USB161573I5 - - Google Patents
Info
- Publication number
- USB161573I5 USB161573I5 US161573DD USB161573I5 US B161573 I5 USB161573 I5 US B161573I5 US 161573D D US161573D D US 161573DD US B161573 I5 USB161573 I5 US B161573I5
- Authority
- US
- United States
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10P50/691—
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/12—Etching of semiconducting materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/14—Etching locally
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- H10P50/613—
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- H10W74/43—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US161573A US3161576A (en) | 1961-12-22 | 1961-12-22 | Electroetch process for semiconductors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USB161573I5 true USB161573I5 (enExample) |
Family
ID=22581750
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US161573D Pending USB161573I5 (enExample) | 1961-12-22 | ||
| US161573A Expired - Lifetime US3161576A (en) | 1961-12-22 | 1961-12-22 | Electroetch process for semiconductors |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US161573A Expired - Lifetime US3161576A (en) | 1961-12-22 | 1961-12-22 | Electroetch process for semiconductors |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US3161576A (enExample) |
| DE (1) | DE1421973A1 (enExample) |
| GB (1) | GB995104A (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1332173A (enExample) * | 1961-06-19 | 1963-12-16 | ||
| US4268348A (en) * | 1963-12-16 | 1981-05-19 | Signetics Corporation | Method for making semiconductor structure |
| US3395092A (en) * | 1965-05-24 | 1968-07-30 | Ribes Vincent | Dressing apparatus for diamond wheels |
| NL6703014A (enExample) * | 1967-02-25 | 1968-08-26 | ||
| US4108738A (en) * | 1977-02-18 | 1978-08-22 | Bell Telephone Laboratories, Incorporated | Method for forming contacts to semiconductor devices |
| US4166782A (en) * | 1978-11-06 | 1979-09-04 | The United States Of America As Represented By The Secretary Of The Navy | Method of anodically leveling semiconductor layers |
| FR2516408B1 (fr) * | 1981-11-19 | 1985-07-26 | Dassault Electronique | Machine a laver les circuits electroniques |
| EP0296348B1 (de) * | 1987-05-27 | 1993-03-31 | Siemens Aktiengesellschaft | Ätzverfahren zum Erzeugen von Lochöffnungen oder Gräben in n-dotiertem Silizium |
| JPH085011B2 (ja) * | 1989-07-10 | 1996-01-24 | オリンパス光学工業株式会社 | 研削装置 |
| DE4023730C2 (de) * | 1989-07-26 | 1993-11-11 | Olympus Optical Co | Verfahren und Vorrichtung für die Bearbeitung optischer Bauteile |
| DE3929484A1 (de) * | 1989-09-05 | 1991-03-14 | Wacker Chemitronic | Verfahren zum zweiseitigen chemomechanischen polieren von halbleiterscheiben, sowie vorrichtung zu seiner durchfuehrung und dadurch erhaeltliche halbleiterscheiben |
| US5491030A (en) * | 1992-06-26 | 1996-02-13 | Asahi Tec Corporation | Surface finishing for metal moldings |
| US5893966A (en) | 1997-07-28 | 1999-04-13 | Micron Technology, Inc. | Method and apparatus for continuous processing of semiconductor wafers |
| US10390582B2 (en) | 2014-12-05 | 2019-08-27 | Two Guys And A Hat Inc. | Protective headgear |
| US20190177872A1 (en) * | 2016-06-21 | 2019-06-13 | Extrude Hone Gmbh | Electrolytic polishing method and device and method for producing a cathode |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2965556A (en) * | 1959-04-15 | 1960-12-20 | Struers Chemiske Lab H | Apparatus for the electro-mechanical polishing of surfaces |
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0
- US US161573D patent/USB161573I5/en active Pending
-
1961
- 1961-12-22 US US161573A patent/US3161576A/en not_active Expired - Lifetime
-
1962
- 1962-12-06 DE DE19621421973 patent/DE1421973A1/de active Pending
- 1962-12-21 GB GB48409/62A patent/GB995104A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE1421973A1 (de) | 1968-11-07 |
| GB995104A (en) | 1965-06-16 |
| US3161576A (en) | 1964-12-15 |