GB8625410D0 - Vapour deposition apparatus - Google Patents

Vapour deposition apparatus

Info

Publication number
GB8625410D0
GB8625410D0 GB868625410A GB8625410A GB8625410D0 GB 8625410 D0 GB8625410 D0 GB 8625410D0 GB 868625410 A GB868625410 A GB 868625410A GB 8625410 A GB8625410 A GB 8625410A GB 8625410 D0 GB8625410 D0 GB 8625410D0
Authority
GB
United Kingdom
Prior art keywords
deposition apparatus
vapour deposition
vapour
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB868625410A
Other versions
GB2182061B (en
GB2182061A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB858526241A external-priority patent/GB8526241D0/en
Priority claimed from US06/802,744 external-priority patent/US4703718A/en
Application filed by RCA Corp filed Critical RCA Corp
Publication of GB8625410D0 publication Critical patent/GB8625410D0/en
Publication of GB2182061A publication Critical patent/GB2182061A/en
Application granted granted Critical
Publication of GB2182061B publication Critical patent/GB2182061B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
GB8625410A 1985-10-24 1986-10-23 Substrate treatment apparatus Expired - Fee Related GB2182061B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB858526241A GB8526241D0 (en) 1985-10-24 1985-10-24 Inlet chamber for mocvd reactor
US06/802,744 US4703718A (en) 1985-11-29 1985-11-29 Vapor deposition apparatus and method of using same

Publications (3)

Publication Number Publication Date
GB8625410D0 true GB8625410D0 (en) 1986-11-26
GB2182061A GB2182061A (en) 1987-05-07
GB2182061B GB2182061B (en) 1990-02-21

Family

ID=26289926

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8625410A Expired - Fee Related GB2182061B (en) 1985-10-24 1986-10-23 Substrate treatment apparatus

Country Status (2)

Country Link
CA (1) CA1280055C (en)
GB (1) GB2182061B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2177119B (en) * 1985-06-26 1989-04-26 Plessey Co Plc Organometallic chemical vapour deposition
KR960015375B1 (en) * 1994-06-08 1996-11-11 현대전자산업 주식회사 Method and apparatus for manufacturing ferroelectric film

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB859688A (en) * 1958-03-11 1961-01-25 Pilkington Brothers Ltd Improvements in or relating to mixing apparatus
US3152932A (en) * 1962-01-29 1964-10-13 Hughes Aircraft Co Reduction in situ of a dipolar molecular gas adhering to a substrate
GB1022477A (en) * 1962-12-14 1966-03-16 Int Rectifier Corp Improvements in or relating to epitaxial deposition of semiconductor devices
US3424661A (en) * 1966-09-01 1969-01-28 Bell Telephone Labor Inc Method of conducting chemical reactions in a glow discharge
US3472689A (en) * 1967-01-19 1969-10-14 Rca Corp Vapor deposition of silicon-nitrogen insulating coatings
US3887726A (en) * 1973-06-29 1975-06-03 Ibm Method of chemical vapor deposition to provide silicon dioxide films with reduced surface state charge on semiconductor substrates
GB1601699A (en) * 1977-11-03 1981-11-04 Gen Eng Radcliffe Method and apparatus for dispersing a liquid additive throughout a plastics material
CA1245109A (en) * 1983-10-31 1988-11-22 Hsien-Kun Chu Method of forming amorphous polymeric halosilane films and products produced therefrom

Also Published As

Publication number Publication date
GB2182061B (en) 1990-02-21
CA1280055C (en) 1991-02-12
GB2182061A (en) 1987-05-07

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19981023