JPS5566113A - Manufacture of elastic surface wave device - Google Patents
Manufacture of elastic surface wave deviceInfo
- Publication number
- JPS5566113A JPS5566113A JP13887878A JP13887878A JPS5566113A JP S5566113 A JPS5566113 A JP S5566113A JP 13887878 A JP13887878 A JP 13887878A JP 13887878 A JP13887878 A JP 13887878A JP S5566113 A JPS5566113 A JP S5566113A
- Authority
- JP
- Japan
- Prior art keywords
- comb
- substrate
- line electrode
- electrode
- aluminum film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
PURPOSE:To enhance the reliability for the wire bonding as well as the yield for the comb-line electrode by forming the thin aluminum for use to the comb-line electrode through heating up sufficiently the substrate temperature after forming the electrode parts excepting the comb-line electrode with the metal film on the piezeoelectric substrate. CONSTITUTION:The aluminum film of about 8000Angstrom thick is formed through the evaporation method onto lithium niobate single-crystal substrate 1, and then the metal parts excepting the comb-line electrode are formed through the photoetching technique. Then substrate 1 is held in the vacuum atmosphere about 20 minutes and at about 200 deg.C of the substrate temperature, and then the aluminum film of about 1000Angstrom is formed again through the evaporation method. Then the photo resist is coated on substrate 1 with exposure to form the photo resist pattern, and the aluminum film is etched chemically to form comb-line electrodes 2 and 3. In such way, no damage is given to the comb-line electrode during the forming process of the bonding pad part, thus increasing the defect yield for the electrode pattern.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13887878A JPS5566113A (en) | 1978-11-13 | 1978-11-13 | Manufacture of elastic surface wave device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13887878A JPS5566113A (en) | 1978-11-13 | 1978-11-13 | Manufacture of elastic surface wave device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5566113A true JPS5566113A (en) | 1980-05-19 |
Family
ID=15232216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13887878A Pending JPS5566113A (en) | 1978-11-13 | 1978-11-13 | Manufacture of elastic surface wave device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5566113A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6462009A (en) * | 1987-09-01 | 1989-03-08 | Murata Manufacturing Co | Surface wave element |
JPH0444408A (en) * | 1990-06-12 | 1992-02-14 | Toshiba Corp | Manufacture of surface acoustic wave device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5154794A (en) * | 1974-11-08 | 1976-05-14 | Victor Company Of Japan | Hyomenhasochino seizohoho |
-
1978
- 1978-11-13 JP JP13887878A patent/JPS5566113A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5154794A (en) * | 1974-11-08 | 1976-05-14 | Victor Company Of Japan | Hyomenhasochino seizohoho |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6462009A (en) * | 1987-09-01 | 1989-03-08 | Murata Manufacturing Co | Surface wave element |
JPH0444408A (en) * | 1990-06-12 | 1992-02-14 | Toshiba Corp | Manufacture of surface acoustic wave device |
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