GB995104A - Improvements in or relating to the manufacture of semiconductors - Google Patents

Improvements in or relating to the manufacture of semiconductors

Info

Publication number
GB995104A
GB995104A GB48409/62A GB4840962A GB995104A GB 995104 A GB995104 A GB 995104A GB 48409/62 A GB48409/62 A GB 48409/62A GB 4840962 A GB4840962 A GB 4840962A GB 995104 A GB995104 A GB 995104A
Authority
GB
United Kingdom
Prior art keywords
oxide layer
forming
electrolyte
etched
electro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB48409/62A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Clevite Corp
Original Assignee
Clevite Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clevite Corp filed Critical Clevite Corp
Publication of GB995104A publication Critical patent/GB995104A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P50/691—
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/12—Etching of semiconducting materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • H10P50/613—
    • H10W74/43—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
GB48409/62A 1961-12-22 1962-12-21 Improvements in or relating to the manufacture of semiconductors Expired GB995104A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US161573A US3161576A (en) 1961-12-22 1961-12-22 Electroetch process for semiconductors

Publications (1)

Publication Number Publication Date
GB995104A true GB995104A (en) 1965-06-16

Family

ID=22581750

Family Applications (1)

Application Number Title Priority Date Filing Date
GB48409/62A Expired GB995104A (en) 1961-12-22 1962-12-21 Improvements in or relating to the manufacture of semiconductors

Country Status (3)

Country Link
US (2) US3161576A (enExample)
DE (1) DE1421973A1 (enExample)
GB (1) GB995104A (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1332173A (enExample) * 1961-06-19 1963-12-16
US4268348A (en) * 1963-12-16 1981-05-19 Signetics Corporation Method for making semiconductor structure
US3395092A (en) * 1965-05-24 1968-07-30 Ribes Vincent Dressing apparatus for diamond wheels
NL6703014A (enExample) * 1967-02-25 1968-08-26
US4108738A (en) * 1977-02-18 1978-08-22 Bell Telephone Laboratories, Incorporated Method for forming contacts to semiconductor devices
US4166782A (en) * 1978-11-06 1979-09-04 The United States Of America As Represented By The Secretary Of The Navy Method of anodically leveling semiconductor layers
FR2516408B1 (fr) * 1981-11-19 1985-07-26 Dassault Electronique Machine a laver les circuits electroniques
EP0296348B1 (de) * 1987-05-27 1993-03-31 Siemens Aktiengesellschaft Ätzverfahren zum Erzeugen von Lochöffnungen oder Gräben in n-dotiertem Silizium
JPH085011B2 (ja) * 1989-07-10 1996-01-24 オリンパス光学工業株式会社 研削装置
DE4023730C2 (de) * 1989-07-26 1993-11-11 Olympus Optical Co Verfahren und Vorrichtung für die Bearbeitung optischer Bauteile
DE3929484A1 (de) * 1989-09-05 1991-03-14 Wacker Chemitronic Verfahren zum zweiseitigen chemomechanischen polieren von halbleiterscheiben, sowie vorrichtung zu seiner durchfuehrung und dadurch erhaeltliche halbleiterscheiben
US5491030A (en) * 1992-06-26 1996-02-13 Asahi Tec Corporation Surface finishing for metal moldings
US5893966A (en) 1997-07-28 1999-04-13 Micron Technology, Inc. Method and apparatus for continuous processing of semiconductor wafers
US10390582B2 (en) 2014-12-05 2019-08-27 Two Guys And A Hat Inc. Protective headgear
US20190177872A1 (en) * 2016-06-21 2019-06-13 Extrude Hone Gmbh Electrolytic polishing method and device and method for producing a cathode

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2965556A (en) * 1959-04-15 1960-12-20 Struers Chemiske Lab H Apparatus for the electro-mechanical polishing of surfaces

Also Published As

Publication number Publication date
USB161573I5 (enExample)
DE1421973A1 (de) 1968-11-07
US3161576A (en) 1964-12-15

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