter Brian K Selective processing of microelectronic workpiece surfaces
US6664196B1 (en) 1999-03-15 2003-12-16 Matsushita Electric Industrial Co., Ltd. Method of cleaning electronic device and method of fabricating the same
TW589685B (en) * 2000-07-14 2004-06-01 Infineon Technologies Corp Etching composition and use thereof with feedback control of HF in BEOL clean
TW527443B (en) * 2000-07-28 2003-04-11 Infineon Technologies Corp Etching composition and use thereof with feedback control of HF in BEOL clean
US6692976B1 (en) * 2000-08-31 2004-02-17 Agilent Technologies, Inc. Post-etch cleaning treatment
DE10063600A1 (de) * 2000-12-20 2002-07-04 Infineon Technologies Ag Verfahren und Vorrichtung zum Enstellen einer vorgegebenen HF-Konzentration in einem Reinigungsbad für Wafer
JP4678665B2 (ja) * 2001-11-15 2011-04-27 東京エレクトロン株式会社 基板処理方法および基板処理装置
DE10208120A1 (de) * 2002-02-26 2003-09-18 Schloetter Fa Dr Ing Max Verfahren zur Metallisierung von Keramik auf Basis von Titanaten
JP3688650B2 (ja) 2002-03-26 2005-08-31 株式会社東芝 電子デバイスの製造方法
CN1326638C (zh) * 2002-07-19 2007-07-18 上海华虹（集团）有限公司 一种去除硅化物形成过程中多余金属的方法
US7169323B2 (en) * 2002-11-08 2007-01-30 3M Innovative Properties Company Fluorinated surfactants for buffered acid etch solutions
KR100505044B1 (ko) * 2002-12-17 2005-07-29 삼성전자주식회사 세정액 및 이를 이용한 반도체 장치의 세정방법
TWI304439B (en) * 2003-01-30 2008-12-21 Merck Kanto Advanced Chemical Solution for removal residue of post dry etch
US20040163681A1 (en) * 2003-02-25 2004-08-26 Applied Materials, Inc. Dilute sulfuric peroxide at point-of-use
KR20050011510A (ko) * 2003-07-23 2005-01-29 동부전자 주식회사 반도체 공정의 폴리머 제거용 에천트
JP4326928B2 (ja) * 2003-12-09 2009-09-09 株式会社東芝 フォトレジスト残渣除去液組成物及び該組成物を用いる半導体回路素子の製造方法
JP4859355B2 (ja) * 2004-08-13 2012-01-25 セイコーエプソン株式会社 トレンチ素子分離構造の形成方法、半導体基板および半導体装置
JP4776191B2 (ja) * 2004-08-25 2011-09-21 関東化学株式会社 フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法
US7718009B2 (en) * 2004-08-30 2010-05-18 Applied Materials, Inc. Cleaning submicron structures on a semiconductor wafer surface
JP4728826B2 (ja) * 2006-02-07 2011-07-20 株式会社東芝 半導体装置の製造方法およびエッチング液
KR100815188B1 (ko) * 2006-06-29 2008-03-19 주식회사 하이닉스반도체 반도체 소자의 제조방법 및 이를 이용한 낸드 플래시메모리 소자의 제조방법
US20080083427A1 (en) * 2006-10-09 2008-04-10 Semitool, Inc. Post etch residue removal from substrates
JP4642001B2 (ja) 2006-10-24 2011-03-02 関東化学株式会社 フォトレジスト残渣及びポリマー残渣除去液組成物
CN101303987B (zh) * 2007-05-11 2010-08-11 中芯国际集成电路制造(上海)有限公司 半导体器件的制造方法
CN101393843B (zh) * 2007-09-20 2010-06-09 中芯国际集成电路制造(上海)有限公司 离子注入后的清洗方法
JP5360703B2 (ja) * 2008-01-11 2013-12-04 メック株式会社 エッチング液
CN102107196B (zh) * 2009-12-23 2013-02-13 北大方正集团有限公司 一种清洗半导体中的聚合物的方法
US20130099330A1 (en) * 2011-10-25 2013-04-25 Intermolecular, Inc. Controllable Undercut Etching of Tin Metal Gate Using DSP+
US8545639B2 (en) * 2011-10-31 2013-10-01 Lam Research Corporation Method of cleaning aluminum plasma chamber parts
CN103515295B (zh) * 2012-06-26 2015-09-02 中芯国际集成电路制造(上海)有限公司 通孔的处理方法
CN103087718B (zh) * 2013-01-16 2014-12-31 四川大学 湿法刻蚀镍酸镧薄膜和铁电薄膜/镍酸镧复合薄膜的腐蚀液及其制备方法
US9252053B2 (en) 2014-01-16 2016-02-02 International Business Machines Corporation Self-aligned contact structure
CN105087184A (zh) * 2014-05-22 2015-11-25 中芯国际集成电路制造(上海)有限公司 清洗试剂、清洗半导体器件中刻蚀残留物的方法及金属互连层的制作方法
KR102124328B1 (ko) 2019-12-11 2020-06-18 와이엠티 주식회사 구리 금속 표면의 밀착 향상용 미세 조도 형성 조성물

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5497546A (en) * 1978-01-20 1979-08-01 Fujitsu Ltd Etching method of permalloy thin layer
JP2787788B2 (ja) * 1990-09-26 1998-08-20 インターナショナル・ビジネス・マシーンズ・コーポレーション 残留物除去方法
US5082518A (en) * 1990-10-29 1992-01-21 Submicron Systems, Inc. Sparger plate for ozone gas diffusion
KR0124484B1 (ko) * 1993-03-23 1997-12-10 모리시다 요이치 반도체 장치의 세정방법 및 그 장치
WO1994027314A1 (en) * 1993-05-13 1994-11-24 Interuniversitair Microelektronica Centrum Method for semiconductor processing using mixtures of hf and carboxylic acid
JP3407086B2 (ja) * 1994-06-17 2003-05-19 日本テキサス・インスツルメンツ株式会社 半導体装置の製造方法
TW296405B (en) * 1996-02-12 1997-01-21 Merck Kanto Advanced Chemical Solution and process for removing side-wall residue after dry etching
EP0888578B1 (en) * 1996-03-22 2004-06-16 MERCK PATENT GmbH Solutions and processes for removal of sidewall residue after dry-etching
US5700740A (en) * 1996-03-25 1997-12-23 Taiwan Semiconductor Manufacturing Company Ltd Prevention of corrosion of aluminum interconnects by removing corrosion-inducing species
US5780363A (en) * 1997-04-04 1998-07-14 International Business Machines Coporation Etching composition and use thereof

Also Published As

Publication number Publication date
KR100334346B1 (ko) 2002-08-22
CN1227279A (zh) 1999-09-01
EP0918081A1 (en) 1999-05-26
CN1180459C (zh) 2004-12-15
US6630074B1 (en) 2003-10-07
KR19990045461A (ko) 1999-06-25
JPH11243085A (ja) 1999-09-07
DE69820397T2 (de) 2004-10-28
DE69820397D1 (de) 2004-01-22
EP0918081B1 (en) 2003-12-10
TW570971B (en) 2004-01-11
JP3181264B2 (ja) 2001-07-03

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20081120