GB8508699D0 - Chemical vapour deposition of products - Google Patents

Chemical vapour deposition of products

Info

Publication number
GB8508699D0
GB8508699D0 GB858508699A GB8508699A GB8508699D0 GB 8508699 D0 GB8508699 D0 GB 8508699D0 GB 858508699 A GB858508699 A GB 858508699A GB 8508699 A GB8508699 A GB 8508699A GB 8508699 D0 GB8508699 D0 GB 8508699D0
Authority
GB
United Kingdom
Prior art keywords
products
vapour deposition
chemical vapour
chemical
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GB858508699A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales Optronics Ltd
Original Assignee
Thales Optronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thales Optronics Ltd filed Critical Thales Optronics Ltd
Priority to GB858508699A priority Critical patent/GB8508699D0/en
Publication of GB8508699D0 publication Critical patent/GB8508699D0/en
Priority to GB08608070A priority patent/GB2173512A/en
Pending legal-status Critical Current

Links

GB858508699A 1985-04-03 1985-04-03 Chemical vapour deposition of products Pending GB8508699D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB858508699A GB8508699D0 (en) 1985-04-03 1985-04-03 Chemical vapour deposition of products
GB08608070A GB2173512A (en) 1985-04-03 1986-04-02 Apparatus and method for chemical vapour deposition of products

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB858508699A GB8508699D0 (en) 1985-04-03 1985-04-03 Chemical vapour deposition of products

Publications (1)

Publication Number Publication Date
GB8508699D0 true GB8508699D0 (en) 1985-05-09

Family

ID=10577136

Family Applications (2)

Application Number Title Priority Date Filing Date
GB858508699A Pending GB8508699D0 (en) 1985-04-03 1985-04-03 Chemical vapour deposition of products
GB08608070A Withdrawn GB2173512A (en) 1985-04-03 1986-04-02 Apparatus and method for chemical vapour deposition of products

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB08608070A Withdrawn GB2173512A (en) 1985-04-03 1986-04-02 Apparatus and method for chemical vapour deposition of products

Country Status (1)

Country Link
GB (2) GB8508699D0 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107604340A (en) * 2017-08-31 2018-01-19 清远先导材料有限公司 Chemical vapor deposition stove
CN112663024A (en) * 2020-12-11 2021-04-16 中材人工晶体研究院有限公司 CVD equipment for preparing optical ZnS material
CN112730140A (en) * 2020-12-22 2021-04-30 上海辰荣电炉有限公司 Novel high-vacuum high-temperature quality monitoring device and method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111074237A (en) * 2018-10-18 2020-04-28 君泰创新（北京）科技有限公司 Source bottle

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1172465A (en) * 1967-08-04 1969-12-03 Siemens Ag Process for producing a layer of the intermetallic superconducting compound Niobium-tin (Nb3Sn) on a support
US3791852A (en) * 1972-06-16 1974-02-12 Univ California High rate deposition of carbides by activated reactive evaporation
GB1439861A (en) * 1973-05-08 1976-06-16 Atomic Energy Authority Uk Fluidised bed apparatus
US4033287A (en) * 1976-01-22 1977-07-05 Bell Telephone Laboratories, Incorporated Radial flow reactor including glow discharge limiting shield
US4062318A (en) * 1976-11-19 1977-12-13 Rca Corporation Apparatus for chemical vapor deposition
JPH0766910B2 (en) * 1984-07-26 1995-07-19 新技術事業団 Semiconductor single crystal growth equipment
JPH0766909B2 (en) * 1984-07-26 1995-07-19 新技術事業団 Element semiconductor single crystal thin film growth method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107604340A (en) * 2017-08-31 2018-01-19 清远先导材料有限公司 Chemical vapor deposition stove
CN107604340B (en) * 2017-08-31 2023-09-01 安徽光智科技有限公司 Chemical Vapor Deposition Furnace
CN112663024A (en) * 2020-12-11 2021-04-16 中材人工晶体研究院有限公司 CVD equipment for preparing optical ZnS material
CN112730140A (en) * 2020-12-22 2021-04-30 上海辰荣电炉有限公司 Novel high-vacuum high-temperature quality monitoring device and method

Also Published As

Publication number Publication date
GB2173512A (en) 1986-10-15
GB8608070D0 (en) 1986-05-08

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