GB1459719A - Apparatus for exposing a photosensitive layer through a mask - Google Patents

Apparatus for exposing a photosensitive layer through a mask

Info

Publication number
GB1459719A
GB1459719A GB759275A GB759275A GB1459719A GB 1459719 A GB1459719 A GB 1459719A GB 759275 A GB759275 A GB 759275A GB 759275 A GB759275 A GB 759275A GB 1459719 A GB1459719 A GB 1459719A
Authority
GB
United Kingdom
Prior art keywords
mask
light
prisms
exposing
maxima
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB759275A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1459719A publication Critical patent/GB1459719A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

1459719 Printing apparatus; optical system INTERNATIONAL BUSINESS MACHINES CORP 24 Feb 1975 [13 March 1974] 7592/75 Headings G2A and G2J Apparatus for exposing a photo-sensitive layer through a mask comprises a light source and an optical system for directing light from the source through the mask and including prisms 32, 33 through which the light passes in succession, the prism 33 being adjustably rotatable relative to the prism 32 so as to vary the deflection of the light by the prisms through a continuous range of angles, whereby the light can be made to reach the mask from different directions at a selected angle to suit the disposition of slots in the mask so as to shift the diffraction patterns caused by interference at the slots by half the distance between two adjoining side maxima so that the resulting intensity of the side maxima is weakened and that of the main maxima is increased, see Fig. 1 (not shown). The prisms 32, 33 are mounted in a holder 26 which is rotatable by an electric motor for directing the light at the selected angle in different directions to the mask, see Fig. 2 (not shown).
GB759275A 1974-03-13 1975-02-24 Apparatus for exposing a photosensitive layer through a mask Expired GB1459719A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742411926 DE2411926A1 (en) 1974-03-13 1974-03-13 DEVICE FOR EXPOSING LIGHT-SENSITIVE COATINGS THROUGH MASKS

Publications (1)

Publication Number Publication Date
GB1459719A true GB1459719A (en) 1976-12-31

Family

ID=5909886

Family Applications (1)

Application Number Title Priority Date Filing Date
GB759275A Expired GB1459719A (en) 1974-03-13 1975-02-24 Apparatus for exposing a photosensitive layer through a mask

Country Status (3)

Country Link
DE (1) DE2411926A1 (en)
FR (1) FR2264299B1 (en)
GB (1) GB1459719A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2308667A (en) * 1995-12-29 1997-07-02 Hyundai Electronics Ind Exposure equipment for a semiconductor device
FR2858694A1 (en) * 2003-08-07 2005-02-11 Commissariat Energie Atomique Photolithographic process for microelectromechanical system fabrication, involves developing photosensitive resin layer to obtain patterns with inclined flanks relative to normal to substrates principal plane based on deviation angle

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1270934A (en) * 1985-03-20 1990-06-26 Masataka Shirasaki Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2308667A (en) * 1995-12-29 1997-07-02 Hyundai Electronics Ind Exposure equipment for a semiconductor device
FR2858694A1 (en) * 2003-08-07 2005-02-11 Commissariat Energie Atomique Photolithographic process for microelectromechanical system fabrication, involves developing photosensitive resin layer to obtain patterns with inclined flanks relative to normal to substrates principal plane based on deviation angle
WO2005017623A2 (en) * 2003-08-07 2005-02-24 Commissariat A L'energie Atomique $m(c)method for producing inclined flank patterns by photolithography
WO2005017623A3 (en) * 2003-08-07 2005-10-06 Commissariat Energie Atomique $m(c)method for producing inclined flank patterns by photolithography

Also Published As

Publication number Publication date
DE2411926A1 (en) 1975-09-25
FR2264299A1 (en) 1975-10-10
FR2264299B1 (en) 1977-04-15

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee