GB1157989A - Improvements in and relating to Cleaning Selected Surface Areas of Substrates - Google Patents
Improvements in and relating to Cleaning Selected Surface Areas of SubstratesInfo
- Publication number
- GB1157989A GB1157989A GB41823/66A GB4182366A GB1157989A GB 1157989 A GB1157989 A GB 1157989A GB 41823/66 A GB41823/66 A GB 41823/66A GB 4182366 A GB4182366 A GB 4182366A GB 1157989 A GB1157989 A GB 1157989A
- Authority
- GB
- United Kingdom
- Prior art keywords
- molybdenum
- layer
- glass layer
- mask
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 4
- 239000011521 glass Substances 0.000 abstract 4
- 229910052750 molybdenum Inorganic materials 0.000 abstract 4
- 239000011733 molybdenum Substances 0.000 abstract 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical class F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000011651 chromium Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 abstract 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US502986A US3410774A (en) | 1965-10-23 | 1965-10-23 | Method and apparatus for reverse sputtering selected electrically exposed areas of a cathodically biased workpiece |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1157989A true GB1157989A (en) | 1969-07-09 |
Family
ID=24000292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB41823/66A Expired GB1157989A (en) | 1965-10-23 | 1966-09-20 | Improvements in and relating to Cleaning Selected Surface Areas of Substrates |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3410774A (enrdf_load_stackoverflow) |
| BE (1) | BE688703A (enrdf_load_stackoverflow) |
| CH (1) | CH447760A (enrdf_load_stackoverflow) |
| DE (1) | DE1621599C2 (enrdf_load_stackoverflow) |
| FR (1) | FR1501165A (enrdf_load_stackoverflow) |
| GB (1) | GB1157989A (enrdf_load_stackoverflow) |
| NL (1) | NL154560B (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1992011653A1 (en) * | 1990-12-20 | 1992-07-09 | Mitel Corporation | Preventing of via poisoning by glow discharge induced desorption |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3502562A (en) * | 1967-04-19 | 1970-03-24 | Corning Glass Works | Multiple cathode sputtering fixture |
| US3507774A (en) * | 1967-06-02 | 1970-04-21 | Nat Res Corp | Low energy sputtering apparatus for operation below one micron pressure |
| US3528906A (en) * | 1967-06-05 | 1970-09-15 | Texas Instruments Inc | Rf sputtering method and system |
| US3708418A (en) * | 1970-03-05 | 1973-01-02 | Rca Corp | Apparatus for etching of thin layers of material by ion bombardment |
| US3676317A (en) * | 1970-10-23 | 1972-07-11 | Stromberg Datagraphix Inc | Sputter etching process |
| FR2128140B1 (enrdf_load_stackoverflow) * | 1971-03-05 | 1976-04-16 | Alsthom Cgee | |
| DE2117199C3 (de) * | 1971-04-08 | 1974-08-22 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zur Herstellung geätzter Muster in dünnen Schichten mit definierten Kantenprofilen |
| US4157465A (en) * | 1972-01-10 | 1979-06-05 | Smiths Industries Limited | Gas-lubricated bearings |
| US3897324A (en) * | 1973-06-25 | 1975-07-29 | Honeywell Inc | Material deposition masking for microcircuit structures |
| US4012307A (en) * | 1975-12-05 | 1977-03-15 | General Dynamics Corporation | Method for conditioning drilled holes in multilayer wiring boards |
| US4277321A (en) * | 1979-04-23 | 1981-07-07 | Bell Telephone Laboratories, Incorporated | Treating multilayer printed wiring boards |
| US4340461A (en) * | 1980-09-10 | 1982-07-20 | International Business Machines Corp. | Modified RIE chamber for uniform silicon etching |
| US4391034A (en) * | 1980-12-22 | 1983-07-05 | Ibm Corporation | Thermally compensated shadow mask |
| US4426274A (en) | 1981-06-02 | 1984-01-17 | International Business Machines Corporation | Reactive ion etching apparatus with interlaced perforated anode |
| US4654118A (en) * | 1986-03-17 | 1987-03-31 | The United States Of America As Represented By The Secretary Of The Army | Selectively etching microstructures in a glow discharge plasma |
| US4824544A (en) * | 1987-10-29 | 1989-04-25 | International Business Machines Corporation | Large area cathode lift-off sputter deposition device |
| US5341980A (en) * | 1990-02-19 | 1994-08-30 | Hitachi, Ltd. | Method of fabricating electronic circuit device and apparatus for performing the same method |
| US5340015A (en) * | 1993-03-22 | 1994-08-23 | Westinghouse Electric Corp. | Method for applying brazing filler metals |
| US5415753A (en) * | 1993-07-22 | 1995-05-16 | Materials Research Corporation | Stationary aperture plate for reactive sputter deposition |
| US5527438A (en) * | 1994-12-16 | 1996-06-18 | Applied Materials, Inc. | Cylindrical sputtering shield |
| JP3523405B2 (ja) | 1996-01-26 | 2004-04-26 | 株式会社日立製作所 | 荷電ビーム処理によるパターン形成方法及び荷電ビーム処理装置 |
| US6287977B1 (en) | 1998-07-31 | 2001-09-11 | Applied Materials, Inc. | Method and apparatus for forming improved metal interconnects |
| US6193855B1 (en) | 1999-10-19 | 2001-02-27 | Applied Materials, Inc. | Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage |
| US6350353B2 (en) | 1999-11-24 | 2002-02-26 | Applied Materials, Inc. | Alternate steps of IMP and sputtering process to improve sidewall coverage |
| US6344419B1 (en) | 1999-12-03 | 2002-02-05 | Applied Materials, Inc. | Pulsed-mode RF bias for sidewall coverage improvement |
| US6554979B2 (en) | 2000-06-05 | 2003-04-29 | Applied Materials, Inc. | Method and apparatus for bias deposition in a modulating electric field |
| US6521897B1 (en) * | 2000-11-17 | 2003-02-18 | The Regents Of The University Of California | Ion beam collimating grid to reduce added defects |
| US6746591B2 (en) | 2001-10-16 | 2004-06-08 | Applied Materials Inc. | ECP gap fill by modulating the voltate on the seed layer to increase copper concentration inside feature |
| US20030077910A1 (en) * | 2001-10-22 | 2003-04-24 | Russell Westerman | Etching of thin damage sensitive layers using high frequency pulsed plasma |
| JP4710774B2 (ja) * | 2005-11-09 | 2011-06-29 | 株式会社日立製作所 | 研磨定盤の製造方法 |
| US9779643B2 (en) | 2012-02-15 | 2017-10-03 | Microsoft Technology Licensing, Llc | Imaging structure emitter configurations |
| US9578318B2 (en) | 2012-03-14 | 2017-02-21 | Microsoft Technology Licensing, Llc | Imaging structure emitter calibration |
| US11068049B2 (en) | 2012-03-23 | 2021-07-20 | Microsoft Technology Licensing, Llc | Light guide display and field of view |
| US10191515B2 (en) | 2012-03-28 | 2019-01-29 | Microsoft Technology Licensing, Llc | Mobile device light guide display |
| US9558590B2 (en) | 2012-03-28 | 2017-01-31 | Microsoft Technology Licensing, Llc | Augmented reality light guide display |
| US9717981B2 (en) | 2012-04-05 | 2017-08-01 | Microsoft Technology Licensing, Llc | Augmented reality and physical games |
| US10502876B2 (en) | 2012-05-22 | 2019-12-10 | Microsoft Technology Licensing, Llc | Waveguide optics focus elements |
| US10192358B2 (en) | 2012-12-20 | 2019-01-29 | Microsoft Technology Licensing, Llc | Auto-stereoscopic augmented reality display |
| US20160035539A1 (en) * | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
| US10324733B2 (en) | 2014-07-30 | 2019-06-18 | Microsoft Technology Licensing, Llc | Shutdown notifications |
| US10254942B2 (en) | 2014-07-31 | 2019-04-09 | Microsoft Technology Licensing, Llc | Adaptive sizing and positioning of application windows |
| US10678412B2 (en) | 2014-07-31 | 2020-06-09 | Microsoft Technology Licensing, Llc | Dynamic joint dividers for application windows |
| US10592080B2 (en) | 2014-07-31 | 2020-03-17 | Microsoft Technology Licensing, Llc | Assisted presentation of application windows |
| US9787576B2 (en) | 2014-07-31 | 2017-10-10 | Microsoft Technology Licensing, Llc | Propagating routing awareness for autonomous networks |
| US9414417B2 (en) | 2014-08-07 | 2016-08-09 | Microsoft Technology Licensing, Llc | Propagating communication awareness over a cellular network |
| US10317677B2 (en) | 2015-02-09 | 2019-06-11 | Microsoft Technology Licensing, Llc | Display system |
| US11086216B2 (en) | 2015-02-09 | 2021-08-10 | Microsoft Technology Licensing, Llc | Generating electronic components |
| US10018844B2 (en) | 2015-02-09 | 2018-07-10 | Microsoft Technology Licensing, Llc | Wearable image display system |
| US9827209B2 (en) | 2015-02-09 | 2017-11-28 | Microsoft Technology Licensing, Llc | Display system |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2702274A (en) * | 1951-04-02 | 1955-02-15 | Rca Corp | Method of making an electrode screen by cathode sputtering |
| US3087838A (en) * | 1955-10-05 | 1963-04-30 | Hupp Corp | Methods of photoelectric cell manufacture |
| DE1083617B (de) * | 1956-07-27 | 1960-06-15 | Gen Motors Corp | Verfahren zum Herstellen poroeser Oberflaechen auf chromierten Zylinderbuechsen von Verbrennungsmotoren |
| GB1054660A (enrdf_load_stackoverflow) * | 1963-09-16 | |||
| US3361659A (en) * | 1967-08-14 | 1968-01-02 | Ibm | Process of depositing thin films by cathode sputtering using a controlled grid |
-
1965
- 1965-10-23 US US502986A patent/US3410774A/en not_active Expired - Lifetime
-
1966
- 1966-09-20 GB GB41823/66A patent/GB1157989A/en not_active Expired
- 1966-09-27 NL NL666613583A patent/NL154560B/xx unknown
- 1966-10-19 DE DE1621599A patent/DE1621599C2/de not_active Expired
- 1966-10-21 CH CH1534466A patent/CH447760A/de unknown
- 1966-10-21 BE BE688703D patent/BE688703A/xx unknown
- 1966-11-20 FR FR8091A patent/FR1501165A/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1992011653A1 (en) * | 1990-12-20 | 1992-07-09 | Mitel Corporation | Preventing of via poisoning by glow discharge induced desorption |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1621599B1 (de) | 1973-05-24 |
| FR1501165A (fr) | 1967-11-10 |
| US3410774A (en) | 1968-11-12 |
| DE1621599C2 (de) | 1973-12-06 |
| CH447760A (de) | 1967-11-30 |
| NL154560B (nl) | 1977-09-15 |
| BE688703A (enrdf_load_stackoverflow) | 1967-03-31 |
| NL6613583A (enrdf_load_stackoverflow) | 1967-04-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1157989A (en) | Improvements in and relating to Cleaning Selected Surface Areas of Substrates | |
| GB1082319A (en) | Integrated circuit devices and methods of making them | |
| JPS5538785A (en) | Voltage tuning fork | |
| JPS5496366A (en) | Semiconductor device | |
| GB1129272A (en) | Improvements in and relating to metal-oxide-semiconductor capacitors | |
| JPS51129173A (en) | Semi conductor with high voltage proof schottky electrode and it's man uacturing method. | |
| JPS5336184A (en) | Semiconductor integrated circuit | |
| JPS5339864A (en) | Production of semiconductor element electrode | |
| GB1361357A (en) | Production of semiconductor devices | |
| JPS5412265A (en) | Production of semiconductor elements | |
| JPS5240962A (en) | Fluorescent tube | |
| JPS5772350A (en) | Fabrication of semiconductor device | |
| JPS5429561A (en) | Semiconductor device | |
| JPS575366A (en) | Semiconductor device and manufacture thereof | |
| JPS52141173A (en) | Electrode formation method for semiconductor devices | |
| JPS57206060A (en) | Manufacturing method for semiconductor device | |
| JPS5676543A (en) | Semiconductor element | |
| JPS5658258A (en) | Semiconductor integrated circuit | |
| JPS57154845A (en) | Forming method for rear face electrode | |
| GB1179396A (en) | Improvements in or relating to Thin Film Circuit Devices | |
| JPS55165667A (en) | Preparation of hybrid integrated circuit | |
| JPS571261A (en) | Schottky barrier type semiconductor device | |
| JPS5263681A (en) | Production of mesa type semiconductor device | |
| JPS5779657A (en) | Semiconductor device | |
| JPS5485687A (en) | Hall element of garrium arsenide |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |