JPS5497546A - Etching method of permalloy thin layer - Google Patents
Etching method of permalloy thin layerInfo
- Publication number
- JPS5497546A JPS5497546A JP549578A JP549578A JPS5497546A JP S5497546 A JPS5497546 A JP S5497546A JP 549578 A JP549578 A JP 549578A JP 549578 A JP549578 A JP 549578A JP S5497546 A JPS5497546 A JP S5497546A
- Authority
- JP
- Japan
- Prior art keywords
- permalloy
- layer
- temperature
- dipped
- thin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: A resist layer is deposited onto a permalloy consisting of two continuous layers, first layer formed at a high temperature and a second layer formed at a low temperature. When dipped into anetching solution, this permalloy construction allows the periphery of pattern to be gradually etched away in tapered form.
CONSTITUTION: A permalloy layer 4 is formed by metallizing or similar means onto a substrate 1 maintained at a temperature of 40 to 250°C, next, layer of permalloy 4a is formed on the first one at a substrate temperature of about 30°C. The resulted two-layered permalloy 4.4a is coated with a resist layer 5 by using know method, and then dipped into etching solution consisting of sulfuric acid, H2O2 and water containing a small quantity of HF of NH4F and surfactant. Etching is continued until the permalloy layer 4 reaches into a tapered form.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP549578A JPS5497546A (en) | 1978-01-20 | 1978-01-20 | Etching method of permalloy thin layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP549578A JPS5497546A (en) | 1978-01-20 | 1978-01-20 | Etching method of permalloy thin layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5497546A true JPS5497546A (en) | 1979-08-01 |
JPS5743149B2 JPS5743149B2 (en) | 1982-09-13 |
Family
ID=11612804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP549578A Granted JPS5497546A (en) | 1978-01-20 | 1978-01-20 | Etching method of permalloy thin layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5497546A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6218612A (en) * | 1985-07-17 | 1987-01-27 | Nec Corp | Thin film magnetic head |
US4704188A (en) * | 1983-12-23 | 1987-11-03 | Honeywell Inc. | Wet chemical etching of crxsiynz |
US5792265A (en) * | 1993-07-15 | 1998-08-11 | Mahle Gmbh | Device and process for producing reinforcing layers on cylinder running surfaces of internal combustion engines and the like |
EP0918081A1 (en) * | 1997-11-21 | 1999-05-26 | International Business Machines Corporation | Etching composition and use |
-
1978
- 1978-01-20 JP JP549578A patent/JPS5497546A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4704188A (en) * | 1983-12-23 | 1987-11-03 | Honeywell Inc. | Wet chemical etching of crxsiynz |
JPS6218612A (en) * | 1985-07-17 | 1987-01-27 | Nec Corp | Thin film magnetic head |
US5792265A (en) * | 1993-07-15 | 1998-08-11 | Mahle Gmbh | Device and process for producing reinforcing layers on cylinder running surfaces of internal combustion engines and the like |
WO2004074554A1 (en) * | 1993-07-15 | 2004-09-02 | Kurt Maier | Device and method for producing armoured layers on the cylinder bearing surfaces of internal combustion engines or similar |
EP0918081A1 (en) * | 1997-11-21 | 1999-05-26 | International Business Machines Corporation | Etching composition and use |
Also Published As
Publication number | Publication date |
---|---|
JPS5743149B2 (en) | 1982-09-13 |
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