FR95311E - Appareil de pulvérisation cathodique pour déposer des pellicules minces sur des surfaces a revetir. - Google Patents
Appareil de pulvérisation cathodique pour déposer des pellicules minces sur des surfaces a revetir.Info
- Publication number
- FR95311E FR95311E FR163501A FR163501A FR95311E FR 95311 E FR95311 E FR 95311E FR 163501 A FR163501 A FR 163501A FR 163501 A FR163501 A FR 163501A FR 95311 E FR95311 E FR 95311E
- Authority
- FR
- France
- Prior art keywords
- coated
- thin films
- sputtering apparatus
- cathode sputtering
- depositing thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62573367A | 1967-03-24 | 1967-03-24 | |
US66263767A | 1967-08-23 | 1967-08-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR95311E true FR95311E (fr) | 1970-08-21 |
Family
ID=24658521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR163501A Expired FR95311E (fr) | 1967-03-24 | 1968-08-20 | Appareil de pulvérisation cathodique pour déposer des pellicules minces sur des surfaces a revetir. |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR95311E (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2569000A1 (fr) * | 1984-08-10 | 1986-02-14 | Centre Nat Rech Scient | Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique |
DE4106770A1 (de) * | 1991-03-04 | 1992-09-10 | Leybold Ag | Verfahren und vorrichtung zum reaktiven beschichten eines substrats |
US5512164A (en) * | 1993-06-03 | 1996-04-30 | The United States Of America As Represented By The United States Department Of Energy | Method for sputtering with low frequency alternating current |
-
1968
- 1968-08-20 FR FR163501A patent/FR95311E/fr not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2569000A1 (fr) * | 1984-08-10 | 1986-02-14 | Centre Nat Rech Scient | Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique |
DE4106770A1 (de) * | 1991-03-04 | 1992-09-10 | Leybold Ag | Verfahren und vorrichtung zum reaktiven beschichten eines substrats |
US5169509A (en) * | 1991-03-04 | 1992-12-08 | Leybold Aktiengesellschaft | Apparatus for the reactive coating of a substrate |
US5512164A (en) * | 1993-06-03 | 1996-04-30 | The United States Of America As Represented By The United States Department Of Energy | Method for sputtering with low frequency alternating current |
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