GB1348528A - Methods of and apparatus for growing crystals from solutions - Google Patents

Methods of and apparatus for growing crystals from solutions

Info

Publication number
GB1348528A
GB1348528A GB1698971A GB1698971A GB1348528A GB 1348528 A GB1348528 A GB 1348528A GB 1698971 A GB1698971 A GB 1698971A GB 1698971 A GB1698971 A GB 1698971A GB 1348528 A GB1348528 A GB 1348528A
Authority
GB
United Kingdom
Prior art keywords
solution
substrates
heated
substrate
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1698971A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1348528A publication Critical patent/GB1348528A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/06Reaction chambers; Boats for supporting the melt; Substrate holders
    • C30B19/066Injection or centrifugal force system
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/006Apparatus
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/107Melt

Abstract

1348528 Crystallizing from a liquid WESTERN ELECTRIC CO Inc 25 May 1971 [27 May 1970] 16989/71 Headings BIG and B1S A solution is impelled by centrifuged force into contact with a substrate to grow a crystalline layer thereon epitaxially or otherwise. As shown, a solution 30, for example, of GaP or Ga As in Ga, which may be doped with oxygen and zinc, is heated by RF heaters 45 or 46. At the appropriate temperature, vessel 40 is spun about its axes 43, so that the liquid rises to immerse substrates 22, leaving the impurities behind. The position of the liquid surface during crystal growth is shown at 55. Impurities which either float 56A or sink 56B may be further separated by using an inner container 70, Fig. 6F, from which the melt escapes through holes 73 to immerse the substrates 22. The substrates may be free to move in the radial direction 62 (Fig. 4). Thus, a substrate which is denser than the solution will seat against surface 52 and be heated by heater 46 so that the growth face faces the direction in which the temperature gradient increases. A substrate which is less dense than the solution will seat against surface 60 and be heated by a heater 45. When crystal growth has been completed, the rotation is halted, and the solution falls and may drain into a well (67) or to a cup (90, Fig. 6C) surrounding vessel 40. Instead of spinning vessel 40, the solution may be rotated by an impeller immersed therein.
GB1698971A 1970-05-27 1971-05-25 Methods of and apparatus for growing crystals from solutions Expired GB1348528A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4085470A 1970-05-27 1970-05-27

Publications (1)

Publication Number Publication Date
GB1348528A true GB1348528A (en) 1974-03-20

Family

ID=21913338

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1698971A Expired GB1348528A (en) 1970-05-27 1971-05-25 Methods of and apparatus for growing crystals from solutions

Country Status (9)

Country Link
US (1) US3713883A (en)
JP (1) JPS5144497B1 (en)
BE (1) BE767665A (en)
CA (1) CA964968A (en)
DE (1) DE2126487C3 (en)
FR (1) FR2093789A5 (en)
GB (1) GB1348528A (en)
NL (1) NL7107319A (en)
SE (1) SE375460B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2319481C3 (en) * 1973-04-17 1978-09-07 Beckman Instruments Gmbh, 8000 Muenchen Method for installing a foreign substance in a semiconductor base material, in particular for doping or alloying semiconductor bodies and ultracentrifuge for carrying out the method
DE2445146C3 (en) * 1974-09-20 1979-03-08 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Method and apparatus for forming epitaxial layers
US3963536A (en) * 1974-11-18 1976-06-15 Rca Corporation Method of making electroluminescent semiconductor devices
US4561486A (en) * 1981-04-30 1985-12-31 Hoxan Corporation Method for fabricating polycrystalline silicon wafer
WO1990012905A1 (en) * 1989-04-26 1990-11-01 Australian Nuclear Science & Technology Organisation Liquid phase epitaxy
DE4401626A1 (en) * 1994-01-20 1995-07-27 Max Planck Gesellschaft Method and device for producing crystalline layers

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3097112A (en) * 1960-01-12 1963-07-09 Gen Electric Method and apparatus for making cathodes
US3033159A (en) * 1960-10-27 1962-05-08 Edward D O'brien Centrifugal coating apparatus
US3212929A (en) * 1962-03-22 1965-10-19 Ibm Method of forming a glass film on an object
DE1251441B (en) * 1962-06-20
US3429295A (en) * 1963-09-17 1969-02-25 Nuclear Materials & Equipment Apparatus for producing vapor coated particles

Also Published As

Publication number Publication date
BE767665A (en) 1971-10-18
JPS5144497B1 (en) 1976-11-29
NL7107319A (en) 1971-11-30
CA964968A (en) 1975-03-25
US3713883A (en) 1973-01-30
DE2126487B2 (en) 1973-06-20
SE375460B (en) 1975-04-21
DE2126487C3 (en) 1974-01-24
FR2093789A5 (en) 1972-01-28
DE2126487A1 (en) 1972-12-07

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees