GB1504264A - Etching of tantalum layers - Google Patents
Etching of tantalum layersInfo
- Publication number
- GB1504264A GB1504264A GB10433/76A GB1043376A GB1504264A GB 1504264 A GB1504264 A GB 1504264A GB 10433/76 A GB10433/76 A GB 10433/76A GB 1043376 A GB1043376 A GB 1043376A GB 1504264 A GB1504264 A GB 1504264A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etching
- march
- acetic acid
- tantalum layers
- tantalum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 title abstract 2
- 229910052715 tantalum Inorganic materials 0.000 title abstract 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title abstract 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 5
- 229960000583 acetic acid Drugs 0.000 abstract 2
- GPFIZJURHXINSQ-UHFFFAOYSA-N acetic acid;nitric acid Chemical compound CC(O)=O.O[N+]([O-])=O GPFIZJURHXINSQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000012362 glacial acetic acid Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
- H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Weting (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19752513860 DE2513860C3 (de) | 1975-03-27 | Verfahren zur Herstellung einer aus Tantal bestehenden Schicht für Dünnschichtkondensatoren bzw. Dünnschichtwiderständen |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1504264A true GB1504264A (en) | 1978-03-15 |
Family
ID=5942665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB10433/76A Expired GB1504264A (en) | 1975-03-27 | 1976-03-16 | Etching of tantalum layers |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS5823735B2 (nl) |
BE (1) | BE840074A (nl) |
CH (1) | CH604352A5 (nl) |
DK (1) | DK141107C (nl) |
FR (1) | FR2305838A1 (nl) |
GB (1) | GB1504264A (nl) |
IT (1) | IT1058515B (nl) |
NL (1) | NL7603138A (nl) |
SE (1) | SE7602902L (nl) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109881204A (zh) * | 2017-12-06 | 2019-06-14 | 深圳新宙邦科技股份有限公司 | 一种镁银合金清洗剂及清洗方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0722075B2 (ja) * | 1987-01-23 | 1995-03-08 | 日通工株式会社 | 固体電解コンデンサの半導体層形成方法 |
US4934033A (en) * | 1987-01-23 | 1990-06-19 | Nitsuko Corporation | Method of manufacturing a solid electrolytic capacitor |
US4805074A (en) * | 1987-03-20 | 1989-02-14 | Nitsuko Corporation | Solid electrolytic capacitor, and method of manufacturing same |
-
1976
- 1976-01-27 CH CH96476A patent/CH604352A5/xx not_active IP Right Cessation
- 1976-02-27 SE SE7602902A patent/SE7602902L/xx unknown
- 1976-03-02 DK DK89176A patent/DK141107C/da not_active IP Right Cessation
- 1976-03-16 GB GB10433/76A patent/GB1504264A/en not_active Expired
- 1976-03-24 FR FR7608510A patent/FR2305838A1/fr active Granted
- 1976-03-24 IT IT21523/76A patent/IT1058515B/it active
- 1976-03-25 NL NL7603138A patent/NL7603138A/nl not_active Application Discontinuation
- 1976-03-26 JP JP51034115A patent/JPS5823735B2/ja not_active Expired
- 1976-03-26 BE BE165593A patent/BE840074A/xx not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109881204A (zh) * | 2017-12-06 | 2019-06-14 | 深圳新宙邦科技股份有限公司 | 一种镁银合金清洗剂及清洗方法 |
CN109881204B (zh) * | 2017-12-06 | 2021-07-09 | 深圳新宙邦科技股份有限公司 | 一种镁银合金清洗剂及清洗方法 |
Also Published As
Publication number | Publication date |
---|---|
DE2513860B2 (de) | 1977-06-08 |
DK141107B (da) | 1980-01-14 |
FR2305838A1 (fr) | 1976-10-22 |
BE840074A (fr) | 1976-09-27 |
IT1058515B (it) | 1982-05-10 |
JPS5823735B2 (ja) | 1983-05-17 |
CH604352A5 (nl) | 1978-09-15 |
NL7603138A (nl) | 1976-09-29 |
DE2513860A1 (de) | 1976-09-30 |
DK141107C (da) | 1980-07-07 |
SE7602902L (sv) | 1976-09-28 |
FR2305838B1 (nl) | 1981-02-13 |
JPS51121174A (en) | 1976-10-22 |
DK89176A (da) | 1976-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1265038A (nl) | ||
GB1445659A (en) | Method of etching silicon oxide to produce a tapered edge thereon | |
GB1311509A (en) | Etching methods | |
GB1504264A (en) | Etching of tantalum layers | |
GB1320560A (en) | Etchants for silica | |
JPS57204165A (en) | Manufacture of charge coupling element | |
JPS6468932A (en) | Dry etching | |
US3979238A (en) | Etchant for silicon nitride and borosilicate glasses and method of using the etchant | |
GB1084003A (en) | Improvements in forming apertures in an electrically insulating layer | |
JPS5530826A (en) | Method of manufacturing semiconductor device | |
SU816983A1 (ru) | Травильный раствор | |
GB1153485A (en) | Thin-Film Resistive Elements | |
JPS57211781A (en) | Patterning method of double stacking thin film | |
JPS6439029A (en) | Manufacture of semiconductor device | |
JPS55142480A (en) | Manufacture for planer type magnetic bubble element overlay | |
JPS52122479A (en) | Etching solution of silicon | |
JPS5640257A (en) | Field structure of semiconductor device | |
GB1291038A (en) | A process for etching chromium | |
JPS5518004A (en) | Etching | |
JPS5533070A (en) | Method of forming fine pattern by dry etching process | |
JPS5648150A (en) | Manufacture of semiconductor device | |
JPS5378195A (en) | Manufacture of electrode panel for display | |
JPS5642345A (en) | Manufacture of semiconductor device | |
GB1531648A (en) | Method of manufacturing a body having a gold pattern and body manufactured according to the method | |
JPS5767010A (en) | Etching method for indium-phosphorus crystal |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |