GB1157989A - Improvements in and relating to Cleaning Selected Surface Areas of Substrates - Google Patents
Improvements in and relating to Cleaning Selected Surface Areas of SubstratesInfo
- Publication number
- GB1157989A GB1157989A GB41823/66A GB4182366A GB1157989A GB 1157989 A GB1157989 A GB 1157989A GB 41823/66 A GB41823/66 A GB 41823/66A GB 4182366 A GB4182366 A GB 4182366A GB 1157989 A GB1157989 A GB 1157989A
- Authority
- GB
- United Kingdom
- Prior art keywords
- molybdenum
- layer
- glass layer
- mask
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
1,157,989. Treatment of semi-conductors. INTERNATIONAL BUSINESS MACHINES CORP. 20 Sept., 1966 [23 Oct., 1965], No. 41823/66. Heading H1K. [Also in Division C7] Silicon wafer 20 has a layer of silicon oxide 21 on it and a molybdenum conductive land 23 extending over the silicon oxide. The surface of the molybdenum is oxidized, and glass layer 26 encloses it. Hole 28 is etched through glass layer 26 with nitric and hydrofluoric or fluoboric and hydrofluoric acids, then before making electrical contact with the molybdenum land 23 molybdenum oxide layer 40 is removed from area 38 by sputtering in argon or other gas. Building- up of a positive charge on glass layer 26 around hole 28 and consequent channelling of the sputtering ions to the middle of the holes is avoided by placing an electrically conductive mask 30 at the same potential as silicon wafer 20 over hole 28. The mask 30 may be replaceable, or may be a deposited layer on glass layer 26. Molybdenum is the preferred material for mask 30, but aluminium or chromium may be used.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US502986A US3410774A (en) | 1965-10-23 | 1965-10-23 | Method and apparatus for reverse sputtering selected electrically exposed areas of a cathodically biased workpiece |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1157989A true GB1157989A (en) | 1969-07-09 |
Family
ID=24000292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB41823/66A Expired GB1157989A (en) | 1965-10-23 | 1966-09-20 | Improvements in and relating to Cleaning Selected Surface Areas of Substrates |
Country Status (7)
Country | Link |
---|---|
US (1) | US3410774A (en) |
BE (1) | BE688703A (en) |
CH (1) | CH447760A (en) |
DE (1) | DE1621599C2 (en) |
FR (1) | FR1501165A (en) |
GB (1) | GB1157989A (en) |
NL (1) | NL154560B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992011653A1 (en) * | 1990-12-20 | 1992-07-09 | Mitel Corporation | Preventing of via poisoning by glow discharge induced desorption |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3502562A (en) * | 1967-04-19 | 1970-03-24 | Corning Glass Works | Multiple cathode sputtering fixture |
US3507774A (en) * | 1967-06-02 | 1970-04-21 | Nat Res Corp | Low energy sputtering apparatus for operation below one micron pressure |
US3528906A (en) * | 1967-06-05 | 1970-09-15 | Texas Instruments Inc | Rf sputtering method and system |
US3708418A (en) * | 1970-03-05 | 1973-01-02 | Rca Corp | Apparatus for etching of thin layers of material by ion bombardment |
US3676317A (en) * | 1970-10-23 | 1972-07-11 | Stromberg Datagraphix Inc | Sputter etching process |
FR2128140B1 (en) * | 1971-03-05 | 1976-04-16 | Alsthom Cgee | |
DE2117199C3 (en) * | 1971-04-08 | 1974-08-22 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Process for the production of etched patterns in thin layers with defined edge profiles |
US4157465A (en) * | 1972-01-10 | 1979-06-05 | Smiths Industries Limited | Gas-lubricated bearings |
US3897324A (en) * | 1973-06-25 | 1975-07-29 | Honeywell Inc | Material deposition masking for microcircuit structures |
US4012307A (en) * | 1975-12-05 | 1977-03-15 | General Dynamics Corporation | Method for conditioning drilled holes in multilayer wiring boards |
JPS5582781A (en) * | 1978-12-18 | 1980-06-21 | Ibm | Reactive ion etching lithography |
US4277321A (en) * | 1979-04-23 | 1981-07-07 | Bell Telephone Laboratories, Incorporated | Treating multilayer printed wiring boards |
US4340461A (en) * | 1980-09-10 | 1982-07-20 | International Business Machines Corp. | Modified RIE chamber for uniform silicon etching |
US4391034A (en) * | 1980-12-22 | 1983-07-05 | Ibm Corporation | Thermally compensated shadow mask |
US4426274A (en) | 1981-06-02 | 1984-01-17 | International Business Machines Corporation | Reactive ion etching apparatus with interlaced perforated anode |
US4654118A (en) * | 1986-03-17 | 1987-03-31 | The United States Of America As Represented By The Secretary Of The Army | Selectively etching microstructures in a glow discharge plasma |
US4824544A (en) * | 1987-10-29 | 1989-04-25 | International Business Machines Corporation | Large area cathode lift-off sputter deposition device |
US5341980A (en) * | 1990-02-19 | 1994-08-30 | Hitachi, Ltd. | Method of fabricating electronic circuit device and apparatus for performing the same method |
US5340015A (en) * | 1993-03-22 | 1994-08-23 | Westinghouse Electric Corp. | Method for applying brazing filler metals |
US5415753A (en) * | 1993-07-22 | 1995-05-16 | Materials Research Corporation | Stationary aperture plate for reactive sputter deposition |
US5527438A (en) * | 1994-12-16 | 1996-06-18 | Applied Materials, Inc. | Cylindrical sputtering shield |
JP3523405B2 (en) | 1996-01-26 | 2004-04-26 | 株式会社日立製作所 | Pattern forming method by charged beam processing and charged beam processing apparatus |
US6287977B1 (en) | 1998-07-31 | 2001-09-11 | Applied Materials, Inc. | Method and apparatus for forming improved metal interconnects |
US6193855B1 (en) | 1999-10-19 | 2001-02-27 | Applied Materials, Inc. | Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage |
US6350353B2 (en) | 1999-11-24 | 2002-02-26 | Applied Materials, Inc. | Alternate steps of IMP and sputtering process to improve sidewall coverage |
US6344419B1 (en) | 1999-12-03 | 2002-02-05 | Applied Materials, Inc. | Pulsed-mode RF bias for sidewall coverage improvement |
US6554979B2 (en) | 2000-06-05 | 2003-04-29 | Applied Materials, Inc. | Method and apparatus for bias deposition in a modulating electric field |
US6521897B1 (en) * | 2000-11-17 | 2003-02-18 | The Regents Of The University Of California | Ion beam collimating grid to reduce added defects |
US6746591B2 (en) | 2001-10-16 | 2004-06-08 | Applied Materials Inc. | ECP gap fill by modulating the voltate on the seed layer to increase copper concentration inside feature |
WO2003036703A1 (en) * | 2001-10-22 | 2003-05-01 | Unaxis Usa, Inc. | Process and apparatus for etching of thin, damage sensitive layers using high frequency pulsed plasma |
JP4710774B2 (en) * | 2005-11-09 | 2011-06-29 | 株式会社日立製作所 | Manufacturing method of polishing surface plate |
US9779643B2 (en) | 2012-02-15 | 2017-10-03 | Microsoft Technology Licensing, Llc | Imaging structure emitter configurations |
US9578318B2 (en) | 2012-03-14 | 2017-02-21 | Microsoft Technology Licensing, Llc | Imaging structure emitter calibration |
US11068049B2 (en) | 2012-03-23 | 2021-07-20 | Microsoft Technology Licensing, Llc | Light guide display and field of view |
US10191515B2 (en) | 2012-03-28 | 2019-01-29 | Microsoft Technology Licensing, Llc | Mobile device light guide display |
US9558590B2 (en) | 2012-03-28 | 2017-01-31 | Microsoft Technology Licensing, Llc | Augmented reality light guide display |
US9717981B2 (en) | 2012-04-05 | 2017-08-01 | Microsoft Technology Licensing, Llc | Augmented reality and physical games |
US10502876B2 (en) | 2012-05-22 | 2019-12-10 | Microsoft Technology Licensing, Llc | Waveguide optics focus elements |
US10192358B2 (en) | 2012-12-20 | 2019-01-29 | Microsoft Technology Licensing, Llc | Auto-stereoscopic augmented reality display |
US10324733B2 (en) | 2014-07-30 | 2019-06-18 | Microsoft Technology Licensing, Llc | Shutdown notifications |
US20160035539A1 (en) * | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
US10254942B2 (en) | 2014-07-31 | 2019-04-09 | Microsoft Technology Licensing, Llc | Adaptive sizing and positioning of application windows |
US10678412B2 (en) | 2014-07-31 | 2020-06-09 | Microsoft Technology Licensing, Llc | Dynamic joint dividers for application windows |
US10592080B2 (en) | 2014-07-31 | 2020-03-17 | Microsoft Technology Licensing, Llc | Assisted presentation of application windows |
US9787576B2 (en) | 2014-07-31 | 2017-10-10 | Microsoft Technology Licensing, Llc | Propagating routing awareness for autonomous networks |
US9414417B2 (en) | 2014-08-07 | 2016-08-09 | Microsoft Technology Licensing, Llc | Propagating communication awareness over a cellular network |
US9827209B2 (en) | 2015-02-09 | 2017-11-28 | Microsoft Technology Licensing, Llc | Display system |
US11086216B2 (en) | 2015-02-09 | 2021-08-10 | Microsoft Technology Licensing, Llc | Generating electronic components |
US10317677B2 (en) | 2015-02-09 | 2019-06-11 | Microsoft Technology Licensing, Llc | Display system |
US10018844B2 (en) | 2015-02-09 | 2018-07-10 | Microsoft Technology Licensing, Llc | Wearable image display system |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2702274A (en) * | 1951-04-02 | 1955-02-15 | Rca Corp | Method of making an electrode screen by cathode sputtering |
US3087838A (en) * | 1955-10-05 | 1963-04-30 | Hupp Corp | Methods of photoelectric cell manufacture |
DE1083617B (en) * | 1956-07-27 | 1960-06-15 | Gen Motors Corp | Process for producing porous surfaces on chromed cylinder liners of internal combustion engines |
GB1054660A (en) * | 1963-09-16 | |||
US3361659A (en) * | 1967-08-14 | 1968-01-02 | Ibm | Process of depositing thin films by cathode sputtering using a controlled grid |
-
1965
- 1965-10-23 US US502986A patent/US3410774A/en not_active Expired - Lifetime
-
1966
- 1966-09-20 GB GB41823/66A patent/GB1157989A/en not_active Expired
- 1966-09-27 NL NL666613583A patent/NL154560B/en unknown
- 1966-10-19 DE DE1621599A patent/DE1621599C2/en not_active Expired
- 1966-10-21 CH CH1534466A patent/CH447760A/en unknown
- 1966-10-21 BE BE688703D patent/BE688703A/xx unknown
- 1966-11-20 FR FR8091A patent/FR1501165A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992011653A1 (en) * | 1990-12-20 | 1992-07-09 | Mitel Corporation | Preventing of via poisoning by glow discharge induced desorption |
Also Published As
Publication number | Publication date |
---|---|
BE688703A (en) | 1967-03-31 |
NL154560B (en) | 1977-09-15 |
NL6613583A (en) | 1967-04-24 |
DE1621599C2 (en) | 1973-12-06 |
FR1501165A (en) | 1967-11-10 |
US3410774A (en) | 1968-11-12 |
DE1621599B1 (en) | 1973-05-24 |
CH447760A (en) | 1967-11-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |