GB1392583A - High rate deposition of carbides by activated reactive evaporation - Google Patents

High rate deposition of carbides by activated reactive evaporation

Info

Publication number
GB1392583A
GB1392583A GB2663873A GB2663873A GB1392583A GB 1392583 A GB1392583 A GB 1392583A GB 2663873 A GB2663873 A GB 2663873A GB 2663873 A GB2663873 A GB 2663873A GB 1392583 A GB1392583 A GB 1392583A
Authority
GB
United Kingdom
Prior art keywords
carbides
high rate
reactive evaporation
activated reactive
rate deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2663873A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bunshah R F
Original Assignee
Bunshah R F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bunshah R F filed Critical Bunshah R F
Publication of GB1392583A publication Critical patent/GB1392583A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

1392583 Metallic carbides R F BUNSHAH 5 June 1973 [16 June 1972] 26638/73 Heading C1A [Also, in Division C7] A carbide film of, e.g. Ti, Zr, Hf, V, Nb or Ta is formed on a substrate 24 by evaporating a metal rod 14 by an electron beam 20. An electrode 46 deflects some of the electrons from the beam to a reaction zone, to which a hydrocarbon gas, e.g. acetylene or ethylene, is fed through a nozzle 41. The temperature of the substrate is controlled by a heater 27. If a powdery deposit is required, the temperature is kept at either a low or ambient temperature.
GB2663873A 1972-06-16 1973-06-05 High rate deposition of carbides by activated reactive evaporation Expired GB1392583A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26370872A 1972-06-16 1972-06-16

Publications (1)

Publication Number Publication Date
GB1392583A true GB1392583A (en) 1975-04-30

Family

ID=23002928

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2663873A Expired GB1392583A (en) 1972-06-16 1973-06-05 High rate deposition of carbides by activated reactive evaporation

Country Status (4)

Country Link
US (1) US3791852A (en)
JP (1) JPS5148463B2 (en)
DE (1) DE2330545B2 (en)
GB (1) GB1392583A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4505948A (en) * 1983-05-13 1985-03-19 Wedtech Corp. Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
GB2173512A (en) * 1985-04-03 1986-10-15 Barr & Stroud Ltd Apparatus and method for chemical vapour deposition of products
GB2189509A (en) * 1986-03-27 1987-10-28 Mitsubishi Electric Corp Process for coating a workpiece with a ceramic material
DE3390533C2 (en) * 1983-09-30 1992-07-09 Vni Skij Instr Nyj I Cutting tool and method for its production

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916052A (en) * 1973-05-16 1975-10-28 Airco Inc Coating of carbon-containing substrates with titanium carbide
JPS5318184B2 (en) * 1973-08-04 1978-06-13
JPS51107287A (en) * 1975-03-18 1976-09-22 Fujikoshi Kk KOSHITSUHIMAKUKEISEISOCHI
JPS5841351B2 (en) * 1975-08-19 1983-09-12 ニホンシンクウギジユツ カブシキガイシヤ Katsuseikahannoujiyouchiyakuuchi
GB1579999A (en) * 1977-09-12 1980-11-26 Gen Electric Annular metal cutting die of titanium carbide coating tool steel and method of shaving metal rods
ES494779A0 (en) * 1979-08-09 1981-03-16 Mitsubishi Metal Corp PROCEDURE FOR THE MANUFACTURE OF BLADES EQUIPPED WITH COATING, FOR CUTTING TOOLS
US4416912A (en) * 1979-10-13 1983-11-22 The Gillette Company Formation of coatings on cutting edges
US4297387A (en) * 1980-06-04 1981-10-27 Battelle Development Corporation Cubic boron nitride preparation
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
JPS5928629B2 (en) * 1981-03-30 1984-07-14 工業技術院長 Hard coating manufacturing method
GB8324779D0 (en) * 1982-09-29 1983-10-19 Nat Res Dev Depositing film onto substrate
US4656052A (en) * 1984-02-13 1987-04-07 Kyocera Corporation Process for production of high-hardness boron nitride film
DK148784D0 (en) * 1984-02-29 1984-02-29 Nexus Aps POWDER PRODUCTS
JPS60234965A (en) * 1984-05-04 1985-11-21 Diesel Kiki Co Ltd Manufacture of thin film
JPS6222314A (en) * 1985-07-22 1987-01-30 株式会社ボッシュオートモーティブ　システム Manufacture of thin film
US4781989A (en) * 1986-03-07 1988-11-01 Mitsubishi Kinzoku Kabushiki Kaisha Surface-coated cutting member
DE3627151A1 (en) * 1986-08-11 1988-02-18 Leybold Heraeus Gmbh & Co Kg METHOD AND DEVICE FOR REACTIVELY EVAPORATING METAL COMPOUNDS
US4816291A (en) * 1987-08-19 1989-03-28 The Regents Of The University Of California Process for making diamond, doped diamond, diamond-cubic boron nitride composite films
US4957773A (en) * 1989-02-13 1990-09-18 Syracuse University Deposition of boron-containing films from decaborane
JPH0620464B2 (en) * 1989-04-03 1994-03-23 信越化学工業株式会社 Medical incision, press-fitting device and method of manufacturing the same
DE4006457C2 (en) * 1990-03-01 1993-09-30 Balzers Hochvakuum Process for evaporating material in a vacuum evaporation plant and plant thereof
EP0470777A3 (en) * 1990-08-07 1993-06-02 The Boc Group, Inc. Thin gas barrier films and rapid deposition method therefor
CH683776A5 (en) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Coating a substrate surface with a permeation barrier.
DE4336681C2 (en) * 1993-10-27 1996-10-02 Fraunhofer Ges Forschung Method and device for plasma-activated electron beam evaporation
DE4336680C2 (en) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Process for electron beam evaporation
EP0784102B1 (en) * 1996-01-10 2001-12-12 Alcan Technology & Management AG Process and apparatus for coating a substrate surface
DE19724996C1 (en) * 1997-06-13 1998-09-03 Fraunhofer Ges Forschung Plasma-activated electron beam vapour deposition
US6827828B2 (en) * 2001-03-29 2004-12-07 Honeywell International Inc. Mixed metal materials
WO2003082482A1 (en) * 2002-03-25 2003-10-09 Penn State Research Foundation Method for producing boride thin films
JP4181332B2 (en) * 2002-03-26 2008-11-12 松下電器産業株式会社 Thin film manufacturing method and manufacturing apparatus
WO2005010953A2 (en) * 2003-02-28 2005-02-03 Penn State Research Foundation Boride thin films on silicon
US8122600B2 (en) * 2003-03-03 2012-02-28 United Technologies Corporation Fan and compressor blade dovetail restoration process
GB0307745D0 (en) * 2003-04-03 2003-05-07 Microemissive Displays Ltd Method and apparatus for depositing material on a substrate
WO2004102634A2 (en) 2003-04-16 2004-11-25 The Regents Of The University Of California Metal mems devices and methods of making same
JP5139002B2 (en) * 2007-08-10 2013-02-06 株式会社東芝 Fine particle carrying method and fine particle carrying device
US8526137B2 (en) 2010-04-16 2013-09-03 International Business Machines Corporation Head comprising a crystalline alumina layer
US9023422B1 (en) * 2011-08-31 2015-05-05 Maxim Integrated Products, Inc. High rate deposition method of magnetic nanocomposites
US10167555B2 (en) 2014-08-18 2019-01-01 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
US11499230B2 (en) 2014-08-18 2022-11-15 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
CN106676480B (en) * 2017-03-10 2019-11-08 南京大学 A kind of electron beam evaporation source that evaporation rate is controllable

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230110A (en) * 1962-01-22 1966-01-18 Temescal Metallurgical Corp Method of forming carbon vapor barrier
US3373050A (en) * 1964-12-30 1968-03-12 Sperry Rand Corp Deflecting particles in vacuum coating process
US3419487A (en) * 1966-01-24 1968-12-31 Dow Corning Method of growing thin film semiconductors using an electron beam
US3695910A (en) * 1969-01-21 1972-10-03 Anthony W Louderback Method of applying a multilayer antireflection coating to a substrate
US3677795A (en) * 1969-05-01 1972-07-18 Gulf Oil Corp Method of making a prosthetic device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
US4609564A (en) * 1981-02-24 1986-09-02 Wedtech Corp. Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4505948A (en) * 1983-05-13 1985-03-19 Wedtech Corp. Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
DE3390533C2 (en) * 1983-09-30 1992-07-09 Vni Skij Instr Nyj I Cutting tool and method for its production
GB2173512A (en) * 1985-04-03 1986-10-15 Barr & Stroud Ltd Apparatus and method for chemical vapour deposition of products
GB2189509A (en) * 1986-03-27 1987-10-28 Mitsubishi Electric Corp Process for coating a workpiece with a ceramic material
US4816293A (en) * 1986-03-27 1989-03-28 Mitsubishi Denki Kabushiki Kaisha Process for coating a workpiece with a ceramic material
GB2189509B (en) * 1986-03-27 1990-10-17 Mitsubishi Electric Corp Process for coating a workpiece with a ceramic material

Also Published As

Publication number Publication date
JPS5148463B2 (en) 1976-12-21
DE2330545B2 (en) 1977-06-08
DE2330545A1 (en) 1974-01-03
JPS4952186A (en) 1974-05-21
US3791852A (en) 1974-02-12

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLE Entries relating assignments, transmissions, licences in the register of patents
PCNP Patent ceased through non-payment of renewal fee