GB1392583A - High rate deposition of carbides by activated reactive evaporation - Google Patents

High rate deposition of carbides by activated reactive evaporation

Info

Publication number
GB1392583A
GB1392583A GB2663873A GB2663873A GB1392583A GB 1392583 A GB1392583 A GB 1392583A GB 2663873 A GB2663873 A GB 2663873A GB 2663873 A GB2663873 A GB 2663873A GB 1392583 A GB1392583 A GB 1392583A
Authority
GB
United Kingdom
Prior art keywords
carbides
high rate
reactive evaporation
activated reactive
rate deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2663873A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bunshah R F
Original Assignee
Bunshah R F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bunshah R F filed Critical Bunshah R F
Publication of GB1392583A publication Critical patent/GB1392583A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
GB2663873A 1972-06-16 1973-06-05 High rate deposition of carbides by activated reactive evaporation Expired GB1392583A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26370872A 1972-06-16 1972-06-16

Publications (1)

Publication Number Publication Date
GB1392583A true GB1392583A (en) 1975-04-30

Family

ID=23002928

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2663873A Expired GB1392583A (en) 1972-06-16 1973-06-05 High rate deposition of carbides by activated reactive evaporation

Country Status (4)

Country Link
US (1) US3791852A (enrdf_load_stackoverflow)
JP (1) JPS5148463B2 (enrdf_load_stackoverflow)
DE (1) DE2330545B2 (enrdf_load_stackoverflow)
GB (1) GB1392583A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4505948A (en) * 1983-05-13 1985-03-19 Wedtech Corp. Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
GB2173512A (en) * 1985-04-03 1986-10-15 Barr & Stroud Ltd Apparatus and method for chemical vapour deposition of products
GB2189509A (en) * 1986-03-27 1987-10-28 Mitsubishi Electric Corp Process for coating a workpiece with a ceramic material

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916052A (en) * 1973-05-16 1975-10-28 Airco Inc Coating of carbon-containing substrates with titanium carbide
JPS5318184B2 (enrdf_load_stackoverflow) * 1973-08-04 1978-06-13
JPS51107287A (ja) * 1975-03-18 1976-09-22 Fujikoshi Kk Koshitsuhimakukeiseisochi
JPS5841351B2 (ja) * 1975-08-19 1983-09-12 ニホンシンクウギジユツ カブシキガイシヤ カツセイカハンノウジヨウチヤクソウチ
GB1579999A (en) * 1977-09-12 1980-11-26 Gen Electric Annular metal cutting die of titanium carbide coating tool steel and method of shaving metal rods
ES8103780A1 (es) * 1979-08-09 1981-03-16 Mitsubishi Metal Corp Procedimiento para la fabricacion de cuchillas dotadas de recubrimiento,para herramientas de corte
US4416912A (en) * 1979-10-13 1983-11-22 The Gillette Company Formation of coatings on cutting edges
US4297387A (en) * 1980-06-04 1981-10-27 Battelle Development Corporation Cubic boron nitride preparation
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
JPS5928629B2 (ja) * 1981-03-30 1984-07-14 工業技術院長 硬質被膜の製造方法
GB8324779D0 (en) * 1982-09-29 1983-10-19 Nat Res Dev Depositing film onto substrate
US4656052A (en) * 1984-02-13 1987-04-07 Kyocera Corporation Process for production of high-hardness boron nitride film
DK148784D0 (da) * 1984-02-29 1984-02-29 Nexus Aps Pulverprodukt
JPS60234965A (ja) * 1984-05-04 1985-11-21 Diesel Kiki Co Ltd 薄膜製造方法
JPS6222314A (ja) * 1985-07-22 1987-01-30 株式会社ボッシュオートモーティブ システム 薄膜製造方法
US4781989A (en) * 1986-03-07 1988-11-01 Mitsubishi Kinzoku Kabushiki Kaisha Surface-coated cutting member
DE3627151A1 (de) * 1986-08-11 1988-02-18 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum reaktiven aufdampfen von metallverbindungen
US4816291A (en) * 1987-08-19 1989-03-28 The Regents Of The University Of California Process for making diamond, doped diamond, diamond-cubic boron nitride composite films
US4957773A (en) * 1989-02-13 1990-09-18 Syracuse University Deposition of boron-containing films from decaborane
JPH0620464B2 (ja) * 1989-04-03 1994-03-23 信越化学工業株式会社 医療用切開、圧入器具およびその製造方法
DE4006457C2 (de) * 1990-03-01 1993-09-30 Balzers Hochvakuum Verfahren zum Verdampfen von Material in einer Vakuumaufdampfanlage sowie Anlage derselben
EP0470777A3 (en) * 1990-08-07 1993-06-02 The Boc Group, Inc. Thin gas barrier films and rapid deposition method therefor
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
DE4336680C2 (de) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Verfahren zum Elektronenstrahlverdampfen
DE4336681C2 (de) * 1993-10-27 1996-10-02 Fraunhofer Ges Forschung Verfahren und Einrichtung zum plasmaaktivierten Elektronenstrahlverdampfen
DE59608441D1 (de) * 1996-01-10 2002-01-24 Alcan Tech & Man Ag Verfahren und Vorrichtung zum Beschichten einer Substratfläche
DE19724996C1 (de) * 1997-06-13 1998-09-03 Fraunhofer Ges Forschung Verfahren zum plasmaaktivierten Elektronenstrahlverdampfen und Einrichtung zur Durchführung des Verfahrens
US6827828B2 (en) * 2001-03-29 2004-12-07 Honeywell International Inc. Mixed metal materials
US6797341B2 (en) * 2002-03-25 2004-09-28 Penn State Research Foundation Method for producing boride thin films
JP4181332B2 (ja) * 2002-03-26 2008-11-12 松下電器産業株式会社 薄膜の製造方法及び製造装置
WO2005010953A2 (en) * 2003-02-28 2005-02-03 Penn State Research Foundation Boride thin films on silicon
US8122600B2 (en) * 2003-03-03 2012-02-28 United Technologies Corporation Fan and compressor blade dovetail restoration process
GB0307745D0 (en) * 2003-04-03 2003-05-07 Microemissive Displays Ltd Method and apparatus for depositing material on a substrate
WO2004102634A2 (en) 2003-04-16 2004-11-25 The Regents Of The University Of California Metal mems devices and methods of making same
JP5139002B2 (ja) * 2007-08-10 2013-02-06 株式会社東芝 微粒子担持方法および微粒子担持装置
US8526137B2 (en) 2010-04-16 2013-09-03 International Business Machines Corporation Head comprising a crystalline alumina layer
US9023422B1 (en) * 2011-08-31 2015-05-05 Maxim Integrated Products, Inc. High rate deposition method of magnetic nanocomposites
US11499230B2 (en) 2014-08-18 2022-11-15 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
US10167555B2 (en) 2014-08-18 2019-01-01 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
CN106676480B (zh) * 2017-03-10 2019-11-08 南京大学 一种蒸发速率可控的电子束蒸发源

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230110A (en) * 1962-01-22 1966-01-18 Temescal Metallurgical Corp Method of forming carbon vapor barrier
US3373050A (en) * 1964-12-30 1968-03-12 Sperry Rand Corp Deflecting particles in vacuum coating process
US3419487A (en) * 1966-01-24 1968-12-31 Dow Corning Method of growing thin film semiconductors using an electron beam
US3695910A (en) * 1969-01-21 1972-10-03 Anthony W Louderback Method of applying a multilayer antireflection coating to a substrate
US3677795A (en) * 1969-05-01 1972-07-18 Gulf Oil Corp Method of making a prosthetic device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
US4609564A (en) * 1981-02-24 1986-09-02 Wedtech Corp. Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4505948A (en) * 1983-05-13 1985-03-19 Wedtech Corp. Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
GB2173512A (en) * 1985-04-03 1986-10-15 Barr & Stroud Ltd Apparatus and method for chemical vapour deposition of products
GB2189509A (en) * 1986-03-27 1987-10-28 Mitsubishi Electric Corp Process for coating a workpiece with a ceramic material
US4816293A (en) * 1986-03-27 1989-03-28 Mitsubishi Denki Kabushiki Kaisha Process for coating a workpiece with a ceramic material
GB2189509B (en) * 1986-03-27 1990-10-17 Mitsubishi Electric Corp Process for coating a workpiece with a ceramic material

Also Published As

Publication number Publication date
JPS5148463B2 (enrdf_load_stackoverflow) 1976-12-21
DE2330545A1 (de) 1974-01-03
JPS4952186A (enrdf_load_stackoverflow) 1974-05-21
DE2330545B2 (de) 1977-06-08
US3791852A (en) 1974-02-12

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLE Entries relating assignments, transmissions, licences in the register of patents
PCNP Patent ceased through non-payment of renewal fee