GB2121980B - X ray masks - Google Patents

X ray masks

Info

Publication number
GB2121980B
GB2121980B GB8216847A GB8216847A GB2121980B GB 2121980 B GB2121980 B GB 2121980B GB 8216847 A GB8216847 A GB 8216847A GB 8216847 A GB8216847 A GB 8216847A GB 2121980 B GB2121980 B GB 2121980B
Authority
GB
United Kingdom
Prior art keywords
membrane
microns
ribs
regions
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8216847A
Other versions
GB2121980A (en
Inventor
John Christopher Greenwood
David William Satchell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB8216847A priority Critical patent/GB2121980B/en
Publication of GB2121980A publication Critical patent/GB2121980A/en
Application granted granted Critical
Publication of GB2121980B publication Critical patent/GB2121980B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters

Abstract

In semiconductor manufacture, where X-ray irradiation is used, a thin silicon membrane can be used as an X-ray mask. This membrane has areas on which are patterns to define the regions to be irradiated. These regions are of antireflection material 3. With the thin, in the order of 3 microns, membranes used, fragility is a problem. Hence a number of ribs 1 of silicon are formed integral with the membrane, and which are relatively thick, 5 to 10 microns. The ribs may be formed by localised deeper boron deposition followed by a selective etch. <IMAGE>
GB8216847A 1982-06-10 1982-06-10 X ray masks Expired GB2121980B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8216847A GB2121980B (en) 1982-06-10 1982-06-10 X ray masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8216847A GB2121980B (en) 1982-06-10 1982-06-10 X ray masks

Publications (2)

Publication Number Publication Date
GB2121980A GB2121980A (en) 1984-01-04
GB2121980B true GB2121980B (en) 1986-02-05

Family

ID=10530939

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8216847A Expired GB2121980B (en) 1982-06-10 1982-06-10 X ray masks

Country Status (1)

Country Link
GB (1) GB2121980B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3171590B2 (en) * 1990-08-28 2001-05-28 住友電気工業株式会社 X-ray mask and manufacturing method thereof
JP4928494B2 (en) * 2008-05-02 2012-05-09 信越化学工業株式会社 Pellicle and method for manufacturing pellicle

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3508982A (en) * 1967-01-03 1970-04-28 Itt Method of making an ultra-violet selective template
DE2626851C3 (en) * 1976-06-15 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Process for the production of masks for X-ray lithography

Also Published As

Publication number Publication date
GB2121980A (en) 1984-01-04

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Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee