IT1058515B - Procedimento per formare uno strato di tantalio per condensatori a strato sottile o per resistori a strato sottile - Google Patents

Procedimento per formare uno strato di tantalio per condensatori a strato sottile o per resistori a strato sottile

Info

Publication number
IT1058515B
IT1058515B IT21523/76A IT2152376A IT1058515B IT 1058515 B IT1058515 B IT 1058515B IT 21523/76 A IT21523/76 A IT 21523/76A IT 2152376 A IT2152376 A IT 2152376A IT 1058515 B IT1058515 B IT 1058515B
Authority
IT
Italy
Prior art keywords
thin layer
layer
tantalio
procedure
forming
Prior art date
Application number
IT21523/76A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19752513860 external-priority patent/DE2513860C3/de
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1058515B publication Critical patent/IT1058515B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/702Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
    • H01L21/707Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Materials For Photolithography (AREA)
  • Weting (AREA)
IT21523/76A 1975-03-27 1976-03-24 Procedimento per formare uno strato di tantalio per condensatori a strato sottile o per resistori a strato sottile IT1058515B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752513860 DE2513860C3 (de) 1975-03-27 Verfahren zur Herstellung einer aus Tantal bestehenden Schicht für Dünnschichtkondensatoren bzw. Dünnschichtwiderständen

Publications (1)

Publication Number Publication Date
IT1058515B true IT1058515B (it) 1982-05-10

Family

ID=5942665

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21523/76A IT1058515B (it) 1975-03-27 1976-03-24 Procedimento per formare uno strato di tantalio per condensatori a strato sottile o per resistori a strato sottile

Country Status (9)

Country Link
JP (1) JPS5823735B2 (it)
BE (1) BE840074A (it)
CH (1) CH604352A5 (it)
DK (1) DK141107C (it)
FR (1) FR2305838A1 (it)
GB (1) GB1504264A (it)
IT (1) IT1058515B (it)
NL (1) NL7603138A (it)
SE (1) SE7602902L (it)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4934033A (en) * 1987-01-23 1990-06-19 Nitsuko Corporation Method of manufacturing a solid electrolytic capacitor
JPH0722075B2 (ja) * 1987-01-23 1995-03-08 日通工株式会社 固体電解コンデンサの半導体層形成方法
US4805074A (en) * 1987-03-20 1989-02-14 Nitsuko Corporation Solid electrolytic capacitor, and method of manufacturing same
CN109881204B (zh) * 2017-12-06 2021-07-09 深圳新宙邦科技股份有限公司 一种镁银合金清洗剂及清洗方法

Also Published As

Publication number Publication date
JPS5823735B2 (ja) 1983-05-17
NL7603138A (nl) 1976-09-29
DK141107B (da) 1980-01-14
DE2513860B2 (de) 1977-06-08
BE840074A (fr) 1976-09-27
FR2305838A1 (fr) 1976-10-22
CH604352A5 (it) 1978-09-15
SE7602902L (sv) 1976-09-28
DK141107C (da) 1980-07-07
JPS51121174A (en) 1976-10-22
GB1504264A (en) 1978-03-15
DK89176A (da) 1976-09-28
FR2305838B1 (it) 1981-02-13
DE2513860A1 (de) 1976-09-30

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