GB8624006D0 - Metalorganic chemical vapour deposition cell - Google Patents

Metalorganic chemical vapour deposition cell

Info

Publication number
GB8624006D0
GB8624006D0 GB868624006A GB8624006A GB8624006D0 GB 8624006 D0 GB8624006 D0 GB 8624006D0 GB 868624006 A GB868624006 A GB 868624006A GB 8624006 A GB8624006 A GB 8624006A GB 8624006 D0 GB8624006 D0 GB 8624006D0
Authority
GB
United Kingdom
Prior art keywords
vapour deposition
chemical vapour
metalorganic chemical
deposition cell
cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB868624006A
Other versions
GB2196019A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cambridge Instruments Ltd
Original Assignee
Cambridge Instruments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cambridge Instruments Ltd filed Critical Cambridge Instruments Ltd
Priority to GB08624006A priority Critical patent/GB2196019A/en
Publication of GB8624006D0 publication Critical patent/GB8624006D0/en
Priority to DE19873733499 priority patent/DE3733499A1/en
Priority to JP25003487A priority patent/JPS63128622A/en
Publication of GB2196019A publication Critical patent/GB2196019A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
GB08624006A 1986-10-07 1986-10-07 Metalorganic chemical vapour deposition Withdrawn GB2196019A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB08624006A GB2196019A (en) 1986-10-07 1986-10-07 Metalorganic chemical vapour deposition
DE19873733499 DE3733499A1 (en) 1986-10-07 1987-10-03 METHOD AND DEVICE FOR DEPOSIT FROM THE STEAM PHASE
JP25003487A JPS63128622A (en) 1986-10-07 1987-10-05 Method and apparatus for chemical evaporation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08624006A GB2196019A (en) 1986-10-07 1986-10-07 Metalorganic chemical vapour deposition

Publications (2)

Publication Number Publication Date
GB8624006D0 true GB8624006D0 (en) 1986-11-12
GB2196019A GB2196019A (en) 1988-04-20

Family

ID=10605355

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08624006A Withdrawn GB2196019A (en) 1986-10-07 1986-10-07 Metalorganic chemical vapour deposition

Country Status (3)

Country Link
JP (1) JPS63128622A (en)
DE (1) DE3733499A1 (en)
GB (1) GB2196019A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IN177541B (en) * 1990-06-29 1997-02-08 Geoffrey Norman Pain
US5304248A (en) * 1990-12-05 1994-04-19 Applied Materials, Inc. Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions
KR100243784B1 (en) * 1990-12-05 2000-02-01 조셉 제이. 스위니 Passive shield for cvd wafer processing which provides front side edge exclusion and prevents backside depositions
US5328722A (en) * 1992-11-06 1994-07-12 Applied Materials, Inc. Metal chemical vapor deposition process using a shadow ring

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL262369A (en) * 1959-05-28 1900-01-01
NL252532A (en) * 1959-06-30 1900-01-01
NL268294A (en) * 1960-10-10
GB1172230A (en) * 1965-12-16 1969-11-26 Matsushita Electronics Corp A Method of Manufacturing Semiconductor Device
GB1189344A (en) * 1966-06-20 1970-04-22 Matsushita Electronics Corp Process and Apparatus for Depositing Refractory Metals
US3573974A (en) * 1968-03-21 1971-04-06 Ibm Method of fabricating ohmic contacts and conductive connectors
JPS537513A (en) * 1976-07-10 1978-01-24 Mitsubishi Metal Corp Covered hard alloy product
US4314873A (en) * 1977-07-05 1982-02-09 The United States Of America As Represented By The Secretary Of The Navy Method for depositing heteroepitaxially InP on GaAs semi-insulating substrates
JPS5833829A (en) * 1981-08-24 1983-02-28 Toshiba Corp Thin film forming apparatus
US4443488A (en) * 1981-10-19 1984-04-17 Spire Corporation Plasma ion deposition process
US4592933A (en) * 1984-06-29 1986-06-03 International Business Machines Corporation High efficiency homogeneous chemical vapor deposition
JPS61158877A (en) * 1984-12-27 1986-07-18 小宮山　宏 Manufacture of ceramic porous membrane

Also Published As

Publication number Publication date
DE3733499A1 (en) 1988-04-14
JPS63128622A (en) 1988-06-01
GB2196019A (en) 1988-04-20

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)