JPS5550619A - Manufacturing single crystal - Google Patents

Manufacturing single crystal

Info

Publication number
JPS5550619A
JPS5550619A JP12413178A JP12413178A JPS5550619A JP S5550619 A JPS5550619 A JP S5550619A JP 12413178 A JP12413178 A JP 12413178A JP 12413178 A JP12413178 A JP 12413178A JP S5550619 A JPS5550619 A JP S5550619A
Authority
JP
Japan
Prior art keywords
crystal
solution
single crystal
temperature
growing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12413178A
Other languages
Japanese (ja)
Inventor
Toshihiko Hattori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12413178A priority Critical patent/JPS5550619A/en
Publication of JPS5550619A publication Critical patent/JPS5550619A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To manufacture a single crystal having excellent quality by immersing a nuclear crystal into solution, raising the temperature of the solution with the crystal material being supplied, over-saturating the surface of the crystal, depositing and growing the excessive Si on the crystal surface, and hence by only providing the difference in temperatures.
CONSTITUTION: An Si nuclear crystal 1 is held by a holder 3 which is made of an excellent heat conductive material. Solution 2 is put in a crucible 4. The Si crystal is melted near the saturation in the solvent comprising melted Al and is held at a temperature slightly higher than the melting point of Al by a heater 5, and placed in flowing gas such as Ar, N2, and the like. At this time, the crystal 1 is immersed in the solution 2, and the temperature of the solution 2 is raised with a crystal material 6 being supplied. Then, the surface of the crystal 1 becomes over-saturated, the excessive Si is deposited on the surface of the crystal 1, and the single crystal begins to grow. The single crystal is raised very slowly for growing. In this method, the single crystal can be manufactured excellently by only providing the difference in temperatures.
COPYRIGHT: (C)1980,JPO&Japio
JP12413178A 1978-10-11 1978-10-11 Manufacturing single crystal Pending JPS5550619A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12413178A JPS5550619A (en) 1978-10-11 1978-10-11 Manufacturing single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12413178A JPS5550619A (en) 1978-10-11 1978-10-11 Manufacturing single crystal

Publications (1)

Publication Number Publication Date
JPS5550619A true JPS5550619A (en) 1980-04-12

Family

ID=14877679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12413178A Pending JPS5550619A (en) 1978-10-11 1978-10-11 Manufacturing single crystal

Country Status (1)

Country Link
JP (1) JPS5550619A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6051693A (en) * 1983-08-30 1985-03-23 Hitachi Cable Ltd Method and apparatus for growing crystal

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6051693A (en) * 1983-08-30 1985-03-23 Hitachi Cable Ltd Method and apparatus for growing crystal
JPS6357398B2 (en) * 1983-08-30 1988-11-11 Hitachi Cable

Similar Documents

Publication Publication Date Title
JPS5550619A (en) Manufacturing single crystal
US4614672A (en) Liquid phase epitaxy (LPE) of silicon carbide
DE69815422D1 (en) A method of manufacturing a rare earth-barium cuprate type superconductor
JPS5776821A (en) Liquid phase epitaxial growing method
JPS55100295A (en) Production of single crystal thin film
JPS55140792A (en) Manufacture of 3-5 group compound semiconductor single crystal
JPS55104998A (en) Production of silicon carbide crystal layer
CISZEK Method of synthesizing and growing copper-indium-diselenide(CuInSe 2) crystals(Patent Application)
JPS56114316A (en) Boat for liquid phase epitaxial growth
JPS5738397A (en) Apparatus and method for growing crystal
JPS57129896A (en) Liquid phase epitaxial growing apparatus
JPS59147440A (en) Liquid phase epitaxial growth method
JPS54147778A (en) Liquid phase epitaxial growth method
Muhlberg Investigations on the Structural Perfection of Bridgman-Grown PbTe Single Crystals
CISZEK Apparatus and method for the horizontal, crucible-free growth of silicon sheet crystals[Patent Application]
JPS56134596A (en) Preparation of silicon carbide crystal
JPS5710227A (en) Manufacture of semiconductor wafer
JPS54128987A (en) Preparation of single crystal
JPS5560088A (en) Production of single crystal
JPS5654299A (en) Growing method of lead molybdate single crystal
JPS643005A (en) Production of silicon ingot
JPS5464461A (en) Liquid phase epitaxial growth method
JPS6452697A (en) Production of group iii-v compound semiconductor single crystal
JPS56100199A (en) Method and apparatus for manufacturing gallium antimony single crystal
Mazelsky The origin of Czochralski growth through B2O3 glass: a step in the evolution of LEC growth