CH538551A - Appareil pour le dépôt de couches minces par pulvérisation cathodique sur un support conducteur - Google Patents
Appareil pour le dépôt de couches minces par pulvérisation cathodique sur un support conducteurInfo
- Publication number
- CH538551A CH538551A CH998071A CH998071A CH538551A CH 538551 A CH538551 A CH 538551A CH 998071 A CH998071 A CH 998071A CH 998071 A CH998071 A CH 998071A CH 538551 A CH538551 A CH 538551A
- Authority
- CH
- Switzerland
- Prior art keywords
- thin films
- conductive support
- depositing thin
- cathodic sputtering
- cathodic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
- H01M4/88—Processes of manufacture
- H01M4/8825—Methods for deposition of the catalytic active composition
- H01M4/8867—Vapour deposition
- H01M4/8871—Sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7026730A FR2098563A5 (fr) | 1970-07-10 | 1970-07-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH538551A true CH538551A (fr) | 1973-06-30 |
Family
ID=9058937
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH998071A CH538551A (fr) | 1970-07-10 | 1971-07-07 | Appareil pour le dépôt de couches minces par pulvérisation cathodique sur un support conducteur |
Country Status (13)
Country | Link |
---|---|
US (1) | US3779885A (fr) |
JP (1) | JPS5520747Y2 (fr) |
AT (1) | AT304220B (fr) |
BE (1) | BE769722A (fr) |
CA (2) | CA994708A (fr) |
CH (1) | CH538551A (fr) |
DE (1) | DE2134377C3 (fr) |
ES (1) | ES393087A1 (fr) |
FR (1) | FR2098563A5 (fr) |
GB (1) | GB1333617A (fr) |
NL (1) | NL7109534A (fr) |
SE (1) | SE366778B (fr) |
SU (1) | SU405215A3 (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU5889880A (en) * | 1979-07-02 | 1981-01-15 | Olin Corporation | Manufacture of low overvoltage electrodes by cathodic sputtering |
DE3107914A1 (de) * | 1981-03-02 | 1982-09-16 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung |
US4451344A (en) * | 1982-03-26 | 1984-05-29 | International Business Machines Corp. | Method of making edge protected ferrite core |
US4812217A (en) * | 1987-04-27 | 1989-03-14 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method and apparatus for feeding and coating articles in a controlled atmosphere |
US5279724A (en) * | 1991-12-26 | 1994-01-18 | Xerox Corporation | Dual sputtering source |
US5322606A (en) * | 1991-12-26 | 1994-06-21 | Xerox Corporation | Use of rotary solenoid as a shutter actuator on a rotating arm |
CA2137471A1 (fr) | 1992-06-26 | 1994-01-06 | Tugrul Yasar | Systeme de transport pour chaine de traitement de rondelles |
JPWO2021261484A1 (fr) * | 2020-06-23 | 2021-12-30 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1758531A (en) * | 1926-10-22 | 1930-05-13 | Elektrodenzerstaubung M B H Ge | Vacuum dispersion coating process |
US3294670A (en) * | 1963-10-07 | 1966-12-27 | Western Electric Co | Apparatus for processing materials in a controlled atmosphere |
LU45647A1 (fr) * | 1964-03-12 | 1965-09-13 | ||
LU52106A1 (fr) * | 1966-10-05 | 1968-05-07 | ||
US3594301A (en) * | 1968-11-22 | 1971-07-20 | Gen Electric | Sputter coating apparatus |
-
1970
- 1970-07-10 FR FR7026730A patent/FR2098563A5/fr not_active Expired
-
1971
- 1971-06-03 SE SE07187/71A patent/SE366778B/xx unknown
- 1971-06-04 SU SU1659441A patent/SU405215A3/ru active
- 1971-06-15 US US00153217A patent/US3779885A/en not_active Expired - Lifetime
- 1971-07-07 CH CH998071A patent/CH538551A/fr not_active IP Right Cessation
- 1971-07-08 GB GB3214771A patent/GB1333617A/en not_active Expired
- 1971-07-08 BE BE769722A patent/BE769722A/fr unknown
- 1971-07-09 NL NL7109534A patent/NL7109534A/xx not_active Application Discontinuation
- 1971-07-09 ES ES393087A patent/ES393087A1/es not_active Expired
- 1971-07-09 AT AT601371A patent/AT304220B/de not_active IP Right Cessation
- 1971-07-09 DE DE2134377A patent/DE2134377C3/de not_active Expired
- 1971-07-09 CA CA117,900A patent/CA994708A/fr not_active Expired
- 1971-12-29 CA CA131,340A patent/CA981622A/en not_active Expired
-
1975
- 1975-06-03 JP JP1975075200U patent/JPS5520747Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2134377B2 (de) | 1974-04-25 |
AT304220B (de) | 1972-12-27 |
JPS5149723U (fr) | 1976-04-15 |
SE366778B (fr) | 1974-05-06 |
ES393087A1 (es) | 1973-10-01 |
JPS5520747Y2 (fr) | 1980-05-19 |
CA981622A (en) | 1976-01-13 |
SU405215A3 (fr) | 1973-10-22 |
FR2098563A5 (fr) | 1972-03-10 |
DE2134377A1 (de) | 1972-01-13 |
CA994708A (fr) | 1976-08-10 |
GB1333617A (en) | 1973-10-10 |
US3779885A (en) | 1973-12-18 |
DE2134377C3 (de) | 1974-11-28 |
BE769722A (fr) | 1971-11-16 |
NL7109534A (fr) | 1972-01-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |