GB1527179A - Process of providing an apertured photoresist layer - Google Patents

Process of providing an apertured photoresist layer

Info

Publication number
GB1527179A
GB1527179A GB2324477A GB2324477A GB1527179A GB 1527179 A GB1527179 A GB 1527179A GB 2324477 A GB2324477 A GB 2324477A GB 2324477 A GB2324477 A GB 2324477A GB 1527179 A GB1527179 A GB 1527179A
Authority
GB
United Kingdom
Prior art keywords
photo
resist
substrate
providing
incidence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2324477A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1527179A publication Critical patent/GB1527179A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

1527179 Photo-resist processes INTERNATIONAL BUSINESS MACHINES CORP 1 June 1977 [30 June 1976] 23244/77 Headings G2A and G2X A positive photo-resist layer 28 on a substrate 26 is exposed through a mask 38 to light whose direction of incidence is inclined to the normal to the surface of the substrate. Relative movement between the photo-resist/substrate/mask and the incident light is effected so that the direction of incidence of the light is brought to a succession of angular positions around the normal while remaining inclined thereto. The photo-resist is developed to yield apertures therein having vertical Fig. 3 or undercut Fig. 4 profiles. Apparatus for effecting this relative movement and including rotating mirrors is described with reference to Figs. 6 and 7.
GB2324477A 1976-06-30 1977-06-01 Process of providing an apertured photoresist layer Expired GB1527179A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70143776A 1976-06-30 1976-06-30

Publications (1)

Publication Number Publication Date
GB1527179A true GB1527179A (en) 1978-10-04

Family

ID=24817371

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2324477A Expired GB1527179A (en) 1976-06-30 1977-06-01 Process of providing an apertured photoresist layer

Country Status (3)

Country Link
JP (1) JPS533170A (en)
FR (1) FR2356975A1 (en)
GB (1) GB1527179A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3315665A1 (en) * 1983-04-29 1984-10-31 Siemens AG, 1000 Berlin und 8000 München MANUFACTURE OF GALVANOPLASTIC FLAT PARTS WITH TOTATIONALLY UNSYMMETRIC, CONE-SHAPED STRUCTURES
GB2308667A (en) * 1995-12-29 1997-07-02 Hyundai Electronics Ind Exposure equipment for a semiconductor device

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4157935A (en) * 1977-12-23 1979-06-12 International Business Machines Corporation Method for producing nozzle arrays for ink jet printers
DE2828625C2 (en) * 1978-06-29 1980-06-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for the electroforming production of precision flat parts
FR2465255B1 (en) * 1979-09-10 1987-02-20 Roumiguieres Jean Louis PROCESS FOR BRINGING THE FILLED SHADOW OF A PERCEODALLY DISTRIBUTED SLOTTED MASK ONTO A SUPPORT, AND APPLICATION OF THIS PROCESS IN PARTICULAR IN PHOTOLITHOGRAVING
JPS56153738A (en) * 1980-04-30 1981-11-27 Fujitsu Ltd Method for contact exposure
CA1172497A (en) * 1980-10-14 1984-08-14 Hugh S.A. Gilmour Elements containing ordered wall arrays and processes for their fabrication
FR2519157B1 (en) * 1981-12-30 1987-07-31 Labo Electronique Physique PROCESS FOR PRODUCING SUBMICRON PATTERNS AND PATTERNS THUS OBTAINED
JPS63299395A (en) * 1987-05-29 1988-12-06 Mitsubishi Electric Corp Aligner

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT939738B (en) * 1970-08-12 1973-02-10 Rank Organisation Ltd LIGHTING DEVICE FOR PHOTOLITHOGRAPHIC PRINTING OF MICROCIRCUIT COMPONENTS
DE2116713B2 (en) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Exposure method for imaging very finely structured light patterns on photoresist layers and a suitable exposure device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3315665A1 (en) * 1983-04-29 1984-10-31 Siemens AG, 1000 Berlin und 8000 München MANUFACTURE OF GALVANOPLASTIC FLAT PARTS WITH TOTATIONALLY UNSYMMETRIC, CONE-SHAPED STRUCTURES
GB2308667A (en) * 1995-12-29 1997-07-02 Hyundai Electronics Ind Exposure equipment for a semiconductor device

Also Published As

Publication number Publication date
JPS533170A (en) 1978-01-12
FR2356975A1 (en) 1978-01-27
FR2356975B1 (en) 1978-11-03

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee