GB1189344A - Process and Apparatus for Depositing Refractory Metals - Google Patents

Process and Apparatus for Depositing Refractory Metals

Info

Publication number
GB1189344A
GB1189344A GB2705667A GB2705667A GB1189344A GB 1189344 A GB1189344 A GB 1189344A GB 2705667 A GB2705667 A GB 2705667A GB 2705667 A GB2705667 A GB 2705667A GB 1189344 A GB1189344 A GB 1189344A
Authority
GB
United Kingdom
Prior art keywords
heated
gas mixture
substrate
heater
june
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2705667A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Publication of GB1189344A publication Critical patent/GB1189344A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides

Abstract

1,189,344. Coating with metals. MATSUSHITA ELECTRONICS CORP. June 12, 1967 [June 20, 1966], No. 27056/67. Heading C7F. Groups IV and V transition metals Nb, Ta, V, Ti, Zr are deposited on a substrate maintained at 350‹ -700‹ C. from a gas mixture of hydrogen and a gaseous halogen compound of the metal, the gas mixture being pre-heated by a mesh or porous pre-heater plate in the evacuated reaction tube prior to contacting the substrate. The substrate may be ceramic, quartz or a metal and the gas mixture is pre-heated to 600‹ -1300‹C. As shown in Fig. 2 the gas mixture enters reaction tube 11 via 12, is pre-heated by pre-heater 8 made of porous or mesh like Mo, Ta or C the heating being induction, resistance or infrared. The preheater is located 0À3-2 cms. from the substrate 15 which is heated by induction heater 13.
GB2705667A 1966-06-20 1967-06-12 Process and Apparatus for Depositing Refractory Metals Expired GB1189344A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4089566 1966-06-20

Publications (1)

Publication Number Publication Date
GB1189344A true GB1189344A (en) 1970-04-22

Family

ID=12593229

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2705667A Expired GB1189344A (en) 1966-06-20 1967-06-12 Process and Apparatus for Depositing Refractory Metals

Country Status (4)

Country Link
BE (1) BE700185A (en)
CH (1) CH485867A (en)
GB (1) GB1189344A (en)
NL (1) NL149232B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2196019A (en) * 1986-10-07 1988-04-20 Cambridge Instr Ltd Metalorganic chemical vapour deposition
WO1990010092A1 (en) * 1989-02-24 1990-09-07 Massachusetts Institute Of Technology A modified stagnation flow apparatus for chemical vapor deposition providing excellent control of the deposition
US4997677A (en) * 1987-08-31 1991-03-05 Massachusetts Institute Of Technology Vapor phase reactor for making multilayer structures

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3762052D1 (en) * 1986-03-31 1990-05-03 Unisys Corp DEPOSITION OF A VANADIN MAT FOR MAGNETIC FILMS.

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2196019A (en) * 1986-10-07 1988-04-20 Cambridge Instr Ltd Metalorganic chemical vapour deposition
US4997677A (en) * 1987-08-31 1991-03-05 Massachusetts Institute Of Technology Vapor phase reactor for making multilayer structures
WO1990010092A1 (en) * 1989-02-24 1990-09-07 Massachusetts Institute Of Technology A modified stagnation flow apparatus for chemical vapor deposition providing excellent control of the deposition

Also Published As

Publication number Publication date
NL149232B (en) 1976-04-15
DE1621289B2 (en) 1972-08-17
CH485867A (en) 1970-02-15
BE700185A (en) 1967-12-01
NL6708168A (en) 1967-12-21
DE1621289A1 (en) 1971-05-13

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee