GB2155959B - Chemical vapour deposition - Google Patents

Chemical vapour deposition

Info

Publication number
GB2155959B
GB2155959B GB08406693A GB8406693A GB2155959B GB 2155959 B GB2155959 B GB 2155959B GB 08406693 A GB08406693 A GB 08406693A GB 8406693 A GB8406693 A GB 8406693A GB 2155959 B GB2155959 B GB 2155959B
Authority
GB
United Kingdom
Prior art keywords
vapour deposition
chemical vapour
chemical
deposition
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08406693A
Other versions
GB8406693D0 (en
GB2155959A (en
Inventor
Stephen Arthur Banyard
Stephen Hornblow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Secretary of State for Defence
Original Assignee
UK Secretary of State for Defence
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Secretary of State for Defence filed Critical UK Secretary of State for Defence
Priority to GB08406693A priority Critical patent/GB2155959B/en
Publication of GB8406693D0 publication Critical patent/GB8406693D0/en
Publication of GB2155959A publication Critical patent/GB2155959A/en
Application granted granted Critical
Publication of GB2155959B publication Critical patent/GB2155959B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
GB08406693A 1984-03-14 1984-03-14 Chemical vapour deposition Expired GB2155959B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08406693A GB2155959B (en) 1984-03-14 1984-03-14 Chemical vapour deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08406693A GB2155959B (en) 1984-03-14 1984-03-14 Chemical vapour deposition

Publications (3)

Publication Number Publication Date
GB8406693D0 GB8406693D0 (en) 1984-04-18
GB2155959A GB2155959A (en) 1985-10-02
GB2155959B true GB2155959B (en) 1987-02-04

Family

ID=10558090

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08406693A Expired GB2155959B (en) 1984-03-14 1984-03-14 Chemical vapour deposition

Country Status (1)

Country Link
GB (1) GB2155959B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07105349B2 (en) * 1985-11-08 1995-11-13 フオ−カス・セミコンダクタ・システムズ・インコ−ポレイテツド Thin film deposition method, thin film deposition apparatus, and chemical vapor deposition apparatus
JP2839720B2 (en) * 1990-12-19 1998-12-16 株式会社東芝 Heat treatment equipment

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1112140A (en) * 1966-05-27 1968-05-01 Dow Corning A method and apparatus for the continuous production of semiconductor materials

Also Published As

Publication number Publication date
GB8406693D0 (en) 1984-04-18
GB2155959A (en) 1985-10-02

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20000314