JPS4952186A - - Google Patents

Info

Publication number
JPS4952186A
JPS4952186A JP48067000A JP6700073A JPS4952186A JP S4952186 A JPS4952186 A JP S4952186A JP 48067000 A JP48067000 A JP 48067000A JP 6700073 A JP6700073 A JP 6700073A JP S4952186 A JPS4952186 A JP S4952186A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48067000A
Other languages
Japanese (ja)
Other versions
JPS5148463B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4952186A publication Critical patent/JPS4952186A/ja
Publication of JPS5148463B2 publication Critical patent/JPS5148463B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP48067000A 1972-06-16 1973-06-15 Expired JPS5148463B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26370872A 1972-06-16 1972-06-16

Publications (2)

Publication Number Publication Date
JPS4952186A true JPS4952186A (enrdf_load_stackoverflow) 1974-05-21
JPS5148463B2 JPS5148463B2 (enrdf_load_stackoverflow) 1976-12-21

Family

ID=23002928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48067000A Expired JPS5148463B2 (enrdf_load_stackoverflow) 1972-06-16 1973-06-15

Country Status (4)

Country Link
US (1) US3791852A (enrdf_load_stackoverflow)
JP (1) JPS5148463B2 (enrdf_load_stackoverflow)
DE (1) DE2330545B2 (enrdf_load_stackoverflow)
GB (1) GB1392583A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036381A (enrdf_load_stackoverflow) * 1973-08-04 1975-04-05
JPS51107287A (ja) * 1975-03-18 1976-09-22 Fujikoshi Kk Koshitsuhimakukeiseisochi
JPS5223579A (en) * 1975-08-19 1977-02-22 Ulvac Corp Activation reaction evaporating apparatus
JPS57161058A (en) * 1981-03-30 1982-10-04 Agency Of Ind Science & Technol Production of hard film

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916052A (en) * 1973-05-16 1975-10-28 Airco Inc Coating of carbon-containing substrates with titanium carbide
GB1579999A (en) * 1977-09-12 1980-11-26 Gen Electric Annular metal cutting die of titanium carbide coating tool steel and method of shaving metal rods
ES8103780A1 (es) * 1979-08-09 1981-03-16 Mitsubishi Metal Corp Procedimiento para la fabricacion de cuchillas dotadas de recubrimiento,para herramientas de corte
US4416912A (en) * 1979-10-13 1983-11-22 The Gillette Company Formation of coatings on cutting edges
US4297387A (en) * 1980-06-04 1981-10-27 Battelle Development Corporation Cubic boron nitride preparation
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
GB8324779D0 (en) * 1982-09-29 1983-10-19 Nat Res Dev Depositing film onto substrate
US4656052A (en) * 1984-02-13 1987-04-07 Kyocera Corporation Process for production of high-hardness boron nitride film
DK148784D0 (da) * 1984-02-29 1984-02-29 Nexus Aps Pulverprodukt
JPS60234965A (ja) * 1984-05-04 1985-11-21 Diesel Kiki Co Ltd 薄膜製造方法
GB8508699D0 (en) * 1985-04-03 1985-05-09 Barr & Stroud Ltd Chemical vapour deposition of products
JPS6222314A (ja) * 1985-07-22 1987-01-30 株式会社ボッシュオートモーティブ　システム 薄膜製造方法
US4781989A (en) * 1986-03-07 1988-11-01 Mitsubishi Kinzoku Kabushiki Kaisha Surface-coated cutting member
US4816293A (en) * 1986-03-27 1989-03-28 Mitsubishi Denki Kabushiki Kaisha Process for coating a workpiece with a ceramic material
DE3627151A1 (de) * 1986-08-11 1988-02-18 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum reaktiven aufdampfen von metallverbindungen
US4816291A (en) * 1987-08-19 1989-03-28 The Regents Of The University Of California Process for making diamond, doped diamond, diamond-cubic boron nitride composite films
US4957773A (en) * 1989-02-13 1990-09-18 Syracuse University Deposition of boron-containing films from decaborane
JPH0620464B2 (ja) * 1989-04-03 1994-03-23 信越化学工業株式会社 医療用切開、圧入器具およびその製造方法
DE4006457C2 (de) * 1990-03-01 1993-09-30 Balzers Hochvakuum Verfahren zum Verdampfen von Material in einer Vakuumaufdampfanlage sowie Anlage derselben
EP0470777A3 (en) * 1990-08-07 1993-06-02 The Boc Group, Inc. Thin gas barrier films and rapid deposition method therefor
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
DE4336680C2 (de) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Verfahren zum Elektronenstrahlverdampfen
DE4336681C2 (de) * 1993-10-27 1996-10-02 Fraunhofer Ges Forschung Verfahren und Einrichtung zum plasmaaktivierten Elektronenstrahlverdampfen
DE59608441D1 (de) * 1996-01-10 2002-01-24 Alcan Tech & Man Ag Verfahren und Vorrichtung zum Beschichten einer Substratfläche
DE19724996C1 (de) * 1997-06-13 1998-09-03 Fraunhofer Ges Forschung Verfahren zum plasmaaktivierten Elektronenstrahlverdampfen und Einrichtung zur Durchführung des Verfahrens
US6827828B2 (en) * 2001-03-29 2004-12-07 Honeywell International Inc. Mixed metal materials
US6797341B2 (en) * 2002-03-25 2004-09-28 Penn State Research Foundation Method for producing boride thin films
JP4181332B2 (ja) * 2002-03-26 2008-11-12 松下電器産業株式会社 薄膜の製造方法及び製造装置
WO2005010953A2 (en) * 2003-02-28 2005-02-03 Penn State Research Foundation Boride thin films on silicon
US8122600B2 (en) * 2003-03-03 2012-02-28 United Technologies Corporation Fan and compressor blade dovetail restoration process
GB0307745D0 (en) * 2003-04-03 2003-05-07 Microemissive Displays Ltd Method and apparatus for depositing material on a substrate
WO2004102634A2 (en) 2003-04-16 2004-11-25 The Regents Of The University Of California Metal mems devices and methods of making same
JP5139002B2 (ja) * 2007-08-10 2013-02-06 株式会社東芝 微粒子担持方法および微粒子担持装置
US8526137B2 (en) 2010-04-16 2013-09-03 International Business Machines Corporation Head comprising a crystalline alumina layer
US9023422B1 (en) * 2011-08-31 2015-05-05 Maxim Integrated Products, Inc. High rate deposition method of magnetic nanocomposites
US11499230B2 (en) 2014-08-18 2022-11-15 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
US10167555B2 (en) 2014-08-18 2019-01-01 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
CN106676480B (zh) * 2017-03-10 2019-11-08 南京大学 一种蒸发速率可控的电子束蒸发源

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230110A (en) * 1962-01-22 1966-01-18 Temescal Metallurgical Corp Method of forming carbon vapor barrier
US3373050A (en) * 1964-12-30 1968-03-12 Sperry Rand Corp Deflecting particles in vacuum coating process
US3419487A (en) * 1966-01-24 1968-12-31 Dow Corning Method of growing thin film semiconductors using an electron beam
US3695910A (en) * 1969-01-21 1972-10-03 Anthony W Louderback Method of applying a multilayer antireflection coating to a substrate
US3677795A (en) * 1969-05-01 1972-07-18 Gulf Oil Corp Method of making a prosthetic device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036381A (enrdf_load_stackoverflow) * 1973-08-04 1975-04-05
JPS51107287A (ja) * 1975-03-18 1976-09-22 Fujikoshi Kk Koshitsuhimakukeiseisochi
JPS5223579A (en) * 1975-08-19 1977-02-22 Ulvac Corp Activation reaction evaporating apparatus
JPS57161058A (en) * 1981-03-30 1982-10-04 Agency Of Ind Science & Technol Production of hard film

Also Published As

Publication number Publication date
JPS5148463B2 (enrdf_load_stackoverflow) 1976-12-21
DE2330545A1 (de) 1974-01-03
DE2330545B2 (de) 1977-06-08
US3791852A (en) 1974-02-12
GB1392583A (en) 1975-04-30

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