GB8608070D0 - Chemical vapour deposition of products - Google Patents

Chemical vapour deposition of products

Info

Publication number
GB8608070D0
GB8608070D0 GB868608070A GB8608070A GB8608070D0 GB 8608070 D0 GB8608070 D0 GB 8608070D0 GB 868608070 A GB868608070 A GB 868608070A GB 8608070 A GB8608070 A GB 8608070A GB 8608070 D0 GB8608070 D0 GB 8608070D0
Authority
GB
United Kingdom
Prior art keywords
products
vapour deposition
chemical vapour
chemical
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB868608070A
Other versions
GB2173512A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales Optronics Ltd
Original Assignee
Thales Optronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thales Optronics Ltd filed Critical Thales Optronics Ltd
Publication of GB8608070D0 publication Critical patent/GB8608070D0/en
Publication of GB2173512A publication Critical patent/GB2173512A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4487—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by using a condenser
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
GB08608070A 1985-04-03 1986-04-02 Apparatus and method for chemical vapour deposition of products Withdrawn GB2173512A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB858508699A GB8508699D0 (en) 1985-04-03 1985-04-03 Chemical vapour deposition of products

Publications (2)

Publication Number Publication Date
GB8608070D0 true GB8608070D0 (en) 1986-05-08
GB2173512A GB2173512A (en) 1986-10-15

Family

ID=10577136

Family Applications (2)

Application Number Title Priority Date Filing Date
GB858508699A Pending GB8508699D0 (en) 1985-04-03 1985-04-03 Chemical vapour deposition of products
GB08608070A Withdrawn GB2173512A (en) 1985-04-03 1986-04-02 Apparatus and method for chemical vapour deposition of products

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB858508699A Pending GB8508699D0 (en) 1985-04-03 1985-04-03 Chemical vapour deposition of products

Country Status (1)

Country Link
GB (2) GB8508699D0 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111074237A (en) * 2018-10-18 2020-04-28 君泰创新（北京）科技有限公司 Source bottle

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107604340B (en) * 2017-08-31 2023-09-01 安徽光智科技有限公司 Chemical Vapor Deposition Furnace
CN112663024A (en) * 2020-12-11 2021-04-16 中材人工晶体研究院有限公司 CVD equipment for preparing optical ZnS material
CN112730140B (en) * 2020-12-22 2022-11-08 上海辰荣电炉有限公司 Novel high-vacuum high-temperature quality monitoring device and method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1172465A (en) * 1967-08-04 1969-12-03 Siemens Ag Process for producing a layer of the intermetallic superconducting compound Niobium-tin (Nb3Sn) on a support
US3791852A (en) * 1972-06-16 1974-02-12 Univ California High rate deposition of carbides by activated reactive evaporation
GB1439861A (en) * 1973-05-08 1976-06-16 Atomic Energy Authority Uk Fluidised bed apparatus
US4033287A (en) * 1976-01-22 1977-07-05 Bell Telephone Laboratories, Incorporated Radial flow reactor including glow discharge limiting shield
US4062318A (en) * 1976-11-19 1977-12-13 Rca Corporation Apparatus for chemical vapor deposition
JPH0766909B2 (en) * 1984-07-26 1995-07-19 新技術事業団 Element semiconductor single crystal thin film growth method
JPH0766910B2 (en) * 1984-07-26 1995-07-19 新技術事業団 Semiconductor single crystal growth equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111074237A (en) * 2018-10-18 2020-04-28 君泰创新（北京）科技有限公司 Source bottle

Also Published As

Publication number Publication date
GB2173512A (en) 1986-10-15
GB8508699D0 (en) 1985-05-09

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)