JPS5742598A - Liquid-phase epitaxial growing method - Google Patents
Liquid-phase epitaxial growing methodInfo
- Publication number
- JPS5742598A JPS5742598A JP11749580A JP11749580A JPS5742598A JP S5742598 A JPS5742598 A JP S5742598A JP 11749580 A JP11749580 A JP 11749580A JP 11749580 A JP11749580 A JP 11749580A JP S5742598 A JPS5742598 A JP S5742598A
- Authority
- JP
- Japan
- Prior art keywords
- melt
- substrate
- tank
- liquid
- transferred
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
PURPOSE: To grow a liquid-phase epitaxial film of good quality having improved uniformity, by covering the surface of a semiconductor single crystal substrate with a melt of another unreactive substance having a low specific gravity before the liquid phase growing.
CONSTITUTION: A substrate 4 is filled into a slider 7, and the slider 7 is then set in a B2O3 melt reservoir tank 8. The temperature of the tank 8 is increased by a heater 1 to melt B2O3, and the surface of the substrate 4 is covered with the B2O3 melt 8'. The substrate 4 is then transferred quickly under a melt reservoir tank 5. Most of the melt 8' is removed by the transfer; however, the melt 8' partially remaining on the surface of the substrate 4 prevents the thermal corrosion (etching) of the substrate 4 and the volatilization of elements having a high vapor pressure. The melt 8' covering the substrate 4 transferred just under the tank 5 has a lower specific gravity than that of an In melt 5', leaves the substrate 5 and floats on the melt 5'. The surface of the substrate 4 is then molten back by the melt 5'. The substrates 4 are then transferred under a melt reservoir tank 6 to cool an In melt 6' containing InP slowly and grow a Thin InP film epitaxially.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11749580A JPS5742598A (en) | 1980-08-26 | 1980-08-26 | Liquid-phase epitaxial growing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11749580A JPS5742598A (en) | 1980-08-26 | 1980-08-26 | Liquid-phase epitaxial growing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5742598A true JPS5742598A (en) | 1982-03-10 |
JPS614796B2 JPS614796B2 (en) | 1986-02-13 |
Family
ID=14713139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11749580A Granted JPS5742598A (en) | 1980-08-26 | 1980-08-26 | Liquid-phase epitaxial growing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5742598A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01136846A (en) * | 1987-11-12 | 1989-05-30 | Morton Thiokol Inc | Slender gas generator expanding expansion constraint cushion for car |
DE102012217718A1 (en) | 2011-09-30 | 2013-04-04 | Diehl Bgt Defence Gmbh & Co. Kg | Cold-gas pyrotechnic generator useful e.g. in fire-fighting-, driving-, or underwater rescue systems, comprises first chamber, which contains hot combustive gas generator propellant, and a second chamber containing a coolant |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04141287A (en) * | 1990-10-01 | 1992-05-14 | Isao Yamada | Apparatus for producing fresh water from sea water |
-
1980
- 1980-08-26 JP JP11749580A patent/JPS5742598A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01136846A (en) * | 1987-11-12 | 1989-05-30 | Morton Thiokol Inc | Slender gas generator expanding expansion constraint cushion for car |
DE102012217718A1 (en) | 2011-09-30 | 2013-04-04 | Diehl Bgt Defence Gmbh & Co. Kg | Cold-gas pyrotechnic generator useful e.g. in fire-fighting-, driving-, or underwater rescue systems, comprises first chamber, which contains hot combustive gas generator propellant, and a second chamber containing a coolant |
Also Published As
Publication number | Publication date |
---|---|
JPS614796B2 (en) | 1986-02-13 |
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