GB1348528A - Methods of and apparatus for growing crystals from solutions - Google Patents
Methods of and apparatus for growing crystals from solutionsInfo
- Publication number
- GB1348528A GB1348528A GB1698971A GB1698971A GB1348528A GB 1348528 A GB1348528 A GB 1348528A GB 1698971 A GB1698971 A GB 1698971A GB 1698971 A GB1698971 A GB 1698971A GB 1348528 A GB1348528 A GB 1348528A
- Authority
- GB
- United Kingdom
- Prior art keywords
- solution
- substrates
- heated
- substrate
- vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
- C30B19/066—Injection or centrifugal force system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/006—Apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/107—Melt
Abstract
1348528 Crystallizing from a liquid WESTERN ELECTRIC CO Inc 25 May 1971 [27 May 1970] 16989/71 Headings BIG and B1S A solution is impelled by centrifuged force into contact with a substrate to grow a crystalline layer thereon epitaxially or otherwise. As shown, a solution 30, for example, of GaP or Ga As in Ga, which may be doped with oxygen and zinc, is heated by RF heaters 45 or 46. At the appropriate temperature, vessel 40 is spun about its axes 43, so that the liquid rises to immerse substrates 22, leaving the impurities behind. The position of the liquid surface during crystal growth is shown at 55. Impurities which either float 56A or sink 56B may be further separated by using an inner container 70, Fig. 6F, from which the melt escapes through holes 73 to immerse the substrates 22. The substrates may be free to move in the radial direction 62 (Fig. 4). Thus, a substrate which is denser than the solution will seat against surface 52 and be heated by heater 46 so that the growth face faces the direction in which the temperature gradient increases. A substrate which is less dense than the solution will seat against surface 60 and be heated by a heater 45. When crystal growth has been completed, the rotation is halted, and the solution falls and may drain into a well (67) or to a cup (90, Fig. 6C) surrounding vessel 40. Instead of spinning vessel 40, the solution may be rotated by an impeller immersed therein.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4085470A | 1970-05-27 | 1970-05-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1348528A true GB1348528A (en) | 1974-03-20 |
Family
ID=21913338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1698971A Expired GB1348528A (en) | 1970-05-27 | 1971-05-25 | Methods of and apparatus for growing crystals from solutions |
Country Status (9)
Country | Link |
---|---|
US (1) | US3713883A (en) |
JP (1) | JPS5144497B1 (en) |
BE (1) | BE767665A (en) |
CA (1) | CA964968A (en) |
DE (1) | DE2126487C3 (en) |
FR (1) | FR2093789A5 (en) |
GB (1) | GB1348528A (en) |
NL (1) | NL7107319A (en) |
SE (1) | SE375460B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2319481C3 (en) * | 1973-04-17 | 1978-09-07 | Beckman Instruments Gmbh, 8000 Muenchen | Method for installing a foreign substance in a semiconductor base material, in particular for doping or alloying semiconductor bodies and ultracentrifuge for carrying out the method |
DE2445146C3 (en) * | 1974-09-20 | 1979-03-08 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen | Method and apparatus for forming epitaxial layers |
US3963536A (en) * | 1974-11-18 | 1976-06-15 | Rca Corporation | Method of making electroluminescent semiconductor devices |
US4561486A (en) * | 1981-04-30 | 1985-12-31 | Hoxan Corporation | Method for fabricating polycrystalline silicon wafer |
WO1990012905A1 (en) * | 1989-04-26 | 1990-11-01 | Australian Nuclear Science & Technology Organisation | Liquid phase epitaxy |
DE4401626A1 (en) * | 1994-01-20 | 1995-07-27 | Max Planck Gesellschaft | Method and device for producing crystalline layers |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3097112A (en) * | 1960-01-12 | 1963-07-09 | Gen Electric | Method and apparatus for making cathodes |
US3033159A (en) * | 1960-10-27 | 1962-05-08 | Edward D O'brien | Centrifugal coating apparatus |
US3212929A (en) * | 1962-03-22 | 1965-10-19 | Ibm | Method of forming a glass film on an object |
DE1251441B (en) * | 1962-06-20 | |||
US3429295A (en) * | 1963-09-17 | 1969-02-25 | Nuclear Materials & Equipment | Apparatus for producing vapor coated particles |
-
1970
- 1970-05-27 US US00040854A patent/US3713883A/en not_active Expired - Lifetime
-
1971
- 1971-01-14 CA CA102,767A patent/CA964968A/en not_active Expired
- 1971-05-19 SE SE7106532A patent/SE375460B/xx unknown
- 1971-05-25 GB GB1698971A patent/GB1348528A/en not_active Expired
- 1971-05-26 FR FR7119155A patent/FR2093789A5/fr not_active Expired
- 1971-05-26 BE BE767665A patent/BE767665A/en unknown
- 1971-05-27 NL NL7107319A patent/NL7107319A/xx unknown
- 1971-05-27 JP JP46035956A patent/JPS5144497B1/ja active Pending
- 1971-05-27 DE DE2126487A patent/DE2126487C3/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
BE767665A (en) | 1971-10-18 |
JPS5144497B1 (en) | 1976-11-29 |
NL7107319A (en) | 1971-11-30 |
CA964968A (en) | 1975-03-25 |
US3713883A (en) | 1973-01-30 |
DE2126487B2 (en) | 1973-06-20 |
SE375460B (en) | 1975-04-21 |
DE2126487C3 (en) | 1974-01-24 |
FR2093789A5 (en) | 1972-01-28 |
DE2126487A1 (en) | 1972-12-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |