GB1333617A - Cathode sputtering apparatus - Google Patents

Cathode sputtering apparatus

Info

Publication number
GB1333617A
GB1333617A GB3214771A GB3214771A GB1333617A GB 1333617 A GB1333617 A GB 1333617A GB 3214771 A GB3214771 A GB 3214771A GB 3214771 A GB3214771 A GB 3214771A GB 1333617 A GB1333617 A GB 1333617A
Authority
GB
United Kingdom
Prior art keywords
articles
cathodes
screens
sputtering apparatus
envelope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3214771A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Progil SARL
Original Assignee
Progil SARL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Progil SARL filed Critical Progil SARL
Publication of GB1333617A publication Critical patent/GB1333617A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
    • H01M4/88—Processes of manufacture
    • H01M4/8825—Methods for deposition of the catalytic active composition
    • H01M4/8867—Vapour deposition
    • H01M4/8871—Sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
GB3214771A 1970-07-10 1971-07-08 Cathode sputtering apparatus Expired GB1333617A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7026730A FR2098563A5 (enExample) 1970-07-10 1970-07-10

Publications (1)

Publication Number Publication Date
GB1333617A true GB1333617A (en) 1973-10-10

Family

ID=9058937

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3214771A Expired GB1333617A (en) 1970-07-10 1971-07-08 Cathode sputtering apparatus

Country Status (13)

Country Link
US (1) US3779885A (enExample)
JP (1) JPS5520747Y2 (enExample)
AT (1) AT304220B (enExample)
BE (1) BE769722A (enExample)
CA (2) CA994708A (enExample)
CH (1) CH538551A (enExample)
DE (1) DE2134377C3 (enExample)
ES (1) ES393087A1 (enExample)
FR (1) FR2098563A5 (enExample)
GB (1) GB1333617A (enExample)
NL (1) NL7109534A (enExample)
SE (1) SE366778B (enExample)
SU (1) SU405215A3 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5889880A (en) * 1979-07-02 1981-01-15 Olin Corporation Manufacture of low overvoltage electrodes by cathodic sputtering
DE3107914A1 (de) * 1981-03-02 1982-09-16 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung
US4451344A (en) * 1982-03-26 1984-05-29 International Business Machines Corp. Method of making edge protected ferrite core
US4812217A (en) * 1987-04-27 1989-03-14 American Telephone And Telegraph Company, At&T Bell Laboratories Method and apparatus for feeding and coating articles in a controlled atmosphere
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
US5279724A (en) * 1991-12-26 1994-01-18 Xerox Corporation Dual sputtering source
SG47541A1 (en) 1992-06-26 1998-04-17 Materials Research Corp Transport system for wafer processing line
CN115735268B (zh) * 2020-06-23 2025-07-08 三国电子有限会社 通过电感耦合等离子体进行溅射成膜的成膜装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1758531A (en) * 1926-10-22 1930-05-13 Elektrodenzerstaubung M B H Ge Vacuum dispersion coating process
US3294670A (en) * 1963-10-07 1966-12-27 Western Electric Co Apparatus for processing materials in a controlled atmosphere
LU45647A1 (enExample) * 1964-03-12 1965-09-13
LU52106A1 (enExample) * 1966-10-05 1968-05-07
US3594301A (en) * 1968-11-22 1971-07-20 Gen Electric Sputter coating apparatus

Also Published As

Publication number Publication date
DE2134377C3 (de) 1974-11-28
JPS5149723U (enExample) 1976-04-15
CA981622A (en) 1976-01-13
NL7109534A (enExample) 1972-01-12
DE2134377B2 (de) 1974-04-25
US3779885A (en) 1973-12-18
CA994708A (fr) 1976-08-10
CH538551A (fr) 1973-06-30
JPS5520747Y2 (enExample) 1980-05-19
FR2098563A5 (enExample) 1972-03-10
BE769722A (fr) 1971-11-16
AT304220B (de) 1972-12-27
DE2134377A1 (de) 1972-01-13
ES393087A1 (es) 1973-10-01
SU405215A3 (enExample) 1973-10-22
SE366778B (enExample) 1974-05-06

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee