FR2356975B1 - - Google Patents

Info

Publication number
FR2356975B1
FR2356975B1 FR7716799A FR7716799A FR2356975B1 FR 2356975 B1 FR2356975 B1 FR 2356975B1 FR 7716799 A FR7716799 A FR 7716799A FR 7716799 A FR7716799 A FR 7716799A FR 2356975 B1 FR2356975 B1 FR 2356975B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7716799A
Other languages
French (fr)
Other versions
FR2356975A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2356975A1 publication Critical patent/FR2356975A1/en
Application granted granted Critical
Publication of FR2356975B1 publication Critical patent/FR2356975B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7716799A 1976-06-30 1977-05-26 CONTACT TYPE PHOTOLITHOGRAPHIC PRINTING PROCESS FOR OBTAINING HIGH RESOLUTION PROFILES AND APPARATUS USING SUCH A PROCESS Granted FR2356975A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70143776A 1976-06-30 1976-06-30

Publications (2)

Publication Number Publication Date
FR2356975A1 FR2356975A1 (en) 1978-01-27
FR2356975B1 true FR2356975B1 (en) 1978-11-03

Family

ID=24817371

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7716799A Granted FR2356975A1 (en) 1976-06-30 1977-05-26 CONTACT TYPE PHOTOLITHOGRAPHIC PRINTING PROCESS FOR OBTAINING HIGH RESOLUTION PROFILES AND APPARATUS USING SUCH A PROCESS

Country Status (3)

Country Link
JP (1) JPS533170A (en)
FR (1) FR2356975A1 (en)
GB (1) GB1527179A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4157935A (en) * 1977-12-23 1979-06-12 International Business Machines Corporation Method for producing nozzle arrays for ink jet printers
DE2828625C2 (en) * 1978-06-29 1980-06-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for the electroforming production of precision flat parts
FR2465255B1 (en) * 1979-09-10 1987-02-20 Roumiguieres Jean Louis PROCESS FOR BRINGING THE FILLED SHADOW OF A PERCEODALLY DISTRIBUTED SLOTTED MASK ONTO A SUPPORT, AND APPLICATION OF THIS PROCESS IN PARTICULAR IN PHOTOLITHOGRAVING
JPS56153738A (en) * 1980-04-30 1981-11-27 Fujitsu Ltd Method for contact exposure
CA1172497A (en) * 1980-10-14 1984-08-14 Hugh S.A. Gilmour Elements containing ordered wall arrays and processes for their fabrication
FR2519157B1 (en) * 1981-12-30 1987-07-31 Labo Electronique Physique PROCESS FOR PRODUCING SUBMICRON PATTERNS AND PATTERNS THUS OBTAINED
DE3315665A1 (en) * 1983-04-29 1984-10-31 Siemens AG, 1000 Berlin und 8000 München MANUFACTURE OF GALVANOPLASTIC FLAT PARTS WITH TOTATIONALLY UNSYMMETRIC, CONE-SHAPED STRUCTURES
JPS63299395A (en) * 1987-05-29 1988-12-06 Mitsubishi Electric Corp Aligner
GB2308667A (en) * 1995-12-29 1997-07-02 Hyundai Electronics Ind Exposure equipment for a semiconductor device
DE112019005885T5 (en) * 2018-11-27 2021-08-12 Ams Ag FORMATION OF THREE-DIMENSIONAL STRUCTURES USING GRAYSCALE PHOTOLITHOGRAPHY

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT939738B (en) * 1970-08-12 1973-02-10 Rank Organisation Ltd LIGHTING DEVICE FOR PHOTOLITHOGRAPHIC PRINTING OF MICROCIRCUIT COMPONENTS
DE2116713B2 (en) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Exposure method for imaging very finely structured light patterns on photoresist layers and a suitable exposure device

Also Published As

Publication number Publication date
GB1527179A (en) 1978-10-04
FR2356975A1 (en) 1978-01-27
JPS533170A (en) 1978-01-12

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Legal Events

Date Code Title Description
ST Notification of lapse