CA1172497A - Elements containing ordered wall arrays and processes for their fabrication - Google Patents

Abstract

Abstract of the Disclosure Radiation is directed toward a support through an ordered array of lateral walls to f form interlaid radia-tionr-exposed and shadowed microareas on the support. A
first composition is then located on the support in either the shadowed or unshadowed microareas. At least one addi-tional composition is then positioned on the support in laterally displaced microareas forming an interlaid pattern with the first microareas.

Description

' 172~97 . --1 ELEMENTS CONTAINING ORDERED WA~L ARRAYS
~D PROCES~ES FOR THEIR FABRICATION
Field of the Invention This invention is directed to a process of form- ~
ing on a support two or more laterally displaced, but highly interdigitated compositions. The inYention is also directed to elements useful in practicing this process and to elements which are the products of this process. In a specific aspect this invention relates to elements useful in preparing photographic elements, processes of preparing photographic elements, and to tbe photographic elements produced.
Back round of the Invention g It is desirable for a number of purposes to locate two or more laterally dispLaced compositioos in a `~ highly interdigitated relationship on a support. Io those instances where the compositions are divided into very small individual areas (e.g., microareas--here defined as areas too small to be readily individually resolved by the unaided human eye), the techniques for locating the compositions in a predetermined laterally displaced ~ relationship have been both tedious and complex.
-~ A specific illustrative application for ~ighly .i,~erdigitated compositions is additive multicolor photog-raphy. In additive multicolor photography a multicolor filter is employed which can be comprised of three addi-tive primary filters that are segmented and interlaid to form the smallest attainable discrete areas. By exposing ~ through the multicolor filter a panchromatically respon-,l 30 sive imaging material--such as a panchromatically sensi-tized silver halide emulsion--it is possible to form a multicolor image. For instance, a negative-working silver halide emulsion can produce a multicotor negative image following exposure and developmeot when exposed and viewed , 35 through the multicolor filter. A direct-positive imaging ;~ material will similarly produce a positive ~lticolor image. This approach~ commercialized under t~e name Dufaycolor, and variations of it are illustrated by Dufay ' ~''''' ~''`' 3~

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~' 7~97 :

-2-U.K. Patent 15,027 (1912), Dufay U.S. Patent 1,003,720, Land U.S. Patent 3,138,459, and James, The Theo~ of the Photographic Process, 4th Ed., Macmillan, 1977, p. 335~
Dufay and others recognized the desirabli~ity of providing segmented interlaid f~lteræ of the smallest attsinable sizes. Disadvantages were encountarPd in achiaving proper registration of filter segments. Lateral spreading of the materials forming the filter segments was recognized to pose limi~ations, since unwanted mixing of filter materials, even if confined to edge regions9 can produce unwanted shifts in hue. Dufay and others gen-erally employed planar support surfaces, but in some instances filter segments were located in grooves.
K. E. Whi~more Canadian Serial No. 343,727, flled January 15, 19809 commonly assigned, titled IMAGING WITH
NONPLANAR SUPPOR~ ELEMENTS, recognized that lateral `~spreadlng can be overcome by plac~ng ~he filter materials in microcells (or microvessels).
- Whitmore applies to photographic imaging the use of supports containing arrays of microcells opening toward one major surface. In a variety of different forms the photogr~phic elements and components disclosed by Whitmore contain an array of microcells in which first, ~econd, and, usually, third sets of identical microcells are interspersed to form an interlaid pattern. In a typical form three separate sets of microcells, each con~aining a different subtractive primary (i.e., yellow, magenta, or cy~n) or additive primary (i.e., blue, green, or red~
imaging component, are interlaid. Preferably each micro-cell of each set is positioned laterally next ad~acent atleast one microcell of each of the two remaining sets.
The microcells are intentionally sized so that they are not readily individually resolved by the human eye, and ~ the interlaid relationship of the microcell sets further ;~ 35 aids the eye in fusing the imaging components of the separate sets of microcells into a multicolor image.

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-3 In one specifically preferred embodlment dis-closed by Whitmore, cyan, magenta, and yellow dyes or dye precursors of alterable mobility are as~ociated wlth immobile red, green~ and blue colorants, respectively, each present in one of the first~ second, and third se~s o~ microcells, and the microcells are overcoated with a panchromatically sensitized silver halide emulsion layer.
By exposing the silver halide emulsion layer through the microcells and then developing, an additive primary mul~i-color negative image can be formed by the microcellulararray and the silver halide emulsion layer while cyan, ma~enta9 and yellow dyes can be transferred ~o a receiver in an inverse relationship to ima~ewise exposure to form a subtractive primary positive multicolor ~mage. The fore-going is merely exemplary, many other embodiments being diæclosed by Whitmore.
: A technique disclosed by Whitmore for differ-elltially filling microcells to form an interlaid pattern calls for first fllling the microcells of an array w~th a sublimable material. The individual microcells forming a first set within the array can then be individually ~' addressed with a laser to sublime the material initially -~ occupylng the first set of microcells. The emptled micro-cells can then be filled by any convenient conventional technique with a first imaging component. The process is repeated acting on a second, interlaid set of microcells and filling the second set of emptied microcells with a second imaging component. The process can be repeated again where a third set of lnterlaid microcells is to be filled, although individu~l addressing of microcells i6 not in this instance required. This approach is suggested ~' by Whitmore to be useful in individually placing triad6 of additive and/or subtractive primary materials in first, - second, and third sets of microcells, respectively.
H. S. A. Gilmour Canadian Serial No. 385,i71, filed September 3, 1981, commonly assigned, titled AN
I~ROVEMENT IN THE FABRICATION OF ARRAYS CONTAINING INTER-LAID PATTERNS OF MICROCELIS, improves on Whitmore's pro-.

~ 1'7~497 cess of filling interlaid sets of m~crocells with difer-ing imaging compositions by employing a thermally destruc-tible membrane to close one set of m~crocells while another set i5 being filled with or emptled of imaging material.
R. N. ~lazey et al Canadlan Serial No. 38S,244, ~ filed September 4, 1983, commonly assigned, titled PLURAL
- IMAGING COMPONENT MICROCELLULAR ARRAYS, PROCESSES FOR
THEIR FABRICATION, AND ELECTROGRAPHIC COMPOSITIONS, improves on the processes of ~hitmore and Gilmour in eliminating the need to employ ei~her a sublimable material or a destruc~ible membrane. Blazey et al difer-en~ially electrostically charges differing sets of micro-cells and employs an electrographic imaging compositivn to fill selectively at least a f~rst set of microcells. In a preferred form ~he microcells are formed ln an organic photoconductor, the photoconductor is electrostatically charged in a nonimagewise manner, laser scanning is employed to dissipate the electrostatic charge from a first set of microcells, electrographic development intro-duces a first imaging compos~tion into the first set o microcells, and the process is twice repeated to fill second and third sets of microc~lls with second and third imaging compositions.
Land U.S. Patent 3,248,208 illustrates the orma-tion of a multicolor filter array for additlve primary imaging using a ~ransparent lenticular support. The lenticules on one ma~or surface of the support are used to focus radiation in discrete areas on the opposite surface Of the support bearing a radiation-sensitive material. By removing unexposed radiation-sensitive material and dyeing the material which remains, a first segmented filter is , formed. The procedure is then twice repeated with the support being held in a different attitude wlth respect to the exposing radia~ion source in each instance so that the lenticules focu8 the radiation in laterally displaced regions of the opposite surface. By using different addi-,~, ,.
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2~97 --5--tive primary dyes in each dyeing step, three segmented interlaid filters can be produced.
Summary of the Inven~ion .
` In one aspect this inventioo is directed to a process comprising locating adjacent support means, which is areally extended along an axial plane, a predetermined, ordered array of lateral wall means capable of defining microareas. A first composi~ion i8 positioned in one set of microareas on the support means, and a second composi-tion is positioned on the support means in another,laterally displaced set of microareas which form an inter-laid pattern with the one set of microareas. The prosess is characterized by tbe improvement comprising directing ~ tion toward the array at an acute angle with respect to the axial plane of the suppor~ means, the lateral wall means interrupting a portion of the radiation to create a first, shadowed set of microareas on the support means while permitting impingement of an uninterrupted portion - of the radiation on a second, unshadowed, interlaid set of 20 microareas of the support means, and selectively position-ing the first composition as a function of shadowing in one set of the microareas.
In another aspect this invention is directed to `:
an element comprising support means, which is areally extended along an axial plane~ A predetermined, vrdered array of lateral wall means is positioned to interrupt radiation directed toward the axial plane at an acute angle to thereby shadow a first set o microareas of the support means while permitting the radiation to impinge a second, unshadowed set of microareas of the support means forming an interlaid pattern with tbe first microareas. A
first composition is positioned on the support means in the first set of microareas, and a second composition i8 positioned on the support means in tbe second set of microareas.
In an additional aspect this invention is directed to a ~upport comprising a first portion which is areally extended along an axial plane and which forms the . .

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bottom walls of a predetermined, ordered array of micro-cells and a second portion which forms the lateral walls of the ~icrocells. The first and second portions cooper-ate to f~rm first and second interlaid ~ets of the micro-cells of the array. The supp~rt is characterized by ~heimprovement wherein the first and second sets of micro-cells are differentiated in at least one of depth, lateral extent along the axial plane, and orieotation.
This invention can be better appreciated by reference to the detailed description of the preferred embodiments considered in conjunction wi~h the drawings, in which Figure lA is a plan view of a firs~ support;
Figure lB is a section taken along line lB-lB in la ~igure lA;
Figure 2 is a section of a pixel of an alterna-tive form of the support;
Figure 3 is a sec~ion of a pixel of an addi~ional form of the support;
Figure 4 is a plan view of an altesnative support;
Figure SA is a plan view of anot~er support;
Figures 5B and 5C are sections taken along lines 5B-5B in Figure 5A showing differing exposures;
. Figure 6A is a plan view of still another ~upport;
~5 Figure 6B is a plan view of a support identical to that of Figure 6A, but showing a different exposure;
Figure 7 is a plan view of an additional support;
;.~ Figure 8A is a plan view of yet another support;
Figures 8B and 8C are sect;ons taken along lines 8B-8B in Figure 8A showing differing exposures;
, Figure 9 is a section of a further varied support;
Figure lOA is a plan of a preferred support;
Figure 10~ is a section along line lOB-lOB in Figure lOA;
Figure lOC is a section along line lOC-lOC in Figure lOA;
Figures ll, 12, and 13 are plan views of alterna-;~ tive preferred supports;
`~', ~ ~ 72~7 ; ~7-Figure 14A is a sectional view of a color image transfer photographic element;
Figure 14B is a plan view of a suppor~, showing the section 14A-14A of Figure 14A; and Figures 15A, 15B, 15C, and 15D are sectional views showing different stages of processiogO
The drawings are of a schematic nature for con-venience of viewing. Since the individual microareas are too small to be viewed with the unaided human eye, the microareas and the elements in which they sre contained are greatly enlarged. The depth of the microcells and microgrooves have also been exaggerated in relation to the thickness of the supports, w~ich typically are from 50 to 500 or more, times greater.
Description of Preferred Embodiments The present invention can be practiced with any suppor~ which is areally ex~ended along an axial plane and a predetermined, ordered array of lateral walls capable of ` interrupting radiation. The lateral walls can be an integral portion of the support or separate therefrom.
` The lateral wall array is positioned to create an ioter-laid pattern of shadowed and unshadowed areas wben radia~
tion is directed toward the support at an acute angle with ~L~ to its axial plane. Further, tbe array is chosen to dimensionally restrict the individual shadowed aod ; unshadowed areas of the interlaid pattern in at least one direction parallel to the axial plane so that they cannot be readily individually resolved by the uoaided human eye. In other words, the lateral wall array is cbosen to ; 30 produce an inter~?id pattern of shadowed and unshadowed microareas.
An illustrative simple support 100 is shown in Figures lA and lB. The support has substantially parallel first and second major surfaces 102 and 104. The support define~ a ~lura~ity of parallel microgrooves 106, which open toward the first major surface of the support. The microgrooves are defined in the support by an array of , . . .

~7~7 lateral walls 1~8 which are integrally joined to an under-lying portion 110 of the support.
ln Figure lB the ar~ows 112 schematically desig-nate radiation striking the support at an acute angle 0 with respect to an axial plane 114 along which the support is areally ex~ended. A portion of the radiation strikes the bo~tom walls 116 of tbe microgrooves in unshadowed microareas 116A while another portion of the radiation strikes the lateral walls 108 and is thereby interrupted, so that microareas 116B of the microgrooves are shadowed and do not receive radiation, at least not to the same extent, as the unshadowed microareas.
The lines 118 define the ~oundary of an area unit containing a single microgroove. The remaining depicted area of the support is formed by area units essentially identical to that within the boundary. Each area un;t forms a pixel. The term "pixel" is employed he~ein to indicate an area which can be repeated to make up the support.
Certain features of tbe invention can be appre-ciated by reference to support 100. First, i~ should be noted that the lateral walls 108 lie along balf the boundar;~ between adjacent microareas. Thus, if a , _rial is contained in the microgrooves which is capable of lateral spreading, it is restrained from spreading between microareas over half of the boundaries there-between. Similarly, radiation that might otherwise be ~cattered between adjacent microareas is also restrained where the lateral walls are present.
The acute angle ~ at which the radiation is directed towa~d the support can be varied by repositioning either the radiation source ~ndlor the support. As sbown, the radiation is directed parallel to the section line lB-lB and perpendicular to the major axes of the lateral walls 108. In this orientation the ~inimum angle of 9 at which the radiation can strike the bottom walls 116 is determined by the relationship tan ~ = H/WJ where H is the height of the lateral walls 1~8 and W is the width of ~2~9~

the bottom walls 116. It is therefore apparent that the proportion of the bottom walls that arè uoshadowed can be controlled by varying any one or combination of ~, H, or W. Further, if the support is rotated 90 with respect to the radiation source so that the radiat;on is introduced perpendicular to the section line lB-lB, no shadows are produced. It is therefore apparent that maximum shadowing for a given value ~ e is achieved when radiation is introduced perpendicularly to the major axes of the lateral walls and that the degree of shadowing can be ~^ decreased by rotating the lateral walls of the support ; toward alignment with the radiation.
Figures 2 and 3 illustrate pixels of variant forms of supports generally similar to support 100, In lS Figure 2 support 200 is shown ~aving a first major surface 202 and a second major surface 204. A microgroove 206 i9 shown opening toward the first major surface. The support is formed with the microgroove having inwardly sloping walls w~ich perform the functions of botb the lateral and bottom wall~ of the microgrooves 106.
In Figure 3 a pixel of a support 300 is shown.
The support is comprised of a first support element 302 having a first major surface 304 and a second sub-stantially parallel major surface 306. Joined to the first support element is a second support element 308 which is provided in each pixel with an aperture 310. The second support element is provided with an outer major surface 312. The walls of the second support element forming the aperture 310 and the first major surface of the first support element together define a microgroove.
The support is comprised of repetitions of the pixel shown.
Referring to Figure lA, it can be appreciated that if the support 100 i6 resolved into two separate halves joined along the secion lioe lB-lB and one half is translsted with respect to the other along the axial plane 114, the support continues to respond to angled radiation exposure substantially as described above--that is, it continues to satisfy the essential shadowing criteria :

1 1 72.~97 described above. The plane represented by the section line lB-lB thus constitutes a glide plane--herein defined as a plane separating two portions of a support which can be displaced rela~ive to each other along the axial plane S of the support without dimininishing ~he shadowing utility of the support. It is further observed that the support 100 can be resolved not just into halves, but into a large number of separate portions displaced along the axial plane without substantially altering its shadowing utility. It is thus apparent that the supports lO0, 200, and 300 provide only simple examples of a large family of lateral wall arrays that provide roughly similar shadowing utility.
This is specifically illustrated in Figure 4 in lS which support 400 is comprised of identical support regions 400A, 400B, 400C, and 400D Joined along parallel glide planes 402. In comparing supports 100 and 400, it can be seen that the two supports are identical, except that the support regions 400A and 400C are laterally displaced with respect to the support regions 400B and 400D. This has the result of producing lateral walls 408 and microareas 416A and 416B which are limited in their maximum dimension in the form shown to the distance betwe~n glide planes 402l Thus, support 400 is superior to support lO0 for applications in which the microareas are preferably limited in their longest dimension, For example, by positioning the glide planes between support regions at a spacing of 200 microns or less and the lateral walls within each support region at a center-to-center spacing of 400 microns or less, microareas limitedin both length and width to 200 microns or less can be readily obtained. As a result of the relative translation of adjacent support regions, the support 400 contains no grooves, but only upstanding lateral walls. This illus-trates that neither microgrooves nor any other type ofareally limited depressions in the support are required for the practice of this invention. It is recognized that ~ 1 72~g~
i the suppor~ 400 can, if desired, appear in section essen-tially identical to any one of supports 100, 200, or 300.
In further comparing the microarea patterns of supports 100 and 400, it can be appreciated that the microareas 416A and 416B are interspersed to a greater degree than the microareas 116A and 116B. The microareas 416A and 416B are interlaid along two perpendicular axes, whereas the microareas 116A and 116B are interlaid along only one axis. The higher degree of in~erlay can repre-sent a distinct advantage for specific applications requiring a high degree of interlay for desired optical or chemical properties.
Still fur~her comparing the supports 100 and 400, it can be seen that the lateral walls 408 separate the 15 first and second microareas 416A and 416B over a bouodary approximately equal in length to that by which the lateral ` walls 108 separate the microareas 116A and 116B. However, in the support 400, because the microareas 416A and 416B
are more highly interspersed, there is a larger boundary between adjacent microareas where no lateral walls are present. This feature of the support 400 can, bowever, be readily modified in a manner which does not dimini~h the shadowing utility of the support. If, for example, addi-- ~ional lateral walls are introduced along the glide planes 402 in Figure 4, it can be seen that the lateral walls now extend over a much larger proportion of ~be boundaries between adjacent microareas. The result is to limit significantly the boundary region available for lateral spreading between adjacent microareas.
If additional lateral walls are provided for the support 4~0 along the glide planes 402, it is apparent that a predetermined, ordered array of microcells is created, each containing two microareas. The term "micro-cell" is herein defined as a cell or vessel too small in size to be readily individually resolved witb the unaided human eye~ In the geometrical form described the micro-cells produced on the support 400 are approximately square, but it is apparent that microcells of any geo-:' .. , ~
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a 1 72497 metric configuration can be employed. Thus, supports exhibiting any oE the microcell or microvessel configura-tions disclosed by Whitmore, Gilmour, and/or Blazey et al in the copending patent applications cited abovet can be employed in the practice of this invention. Hence all of the microcellular supports disclosed in these patent applications are useful in the practice of this inven-;tion. Polygonal (square, rectangularl and hexagonal), - circular, and elliptical microcell configurations have -10 been explicitly disclosed, although any other predeter-mined recurring microcell configuration (or combination of :configurations, discussed below) can be employed in the practice of this invention.
Any predetermined, ordered array of lateral walls `-15 capable of interrupting radiation, whether or not micro-cells or microgrooves are formed by these walls, can be `;employed in the practice of this invention to produce two or more laterally displaced contiguously adjoining micro-areas (that is, microareas which over some boundary region are not separated by lateral walls). Supports having uniformly spaced lateral wall arrays, such as supports 100 and 400, or supports having a single repeated microcell configuration are particularly suited for forming two or more laterally displaced contiguous sets of microareas that are of uniform size in each individual occurrence.
Figures lA, lB, and 4 illustrate perhaps the simplest shadowing approach of this invention wherein the bottom walls of the supports are shown divided into two separate interlaid sets of uniform microareas of sub-stantially equal area by a single exposure of the supportto radiation directed toward the axial plane of the support at an acute angle. Where one composition is introduced into exposed microareas and a second composi-tion is introduced into unexposed or shadowed microareas, an interlaid array of two separate compositions is pro-duced. For some applications the microareas represented by the lateral walls can also be utilized, so that three separate useful sets of microareas are actually present.

t~ 72~97 `; Supports useful as described above can also be applied to applications requir~ng mOre than two laterally displaced compositions. For example, in Figures lA and lB
it can be seen that by adjus~ing the angle of exposure ~, the size of the microareas 116A exposed c~n be ad~usted. If, for example, it is desired to place three separ~te strips of equal size of three separate composi-~ions between adjacen~ pairs of lateral walls 108, the angle ~ is adjusted so that the radiat~on strlkes only one third of the area of each bottom wall 116. A first ; co~position can then be sel ctively positioned in the microareas corresponding ~o the exposed portions of the bot~om walls. The angle ~ ls then increased so ~hat on ;~ a second exposure radia~ion strikes the area originally struck, now contalning the fir6t composition, ~nd a contiguous one third oE each bottom wall 116. A second composition is then selectively positioned in the micro-areas corresponding ~o the exposed areas not occupied by the first composition. The procedure can be repeated using radiation directed perpendicularly to the axial plane 114 to position ~ third composition in a third laterally displaced set of microareas, or the third composition can in many ins~ances be introduced by a conventional technique for coating a single composltion, such as doctor blade coating. Although described by reference ~o three compositions and a specific support, it is apparent that the procedure is generally useful with :

' ~72~7 all of the supports containing lateral wall arrays herein described and with more than three compositions~
The procedure described above for positioning three or more laterally displaced compositions, while -~
useful with all lateral wall array patterns, relies in part on the presence of a previously positioned composi-tion to define A microarea resulting from a later expo-sure. Stated aoother way, the first and second exposures are in part areally overlapping. This limits the shadow-; 10 ing procedure descr;bed above to use with materials which allow the presence or absence of one composition to exclude a subsequent composition, as is possible in cer-tain preferred embodiments of this inventioo. Exclusion ~h~ exhaustion effects are discussed more specifically / 15 below.
It is possible to uniquely address two or more areas of a support according to this invention so that no materials dependent exclusion effect is relied upon. An approach for uniquely addressing two separate sets of microareas with radiation while creating a third set of microareas by shadowing is illustrated in Figures 5A, 5B, and 5C. Except as otherwise noted belo~, the features bearing 500 series reference numerals are identical to ~h~se bearing the corresponding 100 series refereDce numerals in Figures lA and lB and are not redescribed in detail.
The support 500 as illustrated differs from support 100 solely in the use of an optional transparent underlying portion 510; however, tbe lateral walls 508 remain capable of interrupting radiation. In Figure 5B
radiation 512A is directed toward the axial plane 514 at an angle ~ cbosen to permit impingement of radiation only on the microareas 516A. The remaining area of each bottom wall 516 is shadowed by the lateral walls 508.
Thus, exposure as shown in Figure 5B creates one set of microareas 516A in an interl~id pattern with remaining support areas. A first composition can be selectively positioned in tbe first set of microareas.

' ~2~7 In Figure 5C the support is given a second exposure to radiatioD 512B at an acute angle ~'. As shown, the radiation exposure patterns in Figures 5B and 5C are mirror images, although the angles ~ and ~' ~
`5 need not be equal, except when t~e microareas 516A and 516B are întended to be equal. Instead of changing the direction of radiation between the firs~ and second expo-sures, the support could alternatively be rotated 180 in the axial plane.
Radiation impinges on the bottom walls 516 only in the m;croareas 516B, creating a second ~et of radiation exposed microareas. A second composition can be selec-tively positioned in the second set of microareas.
third set of microareas 516C, not exposed by either the first or second exposures, is created concurrently with the second set of microareas. A third composition can be positioned in the third set of microareas. It is to be noted t~at the first composition is laterally spaced from the second microareas and no exclusion property is re-quired in order to position the second composition. It isappreciated that the angles ~ and/or ~' can be in-creased to eliminate the microareas 516C without in any wav ~ltering the shadowing technique described above.
Using the supports 100, 200, 300, 400, and 500 only two interlaid sets of microareas can be uniquely addressed by shadowing techniques. By the term "uniquely addressed" it is meant that a set of microareas is e~posed to only tbe single radiation exposure which defines its boundaries and no other microarea defining radiation exp~sure. It is possible, however, to produce three, four, five, six, or even more sets of uniquely addressed microareas in a single support containing microcells. For tbis purpose microcells of polygonal shape are preferred.
Generally the number of sets of uniquely addressed areas that can be produced by shadowing in a single polygonal microoell i9 equal to its number of apices.
An illustration of tbe creation of microareas in a set of polygonal microcells by shadowing techniques of :
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t 1 ~2'~97 ~he type described above is provided in Figures 6A and 6B, in which a detail o~ 2 suppor~ 600 containing a pre-determined, ordered array of microcells 602 of a regular hexagonal shape is shown. The support 600 in section can appear identical to the supports shown in Figures lB, 2, 3, or 5B. Referring fir~t to Figure 6A, exposure of the support 600 in a direction parallel to arrow 1 at an acute angle with the axial plaoe of the support exposes tbe bottom wall of each microcell in only diamond-shaped area 1, the remainder of the wall of each microcell being shadowed. By chang;ng tbe direction of exposure, as indi-cated by arrows 2, 3, 4, 5, and 6, but not the exposure angle, five more iden~ical diamond shaped exposed micro-areas 2, 3, 4, S, and 6 are produced. The six diamond-shaped microareas provided in each microcell are of equalarea, since each microcell is a regular hexagon and the angle of exposure is unchanged. I~ is to be noted that none of the six microareas impinges on any other of the six diamond-shaped microareas and ~herefore each is uniquely addressed by shadowing exposures. Thus, it is possible to place up to six separate compositions in eacb microcell 602 without relying upon any exclusion property.
~X?osure csn be terminated after the sixth expo-~ure and the central area of each microcell can be left unexposed, if desired. In this instance the lateral spac-ing in the center of each microcell between compositions introduced into the six separate microareas can be relied upon to prevent or reduce boundary mixing of composi-tions. In an ~lterna-tive form in which the central region is desired to receive material, one or more compositions can be employed capable of wandering from the diamond-shaped areas to cover the central portion of each micro-cell.
By using a combination of the procedures des-cribed above and exclusion effects, it is possible to produce additional microareas in each hexagonal microcell 602. As shown in Figure 6A, a microarea 7 equal in area to the diamond-shaped areas is produced by exposing at the 2~9 ~;~ same acute angle in a direction iDdicated by arrow 7. The radiation overlaps botb the microareas 1 and 2 in exposing additional microarea 7. By using exclusion effects a seventh composition can be located in only the microarea 5 7. Microareas 8, 9, 10, 11, and 12 are sequentially simi-larly formed by shadowing exposures along like umbered axes.
Thus far it can be seen that 12 microareas can be formed, six of which can be uniquely addressed aod six of which depend on exclusion effects. At this point tbe central portion of eac~ hexagonal microcell remains sha-dowed. If desired, the central portion of the microcell can be left shadowed and unfilled. Alternately, the ; central, shadowed portion of the microcell can be filled with a single composition. For example, if the microareas 1, 2, 3, 4, 5, and 6 receive a first composition and tbe microareas 7, 8, 9, 10, 11, and 12 receive a second com-position, a third composition can be located in the central, shadowed portion of each mîcrocell, and three compositions will occupy roughly equal areas of each microcell bottom wall.
: By increasing the acute angle of exposure and relying on exclusion effects, it is possible to form additional microareas in the central, initially shadowed portion of each microcell. By exposing again in the direction indicated by arrow 7, but at an increased acute angle, the microarea 13 can be formed, which is roughly equal to the previously formed microareas. Similarly, by exposing in the direction indicated by arrow 10 microarea 14 can be formed. By exposure in the direction indicated by arrow 6 t~e microarea lS can be formed, and by exposing in the direction indicated by arrow 3 the microarea 16 can be formed. Microareas 13, 14, 15; and 16 are all formed at the same acute angle of exposure and are approximately equal. By increasing the acute angle of exposure again, microareas 17 and 18 can be formed by exposing in the direction indicated by arrows 6 and 3, respectively.
Tbese microareas are roughly equal to the previously : /

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1172~9 formed microareas. Two triangular microareas 19 remain unexposed which, together are roughly equal to the remain-ing microareas. By using shadowed microareas 19 as one microarea, 19 laterally spaced compositions can be placed on the bottom walls of each hexagonal microcell, each composition occupying an approximatelg equal area. The shown pattern is, of course, only exemplary. Sbadowing exposures can produce microareas of difEering configura-tion, size, and number.
The ability to uniquely address a plurality of sets of microareas so that the microareas cover an entire surface of a support, except for the areas occupied by lateral walls~ is an obvious advantage in making maximum use of a support surface and in achieving a high degree of interdigitation of compositions. Some lateral wall patterns offer this capability and some do not. In referring to supports 100, 200, 300, 400, and 500, it can be seen that the lateral wall patterns permit the creation of uniquely addressed microareas which cover the entire support surface not occupied by the lateral walls. It is also apparent that microcells of square or rectangular - configuration also offer this capability, since it has ~lready been pointed out above that any two contiguous microareas in the same segment of the support 400 can be enclosed in a microcell without altering the shadowing capability of the support. Upon further reflection it can be appreciated that square and rectangular microcells are but special cases of lozenge (diamond-shaped) and parallelogram configuration microcells and that all such microcells can be uniquely addressed over their entire bottom wall areas. As shown in Figure 6A, the uniquely addressed areas 1 through 6 of the hexagonal microcells 602 do not occupy the entire bottom surface of the micro-cell; but, referring to Figure 6B, the identical support is uniquely addressed over the entire bottom walls of the microcells by three exposures at an acute angle with respect to the axial plaDe. Area 1 is addressed by exposure in a direction 1, area 2 by exposure in a direc-tion 2, and area 3 by exposure in a direction 3. This .. `~
~.' : .

,~
''

4 ~ 7 demonstrates that uniquely addressing microcells over their entire bottom walls is a function not only of the shape of the microcells, but also a function of the angle and direction of exposure. Many microcell configurations, such as circular, elliptical, triangular, and trapezoidal microcells cannot be uniquely addressed over their entire bottom wall areas by shadowing techniques, regardless of the number or angle of shadowing exposures attempted.
- Whitmore, Gilmour, and Blazey et al, cited above, employ support containing microcells which are not only identical in each occurrence, but are identically aligned in each occurrence. While the present invention can employ supports con~aining any of tbe microcell arrange-ments disclosed by Whitmore, Gilmour, and Blazey et al, it is additionally recognized that advantageous results can be obtained by using supports containing identical micro-cells which by their orientat;on can be resolved into interlaid sets that can be differentially addressed.
This is illustrated in Figure 7, in which a support 700 is provided with a plurality of identical microcells which appear triangular in plan. As can be readily appreciated, however, the triangular microcells are not all similarly aligned. There are two interlaid sets of microcells 702A and 702Bo When the support is 2S addressed by radiation at an acute angle with respect to its axial plane as indicated by arrow 704, radiation strikes the bott)m walls-of the microcells 702A in micro~
areas 706A and strikes the bottom walls of the microcells 702B in microareas 706B. It is to be noted that the microareas are equal, but differ in their orientation similarly as the microcells in which they occur. Wbile the triangular microcells shown are each equilateral tri-angles, triangles of any desired type, including isosceles and right triangles, can be employed with similar results.
In each of the embodiments heretofore described at least two sets of microareas are contiguously adjoin-ing--that is, they are not separated by a lateral wall over some portion of their boundary. Thus, the advantages which lateral walls have to offer in preventing lateral ~ .
D~

! 1 7249 spreading either of materials or radiation are partially, but not entirely, realized. It is not possible using any of the supports disclosed by Whitmore, Gilmour, or Blazey et al to locate two or more compositions in two or more interlaid sets of microareas each entirely separated from the other lateral walls by shadowing techniques of the type described above. The preferred supports of this invention are those which offer the capability of provid-ing two or more interlaid sets of microareas by shadowing techniques, each of the microareas being entirely sepa-rated from microareas of other sets by lateral walls.
Specifically preferred supports are those which allow three separate compositions ~o be interlaid by shadowing techniques in separate sets of microareas each separated from the other by lateral walls.
A simple support 800 capable of providing three interlaid sets of microareas each entirely separated from the other by lateral walls is illustrated in Figures 8A, 8B, and 8C. Except as otherwise noted, the features bearing 800 series refereoce numerals are identical to ; those bearing the corresponding 100 series reference numerals in Figures lA and lB and are not redescribed in detail.
The lateral walls 808 of the support are arranged in parallel relationship, but unlike t~e lateral walls in support 100, are unequally spaced in a predetermined, ordered manner. The w;dest spaced lateral wall pairs together with the connecting portion 810 form a first set of microgrooves 806A each having a bottom wall 816A. The farthest spaced pairs of lateral walls similarly form a set of microgrooves 806B each having a bottom wall 816B.
The closest spaced pairs oE lateral walls form a third set of microgrooves 806C having a bottom wall 816C.
When the support is exposed with radiation as indicated by arrows 812A in Figure 8B, the acute angle ~
with respect to the axial plane 814 is chosen so that the radiation strikes only the bottom walls 816A. The bottom walls 816A are shadowed, however, to some degree. The extent to which the bottom walls ~16A are shadowed can be L 9 ~

reduced significan~ly by performing a second exposure a6 described above in connection with support 500. For example, the support can be rotated 180 and given a second exposure at the same angle. By properly position- -ing the lateral walls and choosing the angle ~, it is possible to expose all of the bottom walls 816A without exposing any portion of the bottom walls 816B and 816C.
Once the bottom walls 816A have been selectively exposed, a first composition can be selectively Located in the first microgroove~ 806A.
With a first composition 850 in place, as shown ; in Figure 8C, the suppor~ is given a second exposure to radiation 812B at an increased acute angle ~ with respect to the axial plane. Radiation strikes the first composition in the first microgrooves and also the bottom ~` walls 816B of the second microgrooves 806B, but is blocked by the narrowness of the third microgrooves 806C from striking the bottom walls 816C. Since a portion of the bottom walls 816B remain shadowed, the support can be rotated 180 and exposed again to increase the exposure of the bottom walls 816B as a function of exposure. The third set of microgrooves 816C can then be filled with a second composition. A third composition can be introduced into the third microgrooves 806C using any of the tech-niques described above for positioning a third compositionin the microareas 516C.
The area between the lines 818 forms a single pixel of the support 800. It is to be noted that the microareas 816A, 816B, and 816C of the pixel present unequal areas. In applications where a more nearly equal distribution of microareas is preferred, the support can be formed so that the number of occurrences of each micro-area i~ varied to more closely balance the total areas presented by the separate sets of microareas. ~'or exam-35 -ple, a second microarea 816C can be added to each pixel 818, thereby doubling the area of the third set of micro-areas without in any way altering the shadowing capability of the support 800 described above.

D~`' 3~2~9 An alternative support which responds to shadow-ing exposures identically as the support 800, described above, but which offers the fur~her advantage of providing three interlaid sets of microareas that present equal areas in each individual occurrence is shown in Figure 9.
The support 900 is shown by reference to a single pixel 918, which contains three separate microgrooves 906A, 906B, and 906C. The only difference between the micro-grooves is the depths of the bottom walls 916A, 916B, and 916C, which, as sbown, are parallel to the axial plane 914 of the support.
Shadowing exposure of the support 900 can be appreciated by reference to ~he arrows 912A, 912~, and 912C which strike the intersections of the bo~tom and lateral walls of the microgrooves 906A, 906B, and 906C, respectively. By reference to the arrows it can be appreciated that an exposure to radiation at an angle greater than ~, but less than ~, will strike the bottom walls of the microgrooves 906A while leaving the bottom walls of the microgrooves 906B and 906C entirely in shadow. After a first composition is introduced into the microgrooves 906A, a second exposure at an angle with respect to the axial plane of greater than ~ and less ~nan ~ will permit the bottom walls 916B of tbe micro-grooves 905B to be exposed without exposing any portion ofthe bottom walls ~16C of tbe microgrooves 906C. After a second composition is introduced into the second micro-grooves, a third composition can be introduced into tbe t~ird microgrooves by any technique described above for introducing a third composition.
It is apparent that the supports 800 and 90G can be resol~ed into separate segments along glide planes siml~arly as the supp~rt 100 is resolve~ along glide planes to form t~e suppo~t 400. Further, although des-cribed by reference to parallel lateral wa~ls only, it is - apparent that the use of the sets of microcells differing in lateral extent, in depth, or in any combination of both can be employed in the practice of this invention. Al-, though described above in terms of three separate sets of microareas, it is appreciated that any one of the three sets of microareas in the supports 800 and 900 can be omitted to allow two compositions to be interlaid sub~
stantially as described.
Figures lOA, lOB, and lOC illustrate a preferred support 1000 for use in the practice of this invention which is (1) capable of entirely laterally separating three different eompositions similarly as supports 800 and 900~ (2) capable of providing equal composition microareas similarly as support 900, (3) capable of additionally providing equal microcell volumes of each composition within each pixel, (4) capable of being radiation exposed by shaaowing techniques over the entire bottom wall area of each of three separate sets of microcells, and (5) : capable of having two microcell sets uniquely addressed.
The support 1000 is comprised of substantially parallel first and second major surfaces 1002 and 1004.
The support defines a first set of rectangular microcells 1006A, a second set of rectangular microcells 1006B, and a third set of square microcells 1006C. The microcells are defined in the support by an array of lateral walls 1008 which are integrally juined to an underlying portioa 1010 of the support.
The microcells 1006A and 1006B as shown are identical in shape, but not in orientationO The major r axis of each microcell of the first and second set is aligned with or parallel to the major axis of microcells of the same set and perpendicular to the major axis of each microcell of the other set. The set of square micro-cells is positioned so that an edge of each square is substantially parallel to an adjacent edge of a rectangu-lar microcell.
The dashed lines in Figure lOA separate the support into identical pixels lOlB. Each pixel contaios one rectangular microcell from each of the first and second sets and two square microcells of the third set.

! l~2ll97 By uniformly exposing the first major surface ofthe support in the direction indicated by the arrows 1012A, it is possible to selectively expose the bottom walls of the first set of microcells 1006A while the

- 5 lateral walls prevent direct impingement of the radia~ion on the bottom walls of the remaining two sets of micro-cells. If desired to expose entirely the bottom walls of the first set of microcells, the support can be rotated 180 and exposed again a~ the same angle or the support can be exposed again at the same angle, but with the horizontal direction component of the radiation as shown in Figure lOA reversed. After a first composition is positioned in the first set of microcells as a func~ion of exposure, the bottom walls of the second set of microcells 1006B ean be selectively exposed by uniformly exposing the first major sur~ace of the support in the direction indi-cated ~y the arrows 1012B, and in the opposite horizontal direction at the same acute angle similarly as in exposing the bottom walls of the first set of microcells. The bottom walls of the first and third sets of microcells are not exposed. A second composition can then be selectively introduced into the second set of microcells as a function of exposure. The bottom walls of the third set of micro-cells can then be exposed by addressing the first major surface of the support in a direction perpendicular to its axial plane 1014. A third composition can then be intro-duced into the third set of microcells. It is to be noted that no exclusion property is required to selectively introduce the irst and second compositions into the first and second sets of microcells, but that in using a third, perpendicular exposure the first and second compositions must exclude the third composition from the first and second sets of microcells, since the third set of micro-cells is not uniquely addressed, but is addressed con-currently with all the other microcells~
In considering the sequence of exposures dis-closed above, certain more general parameters of the invention will become apparent. In exposing the micro-~ cells 1006A, it is apparent that it is their length and :~, ' D~

: ' ' ! 1'72~g7-25-the height of the lateral walls which controls exposure of the bottom walls. Exposure is entirely independent of the width of the first set of microcells. It is therefore apparent that the width of the first set of microcells can be varied at will from very small to very large, depending upon the size of the microareas and the amount of the first composition desired. The wid~h of the microcells of the first set in the direction of arrows 1012B can even be increased to a point wllere it exceeds the length of these microcells in the direction of arrows 1012A. The widths can, of course, be variable from one microcell to the next, if desired. The microcells 1006B of the second set can be of anY desired leng~h, but to avoid heing exposed on their bottom walls while the first set of microcells are being addressed~ the width of the second set of micro-cells must be no greater than half the length of t~e first set of microcells. Measured in a direction parallel to the major axes of the first set of microcells, the micro-cells of the third set can be up to one half the length of the microcells of the first set without being addressed on ~ their bottom walls during exposure of the bottom walls of '~ the microcells of the first set. The microcells of the third set similarly can be up to half the leng~h of the microcells of the second set measured in a direction parallel to the major axes of the second se~ of micro-cells. In the preferred form shown the first and second sets of microcells are of equal length and the microcells of the third set are each substantially one balf the length of both the first and second sets of microcells and thus square; however, the third set of microcells can be rectangular whether or not the first and second sets of microcells are of equal length. As suggested above, the rectangular microcells of the first and second sets are only an example of a general class of microcells of parallelogram configuration. The microcells of the third set, shown to be square, can be of either lozenge or parallelogram configuration. Stated another way, adjacent sides of the microcells need not be perpendicular, but to retain the functional capabilities disclosed, opposite :
,..

.

~ 497 sides of the microcells should remain patallel. The above discussion is limited to microcell dimensions that provide all the advantages of the support lO00 as shownO If less than the entire bottom wall of each microcell of the first and second set is to be addressed by radiation, then the dimensions of the second and third sets of microcells can be increased above the one half limits indicated.
A number of variations of the support lO00 a~d the shadowing technique for introducing compositions will readily be apparent. For example, instead of giving the support a third exposure to in~roduce the third composi-tion, in many instances the third composition can be introduced without reference to any exposure patterr., simply relying on the first and second compositions to exclude the third composition from the first and second sets of microcells, as has been mentioned in connection with previously discussed supports. The support 1000 can be adapted to the use of two rather than three composi-tions merely by omitting any one of the three sets of microcells without otherwise alterîng the capabilties or shadowing techniques described above. It is to be noted that the placement of the individual microcells in rela-tion to each other is entirely a matter of choice. For example, instead of placing pairs of square microcells side-by-side, as shown, they can be separa~ed by interven-ing rectangular microcells. Alternatively, the square microcells can form columns and/or rows perpendicular to the columns which are not interrupted by rectangular microcells.
In looking a~ the support 1000, it is apparent that it is only exemplary of a large family of alternative support configurations capable of exhibiting some or all of the advantages of this invention. For example, if the microcells 1006B are arranged in an end-to-end pattern in parallel columns (this can be done by laterally displacing the support along the horizontal dashed line in Figure lOA
: extending in the same direction in the axial plane as the arrows 1012A); it is apparent that glide planes exist in these columns. By laterally displacing the support on one .' .
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:;
.
., .

! 1 7 2 49 7 side of a glide plane one-half the length of the micro-cells 1006B, the second set of microcells 1006B are trans-formed into a serpentine microgroove. The shadowing utility of the support is not aEfected, however. In like manner, it can be appreciated that if the square micro-; cells are arranged in a row or column uninterrupted by rectangular microcells, glide planes exist in these rows or columns. By translating one portion of the support on one side of a glide plane witb respect to the portion of the support on the other side, the square microcells areconverted into a serpentine microgroove, but the shadowing utility of the support is not changed. If additional lateral walls are provided aligned with the glide planes, the serpentine microgrooves, formed by displacing halves of the first set of rectangular microcells, become rec-tangular microcells again, with two rectangular inicrocells being present where only one existed prior to displacement along the glide plane. In like manner, the serpentine microgroove formed by displacement along a glide plane running through the square microcells is replaced by a series of smaller rectangular microcells w~ich are equal in leng~h to the sides of the squares initially present, but smaller in width. The variants of the suppor~ 1000 that can be created by displacement along glide planes should be apparent by comparing supports 100 and 400 in light of the above description.
Figure 11 illustrates a preferred support 1100 for use in the practice of this invention which is (l) capable of entirely separating three different composi-tions by intervening lateral walls, similarly as supports800, 900, and lO00 (2) capable of providing equal micro-areas in each of three different sets, similarly as supports 900 and lO00, (3) capable of providing equal volumes in each of three separate microcell sets, simi-larly as support 1000, (4) capable of being uniquelyaddressed in each of three separate sets of microcells, a ; capability not shared by any of the supports previously addressed, and ~5) capable of providing a more symmetrical distribution of three compositions than the support 1000.

,, ~ ~ ~24~7 -~8-The support 1100 can be resolved into a plurality of pixels 1118 each containing three identical microcells 1106 which are diamond-shaped in plan view. Each micro-cell within the pixel belongs to a separate set of micro- -cells. A first set of the microcells is positioned so that the longest dimension of each microcell is aligned wlth or parallel to a first axis 1120. A second set of microcells is similarly positioned with respect to a second axis 1122, which intersects the first axis at a 6Q
angle. In like manner a third set of microcells is simi-; larly positioned with respect to a third axis 1124, which intersec~s each of the first and second axes at an angle - of 60. If the support 1100 is viewed in section along any one of the first, second, or third axes it would appear similar to the sectioned support shown in Figure lB
(ignoring wall structures outside of the section plane).
If the support 1100 is uniformly exposed at an acute angle with respect to its axial plane similarly as the support 100 in Figure lB or the support 500 in Figure 5B in a direction indicated by the arrow 1126, which is parallel to the first axis, the bottom wall of each micro-cell of the first set can be exposed to radiation in the microarea 1123 while the bottom walls of the second and third sets of microcells remain entirely shadowed. If a second exposure is given at the same acute angle, but in the opposite direction, as indicated by arrow 1130, the bottom walls of the first set of microcells are again ; exposed, this time in only the microareas 1132. Again the bottom walls of the second and third sets of microcells remain entirely shadowed.
; It can thus be seen that two uniquely addressed microareas can be formed by angled exposure of the bottom walls of the first set of microcells. After the first angled exposure, a first composition can, if desired, be introduced as a function of exposure so that it is selec-' tively positioned in only the microareas 1128. After the second exposure a second composition can be similarly . . .
selectively positioned in only the microareas 113~.
~ Alternatively, both the first and second exposures can .~- C'~

,, .

~ 172~9 occur before any composition is introduced, and a single composition can then be introduced so tha~ ;t is selec-tively positioned in i:he microareas 1128 and 1132 only.
By analogy it is apparent that if the procedure described above is twice repeated, the second and third sets of microcells can be similarly uniquely addressed and up to four additional compositions placed in uniquely addressed interlaid sets of microareas~ Uniform exposure in the direction indicated by arrow 1134, but otherwise identical to the first uniform exposure uniquely addresses - microareas 1136 while leaving the remainder of the bottom walls in shadow. A reversed exposure in the direction indicated by arrow 1138 uniquely addresses microareas 1140 while leaving the remainder of the bottom walls in shadow. Uniform exposure in the direction indicated by arrow 1142 uniquely addresses microareas 1144 while a reversed exposure in the direction indicated by arrow 1146 uniquely addresses microareas 1148. Thus, six separate uniquely addressed microareas cnn be produced and 6iX
separate compositions can be introduced~ each selectively positioned in a separate microarea. It is generally preferred ~o position ~he three compositions in the micro-cells so that a different composition lies in each set of microareas.
In looking at the s~pport 1110, it is apparent that it is merely representative of a family of possible supports having generally similar capabilities. For example, any one of the axes 1120, 1122, and 1124 shown in ; the drawings is merely one axis arbitrarily selected for purposes of illustration from among a family of identical parallel axes Further, each family of axes constitute6 a family of glide planes. By relatively displacing portions of the support in the axial plane of the support along one or up to the entire family of glide planes, essentially functionally identical suppbrts can be created which have differently shaped microcells, microgrooves, and/or micro-areas. To avoid converting microcells into serpentine - microgr~oves by lateral displacement additional lateral walls can be located along the glide planes.
~.' ' 1 7~9~

To illustrate the effect of displacement along glide planes, in Figure 12 a support 1200 is shown differ-ing from the support 1100 by lateral displacement of adjacent portions of the support along glide planes 1220A
and 1220B~ This displacement converts one set of micro-cells having major axes in the glide plane 1220A into serpentine microgrooves which cross and recross this glide plane. Along the glide plane 1220B an additional lateral wall 1208 is provided so ~hat the one set of microcells having major axes in the glide plane are converted by displacement and the lateral walls to triangular micro cells of approximately half the area, but twice the number, of the corresponding diamond-shaped microcells in support 1100. The additional lateral walls 1208 can be present along bot~ glide planes 1220A and 1220B or omitted entirely. The firs~ and second sets of microcells are identical to those of support 1100. The shadowing u~ility of the support 1200 is identical to that of the support i 1100. Since the microcells of the first, second, and third sets are identical and form a symmetrical pattern in ~ support 1100, it is apparent that identical patterns ;~ resul~ from displacement along glide planes aligned with the major axis of any one of the three sets oE micro-cells. In terms of capabilties and use the support 1200 is substantially the same as support llO0.
~ Referring again to support 1100, three axes 1152, 'r' 1154, and 1156 are present extending through or parallel to the minor axes of the three sets of microcells. These three axes intersect at 60 angles. Using any one of these axes as a glide plane and displacing t~e portions of the support lying on either side of the glide plane in the axial plane of the support, one set of microcells can be converted from diamond-shaped microcells to triangular microcells of approximately half the area, but twice the number. When this type of glide plane variation is under-taken, the result is a support that possesses the cap-abilities of support 1100, except the capability of uniquely addressing the triangular set of microareas produced by lateral displacement. The triangular micro-. :
;"

:

1 1 72,49 ~31-cells can still be addressed similarly as the square microcells in the support lO00, however.
In Figure 13 an addi~ional preferred support 1300 for use in the practice of this invention is illustrated.
The support is provided with first and second sets of diamond-shaped microcells 1306A and 1306B. The microcells of each of the first and second sets have major axes lying along parallel axes, while the axes of one set intersect those of the other set at a 60 angle. A third set of microcells 1306C is rectangular in shape. The major axes of the rec~angular microcells are substantially parallel to each other and intersect the axes of the first and second microcells at 60~ angles. Thus, in terms of micro-cell content the support 1300 differs from the support llO0 in substituting for one set of diamond-shaped micro-- cells a set of rectangular microcells. The first and second sets of microcells can be uniquely addressed in microareas 1326, 1332, 1336, and 1340, which are identical to corresponding microareas in support 1100. The rec-20 tangular microcells can be uniquely addressed in micro-areas 1344 and 1348, which differ in shape from the corresponding uniquely addressed microareas in the support 1100. In terms of relative placement of microcells, it can be seen that the microcells of each set form a 25 separate column in the support 1300. Adjoining columns h are shown separated by glide planes 1320A, 1320B, and 1320C. It is apparent that any column can be laterally ; displaced in the axial plane of the support without in any ; way affecting the remaining columns or their function.
30 For certain applications, such as linear scanning, the ; columnar arrangement of the microcells in support 1300 is ` particularly advantageous. Although the microcell pattern of support 1300 is less symmetrical than that of support llO0, it otherwise offers all the capabilities of the 35 support 1100.
Each of the supports 1100, 1200, and 1300 contain microareas within each microcell, shown as shadowed areas, which cannot be uniquely addressed. These areas are ' ~

;
: -! 1 7~A~g7-32 shadowed when the remaining bottom wall areas of each set of microareas i5 addressed with radiation at an acute angle with respect to the axial plane of the support~ ID
some applications the shadowed areas can be left free o any composition. That is, one or two compositions can be introduced into a microcell in only the uniquely exposed microareas thereof without taking any further steps to introduce an additional composition in the remaining microareas. If the compositions introduced in uniquely addressed microareas are not capable of lateral spreading, the shadowed bottom wall portions remaining will have no composition associated therewith. Where compositions capable of lateral spreading are introduced into the uni~uely addressed microareas, they can spread over the entire bottom wall of each microcell in which they are contained. For example, if a mobile cyan, magenta, or yellow dye is positioned in one uniquely addressed micro-area of a microcell and a diEferent mobile subtractive ' primary dye is placed in the remaining uniquely addressed microarea in the same microcell, one of three different additive primary colors, depending on the combination of subtractive primaries chosen, can be produced as the mobile dyes wander over the entire bottom wall of the microcellO
Where compositions are introduced into the uniquely addressed microareas of the supports 1100, 1200, or 1300 and it is desired to place a composition also in the shadowed areas remaining, this can be undertaken using techniques similar to those described above. For example, if the bottom walls of the support are transparent and colorants are placed in the uniquely addressed areas, it may be undesirable to have transparent microareas as well v as colored microareas. It is possible to selectively position an additional, high density or opaque composition in all of the shadowed microareas remaining to eliminate transparent microareas in the support. Since the lateral walls are capable of interrupting radiation, radiation cannot penetrate these areas of the support. Where a . ~)( .

~ 172~97 technique is employed for positioning the additional composition that requires the initially shadowed micro-areas to be exposed to radiation, the support can be exposed in a direction substantially perpendicular to its ~
axial plane and the exclusion properties of the materials employed can be relied upon to selectively position the additional composition in the initially shadowed micro-areas. Where a technique is employed for positioning the additional composition in initially shadowed areas that allows a material to be selectively positioned in un-exposed areas, the additional composition can be selec-tively positioned without relying upon any exclusion capability by any composition previously positioned and without exposing the initially shadowed areas to radiation.
In various embodiments described above it is suggested to expose the support substantially perpendi-cularly to its axial plane where shadowing is not de-sired. In some instances this can be disadvantageous, : since the radiation source is fixed at a particular acute angle for shadowing exposures and it may be inconvenient to provide a second radiation source or relocate the radiation source used for shadowing. An alternative is .;.
possible when the lateral walls are capable of interrupt-ing radiation, but are not entirely opaque. For example, if transparent lateral walls are dyed to the extent ; necessary to provide shadowing, they may still be pen-etrable by radiation of increased intensity. In such instances it is contemplated to first give the support a uniform exposure at an acute angle, choosing a level of , 30 radiation intensity ~hich permits the lateral walls to interrupt the radiation and provide shadowing as re-quired. Thereafter, when exposure of the shadowed areas is required, the same radiation source at the same acute angle can be increased in intensity and used to reexpose the support. This time sufficient radiation penetrates the lateral walls to allow exposure of the initially shadowed areas. Instead of altering the intensity of radiation between exposures, a change in the wavelengtb or :

! 1 7 2 4 9 even type of radiation can be relied upon to allow shadow-ing in one ins~ance, but not another. Transparent lateral walls containing an ultraviolet absorber can interrupt ultraviolet radiation while permitting penetration of visible light. Similarly lateral walls which are dyed to appear visibly opaque may nevertheless absorb little i ultraviolet radiation.
~`~ In the preferred embodiments of the invention, ~; described in connection with supports 800, 900, 1000, 1100, 1200, and 1300, one set of microareas can be entirely separated from all other sets of microareas by lateral walls. However, because of shadowing by the .
lateral walls, the entire bottom wall surface between these boundary forming lateral walls cannot be en~irely exposed at one time. In some geometrical forms of the support, such as support 1000, the entire bottom wall surface between boundary forming lateral walls (e.g., the entire bottom wall of a microcell) can be addressed ~y a combination of two exposures if the support is rotated 180~ or the second radiation source is changed in direc-tion. In some instances, however, this still leaves bottom wall surfaces sbadowed that are not intended ~o be differen~iated from exposed microareas within the same lateral wall boundary. F`or example, the shadowed areas shown in the supports 1100, 1200, and 1300 can represent a significant inconvenience and limitation where it is desired to locate three compositions, each in a different set of microcells, so that each composition entirely covers the bottom walls of its microcell set.
In those instances where it is desired for an entire bottom wall surface bounded by lateral walls, such as the enti~e bottom wall surface of a microcell, to form a single microarea, but exposure at an acute angle casts a shadow over at least a portion of the microarea, it is specifically contemplated to modify the support to either spread the radiation itself or to spread whatever modify-ing effect the radiation produces over the entire m~cro-area. The specific approach for accomplishing this objec-, ~
., ~'72~97 tive can be varied, depending upon the specific applica-tion the support is intended to serve.
In ano~her form, a removable cover, preferably bearing a semitransparent reflective coating, can be laid over the first major surface o the support to aid in reflecting, if desired. Exposure must, of course, occur through the cover. The lateral walls can be relied upon ; to prevent radiation from scatteriog beyond the intended boundary of the microarea.
Where the support or at least the bottom wall : portion of the support is a photoconductor, as described by Blazey et al, cited above, a conductive layer which is at least partially transparent can be placed selectively on the bottom wall surfaces. Without the conductive layer present only ~he bottom wall portions actually exposed to radiation are increased in conductivity, but with the conductive layer presen~, if any portion o a `~ lateral wall bounded bottom wall is struck by radiation to which the photoconductor is responsive, the effect in ~0 terms of static charge retention is as though the entire bottom wall had been radiation struck.
Another approach applicable to supports generally (i.e., no~ limited to reflective or photoconductive supports, but also fully applicable to transparent and insulative or conductive supports) is to locate a flùor on the bottom wall surfaces. Exposure in one microarea stim-ulates emission of radiation by the fluor and causes the entire bottom wall portion in the bounded area to be exposed to either direct or stimulated radiation. Again, the lateral walls can be relied upon to prevent radiation scattering beyond the intended boundary of the microarea.
In a very simple form of the invention the bottom walls of the supports can themselves be relied upon to distribute radiation over a bottom wall surface. It is generally recogni~ed that even a polished transparent support will r~flect some radiation. For applications requiring very little radiation, the inherent light scattering property of unmodified bottom walls can be D<
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~ 1 72~7 ;; -36-sufficient to dis~ribute a useful amount of radiation over the entire bot~om wall surface. Scat~ering of radiation by the bottom walls can be significantly increased by roughening the bottom walls of the support.
d 5 The suppor~s of this invention can be applied to any application requ~ring two or more compositions to be laterally related in a highly lnterdigi~a~ed manner. The supports are generally useful for the same purposes as those of Whitmore and Blazey et al, clted above, and, except for the unique features specifically described J' above 3 can be formed in the same manner uæing the same or similar materlals. For purposes of disclosing specif~c ~ preferred embodiments of an exemplary nature, the ;r' invention is hereinafter described in terms of employing ; 15 the supports described above to form el~ments useful in multicolor photography.
A specific preferred photogrRphic ~pplication of the invention can be illustrated by reference ~o Figure 14A, wherein a multicolor image transfer photographic element 1400 is shown. The photographic element ~s shown employs support 1100 as it would appear if sectioned ~long the ma~or axis of microcells forming each of the ~hree sets--i.e., along section line 14A-14A as shown in Figure 14B. The la~eral walls 1108 of the support are capable of interrupting radiation, but the underlying portion 1110 which connects the lateral walls is substantially trans-parent. The first set of microcells R contain red colorant and a cyan dye precursor. The second set of microcells G similarly contain green colorant and a magenta dye precursor. The third set of micxocells B
contain blue colorant and a yellow dye precursor. The dye precursors can each be shifted between a mobile and an - immobile form either in their dye or dye precursor forms.
A panchromatically sensitized silver halide emulsion layer :~ 35 1402 overlies the first ma~or surface 1102 of the 8Up-port. The support 1100, the contents of the mierocells, and the s~lver halide emulslon layer together form an image generating portion of the photographic element.
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;` '~' An image-receiving portion of the photographic element is comprised of a transparent support (or cover sheet) 1450 on which is coated a conventional dye immobi-lizing layer 1452. A reflection and spacing layer 1454, which is preferably white, is coated over the immobilizing layer. A silver reception layer 1456, which contains a silver precipitating agent, overlies the reflection and spacing layer.
In a preferred, integral construction of tbe photographic element the image-generating and image-receiving portions are joined along their edges and lie in ~ace-to-face relationship. After imagewise exposure a processing solution is released from a rupturable pod, not shown, integrally joined to the image-generating and receiving portions along one edge thereof. A space 1458 is indicated be~ween the image-generating and receiving portions to indicate the location of the processing solution when present after exposure. The processing solution contains a silver halide solvent. A silver halide developing agent is contained in either the processing solution or in a position contacted by the processing solution upon its release from the rupturable pod. The developing agent or agents can be incorporated in the silver halide emulsion.
The photographic element 1400 is preferably a positive-working image transfer system and is described by reference to such a system. In such a system the silver halide emulsions are preferably negative-working and the dye precursors is positive-working, although a direct-positive emulsion and negative-working dye precursors also produce a positive-working image transfer system.
The photograpbic element 1400 is imagewise exposed through the transparent underlying portion of support 1100. The red, green, and blue colorants act as filters allowing the silver halide emulsion layer to be exposed selectively to red, green, and blue light in microareas corresponding to the like colored filters~

` -38-Upon release of processing solution between ~he image-forming and receiving portions of the element, development of the exposed silver halide is initiated.
SilYer halide development results in one exemplary form in a selective immobilization of ~he initially mobile dye precursor present in the adjacent microcells. In a pre-ferred form the dye precursor is both i~mobilized and converted to a subtractive primary dye of a hue comple-mentary to the filter. The residual mobile imaging dye precursor, either in the form of a dye or a precursor, migrates through the silver recep~ion layer 1456 and the reflection and spacing layer 1454 to the dye immobilizing layer 1452. In passing tbrough the silver reception and spacing layers the mobile subtractive primary dyes or ` 15 precursors are free to and do spread laterally. Referring to Figure 14B, it can be seen that each microcell contain ing a selected subtractive primary dye precursor is sub-stantially surrounded by microcells containing precursors of the remaining two subtractive primary dyes. It can ~- 20 thus be seen that lateral spreading results in overlapping transferred dye areas in the dye im~obilizing layer of tbe receiver when mobile dye or precursor is bei~g ~ransferred from adjacent microcells. Where three subtractive primary dyes overlap in the receiver, black image areas are formed, and where no dye is present, white areas are viewed due to the reflection from the spacing layel.
Where two of the subtractive primary dyes overlap at the receiver an additive primary image area is produced.
Thus, it can be seen that a positive multicolor dye image can be formed which can be viewed through the transparent support 1450. The positive multicolor transferred dye image so viewed is right reading.
In the multicolor photographic element 1400 the risk of undesirable interimage effects attributable to , 35 wandering oxidized developing agent is substantially ' reduced, as compared to conventional multicolor photo-; grapbic elements having superimposed color-for~ing layer units since the lateral walls of the support element .. ' D~

. . .

: ~ ~ 72497 prevent direct lateral migration between adjacent micro-cells. Nevertheless, the oxidized developing agent in some systems can be mobile and can migrate with the mobiLe dye or dye precursor toward the receiver and migrate back ~` 5 to an adjacent microcell. To minimize unwanted dye or dye precursor îmmobilization prior to its transfer to the immobili~ing layer of the receiver it is preferred to incorporate in the silver reception layer 1456 a conven-tional oxidized developing agent scavenger.
Since the processing solution contains silver halide solvent, the residual silver halide not developed in the microcells is solubilized and allowed to diffuse to the adjacent silver reception layer. The dissolved silver is physically developed in the silver reception layer.
Solubilization and transfer of the silver halide from the microcells operates to limit direct or chemical develop-ment of silver halide occurring therein. It is well recognized by those skilled in the art that extended contact between silver halide and a developing agent under development conditions (e.g., at an alkaline pH) ca~o result in an increase in fog levels. By solubilizing and transferring ~he silver halide a mechanism is provided for terminating silver halide development in the microcells.
In this way production of oxidized developiog agent is terminated ~nd immobilization of dye in the microcells is also terminated. Thus, a very simple mechanism is proW
vided for terminating silver halide development and dye immobilization.
In addi~ion to obtaining a viewable transferred multicolor positive dye image a useful negative multicolor dye image is obtained. In microcells where silver lalide development has occurred, an immobilized subtractive primary dye is present. This immobilized imaging dye together with the additive primary filter offers a sub-stantial absorption throughout the visible spectrum,thereby providing a high neutral density to these micro-cells. For example, where an immobilized cyan dye is formed in a microcell also containing a red filter, it is ~ 1 7~7 apparent that the cyan dye absorbs red light while the red filter absorbs in the blue and the green regions of the spectrum. The developed silver present in the microcell also increases the neutral density. In microcells in which silver halide development has not occurred, the mobile dye precursor, either before or after conversion to a dye, has migrated to the receiver. The sole color presenL then is that provided by the filter. It is a distinct advantage in reducing minimum density to employ the silver reception layer 1455 to terminate silver balide development as described above rather than to rely on other development termination alternatives, If the image-generating portion of the photographic element 1400 is separated from the image-receiving portion, it is apparent that the image-generating portion forms in itself an additive primary multicolor negative of the exposure image. The additive primary negative image can be used for either transmission or reflection printing to form right-reading multicolor positive images, such as enlarge-ments, prints, and transparencies, by conventional photo-graphic techniques.
The foregoing description of photographic element 1400 illustrates the use of initially mobile subtractive primary dye precursors in addition to additive primary filter materials in interlaid sets of microcells. In alternative multicolor image transfer photographic ele-ments the microcells can contain the silver halide preci-pitating agent. The subtractive primary dye precursors can either be initially mobile or immobile. Further, either mobile or immobile subtractive primary dyes capable of undergoing imagewise alterations in mobility can be substituted for the dye precursors. In this instance it is preferred to locate both silver halide and the subtrac-tive primary dyes io the microcells so that exposing radiation strikes the silver halide before the dye, thereby avoiding competing absorption and any resulting decrease in speed. In still another variant form pre-formed image dyes can be shifted in hue so that they do G~

7~97 not compete with silver halide in absorbing light to which silver halide is lntended to respond. The dyes can shift back to their desired image hue upon contact with process-ing solution. If no additive multicolor retained image i~
desired, the additive primary filter materials can be omitted from the microcells in those ins~ances where the sllver halide ls present ln each set of microcells and in each set of microcells is responsive to only one of the blue, green, and red portions of the spectrum. A variety of techniques are known in the art for avoiding response by green and red sensi~ized silver halide emulslons to blue light, such as the use of silver chlorides and - chlorobromides and the use of yellow filter materials.
These techniques are described in more det~il by Whitmore, cited above. When silver halide is located in t:he microcells, the oxidized developing agent scavenger is preferably coated over the microcells or can be located in the microcells above the silver halide. I~ no l:ransferred multicolor dye image is desired, the layer 1456 can be 2~ substituted for the layer 1452 so that a transferred silver image can be viewed and all subtractive primary dyes or dye precursors can be omitted. Of course, if no ~ransferred dye or silver image is desired, the entire image receiving portion of the photographic element as well as the subtractive primary dye or dye precursor can be omitted. Alternatively3 if no transferred image of any type is desired, the entire image recelving portion of the photographic element 1400 can be omitted.
It is therefore apparent that a wide variety of different materials can be employed to form interlaid sets of mlcrocells useful in even a specific application, such as multicolor photography. While the photographic element 1400 employs support 110, any of the supports described above can be substituted without altering the overall performance of the photographic element, although some supports offer more advantages than othere, as has already been discussed. Specific illustrations of preferred ' ~ ~...
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72~97 -4z -multicolor image transfer systems are discussed by Whitmore, Gilmour, and Blazey et al, cited sbove.
If no transferred dye image is desired and the subtractive primary dyes or dye precursors ~re om~tted from the photographic element 1400, i~ is apparent that only immobile primary colorants need remaln in the micro-i cells. However 9 as has been noted above in connec~ion with previously described supports, the lateral walls can be dyed to provide one additive primary filter. It is therefore apparent that where the microcells contain onlyadditive primary colorants, such as red, green, and blue, the function of one set of microcells can be performed merely by dyeing the lateral walls to prov~de the corres-ponding addltive primary color. Thus, one set of micro-cells can be omitted from the support 1100 witholut afect-ing it~ performance. Since the microcell sets of support 1100 are identical, except for the additive primary contained therein, it is immaterial which set i8 omitted.
It is apparent that for a similar application any set of 20 microcells can be omitted from the supports 900, 1000~ or 1300. Similarly in support 1200, either a diAmond-shaped set of microcells can be removed or the microgrooves ; and/or microcells formed by lateral displacement along the glide planes can be removed. In support 1000 a distinct advantage is realized in some applications requiring ~` unique exposures of the microcells, since the square microcells which cannot be uniquely expoæed can be omitted, leaving only two rectangul~r sets of microcells~
both of which can be uniquely addressed.
In one specific, illustrative form the photo-graphic element 1400 can contain (1) ~n a first set of microcellæ a blue filter dye or pigment and an initially colorless, mobile yellow dye-forming coupler, (2) in a second, interlaid set of microcells a green filter dye or pigment and an initially colorless, mobile magenta dye-forming coupler and (3) in a third, interlaid set of microcells a red filter dye or pigment and an initially J~

, ! 1 7 2 4 9 7 -~3 colorless, mobile cyan dyeDforming coupler. A panchro-matically sensitized negative-working silver halide emul-sion layer 1402 is coated over the microcells~ The layer 1456 con~ains a silver precipitating agent and an oxidized developing agent scavenger. The reflection and spacing layer 1454 can be a conventional ~itanium oxlde pigment containing layer. The dye immobilizing layer 1452 con-tains an oxidizing agent.
The photographic element 1400 so constituted is first exposed imagewise through the transparent underlying portion of support 1100. Thereafter a processing composi-tion containing a color developing agent and a silver halide solvent is released and uniformly spread in the space 1458. In exposed areas silver halide is developed producing oxidized color developing agent which couples with the dye forming coupler present to form an immobile dye~ The filter dye or pigment, the î~mobile dye formed, and the developed silver thus together increase the optical density of the microcells which are exposed.
In areas not exposed, the undeveloped silver halide is solubilized by the silver halide solvent and migrates to the layer 1456 where i~ is reduced to silver.
Any ~xidized developing agent produced in reducing the silver halide to silver immediately cross-oxidizes with the oxidized developing agent scavenger which is present with the silver precipitating agent in the layer 1456.
At the same time mobile coupler is wandering from microcells which were not exposed. The mobile coupler does not react with oxidized color developing agent in the layer 1456, since any oxidized color developing agent present preferent~ally reacts with the oxidized developing agent scavenger. The coupler thus migrates through layer 1456 unaffected and enters reflection and spreading layer 1454. Because of the thickness of this layer, the mobile coupler is free to wander laterally to some extent. Upon , 35 reaching the immobilizing layer 1452, the coupler reacts with oxidized color developing agent. The oxidized color developing agent is produced uniformly in this layer by .. D( r' :
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~ 72~97 interaction of oxidizing agent with the color develvping agent. Due to lateral diffusion in the spreading layer, superimposed immobile yellow, magenta and cyan dye images are formed in the immobiliæing layer and can be viewed as a multicolor image through the transparent support ~or cover sheet~ 1450 with the layer 1454 providing a white - reflective background. At the SamQ time, since only filter dye or pigment remains in the unexposed microcells, a useable additive primary negative transparency is formed by the support 1100.
To illustrate a variant system, a photographic element as described immediately above can be modified by subs~ituting for the initially colorless, mobile dye forming couplers initially mobile dye developers. Tbe dye developers are shifted in hue, so that the dye developer present in the microcells containing red, green, and blue fllters do not initially adsorb light in the red~ green, and blue regions of the spectrum, respectively. A dye mordant as well as an oxidant can be present in the dye immobilizing layer 1452. Since the dye image forming material is itself a silver halide developing agent, a conventional activator solution can be employed (prefer-ably con~aining an electron transfer agent). The remain-ing features can be identical to those described in the preceding embodiment.
Upon imagewise exposure and release of the activator solution, dye developer reacts with exposed silver halide to form an immobile subtractive primary dye which is a complement of the additive primary filter material in the exposed microcell. Thus the optical density of exposed microcells is increased, and a negative multicolor additive primary image can be formed in the support 1100 by the filter materials. Silver halide - development is terminated by transfer of solubilized silver halide as has already been described. In unexposed areas unoxidized dye developer migrates to the immobiliz-ing layer 145? where it is oxidized and mordanted to form a multicolor positive image. During processing the dye D( . .

! 1 7 2 A 9 7 developers shift in hue so that they form subtractive primaries complementary in hue to ~he additive primary filter materials with which they are initially associated in the microcells. That is, the red, green and blue - 5 filter material containing microcells contain dye devel-opers which ultimately form cyan, magenta and yellow image dyes. Hue shifts can be brought about by the higher pH of processing, mordanting, or by associatillg the image dye in the receiver with a chelating material.
Instead of using shifted dye developers as des--~ cribed above, initially mobile leuco dyes can be employed in combination with electron transfer agents to produce essentially similar results. Since the leuco dyes are initially colorless, hue shifting does not have to be 15 undertaken to avoid competing light absorption durinK
imagewise exposure.
Instead of employing initially mobile dyes or dye precursors as described above, it is possible to employ initially immobile mate~ials. In one specific preferred 20 form benzisoxazolone precursors of hydroxylamine dye releasing compounds are employed. Upon cross-oxidation in ; the microcells with oxidized electron transfer agent produced by development of exposed silver halide, release of mobile dye is prevented. In areas in which silver 25 halide is not exposed and no oxidized electron transfer agent is produced mobile dye release occurs. The dye image providing compounds are preferably initially shifted ; in hue to avoid competing absorption during imagewise exposure. Mordant immobilizes the dyes in the layer 30 1452. No oxidant is required in this layer in this embodiment. Except as indicated, this element and its function is similar to the illustrative embodiments described above.
Each of the illustrative embodiments described 35 above employ positive-working dye image providing com-v pounds. To illustrate a specific embodiment employing ; negative-working dye image providing compounds, a first set of microcells 1408 can contain a blue filter dye or ~ ' ' . `
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2 4 9 ~
pigment, 8 silver ion complex precipitating agent, and a redox dye-releaser containing a yellow dye which is shifted in hue to avoid adsorption prior to processing in the blue region of the spectrum. In like manner a second, interlaid se~ of microcells contain a green filter dye or 5 pigment, t~e silver precipitating agent and a redox dye-releaser containing analogously shifted magenta dye, and a third, interlaid set of microcells containing a red filter dye or pigment, the silver precipitating agentl and a redox dye-releaser containing an analogously shifted 10 cyan dye. Tbe microcells are overcoated with nega-tive-working panchromatically sensitized silver halide emulsion layer also containing an oxidized developing agent scavengerO The silver precipitating layer 1456 shown in Figure 14 is not present. The reflection and 15 spreading layer is a white titanium oxide pigment layer, T~e dye immobilizing layer 1452 contains a mordant.
The photographic element is imagewise exposed through t~e transparent support 1100. A processing solu-tion containing an electron transfer agent and a silver ~0 balide solvent is spread between the image generating and the image receiving portions of the element. In a pre-ferred form the pH of the processing solution causes the redox dye-releasers to shift to their desired image-form-~ i[.g hues. In areas io wbich silver halide is exposed ; 25 oxidized electron transfer agent produced by development ` o~ exposed silver halide immediately cross-oxidizes with F the oxidized developing agent scavenger. Thus, in micro-cells corresponding to exposed silver halide the redox dye-releasers remain unaltered io their initially 30 immobile, shifted form. In areas in which silver halide is not exposed, silver halide solvent present in the processing solution solubilizes silver halide allo~ing it to form soluble silver ion complex (e.g., AgSo3~) capable of wandering into the underlying microcells. In 35 the microcells physical development o~ solubilized silver halide occurs producing silver and oxidized electron transfer agent. The oxidized electron transfer agent ~' interacts with the redox dye-releaser to release mobile ~ ~'72'19~

dye which is transf~rred to the layer 1452, shifted in hue, and immobilized by the mordantO A multicolor posi-tive transferred image is producPd in the layer 1452 eomprised of yellow, magenta, and cyan ~ransferred dyes~
A mul~icolor positive retai~ed image is also produced, --since (1) the silver den~ity produced by chemical develop-ment in ~he emulsion layer is small compared to the silver density produced by physical development in the microcells and (2) with the image generating portioo separated from the image receiving portion the redox dye-releaser~
remaining in their initial, immobile condition in the microcells can ~e uniformly reacted with an oxidizing agent to release mobile dye which can be removed from the microcells by washing.
To illustrate a simple teohnique for providing `~ 15 two or three sets of microareas each having a different colorant associated therewith, any one of the supports ; described above ~hich provide two or more microareas that can be uniquely addressed can be initially coated first ` with a colorant immobilizing material, such as a mordant `~ 20 or oxidant, so that a thin layer that can be shadowed by the lateral walls is formed over the entire bottom wall of the support. Next the immobilizing layer is overcoated with a positve-working photoresist--that is, a photoresist which is selectively removable on development in exposed 25 areas. Again, the photoresis~ is coated in a thin layer so that the lateral walls rise above t~e upper surface of ; the photoresist layer and are therefore capable of shadow-ing this layer. The photoresist layer is then selectively exposed to radiation to wh;ch it is responsive in a first v 30 set of microareas by shadowing techniques described above. Upon development the photoresist is selectively removed from the support in just these areas. By bringing the support into contact with a dye containing ~olution, dye can be i~bibed into the immobilizing layer selectively 35 in only tbose areas initlally exposed. This selectively places immobilized dye in the first set of microareas. By repeating the procedure using shadowing techni~ues already ! ~ 7 2 49 7 described above two, three, or more interlaid displaced sets of ~niquely addressed microareas can be produced capable of acting as filters in additive multicolor photo-graphic applications. Either additive primary (i.e., red, green, and blue) dyes or combinations of subtractive primary (i.e., cyan, magenta, and yellow~ dyes which give an additive primary color can be employed to form the filter colorants. Before each repetition it is preferred to uniformly expose all bottom wall areas of the support and to remove photoresist entirely by development. This avoids build up of overlaid photoresist layers.
By substituting a negative-working photoresist for the positive-working photoresist, dye can be selec-tively introduced into shadowed microareas instead of exposed microareas. This is fully satisfactory where two ; colorants are being positioned, but this procedure is oot generally applicable to the supports described where three sets of colorants are being positioned in three separate sets of microareas.
An alterative approach for employing negative-working photoresists is to coat a mobile colorant initially on the support in place of the immobilizing lavel described above aod tben to overcoat the negative-w~king photoresist layer in place of the positive-working photoresist layer described above. The negative-working photoresist upo~ exposure in a first ~et of microareas is rende~ed immobile on development, 50 that subsequent development removes photoresist in unexposed areas.
Mobile colorant is removed on development in only those areas where the photoresist is also removed, leaving colorant in a first set of microareas initially exposed.
By repeating the procedure described above using previ-ously described exposure techniques, two, three, or more sets of colorants can be positioned in interlaid sets o~
microareas. The procedure is generally applicable to the supports descrîbed which pr~ide t~o or more sets of microareas that can be uniquely addressed. Photoresists are preferably employed as described above to form micro-~ 1~2497-49 areas that are substantially coextensive with microcells ; or microgrooves.
Instead of using photoresists to form multicolor filter elements useful in additive multicolor photography, S other radiation-sensitive materials can be employed which are capable of producing additive primary filter micro-areas as a function of selective exposure and shadowing.
To illustrate a simple approach, ~he suppor~s 1100, 1200, or 1300 can be coated with vacuum vapor deposited silver halide on the bot~om and la~eral walls of the microcells.
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~- The advantage of using vacuum vapor deposited silver halide is that a layer of radiation-sensitive materal can ` be substantially uniformly deposited on the walls of the microcells which is quite thin in comparison to the lateral walls of the microcells. If desired, a silver halide emulsion layer which is sufficiently thin in relation to the lateral walls to permit shadowing can be substituted for vacuum vapor deposited silver halide.
In use, a first shadowing exposure renders the silver halide developable on the exposed lateral walls and in the bottom walls of the one set of microcells exposed.
Development with a color developer containing a mobile dye fvrmer, such as one or more dye-forming couplers, produces ;. ~ colorant selectively on the bottom walls of the first set of microcells and on the exposed lateral walls.
Colorant produced on the lateral walls can be useful in - enhancing tbeir radiation interrupting capability during subsequent exposuresO A dye-forming coupler can be chosen that produces an additive primary dye on reaction with oxidized color developing agent, or two dye-forming couplers can be employed each of which produce a different ~ubt~ctive primary dye on reaction with oxidized color developing agent, so that tbeir combined effect i8 to produce an additive primary filter colorant. By going through the shadowing exposure procedure already described above using different dye-forming ~ouplers, two, three, or more sets of laterally displaced ~ilter segments can be produced~ Bleaching aod/or fixing can be employed to reduce neutr~l densities attributable to eilver.
It is important to ~ate that in exposing a ~irst set of microareas containing silver halide and processing as described all of the silver halide in these microareas can be developed. Thus, in subsequent processing it ie immaterial whether these microareas are again addressed by radiation. For example, in exposing a second time both the first and second set of microareas can be addressed, but a second development produces dye in only the second set of microareas where the silver halide iD the first ~et of microareas has already been exhausted in the first development step. Thus, the use of silver halide lends itself to forming microareas of differing colors where the configuration of the support does not lend itself to uniquely addressing each microarea. This capability of excluding a second or subsequent material based on deple~
tion of an active component in a microarea is hereinafter referred to as an exhaustion e~fect.
In one form of the invention it is preferred to form multicolor filter elements 80 that filter calorant overlies the entire bottom wall of each microgroove or microcell. In some support forms, such as support 1000, this ~n be achieved without the provision of additional steps or materials. In other configurations some bottom wall areas receive no exposure and no colorant, unless this result is specifically sough~. For example, in the embodiment shown in Figures 14A and 14B bottom wall areas which cannot ~e l~iquely addressed are not differentiated from the bottom wall areas which can be uniquely ad-dressed, although the techniques described above for forming three color filters with photoresists and silver halide require some further elaboration to achieve this result. By employing scattering and/or fluorescence, as described above, in combination with shadowing exposure, the entire bottom wall area of each microgroove or micro-cell is exposed so that filter colorant is uniformly distributed over the bottom wall.

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! 17249 7 ` : - 51 -In some applications bottom ~all areas which are not uniquely addressed can remain transparent. W~ere the filter colorant is not distributed over ~he entire bottom wall area of each microgroove or microcell, it is gen-erally preferred that tbe microareas which cannot be ` uniquely addressed be rendered substantially opaque.
Using silver halide as described above, opacifi-cation can be accomplished in an illustrative form by exposing the support perpendicularly to its axial plane after the desired colorants have been formed in t~e micro-grooves or microcells of each set. In a final color development step a mixture of three different subtractive primary or two different additive primary dye-forming couplers can be employed to produce a substan~ially blacX
` 15 colorant in the microareas not uniquely addressed. Silver produced in the final development step can also increase neutral density in t~ese areas. It i6 therefore preferred '- to bleach silver from uniquely exposed areas providing additive primary filter microareas before the final development step and to avoid bleaching after the final development step.
Using a positive working pbotoresist layer over-lying a dye immobilizing layer as described above, opaci-~` fication can be accomplished by giving the support a non-shadowing (perpendicular to the axial plane) exposure after the uniquely addressed colorant containing filter microareas are formed. Development removes any remaining positive photoresist. The positive-working photoresist is replaced by a negative-working photoresist layer. Prior shadowing exposures are repeated, but without the intro-duction of any colorants. Development leaves negative-working photoresist overlying and protecting only the microareas uniquely addressed, the microareas not uniquely addressed being open. One or a combination of dyes can then be imbibed into the immobili2ing layer in the micro-areas not uniquely addressed, thereby opacifying the bottom walls of the support in microareas not occupied by the filters.
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~ 1 72~7 A preferred technique for positioning compos~-tions as a function of exposure useful with every support configura~ion and shadowing exposure sequence heretofore described employs a support at least the bottom walls of which are photoconductive. ThiB technlque can employ ~ny of the supports disclosed by Blazey et al, cited sbove, and is described herein by reference ~o an illus~r~tive embodiment in which support 600 is provided with red, green, and blue colorants in microareas 1, 2, and 3 of each mlcrocell 602, as shown in Figure 6B. Additional features of the support and the procedure for posltioning colorants can be better appreciated by reference to Figures lSA through 15D. A regular hexagonal array of microcells 602 are formed in a photoconductive portion 604 of the support 600 and open toward a first ma~or surface 606. Adjacent microcells are separated by later~l walls 608 which are dyed to increase their abil~ty to interrupt radiation. A substantially transparent underlying portion 610 connects the lateral walls and forms bottom walls 616 of the microcells.
In addition to the photoconductive portion, ~he support is formed by a thin, transparent conductive layer 612 and a transp~rent film base 614. Along at lea~t one - lateral edge of the support, not shown, the film base and ~he conductive layer can extend later~lly beyond the photoconductive portion to facilitate attachment of an external conductor to the support. A charge control ba rier layer, not shown, can be interposed between the conductive layer and the photoconductive portion. Depend-ing on the choice o~ photoconductive and conductivematerials employed, electrical biasing of one polarity can result in a charge in~ection from the conductive layer into the photoconductive layer rendering lt conductive.
The function of the charge control barrier layer is to lntercept and trap in~ected charge- i.e., electrons or holes. Charge control barrier layers are well known in the art, as illustrated by Dessau~r et al U.S. Patent 2,901,348, Gramza et al U.S. Patent 3,554,742, Humphriss .' ''P~.
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~ 1 72~97 et al U.S. Patent 3,640,708, and Hodge6 German OLS
1,944,0Z5.
Although the support is shown to be comprised of the photocoDductive portion, the conduc~ive layer, and the film base, it ls appreciated that it may b~ formed of only the photoconductive portlon. For lng~ance, once the microcells are filled to the extent desired, ~he conduc-tive layer and/or film base can be stripped from the photoconductive portion, leaving it as a s~parate ele-ment. Alternatively, ~he photoconductlve por~ion can formthe entire support and be brought into contact, as required, with an electrode whlch forms no part of the support.
In Figure 15A the support 600 is shown with ~he photoconduc~ive portion 604 bearing on its outer surface a positive electrostatic charge, applied in a noni~agewise manner to provide a substantially uniform charge dis~ribu-tion. It is to be noted that the posi~ive charge not only covers the bottom walls 616 o the microcells, but also ~; 20 covers the upper edges of the lateral walls 608. As is well understood by ~hose skilled in the ~rt, the electro-static charge can be conveniently applied by passing the support through a corona discharge.
The next step of the process is to remove the electrostatic charge selectively from the bottom walls of th~ microcells in the first set of mlcroareas 1 without disturbing the electrostatic charge in the other bo~tom wall microareas 2 and 3. This is accomplished as shown in Figure 15B by exposing the support at an acute angle with respect to the bottom walls, as indicated by arrows 618.
Radiation is employed for exposure to which the photo-conductive portion is responsive. The rediation strikes only the first set of microareas at the bottom walls, the remaining microareas of the bottom walls being shadowed.
The photoconductive portion of the support is thereby rendered conductive in the exposed first set of micro-areas. By grounding or negatively biasing the conductive '. ~

172~97 ~54-- layer 612, electrostatic charge can be conducted through the photoconduetive portion in the f~rst set of microareas leaviog the first set of microareas substantially un-charged, as shown.
The shadowed exposure s~own in Figure 15B ofers distinct advantages as compared to the exposure procedure disclosed by Blazey et al, cited a~ove. 31azey et al in a preferred form employs a laser to address individual microcells sequentially~ This in~olves careful alignment of the laser beam with t~e microcells. Since the support can be comprised of in the order of 1000 microcells per centimeter measured on the support surface, it is apparent that laser addressing individual microcells can be tedious and time consuming. Further, the laser addressing lS metbod of Blazey et al does not lend itself to addressing only a portion of the bottom wall of each microcell.
Whereas Blazey et al might employ three different sets of masks to expose three interlaid sets of microcells, mask alignments are if anything more critical and tedious than ; 20 laser alignments. The present invention offers the distinct advantage of allowing all of the first set of ; microareas to be addressed in a single exposure. Only a : portion of the bottom walls of the microcells can be ~aressed, thereby adding a capability not shared by Blazey et al. Tedious alignments with individual mic-ro-cells are entirely eliminated. Only the angle of exposure and the direction of alignment of the support, neither of which must be controlled precisely, provide the desired shadow pattern in the microcells.
To introduce a first imaging composition selec-tively into the first set of microcells, a development procedure can be employed as illustrated in Figure 15C. A
direct curreot source 620 i5 connected between a develop-ment electrode 622 and the conductive layer 612 of the support so that the development electrode is positively biased with respect to the oonductive layer 612. An electrograp~ic developer containing a carrier liquid 624 and dispersed positively charged particles 626 of an 3 1 ~2~7 electrographic imaging composition is interposed between the development electrode and ~e support 600 so that it can enter the ~;crocells. The positive ~ias oo the `~ development electrode can be viewed as inducing a negative ; 5 electrostatic charge on the bottom walls of the fir6t set `~ of microareas. (See Schaffert, Electrophoto~raph~, John `; Wiley and Sons, New York, p. 51.) The positively charged dispersed particles of electrographic imaging composition are therefore selectively attracted into the first set of - 10 microareas while being concurrently repelled from the ; remaining ~icroareas 2 and 3, which contain a positive ~` electrostatic charge. In Figure 15D a first set of micro-~- areas of the support 600 are shown covered with a red electrographic imaging compos;tion R~
To complete the preparation of an element con-taining green, red, and blue imaging compositions in first J second, and third interlaid sets of microareas tbe procedure described above can be twice repeated, except that the support is rotated 120 before each of the second and third exposures and a different additive primary electrographic imaging composi~ion is employed in eacb instance. Although it is preferred to associate red, green, and blue compositions with the first, second, and ~hird sets of microareas using the electrographic tech-~; 25 nique described above, it is appreciated that the second and third compositions can be positioned using any of the alternative technigues previously described.
; It is to be appreciated that the description of the process of this invention by reference to Figures 15A
through 15D is merely illustrative of certain preferredembodiments. Numerous variations will readily occur to those skilled in the art of electrophotography, once the invention is appreciated. For example, the polarity of charge on the photoconductive portions, elect~ographic imaging composition particles, and development electrode can be reversed without the exercise of invention. The ; use of a development electrode is not required. Reversal ~ development through field fringing is known to be obtain-7~97 able for small areas, such as line copy. Further, it is possible to choose the polarity of the electrographic imaging composition par~icles 80 that it is opposite that of the electrostatic charge on the photoconductive portion and therefore a~tracted to the remaining charged micro-areas not exposed rather than the microareas which are exposed. In such an alternative, particles are attracted to shadowed ra~her than exposed microareas. Any con-ventional electrographic imaging composition particle size less than the dimensions of the individual microareas can be employed. It is preferred to employ particle sizes of less tban about 25 percent of the size of the microareas.
Although electrographic developers containing liquid carrier vehicles are preferred, since smaller particle si~es compatible with the widths of the microcells are more readily employed, any conventional electrographic development technique, such as the use of aerosols and dry toners, can be emp]oyed. Liquid electrographic developers are particularly preerred which require no separate fusing step to hold the electrographic imaging composition particles in place in the microcells. A separate fusing step can be employed where all of the components o~ the electrograpbic imaging composition are intended to remain p~m~nently in the microcells, as in a simple multicolor filter, such as 200 or 400, but it is preferred to avoid a separate ~using step intended to produce a high degree of fusing where one or more materials are to be removed from the microcells. Conventional biasing voltages are gen-erally suitable for the practice of this process.
It is an advantage that second and subsequel~t electrographic imaging compositions do not enter tbe set or sets o~ microareas which already received an electro-graphic imaging composition. As observed by Blazey et al, this is true even if the first set of microareas is again exposed to radiation, either intentionally or inadver-tently~ in rendering the photoconductive portion conduc-tive in the second and/or third sets of microareas. This ~ 1 ~2497 effect is referred to as the exclusion effect. Hercock et al U.S. Patent 3,748,125 reports exclusion effects for xerographic photoconductive suraces. The exclusion effect observed in the practice of this process does not appear related to any specific choice of electrographic toners or specific compositions applied to planar photo-conductive surfaces. The exclusion effect observed in the practice of this process does not appear related to ~ny specific choice of electrographic imaging compositions~
Without wishing to be bound by any particular ~heory to account for the exclusion effect observedt it may result from photoconductive surface masking by the already deposited imaging compositions, field gradient or fringing effects (influenced to a degree by the nonplanar con-figura~ion of the pho~oconductive surface), or, mostprobably, some combination of these effects.
Th~ exclusion effect is particularly important to the use of photoconductive supports having microareas that cannot be uniquely addressed. For example, three inter-laid sets of nonoverlapping red, green, and blue filtersegments can be formed on the ~upports 100, 200, 300, and 400 by exposing at three angles (each successive angle being larger than the preceding angle) and using the same n~ral procedure described in connection with Figures 15A
through 15D. Only the first exposed microareas are uniquely addressed~ The second ~nd third exposures over-lap previously addressed sets of microareas. However, the exclusion effect prevents any significant deposition of the second and third electrographic imaging compositions in previously exposed and toned microareas. The exclusion effect can be relied upon in placing one or more composi-tions selectively in the microareas 7 through 18 ;n Figure 6A; in placing one or more compositions selectively in the microareas 816B and 816C in Figure 8; in placing one or more composit~ons ~electively in the microareas 916B and 916C in Figure 9; and in pl~cing the third composition in the microcells 1006C in Figure 10. In supports 1100, 1200, and 1300 the exclusion effect can be relied upon to .

2~97 selectively position an electrographic opacifying composi-tion in the shaded microareas tha~ cannot be uniquely addressed. (The exhau~tion effect previously described in connection with the use of silver halide can be applied to the same support configurations as the exclusion effect.) By modifying according to the teachings of this invention supports having microgrooves or microcells that can be uniquely addressed having photoconductive bot~om walls t~at cannot be entirely uniquely addressed, it is possible to position an electrographic imaging composition over the entire bottom wall of each microcell or micro-groove that is uniquely, but partially addressed. This allows a fill pattern as shown in Figure 14B to be achieved, for example, even though support 1100 contains microareas, shown in shadow in Figure 11, that cannot. be uniquely addressed. It is a recognition of this invention ; t~at uniform toning of uniquely but partially addressed microcells or microgrooves in photoconductive supports can be achieved by positioning a thin conductive layer on the ~;~ 20 bottom walls thereof.
If support 1100 as shown in Figure 11 is modified to provide a thin conductive layer overlying the bottom wall of each microcell 1106, the capability of uni~orm toning described above is achieved. It is, of course, important that conductivity Dot extend through or over the lateral walls 1108, although this may be occasionally employed to a limited degree for specialized imaging effects.
After uniform electrostatic charging of the support 1100 similarly as the support ~00 in Figure 15A, exposure in the direction of arrow 1126, as previously described, allows radiation to strike only the bottom wall mîcroareas 1128 of one set of microcells. In Figure 15B
it can be seen that i-l the absence of a conductive bottom ` 35 wall electrostatic charge is dissipated only in the radia-tion struck microareas; however, with a conductive bottom wall present, electrostatic charge i6 drained from the entire bottom wall of each microcell of the exposed set.

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, ~2~97 Hence a second exposure of the exposed set of microcells in the direction of the arrow 1130, as previously des-cribed, is not required and would normally serve no usef-ll purpose, although it is not precluded. Toning as des-cribed in connec~ion with Figure 15C results in a firstcomposition, such as a red filter composition, being deposited uniformly over the entire bottom wall of each microcell of the exposed set. By repeat;ng the above-described procedure twice more, exposing from different directions and using different compositions, an element can be produced as shown in Figure 14B. Although the above description refers specifically to support 1100, essentially the same procedure can be applied to supports 800, 900, 1200, and 1300. The procedure can be applied to lS support 1000 as well, although i~ does not require this technique to ac~ieve uniform toning of each microcell set.
The extent to which different compositions are interdigitated on the supports can `be varied, depending upon the requirements of the contemplated application being served. For photographic applications, it is pre-ferred that each microarea corresponding to one occurrence of an interdigitated composition, hereinafter referred to as composition microareas (as opposed to shadowing micro-areas, which can be smaller), be sufficiently small that it cannot be readily resolved with the unaided ~uman eye.
In this way, for example, interlaid blue, green, and red filter segments are readily fused by the human eye on viewing. For ease of description, the size of composition microareas formed by microgrooves is indicated in terms of the width thereof measured perpendicularly to one lateral wall of the microgroove. The sizes of composition micro-areas formed in microcells correspond to the diameter of a circle of equal area.
Where a photographic image is to be viewed with-out enlargement and minimal visible graininess is desired, composition microareas having sizes within the range of from about 1 to 200 microns, preferably from about 4 to 100 microns, are contemplated for use in the practice of D~
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this invention. To the extent that visible grainine5s can be tolerated for specific photographic applications, the composition microareas can be still larger in size. Where the photographic images produced are intended for enlarge-` 5 ment, composition microarea si7es in the lower portion of the size ranges are preferred. It is accordingly pre-ferred that the composition microareas be about 20 microns or less in size where enlargements are to be made of the images produced. Where ~he composi~ion microareas of the support provide a radiation-sensitive material to perform an imaging function, the lower limit on the size of the microareas is a function of the photographic speed desired. As tbe areal extent of the microareas i6 decreased, the probability of an imaging amount of radia-, 15 tion striking a particular microarea on exposure is reduced. Microarea si~es of at least about 7 microns, preferably at least 8 microns, optimally at least 10 microns, are contemplated where the microareas contain radiation-sensitive materials of camera speed. At sizes below 7 microns, silver halide emulsions in the microareas can be expected to show significant reductions in speed.
In some of the preferred supports described above a single composition microarea corresponds to the entire bottom wall of a microgroove or microcell. In this instance the sizes of the microgrooves and microcells correspond to the stated sizes of the composition mic:ro-areas. In other supports a number of laterally displaced composition microareas can be present in a single micro-cell or microgroove. For these supports the microgrooves and/or microcells can range upward in size by a multiple of the number of composition microareas contained.
The lateral walls can be of any height convenient for shadowing. When the lateral walls form microgrooves or microcells, the height is chosen so that the micro-grooves or microcells can be of any necessary depth tocontain the compositions intended to be placed tberein.
It is generally preferred that the microgrooves or micro-cells be sized so that they are entirely filled, although ,, ~

J 1 7~97 in some forms of t~e invention partial filling i5 contem-plated. ln terms of actual dime~sions, the height of the microcells is choseo a~ a function of t~e compositions to be placed therein. For example, in photographic applica-tions the heIght of the microgrooves or microcells ischosen to permit the composi~ion con~ained therein to provide a desired optical density. The height of the lateral walls can be less than, equal to, or greater than their lateral spacing. For photographic applications the height of the lateral walls is typically chosen to corres-pond to the thickness to which the same compositions are coated on planar supports. It is generally contemplated ` that the height of the lateral walls (and hence the depth of the microcells or microgrooves) will fall within tbe 15 range of from about 1 to 1000 microns. For silver ha:Lide emulsions, dyes, and dye image forming components commonly employed in conjunction with silver halide emulsions, it is generally preferred that the lateral walls be in the range of from 5 to 20 microns in height.
The thickness of the lateral walls can be varied, depending upon the application and the effect intended.
It is generally preferred for the practice of this inven-tion that the thickness of the lateral walls range from ~bout 0.5 to 5 microns, although both greater and les~er thicknesses are contemplated. The bottom walls ~or photo-grapbic applications normally occupy at least 50 percent (preferably at least 80 percent) of the array area. Tbe microcells can occupy as mucb as 99 percent of the support area, but more typically in the practice of this invention occupy no more than 90 percent of the support area. In the preferred support configurations shown the microcells and microgrooves are arranged in closely packed patterns which allow the lateral walls to occupy the least possible area. It is recognized, however, that the microcells and microgrooves ca~ be separated by lateral walls of substan-tial areal extent where this is not objectionable to the end use contemplated. In other words, closely packed patterns are not essential.

In some instances the supports employed in the practice of this invention are identical to those dis-closed by Whitmore, Gilmour, and Blazey et alO These suppor~s can be prepared by any of the techniques dis-closed thereln. Certain preerred supports employed in - the practice of this invention are gimil~r to those previously disclosed, but differ in the configuratlon of the lateral and bottom wall patterns. The prepara~ion techniques of Whitmore, Gilmour, and Blazey et el can be readily modified to prepare ~hese supports. Stlll other supports, such as those re~uiring conductive bottom walls in a photoconductive support portion, require fabrication techniques not previously known to ~he art.
A preferred technique for forming lateral and bottom walls in the supports is to form a plastic deform-; able material as a planar element or as a coating on a relatively nondeformable support element and then to form the lateral and bottom walls in the rela~ively deformable material by embossing. An embossing tool is employed which contains pro~ections corresponding ~o the desiredshape of the bottom walls. The pro~ections can ~e formed on an initially plane surface by conventional techniques, such as coa~ing the qurface with a photoresist, imagewise exposing in a desired pattern and removing the photoresist in the areas corresponding to the spaces be~ween the intended projections (which also correspond to the con-figuration of the lateral walls to be formed in the support). The areas of the embossing tool surface which are not protected by photoreslst are then etched to leave the pro~ectlons. Upon removal of the photoresist overly-ing the pro~ections and any desired cleaning step, such as washing with a mild acid, base or other solvent, the embossing tool is re~dy for use. In a preferred form the embossing tool is formed of a metal, such as copper, and is given a metal coating, such as by vacuum vapor deposit-ing chromium or silver. The metal coating results in smoother walls being formed during embossing.

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In various forms of the supports described above the portion of the support forming the bottom walls is transparent, ~nd the portion of the support forming the lateral walls is either opaque or dyed to interrupt light transmission therethrough. As has been discussed above, one technique for achieving this result is to employ - different support materials to form the bottom and lateral walls of the supports.
A preferred technique for achieving dyed lateral walls and transparent bottom walls in a support formed of a single material is as follows: A transparent film is employed which is initially unembossed and relatively nondeformable with an embossing tool. One or a combina tion of dyes capable of imparting the desired color to th~
lateral walls to be formed is dissolved in a solution capable of softening the transparent film. The solution can be a conventional plasticizing solution for the film.
As the plasticizing solution migrates into the film from one major surface, it carries the dye along with it, 80 that the film is both dyed and softened along one major surface. Thereafter the film can be embossed on its softened and therefore relatively deformable surface.
This produces dyed lateral walls and transparent bottom ~118 in the film support.
` 25 To position a conductive layer on each bottom - wall while avoiding conductively connecting adjacent bottom wall areas, a continuous, thin conductive layer is first formed on a planar surface of an embossable sup-port. Although the conductive layer can be formed by any convenient method, it is preferred to form the conductive layer by vacuum vapor deposition, since this permits uniform layers which are very thin to be easily formed.
Generally preferred conductive vacuum vapor depositions are metals at coverages of from 0.5 to 50 mg/dm2, pre-ferably 1 t~ ~0 m~dm2. The embossing procedure des-cribed above is performed on the surface bearing the conductive layer. This results in breaking the conductive layer into discrete segments corresponding to the bottom ~'7249 wall areas, thereby obvia~ing electrical conduction across the lateral walls between adjacent bot~om walls. The use of conductive layers as described is particularly contem-plated in combination with embossable photoconductive supports. The conductive layer can be formed of any conductive material. Where the conductive layer remains on the support after a photographic image is produced and viewing is through the bottom walls of the support, the conductive layer is preferably of relatively low optical density--e.g., less than about 0.5. On the other hand, if reflection viewing is contemplated and/or the conduct~ve layer is removed before viewing 5 the optical density of the conductive layer need not be limited. Silver conduc-~ive layers are speciflcally preferred, s~nce silver can be removed before ~he photographic element is viewed by well known bleaching techniques.
Although cert~in combinations of materlals offer distinct advantages in the practice of ~hi~ invention, none of the materials employed are in and of themselves new. Once the principles of this invention are understood by those skilled in the ar~ J selection of materi~ls for prac~icing this invention can be readily undertaken from a general knowledge of photographic chem~stry and, particu-larly, from a familiarity with the teachings of Whitmore, Gilmour, and Blazey et al, each cit~d above for ~he purpose of suggesting particularly advantageous materials. Nevertheless, certain preferred materials for use in the practlce of ~his invention are set forth, but are not intended to be limiting.
The supports can be formed of the same types of materials employed in forming conventional photographic supports. Such supports are disclosed, for example, in Research Disclosure, Vol. 176, December 1978, Item 17643, paragraph XVII. Research Disclosure and Product Licensing ;; 35 Index are publications of Industrial Opportunities Ltd., Homewell, Ha~ant Hampshire, P09 lEF, United Kingdom.
Polymeric film ~upports and ;

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' 1 7~497 resin coa~ed reflective supports are particularly ` preferred.
Second support elements, such as 308, which define only lateral walls can be selected from a variety of materials lacking sufficient structural strength to be employed alone as supports. It is specifically contem-plated that the second support elements can be formed using conventional photopolymerizable or photocrosslink-able materials--e.g., photoresis~s. Exemplary conven-tional photoresists are disclosed by Arcesi et al U.S.Paten~s 3,640,722 and 3,748,132, Reynolds et al U.S.
Patents 3,696,072 and 3,748,131, Jenkins et al U.S.
-~ Paten~s 3,699,025 and '026, Borden U.S. Patent 3,737,319, Noonan e~ al U.S. Patent 3,748,133, Wadsworth et al U.S.
Patent 3,779,989, DeBoer U.S. Patent 3,782,938, and Wilson U.S. Patent 4,052,367. Still other useful photopolymeriz-able and photocrosslinkable materials are disclosed by Kosar, ~ t-Sensit_ve Systems: Chemistry and Application ` of Nonsilver Halide Photo~`raPhic Processes, Chapters 4 and 5, John Wiley and Sons, 1965. It is also contemplated that the second support elements can be formed using radiation responsive colloid compositions, such as dichromated colloids--e.g., dichromated gelatin, as illustrated by Chapter 2, Kosar, cited above. The second support elements can also be formed using silver halide emulsions and processing in the presence of transition metal ion complexes, as illustrated by Bissonette U.S.
Patent 3,856,524 and McGuckin U.S. Patent 3,862,855. Once formed, the second support elements are not themselves further responsive to exposing radiation.
It is contemplated that the second support ele-ments can alternatively be formed of materials commonly employed as vebicles and/or binders in radiation-sensitive materials. The advantage of using vehicle or binder materials is their known compatibility with radiation-sen-sitive materials that may be used to fill the microcells.
The binders and/or vehicles can be polymerized or hardened to a somewhat higher degree than when employed in radia-.,,, D~

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72~97-66 -tion-sensitive materials to insure dimensional integrity of the lateral walls which ~hey form. Illustra~ive of specific binder and vehlcle materials are ~hose employed in silver halide emulsions, ~ypically gelatin, gelatin derlvative~, and other hydrophilic colloids. Specific binders and vehicles are disclosPd in Resear~h Disclosure, Vol. 176, December 1978, Item 17643.
Any conventional pho~oconductive material or combination of photoconductive materials can be employed to form the bottom walls of the supports of this inven-tion. Suitable photoconduc~ive mater~al~ are discloæed, for example, in Research Disclosure, Vol. 109, May 1973, Item 10938; Paragraph IV. Photoconductlve materials which in themselves are capable of forming lateral and bottom ` 15 walls can be employed alone, as in the case of polymeric organic photoco~ductors which are plastically de~ormable.
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The photoconductive material is preferably incorporated in a separat~ insulative binder to form a support having a lateral wall array, as disclosed by Wiegl U.S. Patent 3,561,358. Preferred photoconductive supports and support portions can be formed as taught by Contois et al, Research Disclosure, Vol. 108, Apr~l 1979, Item 10823.
Other suppport portions, such as the conductive layers ~nd `~ base portions, can take any conventional form, exemplary ma~erials being disclosed in Research Disclosure, Item 10938, cited above, Paragraphs II Supports and III
Interlayers.
In a specific preferred form at least the photo-conductive portion of each support is fiubstantially ~rans-parent. Where the photoconductive materi~l forms a partof a multicolor reflective photographic print, for instance, even a slight coloration i8 apparent ~o the human eye and therefore ob~ectionable. For such applica-tions, preferred photoconductive materials are those ~! 35 sensitive to the ultraviolet portion of the spectrum, but not sensltized to the visible spectrum, to avoid imparting ',' ~...
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72~97 a visible minimum density. Such photoconductive materials can be exposed by s~adowing ~echniques described above using ultraviolet radiation.
In certain applications, as where radiation-sen-sitive materials are intended to be located on t~e sup-ports, it is not practical to use ultraviole~ radiation to address the photoconductive portion, since many radia-tioo-sensitive imaging materials exhibit a native sensi-tivity in tbe ultraviolet region of the spectrum. For example, silver halide possesses a native sensitivity in the near portion of the ultraviolet spectrum. For intro-ducing each of blue, green, and red-sensitized silver hallde into separate sets of microareas, the photoconduc-tive portion is preferably sensitized ~o the red or a longer wavelength region of the spectrum. Tbe first ~nd second sets of microareas can be addressed with a red light without fogging the blue and green-sensiti~ed silver halides introduced into the first and second sets of microareas. Even if a third exposure is employed, the red-sensitized silver halide introduced into t~e third set of microareas is not fogged, since the red-sensitized silver halide is not introduced until after the third exposure is completed.
Sensitization nf photoconductive materials to a selected portion of the spectrum can be undertaken employ-ing spectral sensitizing dyes well known in the electro-graphic arts, such as those disclosed in Resenrch Dis-closure, Item 10838, cited above, Paragraph IV-C. Any minimum density imparted by spectral sensitization need not be objectionable. For example, if the photographic image to be produced is not intended to be viewed directly, such as a multicolor negative image used for printing a multicolor positive image, coloration due to spectr~l ~ensitization is not objectionable, since color correction can be introduced in printing by procedures well known to those skilled in the art.
The light transmission, absorption, and reflec-tion qualities of the supports can be varied for differeot applications. The supports can be substantially trans-parent or reflective, pre~erably whi~e, as are the majority of conventional photographic supports. In every instance, however, the lateral walls must be capable of interrupting radiation employed for shadowing exposures.
; The la~eral walls of supports that are otherwise trans-parent can in some applications contain dyes or pigments (colorants) to render them substantially light impen-etrable. Levels of dye or pigment incorporation can be chosen to retain the light transmission characteristirs in the thinner regions of the supports --e.g., in the bottom wall region-- while rendering the supports relatively less - light penetrable in thicker region --e.g., in the la~eral ; wall regions. The lateral walls can contain neutral colorant or colorant combinations. Alternatively, the lateral walls can con~ain radiatlon absorbing materia:L6 which are selective to a single region of the electro-magnetic spectrum --e.g., blue dyes. The lateral walls - can contain materials which alter radiation transmission qualities, but are not visible, such as ultraviolet absorbers.
Where the supports are formed of conventional photographic support materials, they can be provlded with ~eflective and absorbing materials by techniques well known by those skilled in the art. In addition, reflec-tive and absorbing materials can be employed of varied types conventionally incorporated directly in radia-tion-sensitive ma~erials, particularly in second supports formed of ve~icle and/or binder materials or using photo-resists or dichromated gelatin. The iDcorporation ofpigments of high reflection index in vehicle materials is illustrated, for example, by Marriage U.K. Patent 504,283 and Yutzy et al U.K. Patent 76~,775. Absorbing materials incorporated in vehicle materials are illust~ated by Jelley et al U.S. Patent 2,697,037; colloidal silve~
(e.g., Carey Lea Silver widely used as a filteT for blue light); super fine silver halide used to improve sharp-ness, as illustrated by U.K. Patent 1,342,687; finely 1 7~97 ` -69-- divided carbon used to improve sharpness or for antihala-tion protecion, as ill~strated by Simmons U.S. Patent 2l327,828; ilter and antihalation dyes, such as the pyrazolone oxonol dyes of Gaspar U.S~ Patent 2, 274, 782, the solubilized diaryl azo dyes of Van Campen U.S. Patent 2~956,879, the solubilized fityryl and butadienyl dyes of Heseltine et al U.S. Patents 3,423,207 and 3,384,4~7, the merocyanine dyes of Silberstein et al U.S. Patent : 2,527,~83, the merocyanine and oxonol dyes of Oliver U.S.
Patents 3,486,897 and 3,552,284 and Oliver et al U.S.
Patent 3,718,472 and the enamino hemioxonol dyes of Brooker et al U.S. Patent 3,976,661 and ultraviolet absorbers, such as the cyanomethyl sulfone-derived mero-cyanines of Oliver U.S. Patent 3,723,154, the thiazoli-dones, benzotriazoles and thiazolothiazoles of Sawdey U.5.Patents 2,739,888, 3,253,921 and 3,250,617 and Sawdey et - al ~.S. Patent 2,739,971, the triazoles of Heller et al U.S. Patent 3,004,896 and the hemioxonols of Wahl et al U.S. Patent 3,125,597 and Weber et al U.S. Patent 4,045,229. The dyes and ultraviolet absorbers can be mordanted, as illustrated by Jones et al U.S. Patent 3,282,699 and Heseltine et al U.S. Patents 3,455,693 and 3,438,779.
In those instances in which an image-bearing photographic element according to this invention is a multicolor negative intended to be used in printing a multicolor positive image or a multicolor positive intended for projection viewing, it is preferred that the lateral walls between adjacent microareas exhibit an elevated optical density and, preferably, the lateral walls should be substantially opaque, but the bottom ~alls forming the microareas should remain substantially trans-parent. Where the microareas are intended to cootain radiation-sensitive material, increasing the absorption of exposing readiation hy the lateral walls can reduce hala-tion and resulting loss of i~age definition. For each of these purposes the lateral walls are preferably of increased optical density, but the bottom walls forming :' ~ ~ 72~97 ; the microareas prefera~ly remain substantially trans-parent. This can be achieved by introducing a dye selec-tively into the lateral walls of the support~ In geoeral any dye which absorbs light over at least a portion of the visible spectrum and which can interrupt radiation employed for shadowing exposures ean be employed. Pre-ferred dyes for projection and printing applications are of neut~al density. For antihalation pwrposes, the ; absorption of the dye at least extends over a spectral region within which the radiation-sensitive material exhibits an absorption peak. For example, dyes ~hich absorb in a~ least the blue portion of the spectrum are useful with radiation-sensitive silver halides. Sudan Black B and Genacryl Orange are exemplary of useful absorbing dyes for incorporation in lateral walls of ot~erwise transparent supports, particularly the p~oto-conductive supports.
Generally any conventional combination of materi-als known to be useful when related in an interlaid pattern can be selected for incorporation in the separate sets of microareas. Virtually any known additive primary dye or pigme~t can, if desired, be selected for use in the multicolor filters described above. Further, the additive primary color can be imparted by blending two subtractive primary dyes or pigments. Additive and subtractive primarY dyes and pigments mentioned in the Color Index, volumes I and II, 2nd Edition, are generally usefu~ in the practice of at least ooe form of the present iovention.
For photographic applications it has been recog-nized that the incorporation of radiation-sensitive and/or image-forming materials in microareas has the effect of limiting lateral image spreading. Lateral image spreading has been o~served in a wide ~ariety of conventional photo-graphic elements. Lateral image spread can be a product of optical phenomena, such as scattering of exposing radiation; diffusion phenomena, such as lateral diffusion of radiation-sensitive andlor imaging materials io the radiation-sensitive and/or imaging layers of the pboto-graphic elements; or, most commonly, a combination of both. Lateral image spreading is particulary common where the radiation-sensitive and/or other imaging materials are dispersed in a vehicle or binder intended to be penetrated by exposing radiation and/or processing fluids. While the present invention can be practiced with conventional radiation-sensitive and inage-forming materials known to be useful in photography, it is appreciated that materials which exhibit visually detect-able lateral image spreading are particularly benefited by incorporation into microareas according to this invention.
A variety of useful nonsilver imaging materials useful in the practice of this invention are disclosed by Kosar, Light-Sensitive Systems: Chemistry and Application of Nonsilver Halide Photographic Processes, John Wiley and Sons, 1965. Generally any imaging system capable of form-ing a multicolor image can be applied to the practice of this invention. It is specidically preferred to employ in the practice of this invention, radiation-sensitive silver halide and the image forming materials associated there-with in multicolor imaging. Exemplary materials are described in Research Disclosure, Vol. 176, December 1978, Item 17643. Particularly pertinent are paragraphs I.
Emulsion types, III. Chemical sensitization, IV. Spectral sensitization, VI. Antifoggants and stabilizers, IX.
Vehicles, and X. Hardeners, which set out conventional features almost always present in preferred silver halide emulsions useful in the practice of this invention.
In the image transfer element 1400 described above, the microcells 1106 form three separate interlaid sets each containing a differing imaging composition.
Each of the imaging compositions contains (1) one or more immobile colorants collectively capable of producing an additive primary color and/or (2) a subtractive primary dye or dye precursor capable of shifting between a mobile and an immobile form as a function of silver halide development, hereinafter collectively referred to as a 7~-colorant portion. The preparation of the photographie element 1400 is descri~ed ~y refer2nce to Figures 15A
through 15D, above, ~sing at leas~ one and preferably three separate electrographic imaging compositions.
Preferred electrographic ;magin8 compositions are comprised of a colorant por~ion, as described above, and from 0.1 to 10 ~preferably 0.3 to 3.0) parts by weight per part of the colorant portion of a resinous portion capable of forming a particulate dispersion wi~h the colorant portion in a liquid carrier vehicle having a dielectric constant of less than 3.0 and a resis~ivi~y of at least 10' ohm-cm. At least one of the colorant and resinous portions is chosen to impart an electrostatic charge of a selected polarity to the particulate dispersion in thle liquid carrier.
It is specifically contemplated to incorporate the radia~ion-sensitive imaging materials in the colorant portion of electrographic imaging compositions as des-cribed above. The appropriate proportion of radia-tion-sensitive materials to subtractive primary dyes and dye precursors will be apparent from conventional photo-graphic compositions, where mole ratios of silver halide to subtractive primary dye or dye precursor ranges from a~out 1 to 100:1. For example, radiation-sensitive silver halide is commonly employed in combination with dye-form-ing couplers in mole ratios of from about 2 to 100:1, more typically from about 3 to 60:1; however dye-forming couplers require at least two equivalents of silver to form one equivalent of image dye, whereas other subtrac-tive primary dyes and dye precursors provide at leasttheoretically image dye in a 1:1 molar rstio with silver halide. Radiation-sensitive silver halide is typically formed in ~ peptizer, such as gelatin, and can be incor-porated in the colorant portion as an emulsion, wherein the nonsilver or vebicle portion of the emulsion can be present in any conventional weight ratlo, typically up to sbout 2:1.

~ 1 72~97 The disclosure of the patents and publicstions cited above, provide a variety of examples of positive and negative-working dye image providing eompounds which can be employed as sub- tractive dyes or dye precursors in the electrographic imaging compositions of ~his invention.
The colorant portion of the preferred electrographic imaging composi- tions ls additlonally comprised of at least one immobile additive primary colorant or a combination of immobile colorants capable of collectively providing a desired additive primary color. Unlike the subtractive primary dyes and dye precursors, the immobile additive colorants which provide an additive primary color should remain immobile at all times and should not wander from the microcells either before, during, or after a photographic image is ob~ained. Suitable immobile colorants can be selected from among a variety of materlals, such as dyes and pigments, but are most preferably pigments, since these can be more readily obtained in highly immobile forms. Useful lmmobile colorants can be selected from the Color Index~ 2nd ~ Edition, 1956, Vols. I and II. Useul immobile polymeric `~ dyes are illustrated by Goldman et al U.S. Patent 3,743,503. Specific pre~erred lmmobile pigments are disclosed in Re6esrch Disclosure, Vol. 109, May 1973, Item 10938, P~ragraph IX-C-2. Exemplary of preferred green~
red, and blue immobile pigments are Monolite Green GN, Red Violet MR~ (Hoechst), Pyrazalone Red0 (Harmon), Alkali Blue MG0 (Shermin-Willlams)~ and Monolite Blue~
(ICI). Exemplary of useful green, red, and blue substantially immobile dyes are Renazol Brilliant Green 6B, Red Dye R3G (Drimarene Scarlet~) ~Sandoz), and MX-G
Procion Blue. The proportions of the subtractive primary dye or dye precursor to the immobile additive primary color~nt can be varied as desired to achieve ~n intended imaging result without the exercise of invention. The proportions will vary, depending upon the speciflc materials selected. For most materials ratlos of subtractive primary dye or dye pre-. .

I 1 ~24~-74-cursor to immobile additive colorant in the range of from about 1:10 to 10:1, most commonly 1:2 to 2:1, are opera-tive, although optimum color balancing for a specific application requires individual adjustment by empirical procedures well known to those skilled in the art.
The resinous portion which together with the colorant portion orms dispersed particles in the liquid electrographic developer is preferably insoluble in the liquid carrier vehicle or only slightly soluble therein.
Resinous materials acting as binders appear to form a coating around the colorants and thus facilitate disper-sion in the liquid carrier. Examples of useful resins are: alkyd resins as described in Australian Patent 254,001; acrylic resins described, for example, in U.S.
Patents 3,671,646 and 3,334,047; alkylated polymers described, for example, in U.S. Patents 3,542,681 and '682; r~sins described, for example in U.S. Patent 3,399,140; polystyrene as described, for example in Australian Patent 253,986 and U.S. Patent 3,296,140;
addition polymers containing a polar moietg as described, for example, in U.S. Patent 3,788,995; ethyl cellulose described in U.S. Patent 3,703,400; cellulosic polymers as described, for example, in U.S. Patent 3,293,183; poly-a~.laes, shellac as described, for example, in U.S. Patent 2,89~,335; waxes or rubber-modified polystyrenes as des-cribed, for example, in U.S. Patent 3,419,411; rosin modi-fied as described? for example, in U.S. Patent 3,220,830;
sil;ca aerogels as described, for example, in U~S. Pa~ent 2,877,133; halogenated polyethylenes described, for exam-30 ple, in U.S. Patent 2,8gl,911; graft copolymers described,for example, in U.S. Patent 3,623,986; cyclized rubbers described, for example, in U.S. Patent 3,640,863; vinyl polymers described, for example, in U.S. Patent 3,585,140 as well as coumarone-indene resins; ester gum resins; and polymerized blends of certain soluble monomers, polar monomers and, if desired, insoluble monomers as described in Belgian Patent 784,367.

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--' 172~9'`1 In order to exhibit electrographic properties, the imaging composition must have an electrostatic charge when dispersed as par~cles in a liquid carrier. The coloran~s can themselves impart the desired electrostatic charge to the dispersed particles. The colorants are selected to exhibit a single polarity of charge to insure the lowes~ possible minimum densities, The electrostatic charge polarity of the dispersed particles can be enhanced or controlled by the selection of resin;ous binder materi-als andlor charge control agents. Illustrative chargecontrol agents are the polyoxyethylated alkyl surfactants such as polyoxyethylated alkylamine, polyoxyethylene palmitate, and polyoxyethylene stearate. Other useful materials are magnesium and heavier metal soaps of fatty and aromatic acids as described in U.S. Patents 3,417,019, 3,032,432, 3,290,251, 3,554,946, 3,$28~097, and 3,639,246. UseEul metal soaps include cobalt naphthenate magnesium naphthenate and manganese naphthenate, zinc resinate, calcium naphthenate, zinc linoleate, aluminum resinate, isopropyltitanium stearate, aluminum stearate, and others many of which are also described in Matkan U.S.
Patent 3,259,581. Typically, the amount of ~uch materials used is less than about 2 percent by weight based on tbe ~ ht of the imaging composition. In certain instances, the resinous hinder materials per se can function as the charge control agent as disclosed, for example in U.S.
Patent 3,788,995, cited a~ove. A dispersing aid can also be added as shown, for example in U.S. Patent 3,135,695.
This patent shows an electrographic liquid developer prepared by surrounding or dispersing electrographic~type pigment particles with a suitable resinous binder envelope and treating t~le pigment-binder combination witb a small amount of an alkylaryl compound before suspending the combination in a liquid aliphatic carrier. This type of liquid e~ectrographic developer i6 especially useful due to îts relatively high stability. Other addenda may include: a phospholipid charge stabilizing material, e.g., lecithin, as described in U.S. Patents 3,220,830, " i '~ 2 ~ 7 3,301,677, 3,301,698, 3,241,957, 3,668,126, and 3,674,693, and U.K. Patent 1,337,32~; noble metal salts as described in French Patent 1,354,520, isocyanate compounds as des-cribed in UoK~ Patent 654,977, and U.S. Patent 3,383,316;
magnetic particles as described in U.S. Patent 3,155,531;
conductive materials as described in U.S. Patent~
3~300,410 and 3,409,35B; fatty acid esters as described in U.S. Patent 3,692,520; manganese salts as described in U.S. Patent 3,438,904; antistain agents as described in U.S. Patent 3,681,~43; and hydroxy-stearins as described in U.S. Patent 3,701,731.
Conventionally, the liquid carrier vehicle ~sed in liquid electrographic developers has a low dielectric constant less than about 3.0 and a resistivity of at least about 109 ohm-cm, preferably at least 10l ohm-cm.
These requirements automatically eliminate water and most alcohols. However, a number of liquids still are avail-able to satisfy the above-noted requirements and have been found to function as effective carrier vehicles for liquid ~0 developers. Among the various useful liquid carrier vehicles are alkylaryl materials such as the xylenes, benzene, alkylated benzenes and other alkylated aromatic hydrocarbons such as are described in U.S. Pate~t 2,899,335. Other useful liquid carr~er vehicles are various bydrocarbons and halogenated hydrocarbons 6ucb a cyclohexane, cyclopentanel n-pentane, n-hexane, carbon tetrachloride, fluorinated lower alkanes, such as tri-chloromonofluorane and trichlorotrifluorethane, typically having a boiling range of from about 2C to about 55C.
Other useful hydrocarbon liquid carrier vehicles are the paraffinic hydrocarbons 9 for example, the isoparaffinic hydrocarbon ~iquids having a boiling point in the range of 145C to 185C (sold under the trade~ark Isopar by Exxon) as well as alkylated aromatic hydrocarbons having a boil-ing point in the range of from 157 to 177C (sold underthe trademark Solvesso 10Q by Exxon). Various other petroleum distillates and mixtures thereof may also be used as liquid carrier vehicles. Additional carrier ' 1 72~7 -77~
; liquids which may be useful in certain situations include polysiloxane oils such as dime~yl ~vlysiloxane as described in IJ~S. PateDts 3,053,688 and 3,150,976; Freon carriers as described iD Canadian Patent 701,875 and U.S.
Patent 3, 076, 722; mixtures of polar and nonpolar ~olvents as described in U.S. Patent 3,256,197; aqueous conductive carriers such as described in U.S. Pa~eot 3,486,922;
nonflammable liquid carriers such as described in U.S.
Patent 3,058,914; polyhydric alcohols such as described in U.S. Patent 3,578,593; and emulsified carriers such as described in U.SO Patents 3,068,115 and 3/507,794.
Electroscopic imagin~ composition can be disper~ed in the liquid carrier vehicle in any convenient conventional concentration, typically in the range of from 0.01 to lO
percent by weight based oo total weight. Conventional techniques for dispersing the electrographic imaging composition can be employed, as disclosed, for example9 in Research Disclosure, Item 10938, cited above, Paragraph IX-E and F.
The invention has been described in detail with particular reerece to preferred embodiments thereof 9 but it will be understood that variations and modifications can be effected within the spirit and scope of the inven-tion.
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Claims

WHAT IS CLAIMED IS
1. In a process of preparing a photo-graphically useful element comprising locating on a support means which is areally extended along an axial plane a predetermined, ordered array of lateral wall means capable of defining microareas on the support means, positioning a first photographically useful composition in one set of microareas on the support means, positioning a second photographically useful composition on the support means in another, laterally displaced set of microareas which form an interlaid pattern with the one set of microareas, the improvement comprising directing radiation toward the array at an acute angle with respect to the axial plane of the support means, the lateral wall means interrupting a portion of the radiation to create a first, shadowed set of microareas on the support means while permit-ting impingement of an uninterrupted portion of the radiation on a second, unshadowed, interlaid set of microareas of the support means, and selectively positioning the first composi-tion as a function of shadowing in one set of the microareas.
2. The improved process according to claim 1, wherein the lateral wall means are located to present an array of substantially parallel lateral walls.
3. The improved process according to claim 2, wherein the parallel lateral walls are located on the support means to form microgrooves 4. The improved process according to claim 3, wherein the parallel lateral walls are formed to present serpentine microgrooves.

5. The improved process according to claim 3, wherein the parallel lateral walls are located to form at least two interlaid sets of microgrooves.
6. The improved process according to claim 5, wherein the parallel lateral walls are spaced to form one set of microgrooves which differ in width from microgrooves of remaining sets.
7. The improved process according to claim 5, wherein the parallel lateral walls and the support means are formed to provide one set of microgrooves which differ in depth from remaining sets of microgrooves 8. The improved process according to claim 1, wherein the lateral wall means are located on the support means to form microcells.
9. The improved process according to claim 8, wherein the microcells are formed to include at least one microarea from each set of microareas.
10. The improved process according to claim 8, wherein the lateral wall means are located on the support means to form at least two different sets of microcells.
11. The improved process according to claim 10, wherein the lateral wall means are located on the support means to form one set of microcells which are elongated1 as compared to microcells of a second set, in a direction parallel to the axial plane of the support means.
12. The improved process according to claim 11, wherein the lateral wall means are located on the support means to form a second set of micro-cells which are elongated as compared to the micro-cells of the one set in a second direction parallel to the axial plane of the support means.

13. The improved process according to claim 11, wherein the two sets of microcells are related so that the second, unshadowed set of microareas are located entirely in the elongated set of the microcells.
14. The improved process according to claim 13, wherein means are positioned in the elongated set of microcells to enlarge the micro-areas of the second set so that the microareas of the first set are entirely excluded from the elongated set of microcells.
15. The improved process according to claim 1, wherein the support means includes a photoconductive portion in areas including the microareas of the support means and the process additionally comprises establishing an electrostatic charge on the photoconductive portion of the support means defin-ing the microareas, removing the electrostatic charge in the second, unshadowed set of microareas by impingement of the uninterrupted portion of the radiation while retain-ing the electrostatic charge on the support means in the first, shadowed set of microareaa, and selectively electrostaticelly attracting an electrographic composition into one set of micro-areas as a function of the electrostatic charge pattern.
16. The improved process according to claim 1, additionally comprising prior to directing radiation toward the array 7 positioning a radiation-sensitive material on the support means so that the radiation-sensitive material is selectively exposed in the second set of microareas by impingement of the radiation, but is not exposed to radiation in the first, shadowed set of microareas, and visibly differentiating the first and second sets of micrOareas by providing a dye in one of the first and second sets of mirroareas as a function of exposure of the radiation-sensitive material.
17. The improved process according to claim 1, wherein the microareas are less than 200 microns in size.
180 The improved process according to claim 17, wherein the microareas are in the range of from 4 to 100 microns in fiize.
19. The improved process gccordlng to claim 1, wherein the support means adjacent the microareas is formed of a substantially transparent material.
20. The improved process according to claim 19, wherein the lateral wall means are dyed to enhance their capability of absorbing radiation.
21. In a process of producing an element useful in multicolor photography comprising forming support means areally extended along an axial plane comprised of bottom wall portions and lateral wall portions cooperating to form an array of microcells and sequentially positioning first, second, and third photographically useful imaging compoæitions in first, second, and third interlaid sets of the microcells, respectively, the first, second, and third imaging compositions being chosen from among compositions which are responsive to or useful for absorbing light each in a different portion of the visible spectrum, the improvement comprising in forming the microcells, differentiating in at least one of depth, lateral extent along the axial plane, and orientation the microcells of the first set from the microcells of the remaining sets, directing radiation toward the support means at an acute angle with respect to the axial plane, a portion of the radiation impinging on the bottom walls of the first get of the microcells while a remaining portion of the radiation is interrupted by the lateral walls to entirely shadow the bottom walls of the second and third sets of microcells, and selectively positioning the first imaging composition on the exposed bottom walls of the support in the first set of microcells.
22. The improved process according to claim 21, wherein the first set of microcells are formed to be diamond-shaped with their major axes aligned in a single direction.
23. The improved process accordlng to claim 21, wherein the first set of microcells are formed to be rectangular with their major axes aligned in 8 single direction.
24. The improved process according to claim 21, wherein the first set of microcells are formed to be of lesser depth than the remaining Set6 of microcells.
25. The improved process according to claim 21, whereln, after initially directing radia-tion toward the support means at an acute angle with respect to the axial plane and before positioning the first imaging composition, the relatsonship of the support means to the initial direction of radiation is rever6ed 180° in the axial plane and the step of directing radiation toword the support means at an acute angle with respect to the axial plane is repeated to selectively expose portions of the bottom walls of the first set of microcells which were shadowed during the first exposure.
26. In a process of producing an element useful in multicolor photography comprising forming support means areally extended along an axial plane comprised of bottom wall portion3 and lateral wall portions cooperating to form an srray of microcells and sequentially positioning first, eecond, and third imaging compositions in first, gecond, and third interlaid sets of microcells, respectively, the first, second, and third photographically useful imaging compositions being chosen from among compo-sitions each responsive to or useful in absorbing light in a different portion of the visible 6pectrum, the improvement comprising in forming the microcells, differentiating the microcells of each set from the microcells of the remaining sets in at least one of depth, lateral extent along the axial plane, and orientation, directing radiation toward the support means at an acute angle with regpect to the axial plane to impinge a portion of the radiation on the bottom walls of the first set of the microcells while a remaining portion of the radiation is interrupted by the lateral walls to entirely shadow walls the bottom walls of the second and third sets of microcells, selectively positioning the first imaging composition on the exposed bottom walls of the support in the first set of microcells, directing radiation toward the support means at an acute angle with respect to the axial plane to impinge a portion of the radiation on the bottom walls of the second set of microcells while a remaining portion of the radiation is interrupted by the lateral walls to entirely shadow the bottom walls of the third set of microcells, and selectively positioning the second imaging composition on the exposed bottom walls of the support in the second set of microcells.

27. The improved process according to claim 26, wherein radiation it subsequently directed toward the support means substantially perpendicu-larly to the axial plane of expose the bottom walls of the third set of microcells and selectively positioning the third imaging composition on the exposed bottom walls of the support in the third set of microcells.
28. The improved process according to claim 21, wherein the first, second, and third compositions are each comprised of radiation-sensi-tive means responsive to a different portion of the spectrum.
29. The improved process according to claim 28, wherein the radiation-sensitive means is silver halide.
30. The improved process according to claim 21, wherein the first, second, and third compositions are each comprised of a subtractive primary dye or dye precursor.
31. The improved process according to claim 30, wherein the first, second, and third compositions are each comprised of a different subtractive primary dye or dye precursor capable of shifting between a mobile and an immobile form as a function of silver halide development.
32. The improved process according to claim 21, wherein the first, second, and third compositions are each comprised of a different additive primary colorant means.
33. A process of preparing a photograph-ically useful element comprising forming support means areally extended along an axial plane comprised of bottom wall portions and lateral wall portions forming an interlaid pattern of at least two sets of microcells, the microcells of at least first and second sets each being rela-tively extended along a major axis parallel to the axial plane, the major axes of microcells of the same set being substantially aligned, and the major axes of microcells of the first and second sets being relatively oriented to intersect, whereby the microcalls of at least the first and second sets can be uniquely addressed by radiation directed toward the support means at an acute angle with respect to the axial plane and substantially aligned with their major axes, uniquely addressing the bottom walls of the first set of microcells with radiation substantially aligned with their major axes and at an acute angle with respect to the axial plane, selectively positioning a first radiation-sensi-tive material, colorant, or colorant precursor in the first set of microcells as a function of selec-tive exposure of the bottom walls thereof, uniquely addressing the bottom walls of the second set of microcells with radiation substan-tially aligned with their major axes and at an acute angle with respect to the axial plane, and selectively positioning a second radiation-sen-sitive material, colorant a or colorant precursor in the second set of microcells as a function of selective exposure of the bottom walls thereof.
34. A process of preparing a photograph-ically use ul element comprising forming support means areally extended along an axial plane comprised of bottom wall portions and lateral wall portions forming an interlaid pattern of at least two sets of microcells, the microcells of at least first and second sets each being rela-tively extended along a major axis parallel to the axial plane, the major axes of microcells of the same set being substantially aligned, and the major axes of microcells of the first and second sets being relatively oriented to intersect, whereby the microcells of at least the first and second sets can be uniquely addressed by radiation directed toward the support means at an acute angle with respect to the axial plane and substantially aligned with their major axes, positioning a radiation-sensitive means on the bottom walls of the microcells, uniquely addressing the bottom walls of the first set of microcells with radiation substantially aligned with their major axes and at an acute angle with respect to the axial plane, selectively immobilizing a first dye on the bottom walls of the first set of microcells is a function of exposure to radiation, uniquely addressing the bottom walls of the second set of microcells with radiation substan-tially aligned with their major axes and at an acute angle with respect to the axial plane, and selectively immobilizing a second dye on the bottom walls of the second set of microcells as a function of exposure to radiation.
35. A process according to claim 34 in which silver halide is positioned as the radiation-sensitive means on the bottom walls of the microcells.
36. A process according to claim 35 in which the first and second dyes are formed by development of exposed silver halide to form oxidized developing agent and reacting the oxidized developing agent with a mobile dye-forming coupler to form an immobile dye.
37. A process of preparing a photograph-ically useful element comprising forming support means areally extended along an axial plane comprised of bottom wall portions and lateral wall portions forming an interlaid pattern of at least two sets of microcells, the microcells of at least first and second sets being relatively extended along a major axis parallel to the axial plane, the major axes of microcells of the same set being substantially aligned , and the major axes of microcells of the first and second sets being relatively oriented to intersect, whereby the microcells of at least the first and second sets can be uniquely addressed by radiation directed toward the support means at an acute angle with respect to the axial plane and substantially aligned with their major axes, positioning a dye immobilizing layer on the bottom walls of the microcells, overcoating the dye immobilizing layer with a positive-working photoresist, uniquely addressing the bottom walls of the first set of microcells with radiation substantially aligned with their major axes and at an acute angle with respect to the axial plane, removing the photoresist that is exposed to radiation, so that the photoresist is at least partially removed from the bottom walls of the microcells of the first set, but remains on the bottom walls of the remaining microcells, spreading a first mobile dye over the support means so that it is immobilized by the dye immobi-lizing layer on the bottom walls of the first set of microcells, but prevented from contacting the immobilizing layer on the bottom walls of the remaining microcells by the overcoated photoresist, removing the first mobile dye from the bottom walls of the remaining microcells, again overcoating the dye immobilizing layer with a positive-working photoresisit, uniquely addressing the bottom walls of the second set of microcells with radiation substan-tially aligned with their major axes and at an acute angle with respect to the axial plane, removing the photoresist that is exposed to radiation, so that the photoresist is at least partially removed from the bottom walls of the microcells of the second set, but remains on the bottom walls of the remaining microcells, spreading a second mobile dye over the support means so that it is immobilized by the dye immobi-lizing layer on the bottom walls of the second set of microcells, but prevented from contacting the immobilizing layer on the bottom walls of the remaining microcells by the overcoated photoresist, and removing the second mobile dye from the bottom walls of the remaining microcells.
38. A process of preparing a photograph-ically useful element comprising forming support means areally extended along an axial plane comprised of bottom wall portions and lateral wall portions forming an interlaid pattern of at least two sets of microcellsg the microcells of at least first and second sets being extended along a major axis parallel to the axial plane as compared to their width, the major axes of micro-cells of the same set being substantially aligned, and the major axes of microcells of the first and second sets being relatively oriented to intersect, whereby the microcells of at least the first and second sets can be uniquely addressed by radiation directed toward the support means at an acute angle with respect to the axial plane and substantielly aligned with their major axes, positioning a first mobile dye on the bottom walls of the microcells, overcoating the mobile dye with a first nega-tive-working photoresist layer, uniquely addressing the bottom walls of the first set of microcells with radiation substantially aligned with their major axes and at an acute angle with respect to the axial plane, removing the first photoresist layer that is unexposed to radiation, so that the first photo-resist layer remains only on the bottom walls of the first set of microcells, but is entirely removed from the bottom walls of the microcells of the second set, removing the first mobile dye from areas where the first potoresist layer is removed, locating a second mobile dye on the support 80 that it is positioned in the bottom walls of the microcells of the second set, overcoating the second mobile dye with a second, negative-working photoresist layer, uniquely addressing the bottom walls of the second set of microcells with radiation substan-tially aligned with their major axes and at an acute angle with respect to the axial plane, removing the second photoresist layer that is unexposed to radiation, go that the second photo-resist layer remains only on the bottom walls of the second set of microcells, but is entirely removed from the bottom walls of the first set of micro-cells, and removing the second mobile dye from areas where the second photoresist layer is removed.
39. A process of preparing a photograph-ically useful element comprising forming support means areally extended along an axial plane comprised of lateral wall portions and photoconductive bottom wall portions forming an interlaid pattern of at least two sets of micro-cells, the microcells of at least first and second sets each being extended as compared to their width along a major axis parallel to the axial plane as compared to their width, the major axes of the microcells of the same set being substantlally aligned, and the major axes of microcells of the first and second sets being relatively oriented to intersect, whereby the microcells of at least the first and second sets can be uniquely addres6ed by radiation directed toward the support means at an acute angle with respect to the axial plane and substantially aligned with their major ax2s, establishing an electrostatic charge on photo-conductive surfaces of the support means, uniquely addressing the bottom wall portions of the first set of microcells with radiation substan-tially aligned with their major axes and at an acute angle with respect to the axial plane, thereby selectively removing electrostatic charge from the exposed bottom wall portions of the first set of microcells while retaining the electrostatic charge on the bottom wall portions of the second set of microcells, selectively depositing a first electrographic imaging composition in the first set of microcells, uniquely addressing the bottom wall portions of the second set of microcells with radiation substan-tially aligned with their major axes and at an acute angle with respect to the axial plane, thereby selectively removing electrostatic charge from the exposed, second set of microcells, and selectively depositing A second electrographic imaging composition in the second set of microcells.
40. A process according to claim 39 in which radiation penetrable conductive layer segments are positioned on the bottom walls of the micro-cells, so that the electrostatic charge is reduced over the entire bottom wall surface of each micro-cell at least partially addressed by radiation.

41. A process according to claim 40 in which the support means initially presents a substantially planar photoconductive surface and a planar conductive layer coated on the planar surface, the microcells being formed in the support by embossing the planar surface, and the planar conductive layer being separated by embossing into discrete laterally spaced segments laying on the bottom walls of the microcells.
42. A photographically useful element comprising support means, which is areally extended along an axial plane, a predetermined, ordered array of lateral wall means positioned to interrupt radiation directed toward said axial plane at an acute angle to thereby shadow a first set of microareas of said support means while permitting the radiation to impinge a second, unshadowed set of microsreas of said support means forming an interlaid pattern with said first microareas, a first photographically useful composition positioned on said support means in said first set of microareas and a second photographically useful composition positioned on said support means in said second set of microareas.
43. An element according to claim 42 in which the lateral wall means are located to present an array of substantially parallel lateral walls.
44. An element according to claim 43 in which the parallel lateral walls are located on the support means to form microgrooves.
45. An element according to claim 44 in which the parallel lateral walls are formed to present serpentine microgrooves.

46. An element according to claim 44 in which the parallel lateral walls are located to form at least two interlaid set of microgrooves.
47. An element according to claim 46 in which the parallel lateral walls are spaced to form one set of microgrooves which differ in width from microgrooves of the remaining sets.
48. An element according to claim 46 in which the parallel lateral walls and the support means are formed to provide one set of microgrooves which differ in depth from the remaining sets of microgrooves.
49. An element according to claim 42 in which the lateral wall means are located on the support means to form microcells.
50. An element according to claim 49 in which the lateral walls surrounding individual microcells also surround at least one microarea from each set of microareas and the portions of the first and second comppositions positioned on the surrounded microareas.
51. An element according to claim 49 in which the lateral wall means are located on the support means to form at least two different sets of microcells.
52. An element according to claim 51 in which the microcells of one set are of greater depth than microcells of a remaining set.
53. An element according to claim 51 in which the lateral wall means are located on the support means to form a first set of microcells which are elongated in a direction parallel to the axial plane of the support means as compared to microcells of a second set.
54. An element according to claim 53 in which the elongated microcells are rectangular.

55, An element according to claim 53 in which the elongated microcells are diamond-shaped-56. An element according to claim 53 in which the lateral wall means are located on the support means to form the second set of microcells which are elongated as compared to the microcells of the first set in a second direction parallel to the axial plane of the support means.
57. An element according to claim 56 in which the microcells of at least one set are triangular.
58. An element according to claim 56 in which the microcells of at least two sets are identical in geometrical configuration, but differ in their alignment along axes parallel to the axial plane of the support.
59. An element according to claim 58 in which the microcells of at least the two sets are rectangular.
60. An element according to claim 58 in which the microcells of at least the two sets are diamond-shaped.
61. An element according to claim 60 in which the lateral wall means form on the support means three sets of diamond-shaped microcells, the major axes of the microcells of each set extending in a different direction parallel to the axial plane of the support means.
62. An element according to claim 42 in which the lateral wall means are substantially transparent to light and are capable of interrupting radiation outside the visible portion of the spectrum.
63. An element according to claim 62 in which the lateral walls are capable of interrupting ultravlolet radiation.

64. An element according to claim 42 in which the lateral wall means are capable of inter-rupting light.
65. An element according to claim 64 in which the lateral wall means are capable of trans-mitting radiation outside the visible portion of the spectrum.
66. An element according to claim 65 in which the lateral wall means are substantially transparent and are capable of absorbing ultraviolet radiation.
67. An element according to claim 42, in which the support means is photoconductive.
68. An element according to claim 67 in which A conductive layer capable of serving as a biasing electrode is associated with the photocon-ductive support means.
69. An element according to claim 67 in which the photoconductive support means is respon-sive to ultraviolet radiation 70. An element according to claim 67 in which the photoconductive support means is respon-sive to at least a portion of the visible spectrum.
71. An element according to claim 67 in which at least one of the first and second composi-tions is electrographic.
72. An element according to claim 42, additionally including a third photographically useful composition positioned on the support means in laterally displaced relation to the first and second photographically useful compositions.
73. An element according to claim 72 in which the microcells are hexagonal.
74. An element according to claim 42 in which said support means forms a predetermined, ordered array of three interlaid sets of microcells opening toward one major surface, microcells of a first set being differentiated from remaining microcells by being elongated along a major axis extending in a first direction parallel to the axial plane of the support means and microcells of a second set being differentiated from remaining microcells by being elongated along a major axis extending in a second, differing direction parallel to the axial plane of the support means, and the first photograpically useful composition, the second photographically useful composition, and a third photographically useful composition are each confined to a differing one of the three sets of microcells.
75. An element according to claim 74 in which the microcells of at least two sets are diamond-shaped.
76. An element according to claim 75 in which the microcells of each of the three sets are diamondshaped.
77. An element according to claim 74 in which the microcells of at least one set are rectangular.
78. An element according to claim 77 in which the microcells of at least two sets are rectangular.
79. An element according to claim 42 wherein the support means forms a predetermined, ordered array of three interlaid sets of microcells opening toward one major surface, the microcells of each set differing in depth from the microcells of the remaining sets, and the first photographically useful composition, the second photographically useful composition, and a third photographically useful composition are each confined to a differing one of the three sets of microcells.

80. An element according to claim 72 in which the first, second, and third imaging composi-tions are each confined to a differing one of first, second, and third sets of microareas.
81. An element according to claim 80 in which each microarea is less than 200 microns in width.
82. An element according to claim 81 in which each microarea is from 4 to 100 microns in width.
83. An element according to claim 72, 74, or 79 in which the first, second, and third photo-graphically useful compositions are each comprised of radiation-sensitive means responsive to a different portion of the spectrum.
84. An element according to claim 723 74, or 79 in which the first, second, and third imaging compositions are each comprised of a different subtractive primary dye or dye precursor capable of shifting between a mobile and an immobile form.
85. An element according to claim 72, 74, or 79 in which the firat, second, and third imaging compositions are each comprised of a different additive primary colorant.
86. An element according to claim 42 which is a photographic element capable of forming multicolor images wherein the support means has first and second major surfaces and includes a portion defining first, second, and third interlaid sets of microcells opening toward the first major surface of the support means to form an array, the support means defining lateral walls capable of interrupting radiation between adjacent microcells, the micro-cells of each set being differentiated in at least one of depth, lateral extent along the first major surface, and orientation, segmented blue filter means located in the first set of microcells, segmented green filter means located in the second set of microcells, segmented red filter means located in the third set of microcells, the first, second, and third sets of the micro-cells forming an interlaid pattern of blue, green;
and red filter segments, and radiation-sensitive imaging means positioned adjacent the first major surface of the support means.
87. A photographic element according to claim 86 in which the radiation-sensitive imaging means is silver halide.
88. A photographic element according to claim 87 in which a yellow dye or dye precursor is located in the first set of microcells, a magenta dye or dye precursor is located in the second set of microcells, and a cyan dye or dye precursor is located in the third set of microcells, each of the dyes or dye precursors being capable of shifting in mobility as a function of silver halide development.
89. A photographic element according to claim 87 additionally including a receiver including means for immobilizing a mobile dye or dye precursor.